• Korean Chemical Engineering Research
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• v.51 no.3
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• pp.297-302
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• 2013

Enhancement of photocatalytic activity of UV/photocatalysis was carried out to oxidize the gaseous $H_2S$ in a tubular reactor coated with photocatalyst of sol type $TiO_2$. EtOH was used as the standard material to select the photocatalyst, and it was confirmed that the reactor activity was dependent on the coated surface characteristics. The selected photocatalytic reactor, which coated with STS-01, showed about 80% conversion when the gas linear velocity was 0.01 m/s and relative humidity was 40%. However, the conversion level of the reaction decreased significantly with increasing gas linear velocity. Pt was loaded on the photocatalyst to enhance and maintain the performance of the reactor, which enhanced the conversion level of $H_2S$ more than 95% under the same experimental condition.

• Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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• v.5 no.2
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• pp.103-108
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• 2007

The absorption spectra of Pu in stock solution were measured using a UV-Vis-NIR spectrophotometer after dissolving $PuO_2\;with\;HNO_3$, HF and $HClO_4$. The spectroscopic characteristics of Pu (III, IV, VI) in acidic, neutral and alkali media were investigated. Also, the intensities and position of major peaks for Pu(VI) were observed with increasing acidic and alkali concentration. The variation of oxidation states of Pu(VI) with an adding reducing reactant was investigated in HCl and NaOH medium.

• Journal of Plant Biotechnology
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• v.30 no.2
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• pp.201-206
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• 2003

Differential responses of red pepper plant and cultured cells to enhanced ${\gamma}$-ray($^{60}$ Co) and ultraviolet(UV) stress were investigated. In seed treatment, 1 Gy of ${\gamma}$-ray increased seedling dry weight up to 19.1%, but 50 Gy treatment markedly ingibited seed germination and subsequent growth of seedling. UV treatment to seed did not change the germination ability of seeds and the growth of seedlings regardless of duration of UV treatment until 24 hrs. In case of UV treatment to seedlings, plant injury was seriously progressed even after the seedlings were returned to no UV condition, and eventually all the leaves showed chlorosis by the stress. However, progress of plant injury by ${\gamma}$-ray stress slower than that caused by UV stress, and even at the high dose of ${\gamma}$-ray 50 Gy, did not caused the cholrosis of stressed plant leaf. Amount of electrolytes leakage from plant leaf by UV treatment for 24hrs was increased up to 28.8 folds in comparison with untreated control, whereas that of 50 Gy of ${\gamma}$-ray was increased only 1.2 folds. UV stress induced the production of capsidiol, antimicrobial phytoalexin, by activation of gene expression involved in capsidiol biosynthesis, such as sesquiterpene cyclase and cyclase and cytochrome P450 hydroxylase in the leaf and cultured cell, but ${\gamma}$-ray stress induced neither the production of capsidiol nor expression of the genes.

• Proceedings of the SCSK Conference
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• 2003.09a
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• pp.338-351
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• 2003

UV radiation is the most dangerous stress factor among permanent environmental impacts on human skin. Consequences of UV exposure are aberrant tissue architecture, alterations in skin cells including functional changes. Nowadays new kinds of outdoor leisure-time activities and changing environmental conditions make the question of sun protection more important than ever. It is necessary to recognize that self-confident consumers do not consider to change their way of life, they demand modern solutions on the basis of new scientific developments. In the past one fundamental principle of cosmetics was the use of physical and organic filter systems against damaging UV-rays. Today new research results demonstrate that natural protecting cell mechanisms can be activated. Suitable biological actives strongly support the protection function not from the surface but from the inside of the cell. A soy seed preparation (SSP) was proven to stimulate natural skin protective functions. The major functions are an increased energy level and the prevention of DNA damage. These functions can I be defined as biological UV protection. The tumor suppressor protein p53 plays a key role in the regulation of DNA repair. p53 must be transferred into the phosphorylated form to work as transcription factor for genes which are regulating the cell cycle or organizing DNA repair. A pretreatment with SSP increases the phosphorylation rate of p53 of chronically UV-irradiated human keratinocytes significantly. According to the same test procedure SSP induces a dramatic increase in the expression of the tumor suppressor protein p14$^{ARF}$ that is supporting the p53 activity by blocking the antagonist of p53, the oncoprotein Mdm2. Mdm2, a ubiquitin E3-ligase, downregulates p53 and at the same time it prevents phosphorylation of p53. The positive influence of the tumor suppressor proteins explains the stimulation of DNA repair and prevention of sunburn cell formation by SSP, which was proven in cell culture experiments. In vivo the increased skin tolerance against UV irradiation by SSP could be confirmed too. We have assumed, that an increased repair potential provides full cell functionality.y.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.19 no.10
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• pp.339-345
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• 2018

We investigated the curing properties of cured coatings for a multi-focal UV-LED. The coatings are for LEDs that operate at multiple UV wavelengths, unlike conventional single-wavelength UV-LEDs. Using UV-LED light sources with wavelengths of 365, 395, 420, and 450 nm, we analyzed the optical characteristics such as the direction of light flux and light source. We also analyzed the curing characteristics at each UV-LED wavelength to optimize the LED for composite wavelengths. The curing performance state was predicted through computer simulation for when the multiple wavelengths of UV light sources are superimposed, and then actual LEDs were designed and fabricated. To improve the internal high-speed curing, a multi-spot module was fabricated, in which each LED is condensed, and multiple wavelengths are synthesized and condensed at the same position. The adhesive strength, surface hardness, and internal hardness of the curing agent were tested by varying the wavelength combination conditions. The surface hardening and internal hardening were compared and analyzed using a hardness tester and FT-IR analyzer. As a result, the characteristics of the surface and internal hardness were improved by a multi-spot method in which four wavelengths were overlapped in a UV-LED rather than a single wavelength.

• Polymer(Korea)
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• v.37 no.3
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• pp.373-378
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• 2013

The interfacial adhesion strength is very important in $SiO_x$ deposited PC film for the barrier enhanced polycarbonate (PC) flexible substrate. In this study, PC films were treated by undercoating, UV/$O_3$ and low temperature plasma and then the effect of physical and chemical surface modifications on the interfacial adhesion strength between PC film and $SiO_x$ barrier layer were studied. It was found that untreated PC film shows significantly low interfacial adhesion strength due to the smooth surface and low surface free energy of PC. Low temperature plasma treatments resulted in the increase of both surface roughness and surface free energy due to etching and the appearance of polar molecules on the PC surface. However, UV/$O_3$ treatment only shows the increase of surface free energy by developed polar molecules on the surface. These surface modifications caused the enhancement of surface interfacial strength between PC film and $SiO_x$ barrier. In the case of undercoating, it was found that the increase of surface interfacial strength was achieved by adhesion between various acrylic acid on acrylate coated surface and $SiO_x$ without increase of polar surface energy. In addition, the barrier property is also improved by organic-inorganic hybrid multilayer structure.

• Journal of Electrochemical Science and Technology
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• v.14 no.1
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• pp.85-95
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• 2023

In recent years, solid-state Li metal batteries (SSLBs) have attracted significant attention as the next-generation batteries with high energy and power densities. However, uncontrolled dendrite growth and the resulting pulverization of Li during repeated plating/stripping processes must be addressed for practical applications. Herein, we report a plastic-crystal-based polymer/ceramic composite solid electrolyte (PCCE) to resolve these issues. To fabricate the one-side ceramic-incorporated PCCE (CI-PCCE) film, a mixed precursor solution comprising plastic-crystal-based polymer (succinonitrile, SN) with garnet-structured ceramic (Li₇La₃Zr₂O₁₂, LLZO) particles was infused into a thin cellulose membrane, which was used as a mechanical framework, and subsequently solidified by using UV-irradiation. The CI-PCCE exhibited good flexibility and a high room-temperature ionic conductivity of over 10^-3 S cm^-1. The Li symmetric cell assembled with CI-PCCE provided enhanced durability against Li dendrite penetration through the solid electrolyte (SE) layer than those with LLZO-free PCCEs and exhibited long-term cycling stability (over 200 h) for Li plating/stripping. The enhanced Li⁺ transference number and lower interfacial resistance of CI-PCCE indicate that the ceramic-polymer composite layer in contact with the Li anode enabled the uniform distribution of Li⁺ flux at the interface between the Li metal and CI-PCCE, thereby promoting uniform Li plating/stripping. Consequently, the Li//LiFePO₄ (LFP) full cell constructed with CI-PCCE demonstrated superior rate capability (~120 mAh g^-1 at 2 C) and stable cycle performance (80% after 100 cycles) than those with ceramic-free PCCE.

• Polymer(Korea)
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• v.34 no.6
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• pp.574-578
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• 2010

In this study, the caprolactone modified hydroxy acrylates (CHAs) were synthesized by ring-opening reaction of caprolactone and 2-hydroxyethyl acrylate (2-HEA) as initiator. Also, the caprolactone modified urethane acrylate (UA) oligomers were synthesized by condensation reaction of previously synthesized CHAs, 2-hydroxyethyl acrylate (2-HEA) and hexamethylene diisocyanate trimer (HDT). Using the hydroxy number of CHAs, the molecular weights of the CHAs were calculated easily and their molecular weight was similar to the theoretical molecular weight of them. The viscosity of UA oligomers decreased as increasing a content of CHA in the UA oligomer. Cure films were prepared from UA oligomer, reactive diluents, and UV initiator to investigate their physical properties. The thermal stability and color difference on high temperature for the cured film were improved as increasing the crosslinking density. Their surface hardness was also increased as increasing crosslinking density of the cured films, but their elongation at break was decreased.

• Journal of Radiation Industry
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• v.10 no.1
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• pp.1-5
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• 2016

In this study, the effect of high-energy proton irradiation on the optical properties of polyacrylonitrile (PAN) films was investigated. PAN thin films spin-coated on a substrate were irradiated 150 keV proton ions at various fluences. The changes in the chemical structure and optical properties were investigated by FT-IR and UV-vis spectroscopy. The results of the FT-IR analysis revealed that the cyclization reaction took place by proton irradiation and the degree of cyclization increased with an increasing fluence. Based on the UV-vis analysis, the optical band gap of PAN decreased from 2.84 to 2.52 eV with an increasing fluence due to the formation of carbon clusters by proton irradiation. In addition, the number of carbon atoms per carbon cluster and the number of carbon atoms per conjugation length were found to be increased with an increasing fluence.

• Applied Chemistry for Engineering
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• v.17 no.2
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• pp.158-162
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• 2006

Poly[4-hydroxystyrene-co-2-(4-methoxybutyl)-2-adamantyl methacrylate] was synthesized and evaluated as a matrix resin for extreme UV (EUV) chemically amplified resist. The resist system formulated with this polymer resolved 120 nm line and space (pitch 240 nm) positive patterns using a KrF excimer laser scanner (0.60 NA). The well defined 50 nm line positive patterns (pitch 180 nm) were obtained using an EUV lithography tool. The dry etching resistance of this resist for a $CF_{4}$-based plasma was 1.1 times better than that of poly(4-hydroxystyrene).