• 제목/요약/키워드: UV Image

검색결과 179건 처리시간 0.03초

자외선 카메라 개발을 위한 직류 연면방전 특성 (Characteristics of DC Surface Discharge for the Development of UV Camera)

  • 방만식;최재형;김우진;김영석;김상현
    • 조명전기설비학회논문지
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    • 제25권5호
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    • pp.98-103
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    • 2011
  • Recently, UV(ultra-violet rays) camera has attracted a great deal of interest from the view point of easy judgement in inspections and diagnoses of the safety of power equipment. Especilly, UV camera is applied the inspection of UV with corona discharge. One of the most important and difficult problems is the basic research of filter design, materials and corona discharge. In this paper, we will report on the UV generation, corona pulse count and the polarity effect of positive and negative DC surface discharge in air. Also, corona discharge characteristics are analyzed using prototype UV camera of Korea. UV generation and corona pulse count due to surface discharge in positive needle is higher than that of negative needle.

An Adaptive Utterance Verification Framework Using Minimum Verification Error Training

  • Shin, Sung-Hwan;Jung, Ho-Young;Juang, Biing-Hwang
    • ETRI Journal
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    • 제33권3호
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    • pp.423-433
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    • 2011
  • This paper introduces an adaptive and integrated utterance verification (UV) framework using minimum verification error (MVE) training as a new set of solutions suitable for real applications. UV is traditionally considered an add-on procedure to automatic speech recognition (ASR) and thus treated separately from the ASR system model design. This traditional two-stage approach often fails to cope with a wide range of variations, such as a new speaker or a new environment which is not matched with the original speaker population or the original acoustic environment that the ASR system is trained on. In this paper, we propose an integrated solution to enhance the overall UV system performance in such real applications. The integration is accomplished by adapting and merging the target model for UV with the acoustic model for ASR based on the common MVE principle at each iteration in the recognition stage. The proposed iterative procedure for UV model adaptation also involves revision of the data segmentation and the decoded hypotheses. Under this new framework, remarkable enhancement in not only recognition performance, but also verification performance has been obtained.

A Facile Method for Micropatterning of Gold Nanoparticles Immobilized on UV Cross-linked Polymer Thin Films

  • Kim, Min-Sung;Jeong, Yeon-Tae
    • Transactions on Electrical and Electronic Materials
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    • 제10권3호
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    • pp.85-88
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    • 2009
  • This report demonstrates the immobilization of uniformly sized gold nanoparticles (AuNPs) on UV cross-linked poly(4-vinylpyridine) (P4VP) polymer thin films and the preparation of micropatterned structures of AuNPs on these films. The polymer thin films were prepared by a spin-coating of P4VP onto a cleaned silicon wafer surface. Upon UV irradiation, these films were then photo cross-linked. Gold nanoparticles were immobilized by immersing the polymer surface in a colloidal solution of gold nanoparticles stabilized by citric acid. The morphology of the films and the immobilization of AuNPs were studied by atomic force microscopy (AFM) and UV-visible spectroscopic techniques. The micropatterned gold structures that were produced on the polymer surface are delineated by combining with the photolithographic method. While untreated and simply spin coated films were physisorbed and unstable that could be easily removed by rinsing with a solvent, the cross-linked and AuNPs immobilized P4VP films were found to be highly stable even after repeated solvent extractions.

Application of Deep Learning to Solar Data: 2. Generation of Solar UV & EUV images from magnetograms

  • Park, Eunsu;Moon, Yong-Jae;Lee, Harim;Lim, Daye
    • 천문학회보
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    • 제44권1호
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    • pp.81.3-81.3
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    • 2019
  • In this study, we apply conditional Generative Adversarial Network, which is one of the deep learning method, to the image-to-image translation from solar magentograms to solar UV and EUV images. For this, we train a model using pairs of SDO/AIA 9 wavelength UV and EUV images and their corresponding SDO/HMI line-of-sight magnetograms from 2011 to 2017 except August and September each year. We evaluate the model by comparing pairs of SDO/AIA images and corresponding generated ones in August and September. Our results from this study are as follows. First, we successfully generate SDO/AIA like solar UV and EUV images from SDO/HMI magnetograms. Second, our model has pixel-to-pixel correlation coefficients (CC) higher than 0.8 except 171. Third, our model slightly underestimates the pixel values in the view of Relative Error (RE), but the values are quite small. Fourth, considering CC and RE together, 1600 and 1700 photospheric UV line images, which have quite similar structures to the corresponding magnetogram, have the best results compared to other lines. This methodology can be applicable to many scientific fields that use several different filter images.

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전기적 특성을 이용한 UV 경화 프로세스에 대한 새로운 평가방법(I) (A new evaluation method of UV curing process by using electrical properties (I))

  • 이문학;김성빈;이태훈;박성수;손세모
    • 한국인쇄학회지
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    • 제21권2호
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    • pp.55-65
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    • 2003
  • A novel evaluation method is investigated for UV curing process in printing system. The method is based on the measurement of conducivity change by the photopolymerization of UV curable inks and paints. It is found that the decrease of conductivity is caused by photopolymerization of epoxy monomer during UV curing process of ink film and the by the rate of UV curing. It is possible to make the dynamical evaluation the curing rate of UV curable ink in curing process by this method.

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자외선 영상 이미지 비교를 통한 22.9kV 특고압 설비의 상태진단 연구 (The Study of Cable Fault Case and the Fault Management System of Electrical Facilities for private use)

  • 김영석;송길목
    • 한국조명전기설비학회:학술대회논문집
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    • 한국조명전기설비학회 2009년도 추계학술대회 논문집
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    • pp.211-213
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    • 2009
  • This paper was studied about the ultra-violet rays(UV) image area and discharge quantity of 22.9kV class polymer insulator using UV camera. The UV image area was begun to observe to 60kV that is about 40% of breakdown voltage of polymer insulator and the area was increased by applied voltage. Also, the discharge quantity was increased at 60kV sharply. If the intensity of breakdown passes over about 40% we can know that need the check on the electrical facility.

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New Photo-addressable Electronic Paper Using An Electrophoretic Device

  • Kang, Seung-Youl;Kim, Chul-Am;Joung, Meyong-Ju;Yu, Dong-Guk;Ahn, Seong-Deok;Lee, Yong-Eui;Suh, Kyung-Soo
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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    • pp.528-530
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    • 2003
  • We present a novel photo-addressable electronic paper using an electrophoretic device, which can show and sustain the 2D images transferred by the UV illumination. The device consists of the organic photoconducting layer reacting with the UV illumination and the electronic ink (white particles and blue dye) dispersing in a suspending medium. The voltage impression under illuminating of UV make an image be transferred to the electrophoretic cell. The transferred image can be maintained by the bistability of the electrophoretic device.

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폰 카메라 모듈 자동 조립.평가시스템 설계 (Design of Automatic Assembly & Evaluation System for Phone Camera Module)

  • 송준엽;이창우;하태호;정연욱;김영규;이명철
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2006년도 춘계학술대회 논문집
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    • pp.71-72
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    • 2006
  • In this study, automatic assembly and evaluation system fer phone camera module is conceptually designed. The designed core(Auto focus & UV curing, Image Test) equipments adopts a clustering mechanism and compactible structure using index table for minimum tact time. Using a ball screw actuator and absolute encoder in each axis, we can verifies the repeatability and position accuracy of system within ${\pm}3{\mu}m$. In result of simulation test, the proposed system is expected up to 30% in productivity than manual operation.

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모사 광전자 소자 상에 적용한 마이크로렌즈 어레이의 UV 성형 (UV molding of Microlens Array on the Simulated Optoelectronic Device)

  • 구승완;김석민;강신일;손현주
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2003년도 추계학술대회논문집
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    • pp.377-380
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    • 2003
  • Recently, demand of digital products with optoelectronic device is increasing rapidly. A microlens array is applied to improve optical efficiency on optoelectronic device, and it is usually fabricated by photolithography and reflow process after planarization layer coating process. UV molding process is more suitable for mass production of high quality microlens array than photolithography and reflow process. In the present study, microlens array was fabricated on the simulated optoelectronic device with planarization layer by aligned UV molding process. The shape of replicated microlens was measured, and the section image of molded part was examined.

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UV Optical Solutions for Thin Film Processing and Annealing Research

  • Delmdahl, Ralph;Shimizu, Hiroshi;Dittmar, Mirko;Fechner, Burkhard
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.246-249
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    • 2009
  • A compact, flexible family of UV laser material processing systems has been developed to drive advancements in both large area processing and annealing of semiconductor surfaces. UV photons can either be applied via demagnifying a mask pattern image or by scanning a homogenized excimer beam across the substrate area. 193nm, 248nm and 308nm wavelength applications are supported.

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