• Title/Summary/Keyword: UV pattern

Search Result 330, Processing Time 0.024 seconds

Quantitative and Pattern Recognition Analyses for the Quality Evaluation of Cimicifugae Rhizoma by HPLC

  • Fang, Zhe;Moon, Dong-Cheul;Son, Kun-Ho;Son, Jong-Keun;Min, Byung-Sun;Woo, Mi-Hee
    • Bulletin of the Korean Chemical Society
    • /
    • v.32 no.1
    • /
    • pp.239-246
    • /
    • 2011
  • In this study, quantitative and pattern recognition analysis for the quality evaluation of Cimicifugae Rhizoma using HPLC/UV was developed. For quantitative analysis, three major bioactive phenolic compounds were determined. The separation conditions employed for HPLC/UV were optimized using ODS $C_{18}$ column ($250{\times}4.6mm$, $5{\mu}M$) with isocratic elution of acetonitrile and water with 0.1% phosphoric acid as the mobile phase at a flow rate of 1.0 mL/min and a detection wavelength of 323 nm. These methods were fully validated with respect to the linearity, accuracy, precision, recovery, and robustness. The HPLC/UV method was applied successfully to the quantification of three major compounds in the extract of Cimicifugae Rhizoma. The HPLC analytical method for pattern recognition analysis was validated by repeated analysis of twelve reference samples corresponding to five different species of Cimicifugae Rhizoma and seventeen samples purchased from markets. The results indicate that the established HPLC/UV method is suitable for the quantitative analysis and quality control of multi-components in Cimicifugae Rhizoma.

A Study on Properties of UV-Curing Silver Paste by Dispersing Agent Characteristic (분산제 특성에 따른 UV 경화형 Ag Paste의 물성 연구)

  • Son, Min-Jeong;Nam, Su-Yong;Kim, Sung-Bin
    • Journal of the Korean Graphic Arts Communication Society
    • /
    • v.30 no.2
    • /
    • pp.59-68
    • /
    • 2012
  • As one of the eletronic device industries has been developed by using a recent printing method, the consumption of Ag paste has been on the rise as well. The printing method has simple processes in comparison with other methods. Also it enables to be large-scaled and to lower price ranges. If UV curing system would be applied to the printing method, energy consumption and dangerousness from curing system can be minimized in a short period of time so that its method can be more eco-friendly. This study conducted an experiment in order to make UV curing Ag paste which is feasible to implement micro patterns with different dispersing agents. The purpose of the study is to analysis the suitable printability for micro pattern and to test dispersibility, hardening properties, conductivity and adhesive stength by measuring viscosity, TI(thixotropy index), G', G", $tan{\delta}$(G"/G') after making paste. We have experimented with four dispersing agents. After We did an analysis of characteristic of rheology, conductivity and adhesive stength, etc, We confirmed that the paste added FP 3060 has excellent dispersibility, conductivity and adhesive stength. If the paste has excellent dispersibility, we will expect that micro pattern is made by that.

Analytic and Numerical Study for air Bubble Defect of UV-NIL Process (UV-NIL 공정의 기포 결함에 대한 해석적 및 수치적 연구)

  • Seok, Jeong-Min;Kim, Nam-Woong
    • Journal of the Korean Society of Manufacturing Technology Engineers
    • /
    • v.21 no.3
    • /
    • pp.473-478
    • /
    • 2012
  • In this paper, the air bubble formation mechanism in the rectangular and triangular line-and-space pattern during dispensing UV Nanoimprint Lithography (UV-NIL) at an atmospheric condition is studied. To investigate the air bubble formation, an analytic model based on geometric approach and a numerical model based on CFD(computational fluid dynamics) were used in the analysis. It was found in the numerical analysis that every time the flow front passed through a corner of the pattern, it proceeded with a newly formed shape, occurring due to interface reconfiguration, since the flow fronts were formed such that they minimized the surface energy. Moreover, the conditions for the air bubble formation were investigated by applying the analytic analysis based on geometric approach and the numerical analysis. Good overall agreement was found between the analytic and numerical analysis.

A study on releasing high aspect ratio micro features formed with a UV curable resin (UV경화수지의 고형상비 미세패턴 이형에 관한 연구)

  • Kwon, Ki-Hwan;Yoo, Yeong-Eun;Kim, Chang-Wan;Park, Young-Woo;Je, Tae-Jin;Choi, Doo-Sun
    • Proceedings of the KSME Conference
    • /
    • 2008.11a
    • /
    • pp.1833-1836
    • /
    • 2008
  • Recently as the micro surface features become higher and diverse in their shapes, the releasing of the molded features becomes more crucial for manufacturing of the micro patterned products. The higher aspect ratio of the features or more complex shape of the features results in larger releasing force, elongation or cohesive failure of the features during the releasing. Another issue would be the uniformity of the released surface features after molding, especially for applications with large area surface. The micro patterned optical film, one of typical applications for micro surface features, consists of two layers, the thermoplastic base film and the micro formed UV resin layer. Therefore two interfaces are typically involved during the forming of this micro featured film; one is between the base film and the UV resin and another is between the resin and the pattern master. To improve the releasing of the molded surface features, the adhesive characteristic was investigated at these two interfaces. A PET film was used as a base film and two UV curable resins with different surface energy were prepared for different adhesiveness. Also the two different pattern masters were employed; one is made from brass-copper alloy and fabricated with PMMA. The adhesiveness at each interface was measured for some combinations of these base film, UV resins and the masters and the effect of this adhesiveness on the releasing was investigated.

  • PDF

Mapping of UV-B sensitive gene in Arabidopsis by CAPS markers (CAPS marker에 의한 Arabidopsis의 자외선 B 감수성 유전자 지도작성)

  • 박홍덕;김종봉
    • Journal of Life Science
    • /
    • v.12 no.6
    • /
    • pp.715-720
    • /
    • 2002
  • A mutant Arabidopsis thaliana which is very sensitive to Ultraviolet-B(UV-B) radiation has been isolated by ethylmethane sulfonate(EMS) mutagenesis. Genetic cross proved the UV-sensitive gene(uvs) to segregate as a single Mendelian locus. For mapping of uvs, we crossed Arabidopsis thaliana Lansberg with uvs plant(Columbia), and made F2 plants by F1 selfcross. We designed 10 kinds of CAPS marker primers. Each primers amplifies a single mapped DNA sequence from uvs and Lansberg erecta ecotyres. Also identified was at least one restriction endonuclase for each of these PCR product that generates ecotype-specific digestion pattern. We got crossing over value of UB-sensitivity and each CAPS marker which located on different chromosome arm. The value of crossing over showed that uvs was linked to LFY3 which was on chromosome 5.

Fabrication of Ceramic Line Pattern by UV-Nanoimprint Lithography of Inorganic Polymers (무기고분자의 나노임프린트법에 의한 세라믹 선형 패턴의 제조)

  • Park Jun-Hong;Pham Tuan-Anh;Lee Jae-Jong;Kim Dong-Pyo
    • Polymer(Korea)
    • /
    • v.30 no.5
    • /
    • pp.407-411
    • /
    • 2006
  • The SiC-based ceramic nanopatterns were prepared by placing polydimethylsiloxane (PDMS) mold from DVD master on the spincoated polyvinylsilaeane (PVS) or allylhydridopolycaybosilane (AHPCS) as ceramic precursors to fabricate line pattern via UV-nanoimprint lithography (UV-NIL), and subsequent pyrolysis at $800^{\circ}C$ in nitrogen atmosphere. As the dimensional change of polymeric and ceramic patterns was comparatively investigated by AFM and SEM, the shrinkage in height was 38.5% for PVS derived pattern and 24.1% for AHPCS derived pattern while the shrinkage in width was 18.8% for PVS and 16.7% for AHPCS. It indicates that higher ceramic yield of the ceramic precursor resulted in less shrinkage, and the strong adhesion between the substrate and the pattern caused anisotropic shrinkage. This preliminary work suggests that NIL is a promissing route for fabricating ceramic MEMS devices, with the development on the shrinkage control.

Development of Optical Illusion Design Pattern for Furniture Using a UV Curing Resin (UV 경화성 수지를 이용한 가구용 옵티컬 일루젼 디자인 패턴 개발)

  • Kim, Ki-Chul
    • Journal of Convergence for Information Technology
    • /
    • v.7 no.1
    • /
    • pp.43-48
    • /
    • 2017
  • The design trend is changed with the times. The design trend of recent 21 century is eco-friendly design. The optical illusion design is a new trend of digital convergence era. In this study, optical illusion patterns were designed for furniture with eco-friendly UV-curable resin. The micro-patterns of optical illusion design were fabricated with the micro-mold which was mastered using a semiconductor micro-fabrication process by photolithography technique. The micro-patterns of optical illusion design were manufactured on PET film with a roll-to-roll process using a UV-curable resin. The manufactured PET film of optical illusion micro-pattern exhibits hologram effect, optical illusion effect, and texture of metal with the backside digital printing of metal tone. The furniture of new design concept so-called emotional furniture was manufactured with the various optical illusion design patterns. The optical illusion design patterns by UV mold prospect a new trend of interior design materials.

Fabrication of Three-Dimensional Reflective White Pattern using Dry-Film Resist

  • Jun, Hwa Joon;Na, Dae Gil;Kwon, Young Hoon;Kwon, Jin Hyuk
    • Journal of the Optical Society of Korea
    • /
    • v.19 no.1
    • /
    • pp.80-83
    • /
    • 2015
  • White reflective patterns are very difficult to fabricate, due to the scattering and reflection of light, especially when the pattern size goes down to micron size. A reflective white barrier structure of height $50{\mu}m$ and width $80{\mu}m$ was fabricated using dry-film resist as an intermediate reverse pattern. The reverse dry-film resist pattern was coated with an $SiO_2$ layer by sputtering, to protect the resist from chemical attack by the radical molecules in UV white resin. The UV white resin was applied on the dry-film resist pattern and then cured with ultraviolet light. The fine three-dimensional reflective patterns were finished by removing the dry-film resist.

Development of UV imprinting process for micro lens array of image sensor (UV 임프린트를 이용한 이미지 센서용 마이크로 렌즈 어레이 성형 공정 개발)

  • Lim, Ji-Seok;Kim, Seok-Min;Jeong, Gi-Bong;Kim, Hong-Min;Kang, Shin-Il
    • Transactions of the Society of Information Storage Systems
    • /
    • v.2 no.2
    • /
    • pp.91-95
    • /
    • 2006
  • High-density image sensors rave microlens array to improve photosensitivity. It is conventionally fabricated by reflow process. The reflow process has some weak points. UV imprinting process can be proposed as an alternative process to integrate microlens array on photodiodes. In this study, the UV imprionting process to integrate microlens array on image sensor was developed using UV transparent flexible mold and simulated image sensor substrate. The UV transparent flexible mold was fabricated by replicating master pattern using siliconacrylate photopolymer. The releasing property and shape accuacy of siliconacrylate mold was analysed. After UV imprinting process, replication quality and align accuracy was analysed.

  • PDF