• 제목/요약/키워드: UV Pulse Laser

검색결과 48건 처리시간 0.034초

피코초 펄스 레이저를 이용한 사파이어 웨이퍼 스크라이빙에 관한 연구 (A Study on Sapphire Wafer Scribing Using Picosecond Pulse laser)

  • 문재원;김도훈
    • 한국레이저가공학회지
    • /
    • 제8권2호
    • /
    • pp.7-12
    • /
    • 2005
  • The material processing of UV nanosecond pulse laser cannot be avoided the material shape change and contamination caused by interaction of base material and laser beam. Nowadays, ultra short pulse laser shorter than nanosecond pulse duration is used to overcome this problem. The advantages of this laser are no heat transfer, no splashing material, no left material to the adjacent material. Because of these characteristics, it is so suitable for micro material processing. The processing of sapphire wafer was done by UV 355nm, green 532nm, IR 1064nm. X-Y motorized stage is installed to investigate the proper laser beam irradiation speed and cycles. Also, laser beam fluence and peak power are calculated.

  • PDF

UV 극초단 레이저 펄스의 발생과 증폭 (UV ultra-short laser pulse generation and amplification)

  • 이영우
    • 한국정보통신학회:학술대회논문집
    • /
    • 한국해양정보통신학회 2004년도 춘계종합학술대회
    • /
    • pp.324-326
    • /
    • 2004
  • 엑시머 레이저로 여기되는 분포제환 색소레이저(DFDL: Distributed Feedback Dye Laser)로부터 616nm의 레이저 펄스를 얻고, 이를 제2고조파 발생에 의한 파장변환을 통해 308nm의 극초단 자외 광펄스를 얻었다. 또한 3단의 XeCl 엑시머 레이저 증폭기를 구성하여 자외 광펄스의 증폭을 행하였다.

  • PDF

자외선 피코초 레이저를 이용한 Low-k 웨이퍼 인그레이빙 특성에 관한 연구 (A Study of Low-k Wafer Engraving Processes by Using Laser with Pico-second Pulse Width)

  • 문성욱;배한성;홍윤석;남기중;곽노흥
    • 반도체디스플레이기술학회지
    • /
    • 제6권1호
    • /
    • pp.11-15
    • /
    • 2007
  • Low-k wafer engraving process has been investigated by using UV pico-second laser with high repetition rate. Wavelength and repetition rate of laser used in this study are 355 nm and 80 MHz, respectively. Main parameters of low-k wafer engraving processes are laser power, work speed, assist gas flow, and protective coating to eliminate debris. Results show that engraving qualities of low-k layer by using a laser with UV pico-second pulse width and high repetition rate had better kerf edge and higher work speed, compared to one by conventional laser with nano-second pulse width and low repletion rate in the range of kHz. Assist gas and protective coating to eliminate debris gave effects on the quality of engraving edge. Total engraving width and depth are obtained less than $20\;{\mu}m$ and $10\;{\mu}m$ at more than 500 mm/sec work speed, respectively. We believe that engraving method by using UV pico-second laser with high repetition rate is useful one to give high work speed in laser material process.

  • PDF

Low-k 웨이퍼 레이저 인그레이빙 특성에 관한 연구 (Study on low-k wafer engraving processes by using UV pico-second laser)

  • 남기중;문성욱;홍윤석;배한성;곽노흥
    • 한국레이저가공학회:학술대회논문집
    • /
    • 한국레이저가공학회 2006년도 추계학술발표대회 논문집
    • /
    • pp.128-132
    • /
    • 2006
  • Low-k wafer engraving process has been investigated by using UV pico-second laser with high repetition rate. Wavelength and repetition rate of laser used in this study are 355nm and 80MHz, respectively. Main parameters of low-k wafer engraving processes are laser power, work speed, assist gas flow rate, and protective coating to eliminate debris. Results show that engraving qualities of low-k layer by using UV pico-second pulse width and high repetition rate had better kerf edge and higher work speed, compared to one by conventional laser with nano-second pulse width and low repetition rate in the range of kHz. Assist gas and protective coating to eliminate debris gave effects on the quality of engraving edge. Total engraving width and depth are obtained less than $20{\mu}m$ and $10{\mu}m$ at more than 500mm/sec work speed, respectively. We believe that engraving method by using UV pico-second laser with high repetition rate is useful one to give high work speed of laser material process.

  • PDF

변형률 속도 효과를 고려한 355 nm UV 레이저 구리재질의 싱글 펄스 전산해석 (Computational Analysis of 355 nm UV Laser Single-Pulsed Machining of Copper Material Considering the Strain Rate Effect)

  • 이정한;오재용;박상후;신보성
    • 한국기계가공학회지
    • /
    • 제9권3호
    • /
    • pp.56-61
    • /
    • 2010
  • Recently, UV pulse laser is widely used in micro machining of the research, development and industry field of IT, NT and BT products because the laser short wavelength provides not only micro drilling, micro cutting and micro grooving which has a very fine line width, but also high absorption coefficient which allows a lot of type of materials to be machined more easily. To analyze the dynamic deformation during a very short processing time, which is nearly about several tens nanoseconds, the commercial Finite Element Analysis (FEA) code, LS-DYNA 3D, was employed for the computitional simulation of the UV laser micro machining behavior for thin copper material in this paper. A finite element model considering high strain rate effect is especially suggested to investigate the micro phenomena which are only dominated by mechanically pressure impact in disregard of thermally heat transfer. From these computational results, some of dynamic deformation behaviors such as dent deformation shapes, strains and stresses distributions were observed and compared with previous experimental works. These will help us to understand micro interaction between UV laser beam and material.

자외선 나노초 펄스 레이저를 이용한 경연성(Rigid Flexible) 인쇄전자회로기판(Printed Circuit Board) 고속 절단에 관한 연구 (Study on High Speed Laser Cutting of Rigid Flexible Printed Circuit Board by using UV Laser with Nano-second Pulse Width)

  • 배한성;박희천;류광현;남기중
    • 한국정밀공학회지
    • /
    • 제27권2호
    • /
    • pp.20-24
    • /
    • 2010
  • High speed cutting processes of rigid flexible printed circuit board by making use of high power UV laser with nano-second pulse width have been proposed and investigated experimentally. Also robust laser cutting system has been designed and developed in order to obtain a good cutting quality of rigid and flexible PCB with multi-layers (2-6 layers). Power controller module developed for ourselves is adapted to control the laser output power in the range less than 1%. The systems show the good performance of cutting speed, cutting width and cutting accuracy, respectively. Especially we have confirmed that the short circuit problem due to the carbonized contamination occurred in cross section of multi-layers by thermal effect of high power laser has been improved largely by using multi-pass cutting process with low power and high speed.

나노초 펄스폭을 갖는 자외선 레이저를 이용한 전자회로기판의 저항체 트리밍과 절단공정 특성에 관한 연구 (Study of Laser Trimming and Cutting of Printed Circuit Board by using UV Laser with Nanosecond Pulse Width)

  • 류광현;신석훈;박형찬;남기중;권남익
    • 한국정밀공학회지
    • /
    • 제27권10호
    • /
    • pp.23-28
    • /
    • 2010
  • Resistance trimming and cutting processes of printed circuit board by making use of high power UV laser with nano-second pulse width have been proposed and investigated experimentally. Also laser-based application system with high flexibility and complex has been designed and adopted power controller, auto beam size control, auto-focusing and control program developed for ourselves. The function of each module shows that they can be reliable for industrial equipments. Resistance trimming method used a plunge and double cut process with $20{\mu}m$ spot size beam. Results show that double cut process is more effective to control resistance trimming in precision than plunge cut process.