• Proceedings of the KSME Conference
• /
• 2003.04a
• /
• pp.1332-1336
• /
• 2003

An experimental method is presented to maximize the replication quality of UV-molded micro-optical components. It is important to maximize the replication quality, because one can obtain the replicated micro-optical components with desired properties by accurate control of the shape. In the present study, a simple technique to avoid micro-air bubbles was first suggested. The effects of the UV-curing dose and the compression pressure on the replication quality of UV-molded structure were examined experimentally. Finally, as a practical application of the process design method, microlens arrays with diameters between 8 ${\mu}m$ and 96 ${\mu}m$ were fabricated by the present method, and the replication quality and the optical properties of the replicated microlens were measured and analyzed.

• Journal of Industrial Technology
• /
• v.27 no.A
• /
• pp.15-18
• /
• 2007

This study investigated disinfection effect by general water purifier and water purifier with UV light disinfection. The results are as follows : (i) The general bacteria existed plentifully in a storage tank before treatment (ii) Water treated in water purifier did not meet the water treatment regulation standard since the presence of bacteria, whereas with UV light application the regulation standard is totally satisfied. (iii) Photocatalytic disinfection process with UV light in the presence of $TiO_2$ more effectively killed general bacteria than UV light only.

• Journal of Sensor Science and Technology
• /
• v.17 no.5
• /
• pp.346-349
• /
• 2008

A metal-semiconductor-metal (MSM) ultraviolet (UV) photodetector (PD) is proposed as an effective UV sensing device for integration with a GaN n-channel MISFET on auto-doped p-type GaN grown on a silicon substrate. Due to the high hole barrier of the metal-p-GaN contact, the dark current density of the fabricated MSM PD was less than $3\;nA/cm^2$ at a bias of up to 5 V. Meanwhile, the UV/visible rejection ratio was 400 and the cutoff wavelength of the spectral responsivity was 365 nm. However, the UV/visible ratio was limited by the sub-bandgap response, which was attributed to defectrelated deep traps in the p-GaN layer of the MSM PD. In conclusion, an MSM PD has a high process compatibility with the n-channel GaN Schottky barrier MISFET fabrication process and epitaxy on a silicon substrate.

• Journal of Sensor Science and Technology
• /
• v.25 no.4
• /
• pp.252-256
• /
• 2016

Epitaxially grown GaN layers have a high surface state density, which typically results in a surface leakage current and a photoresponse in undesirable wavelengths in GaN optoelectronic devices. Surface passivation is, therefore, an important process necessary to prevent performance degradation of GaN UV photodetectors. In this study, we propose oxygen-enhanced thermal treatment as a simple surface passivation process without capping layers. The GaN UV photodetector fabricated using a thermal annealing process exhibits improved electrical and photoresponsive characteristics such as a reduced dark current and an enhanced photoresponsive current and UV-to-visible rejection ratio. The results of this study show that the proposed surface passivation method would be useful to enhance the reliability of GaN-based optoelectronic devices.

• Tribology and Lubricants
• /
• v.26 no.5
• /
• pp.297-302
• /
• 2010

This study is focused on the resin layer formation of UV imprinting process by changing imprinting pressure and period. The mold shape is made for the process of window open over the pattern transfer area and the imprinting period is assigned as the time just before the UV light curing. The residual layer is measured by changing the imprinting period and pressure magnitude, and the measured data of residual layer provides useful information for the design of the process conditions of imprinting processes.

• Proceedings of the Korean Society for Technology of Plasticity Conference
• /
• 2007.10a
• /
• pp.100-103
• /
• 2007

A microlens array has been required to improve light conversion efficiency in image sensors. A microlens array can be usually fabricated by photoresist reflow, hot-embossing, micro injection molding, and UV-imprinting. Among these processes, a UV-imprinting, which is operated at room temperature with relatively low applied pressure, can be a desirable process to integrate microlens array on image sensors, because this process provides the components with low thermal expansion, enhanced stability, and low birefringence, furthermore, it is more suitable for mass production of high quality microlens array. In this study, to analyze the optical properties of the wafer scale microlens array integrated image sensor, another wafer scale simulated image sensor chip array was designed and fabricated. An aspherical square microlens was designed and integrated on a simulated image sensor chip array using a UV-imprinting process. Finally, the optical performances were measured and analyzed.

• Journal of Korean Society of Environmental Engineers
• /
• v.37 no.1
• /
• pp.34-44
• /
• 2015

This study was initiated to remove free cyanide from wastewater using the process of photocatalytic oxidation. UV lamp has been extensively used as a light source in conventional photocatalytic oxidation, but numerous drawbacks of UV lamp have been raised so far. Thus, this study focused on evaluating the applicability of UV LED as an alternative light source to overcome the drawbacks of UV lamp. Furthermore, the effects of diverse operational parameters on the performance of process were investigated. The results demonstrated the applicability of UV LED as a substitute of UV lamp. Also, the results show that the performance of process was improved by the increase in the number of UV LEDs used. To acquire economic feasibility as well as high efficacy, however, it is required to determine the optimum number of UV LED prior to practical implementation of the process. Among the three types of photocatalysts (anatase, rutile, and Degussa P25) tested, the Degussa P25 showed the greatest performance, and it was proven that the process was not improved as much as the Degussa P25 through simple mixing of anatase and rutile without any pretreatment. In addition, the removal efficiency of free cyanide appeared to be increased with the decrease in the particle size of $TiO_2$ photocatalyst. Besides, the process was enhanced with injection of oxygen which is considered as a major electron acceptor in the photocatalytic oxidation.

• Journal of the Korean GEO-environmental Society
• /
• v.23 no.10
• /
• pp.5-12
• /
• 2022

In this study, we investigated the UV/H₂O₂ process to treat organic compound-spilled water. In consideration of usage and properties, benzene, toluene, phenol, and methyl ethyl ketone were selected as representative organic compounds. The selected material was first removed by natural volatilization and aeration that simulated the pretreatment of the prcoess. After that, UV/H₂O₂ oxidation experiments were conducted under various H₂O₂ concentration conditions. Benzene and toluene were mostly volatilized before reaching the oxidation process due to high volatility. Considering the volatility, oxidation experiments were performed at an initial concentration of 5 mg/L for benzene and toluene. The UV/H₂O₂ oxidation process achieved 100% of benzene and toluene removal after 20 minutes under all hydrogen peroxide concentration conditions. The phenol was rarely removed from the volatile experiments and oxidation tests were performed at an initial concentration of 50 mg/L. The process showed 100 % phenol removal after 30 minutes under 0.12 v/v% of hydrogen peroxide concentration condition. Methyl ethyl ketone was removed 58 % after 2 hours of volatile experiments. The process showed 99.7% Methyl ethyl ketone removal after 40 minutes under 0.08 v/v% of hydrogen peroxide concentration condition. It was confirmed that the UV/H₂O₂ process showed high decomposition efficiency for the four selected organic compounds, and identified the amount of hydrogen peroxide in classified organic contaminants.

• Proceedings of the Materials Research Society of Korea Conference
• /
• 1996.11a
• /
• pp.152-153
• /
• 1996

• Journal of the Korean GEO-environmental Society
• /
• v.7 no.4
• /
• pp.5-13
• /
• 2006

This study was conducted to evaluate the application of $UV/TiO_2/H_2O_2$ process for treating humic acid and heavy metals in surface water. Removal efficiency of $UV/TiO_2/H_2O_2$ process was much more efficient than that of $UV/TiO_2$ process for humic acid and heavy metals removal. The removal rate of humic acid and heavy metals increased with the increase of $TiO_2$ dosage and UV intensity, however decreased with more than 0.3 g/L of $TiO_2$ dosage. The addition of $H_2O_2$ as an oxidant was a positive effect for the removal rate of humic acid and heavy metals especially in the concentration of 50 mg/L $H_2O_2$.