• 대한기계학회:학술대회논문집
• /
• 대한기계학회 2008년도 추계학술대회A
• /
• pp.1833-1836
• /
• 2008

Recently as the micro surface features become higher and diverse in their shapes, the releasing of the molded features becomes more crucial for manufacturing of the micro patterned products. The higher aspect ratio of the features or more complex shape of the features results in larger releasing force, elongation or cohesive failure of the features during the releasing. Another issue would be the uniformity of the released surface features after molding, especially for applications with large area surface. The micro patterned optical film, one of typical applications for micro surface features, consists of two layers, the thermoplastic base film and the micro formed UV resin layer. Therefore two interfaces are typically involved during the forming of this micro featured film; one is between the base film and the UV resin and another is between the resin and the pattern master. To improve the releasing of the molded surface features, the adhesive characteristic was investigated at these two interfaces. A PET film was used as a base film and two UV curable resins with different surface energy were prepared for different adhesiveness. Also the two different pattern masters were employed; one is made from brass-copper alloy and fabricated with PMMA. The adhesiveness at each interface was measured for some combinations of these base film, UV resins and the masters and the effect of this adhesiveness on the releasing was investigated.

• 한국정밀공학회:학술대회논문집
• /
• 한국정밀공학회 2005년도 춘계학술대회 논문집
• /
• pp.672-675
• /
• 2005

To imprint 70-nm wide line-patterns, we used a newly developed ultraviolet nanoimprint lithography (UV-NIL) process in which an elementwise patterned stamp (EPS), a large-area stamp, and pressurized air are used to imprint a wafer in a single step. For a single-step UV-NIL of a 4' wafer, we fabricated two identical $5'\times5'\times0.09'(W{\times}L{\times}H)$ quartz EPSs, except that one is with nanopatterns and the other without nanopatterns. Both of them consist of 16 small-area stamps, called elements, each of which is $10\;mm\;\times\;10\;mm$. UV-curable low-viscosity resin droplets were dispensed directly on each element of the EPSs. The volume and viscosity of each droplet are 3.7 nl and 7 cps. Droplets were dispensed in such a way that no air entrapment between elements and wafer occurs. When the droplets were fully pressed between ESP and wafer, some incompletely filled elements were observed because of the topology mismatch between EPS and wafer. To complete those incomplete fillings, pressurized air of 2 bar was applied to the bottom of the wafer for 2 min. Experimental results have shown that nanopatterns of the EPS were successfully transferred to the resin layer on the wafer.

• 폴리머
• /
• 제36권4호
• /
• pp.531-535
• /
• 2012

폴리아닐린(PANI) 나노섬유를 전도성 충전제로 사용하여 광경화형 전도성 투명필름을 제조하였다. 화학산화중합(chemical oxidation polymerization)으로 나노섬유 구조의 산화형 폴리아닐린(ES-PANI)을 합성하였다. ES-PANI는 디도핑을 통해 환원형 폴리아닐린(EB-PANI)으로 유도하였다. 이것을 전도성 충전제의 전구체로 사용하여 도데실벤젠설폰산(DBSA)이 포함되어 있는 광경화형 레진에 분산시키면 재도핑된 재산화형 폴리아닐린(rES-PANI)을 얻을 수 있었다. 이런 과정을 통해 나노섬유 형태가 유지되면서 높은 전도성과 분산안정성이 우수한 광경화형 전도성 레진용액을 제조할 수 있었다. 제조된 광경화형 전도성 레진용액은 상온에서 3달 정도 두어도 rES-PANI 충전제의 침전물이 생기지 않았다. 또한 이 용액을 폴리(메틸 메타크릴레이트)(PMMA) 기재 위에 스핀코팅 후 광경화하여 약 $5{\mu}m$ 두께의 전도성 투명필름을 제조하였다. rES-PANI 나노섬유 농도가 1.4 wt%일 때 표면저항 $6.5{\times}10^8{\Omega}/sq$, 550 nm 파장에서 91.1%의 투과도를 보였다. ES-PANI의 디도핑-재도핑(dedoping-redoping) 과정을 통해 광경화형 전도성 레진용액에 분산된 PANI는 농도에 따라 필름표면저항과 광학적 투명도를 조절할 수 있는 대전방지 보호필름을 제작하는 새로운 방법을 제시하였다.

• 한국정밀공학회:학술대회논문집
• /
• 한국정밀공학회 2010년도 추계학술대회 논문집
• /
• pp.363-364
• /
• 2010

• 한국인쇄학회지
• /
• 제16권3호
• /
• pp.29-41
• /
• 1998

The ultraviolet(UV)-curable materials wildly have been used as a ink and coating materials. A according to measure UV polymerization phase separation of acryl groups 2,3,4-functional monomer, a few experiments were performed gel fraction, dynamic viscosity of alkyd resin blend system. Dependence of photoiniator concentration and various monomer, alkyd resin content investigated structural changes of films cured by UV irradiation. Curing rate measured UV irradiation under $25^{\circ}C$, cell gap 7cm and film thickness 100${\mu}{\textrm}{m}$. In results, it was through that the viscoelastic properties of films cured with increasing the ratios of monomer/alkydresin contents are network polymer in properties such as viscoelasticity.

• 공업화학
• /
• 제24권2호
• /
• pp.148-154
• /
• 2013

UV 경화형 아크릴 점착제는 세상에서 매우 다양한 형태로 이용되는데, 반도체 산업을 기반으로 하는 웨이퍼 제조공정에서도 이용되고 있다. 특히 반도체에 사용되는 웨이퍼가 더욱 얇아짐에 따라, UV 경화형 아크릴 점착제는 더욱 적절한 점착 성능을 요구 받고 있다. 본 연구는 2-EHA (2-ethyl hexyl acrylate), 2-EHMA (2-ethyl hexyl methacrylate), SM (styrene monomer), 2-HEA (2-hydroxy ethyl acrylate), acrylic acid 모노머를 이용하여 hydroxy기를 가진 아크릴 수지점착제를 합성한 후 MOI (methacryloyloxyethyl isocyanate)의 투입량 조절을 통한 경화 특성을 향상시킬 수 있는 부가반응을 시킨 이소시아네이트 변성 아크릴 수지 점착제를 제조하여, 적절한 접착 성능을 알아보고, 수산기 값의 정도와 UV 조사량의 차이에 따라 웨이퍼 제조의 최적화된 조건을 찾았다. 시험 결과 UV 경화형 점착제에서 수산기(Hydroxyl group, -OH)와 이소시아네이트기(isocyanate group, -NCO)의 1 : 1 당량비로 이소시아네이트 경화제를 사용할 경우 수산기값이 클수록, UV 조사 전 박리력이 감소하였다. UV 조사량이 증가할수록 높은 경화 특성 때문에 박리접착 강도는 낮아졌다.

• 한국인쇄학회:학술대회논문집
• /
• 한국인쇄학회 2001년도 국제학술발표회
• /
• pp.127-134
• /
• 2001

• 폴리머
• /
• 제36권4호
• /
• pp.536-541
• /
• 2012

실리카 입자가 첨가된 광경화성 임프린트용 복합체를 제조하여 실리카 양에 따른 경화 특성과 전사된 수 백 나노미터 크기의 임프린트 패턴 형성에 관한 결함을 조사하였다. 상온에서 UV 경화한 임프린트 레진은 실리카 양이 증가할수록 탄성률이 커지고 수축률이 줄어드는 것을 알 수 있었다. 그러나 실리카 입자의 양이 7 wt% 이상인 경우 전사된 나노기둥끼리 서로 달라붙는 결함을 보이는데, 이는 실리카 입자가 광반응을 방해하여 임프린트 레진의 경화가 불완전하게 되면서 광경화된 레진의 점성이 증가했기 때문이다. 임프린트 레진에 실리카 입자를 충전제로 사용하면 경화 후 나노 패턴의 강도를 증가하여 형태를 유지하는데 도움이 되지만, 실리카 양이 7 wt% 이상이 되면 오히려 광반응 전환율이 떨어져 임프린트 공정에 의한 나노 패턴의 전사가 어려운 것을 알 수 있다.

• 한국인쇄학회지
• /
• 제18권1호
• /
• pp.59-69
• /
• 2000

The characteristics of liquid crystal polymer composite(LCPC) films are possessed of large-area and flexible display, polarizer free, high contrast, wide angle of visual filed and high responsiveness. It is well known that the LCPC films consisting of a continuous LC phase embeded in a three-dimentional network of polymer matrix are formed by photopolymerization-induced phase separation. In this study, we have investigated the point that both liquid crystals and polymer having different properties have to coexiste as composed films. The purpose of this study has been the development of new application with liquid crystals and UV-curable monomers. In the results abtained on the miscibility of nematic liquid crystal and UV-curable resins, difunctional monomer HX-620 turned out to shows the best. From the results abtained on structures, electro-optical properties and dynamic visocoelasticity for LCPC films, the best mixing ratio of monomer to LC mixture were 3/7(photoinitiator; 4wt%) by weight, and this ratio has been provided the most thermal stability for LCPC films. In the results abtained on structure and discoloration properties of LCPC films, it has been demonstrated that consiste of a 8:2 mixture of chiral nematic liquid crystal and HX-620 has the greatest domain and it was the best discoloration.

• 한국인쇄학회지
• /
• 제18권2호
• /
• pp.13-27
• /
• 2000

The UV curing industry is one of the most wide application fields in the coating and printing inks industry. Applications extend to general coating for paper, board, wood tapes, compact discs and holograms, ink, photoresists for imaging processes and adhesives for welding and sealing in circuit boards. The UV-curing resins have advantages of quick set, space saving, clean environment and efficient use of energy. The purpose of this study has been to control of morphology structures consist of UV-curing resins and alkyd resins. Therefore, we are investigated with regard to rheology properties on the exposure to UV-curing, structures and mechanical properties for curing films.