• 제목/요약/키워드: Ultraviolet intensity

검색결과 196건 처리시간 0.026초

RGB 컬러모델에서 자외선 조명하 박락태(剝落苔)의 설태와 설질 사이의 색 강도 차이에 관한 연구 (Comparison between Colour Intensity of Tongue Body and That of Tongue Coat under the Ultraviolet Light in RGB system of Peeling Tongue Coat Image)

  • 남동현;김지혜;이우범;이상석;홍유식
    • 대한한의진단학회지
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    • 제15권2호
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    • pp.149-158
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    • 2011
  • Objectives: The objective of this study is to compare the colour intensity of tongue body and that of tongue coat under the visible light and the ultraviolet light. Methods: We selected 7 subjects with completely or partially peeled tongue coat among the recruited 94 adults for the experiment. We took each tongue picture under the visible light and the ultraviolet light (315-400 nm) and then extracted sample images from the tongue body and tongue coat regions. Mean, median and mode of colour intensity from the sample images were calculated in 256 RGB system. Results: The green and the blue colour intensities of the tongue coats were significantly higher than those of the tongue bodies under the visible light. In all channels, the red, green and blue, the colour intensities of the tongue coats were significantly higher than those of the tongue bodies under the ultraviolet light. The colour differences between tongue coats and tongue bodies under the ultraviolet light were significantly higher than the colour differences under the visible light. Especially the colour difference under the ultraviolet light was highest in the green channel. Conclusions: We suggested that green colour image of the RGB system taken under the ultraviolet light could be used for more easy separating tongue coat region from tongue body.

분무열분해 공정에 의해 합성된 유로피움이 도핑된 YBO3 형광체의 진공자외선 하에서의 발광 특성 (Photoluminescence Characteristics of Eu-doped YBO3 Phosphor Prepared by Spray Pyrolysis under Vacuum Ultraviolet)

  • 구혜영;강윤찬
    • 한국재료학회지
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    • 제16권8호
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    • pp.485-489
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    • 2006
  • The preparation conditions of $YBO_3$:Eu phosphor particles having the maximum photoluminescence intensity under vacuum ultraviolet in the spray pyrolysis were optimized. The $YBO_3$:Eu phosphor particles prepared from spray solution with stoichiometric amount of boric acid had the maximum photoluminescence intensity. The $YBO_3$:Eu phosphor particles with pure phases were formed at low post-treatment temperatures because of fast reaction of yttrium and boron components without volatilization of boron component. The prepared $YBO_3$:Eu phosphor particles by spray pyrolysis had fine size, narrow size distribution and regular morphology. The photoluminescence intensity of the prepared $YBO_3$:Eu phosphor particles under vacuum ultraviolet was 103% of the commercial $(Y,Gd)BO_3$:Eu phosphor particles.

산소 가스를 이용한 산화아연의 전자 농도와 광발광 세기 조절 (Control of electron concentration and photoluminescence intensity of ZnO thin films using oxygen gas)

  • 강홍성;김재원;이상렬
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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    • pp.185-187
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    • 2004
  • The electron concentration of ZnO thin film fabricated by pulsed laser deposition was controlled by varying oxygen gas pressure. The electron concentration of ZnO was increased from $10^{17}\;to\;10^{19}/cm^3$ as oxygen gas pressure increased from 20 mTorr to 350 mTorr. Ultraviolet(UV) intensity of photoluminescence of ZnO was controlled, too. UV intensity of ZnO was increased as oxygen gas pressure increased from 20 mTorr to 350 mTorr. The relation between electron concentration and UV intensity was investigated.

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UV/TiO2 광촉매반응에 의한 페놀의 분해 특성 (Characteristics of Phenol Degradation by using UV/TiO2 Photocatalysis)

  • 신인수;최봉종;이승목
    • 한국물환경학회지
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    • 제20권5호
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    • pp.488-493
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    • 2004
  • The effects were examined from several conditions of $TiO_2$ photocatalysis reaction to phenols degradation by changing it's reacting conditions such as phenol concentration, pH, $TiO_2$ concentration, $H_2O_2$ concentration, flow rate, and intensity of ultraviolet rays. Phenol degradation was more efficient in low concentration of phenol, neutral pH. Phenol degradation appeared to increase as concentration of $TiO_2$ photocatalyst, that of $H_2O_2$ and intensity of ultraviolet rays increased. As $TiO_2$ dosage increased, initial rate constant k linearly increased. When $H_2O_2$ was injected more than optimum, phenol removal rate didn't increase in proportional to the change of $H_2O_2$ concentration as OH radicals was being consumed. When flow rate is less than $4.75m^3/m^2$ day, phenol removal efficiency appeared to decrease as ultraviolet rays transmission rate becomes low by $TiO_2$ suspension coated in photo reaction column. Meanwhile, initial rate constant according to light intensity change in less than $25mW/cm^2$ appeared to be in proportion to light intensity ($mW/cm^2$) Removal efficiency decreased about 12% after 180 minutes of reaction time while showed stable removal efficiency of 100% after 300 minutes when using regenerated $TiO_2$.

음식점에서 사용하는 자외선 살균소독기 내 자외선 강도 분포 및 자외선 누출 (Distribution of Ultraviolet Intensity and UV Leaking of Commercial UV Sterilizers Used in Restaurants)

  • 목철균;이남훈
    • 한국식품과학회지
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    • 제40권2호
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    • pp.228-233
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    • 2008
  • 식품제조 및 조리 현장에 널리 보급되어 사용되고 있는 자외선 살균소독기의 유효성과 안전성을 검정하기 위하여 자외선램프의 출력 및 거리에 따른 자외선 강도를 측정하였고, 시판 자외선 살균소독기 5종에 대하여 장치 내 자외선 분포를 조사하였으며, 자외선 누출을 검정하였다. 자외선 강도는 램프 출력에 비례하였으며, 근거리(<25 cm)에서는 램프로부터의 거리에, 원거리(>25 cm)에서는 거리의 제곱에 반비례하여 변화하였다. 자외선 살균소독기 내 자외선 강도는 선반의 중앙부에서 가장 높았고, 선반의 중심에서 전후 또는 좌우 방향으로 멀어짐에 따라 감소하였다. 선반 위치에 따른 자외선 강도는 상단 선반과 하단 선반사이에 큰 차이를 보였으며, 각 선반의 외곽부위에서는 자외선강도가 극히 약화되었다. 문틈 등 틈새가 있을 경우 이를 통한자외선 누출은 상당한 수준에 달하였으며, 누출 자외선 강도는거리에 따라 낮아졌다. 자외선이 누출되는 자외선 살균소독기에 대하여 선진국의 자외선 노출 허용량을 근거로 안전작업거리를 제시하였다.

분무열분해법을 이용하여 M3MgSi2O8:Eu2+ (M=Ca, Sr, Ba) 형광체 분말의 VUV 특성 최적화 (Optimization of VUV Characteristics of M3MgSi2O8:Eu2+ (M=Ca, Sr, Ba) Phosphor by Spray Pyrolysis)

  • 정유리;정경열
    • 한국분말재료학회지
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    • 제15권5호
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    • pp.399-404
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    • 2008
  • Spray pyrolysis was applied to prepare $M_{3}MgSi_{2}O_{8}:Eu^{2+}$ (M=Ca, Sr, Ba) blue phosphor powder. The library of a Ca-Sr-Ba ternary system was obtained by a combinatorial method combined with the spray pyrolysis in order to optimize the luminescent property under vacuum ultraviolet (VUV) excitation. 10 potential compositions were chosen from the first screening. The emission shifted to longer wavelength as Ca became a dominant element and the emission intensity was greatly reduced in the composition region at which Ba is dominant element. On the base of the first screening result, the second fine tuning was carried out in order to optimize the luminescence intensity under VUV excitation. The optimal composition for the highest luminescence intensity was $(Ca_{1.7},\;Sr_{0.3},\;Ba_{1.0})Si_{2}O_{8}:Eu^{2+}$ which had the color coordinate of (0.152, 0.072) and about 64% emission intensity of $BaMgAl_{10}O_{17}$ (BAM) phosphor.

광 루미네슨스 다공질 실리콘을 이용한 새로운 자외선 센서 (A Novel Ultraviolet Sensor using Photoluminescent Porous Silicon)

  • 민남기;고주열;강철구
    • 대한전기학회논문지:전기물성ㆍ응용부문C
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    • 제50권9호
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    • pp.444-449
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    • 2001
  • In this paper, a novel ultraviolet sensor is presented based on a photoluminescent porous silicon. Porous silicon layer was formed by chemical etching of surface of pn junction in a $HF(48%)-HNO_3(60%)-H_20$ solution. Incident ultraviolet(UV) light is converted to visible light by photoluminescent porous silicon layer, and then this visible light generates electron-hole pairs in the pn junction, which produces a photocurrent flow through the device. In order to maximize detection efficiency, the peak sensitivity wavelength of the pn junction diode was matched with the peak wavelength of Photoluminescence from porous silicon layer. The porous silicon ultraviolet sensor showed a large output current as UV intensity increases and but very low sensitivity to visible light. The detection sensitivity of porous silicon sensor was calculated as 2.91mA/mW. These results are expected to open up a possibility that the present porous silicon sensor can be used for detecting UV light in a visible background, compared to silicon UV detectors which have an undesirable response to visible light.

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자외선 조사로 유발된 피부 염증성 반응에 맥동성 초음파가 미치는 영향 (The Effect of Pulsed Ultrasound on Skin Inflammatory Reaction Induced by Ultraviolet Irradiation)

  • 이정우;박수지;윤세원
    • The Journal of Korean Physical Therapy
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    • 제23권4호
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    • pp.53-58
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    • 2011
  • Purpose: This study aims to examine the effects of pulsed ultrasound on skin inflammatory reaction induced by ultraviolet irradiation. Methods: Twenty subjects were selected for this study. Inflammatory reaction was induced by ultraviolet irradiation in two areas of the lumbar region of the subjects. Pulsed ultrasound (3 MHz) was applied to one of the two areas of inflammatory reaction at a pulse ratio of 1:4, intensity of $0.5W/cm^2$, once a day for 5 min, and pulsed ultrasound was not applied to the other area. Wound color (chromatic red), luminance (gray) and wound contraction (area) were measured using digital imaging processing method. Results: There was a significant difference in wound color (chromatic red) in the interaction between time and area. There was a significant difference in luminance in the interaction between time and area. There was a significant difference in wound contraction between the two areas. Conclusion: These results indicate that pulsed ultrasound increased the wound contraction rate and reduced the inflammatory reaction activity such as erythema induced by ultraviolet irradiation.

Measurement of EUV (Extreme Ultraviolet) and electron temperature in a hypocycloidal pinch device for EUV lithography

  • Lee, Sung-Hee;Hong, Young-June;Choi, Eun-Ha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.108-108
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    • 2010
  • We have generated Ne-Xe plasma in dense plasma focus device with hypocycloidal pinch for extreme ultraviolet (EUV) lithography and investigated an electron temperature. We have applied an input voltage 4.5 kV to the capacitor bank of 1.53 uF and the diode chamber has been filled with Ne-Xe(30%) gas in accordance with pressure. If we assumed that the focused plasma regions satisfy the local thermodynamic equilibrium (LTE) conditions, the electron temperature of the hypocycloidal pinch plasma focus could be obtained by the optical emission spectroscopy (OES). The electron temperature has been measured by Boltzmann plot. The light intensity is proportion to the Bolzman factor. We have been measured the electron temperature by observation of relative Ne-Xe intensity. The EUV emission signal whose wavelength is about 6~16 nm has been detected by using a photo-detector (AXUV-100 Zr/C, IRD) and the line intensity has been detected by using a HR4000CG Composite-grating Spectrometer.

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자외선 조사가 Ovalbumin의 분자적 성질에 미치는 영향 (Effect of Ultraviolet Irradiation on Molecular Properties of Ovalbumin)

  • 조용식;송경빈;산전경로;한귀정
    • Applied Biological Chemistry
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    • 제51권4호
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    • pp.276-280
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    • 2008
  • 식품 allergen 저감화 수단으로 자외선 조사의 타당성을 검토하고 자외선조사가 식품 단백질의 분자적 성질에 미치는 영향을 조사하고자 ovalbumin 용액에 자외선을 조사한 후 단백질의 분자량 분포와 2차구조 및 3차구조의 변화를 조사하였다. SDS-PAGE와 Gel permeation chromatography 결과 ovalbumin은 자외선 조사에 의하여 단백질이 분해되고 조사시간이 증가할수록 펩티드가 중합하는 형태를 나타냈다. Circular dichroism 연구는 자외선 조사에 의하여 ${\alpha}$-helix 구조가 감소하고 조사시간이 증가할 경우 compact denatured ovalbumin의 구조를 나타내는 2차구조의 변화를 나타냈다. 자외선 조사된 ovalbumin의 형광스펙트럼은 조사시간이 증가할수록 단백질의 maximum emission intensity가 감소하는 3차구조의 변화를 나타냈다. 결과적으로 자외선 조사는 ovalbumin의 분자적 성질을 변화시키며 allergen의 항원성을 변화시키는 수단으로 이용가능성을 시사한다.