• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.915-918
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• 2007

We have grown $SiO_2$ film on a polycrystalline Si layer using excited ozone gas, which is produced by ultra-violet light irradiation to ozone gas, without heating substrate. The obtained $SiO_2$ film shows dielectric properties comparable to the device quality films measured at the MIS capacitor configuration.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.11a
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• pp.539-542
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• 2000

ZnO thin films for light emission device have been deposited on sapphire and silicon substrates by pulsed laser deposition technique(PLD). A Nd:YAG laser was used with the wavelength of 355 nm. In order to investigate the emission properties of ZnO thin films, PL measurements with an Ar ion laser as a light source using an excitation wavelength of 351 nm and a power of 100 mW are used. All spectra were taken at room temperature by using a grating spectrometer and a photomultiplier detector. ZnO exhibited PL bands centered around 390, 510 and 640 nm, labeled near ultra-violet (UV), green and orange bands. Structural properties of ZnO thin films are analized with X-ray diffraction (XRD).

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2005.09a
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• pp.29-34
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• 2005

A optical head unit for nano optical probe away was developed. The optical probe array is generated by Talbot effect. The shape and thickness of microlens array(MLA) were designed to minimize the spot size at the foci of MLA. To increase the optical efficiency of the system and obtain the large tolerance for fabrication, aperture size was theoretically optimized. Then microlens illuminated aperture array(MLIAA) as an optical head unit was fabricated using a ultra violet(UV) molding process on aluminum aperture array. In this process, Al aperture array was fabricated separately using the photolithography and reactive ion etching(RIE) process. Optical properties of the generated optical probes were measured and compared at Talbot distance from the aperture array having a diameter of $1{\mu}m$ and MLIAA.

• Proceedings of the IEEK Conference
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• 2004.06b
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• pp.605-608
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• 2004

A $Pt/Al_xGa_{l-x}N$ Schottky type Ultra-violet photodetector was modeled and simulated using the commercial SILVACO software program. In the carrier transport, we applied field model and other analytic model to determine the electron saturation velocity and low field mobility for GaN and $Al_xGa_{l-x}N$. A C-Interpreter function was defined to described the mole-fraction for the ternary compound semiconductor such as $Al_xGa_{l-x}N$. As comparing the simulated and experimental results, we found that the simulated result for type-1 has $15.9 nA/cm^2$ of leakage current at 5V. We confirmed a good agreement of photo-current in the UV Photo-detector, while applying the absorption coefficient and reflective index of active $Al_xGa_{l-x}N$ and other layers. There had been an intensive search for the proper refractive indices of the layers.

• Journal of Convergence for Information Technology
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• v.8 no.1
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• pp.147-152
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• 2018

A polarizing spectacle lens having a perfect blocking of ultraviolet light and a partial blocking of blue light and having photochromic properties has been developed. It is a functional spectacle lens which can be used as a spectacle lens in the daytime, which plays a role of sunglass in a space with strong ultraviolet rays, dramatically reducing glare caused by late-night driving or reflected light. Photochromism was recovered in 0.5 second dark reaction and 3 seconds recovery time. The polarization function was about 95%. Ultraviolet rays were completely blocked and blue light was reduced by about 30%. A lens that combines photochromic and UV blocking and polarization functions is the first attempt at investigating the domestic market.

• Proceedings of the Materials Research Society of Korea Conference
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• 2011.05a
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• pp.37.2-37.2
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• 2011

반도체공정에서 Photo-lithography는 특정 광원을 사용하여 구현하고자 하는 패턴을 기판상에 형성하는 기술이다. 이러한 Photo-lithography 공정에서는 패턴이 형성되어 있는 마스크가 핵심적인 역할을 하며 반도체소자의 전체적인 성능을 결정한다. 이에 따라 Photo-lithography용 마스크에 사용되는 Blank 마스크는 Defect의 최소화 및 우수한 평탄도 등의 조건들이 요구되고 있다. 이러한 Blank 마스크 재료로 광원을 효율적으로 투과시키는 성질이 우수하고 다른 재료에 비해 열팽창계수가 작은 석영기판이 사용되고 있다. 석영 기반의 마스크는 UV Lithography에서 주로 사용되고 있으며 그 밖에 UV-NIL (Nano Imrpint Lithography), EUVL (Extreme Ultra Violet Lithography) 등에도 이용되고 있다. 석영기판을 가공하여 Blank 마스크로 제작하기 위해 석영기판의 Lapping/Polishing 등이 핵심기술이며 현재 일본에서 전량 수입에 의존하고 있어, 이에 대한 연구의 필요성이 절실한 상황이다. 본 연구에서는 Blank 마스크제작을 위한 석영기판의 Polishing 공정에 사용되는 Ceria Slurry의 특성 연구 및 이에 따른 연마평가를 실시하였으며 첨가제의 조건에 따른 pH/Viscosity/Stability 등의 물리적인 특성을 관찰하여 석영기판 Polishing에 효율적인 Ceria slurry의 최적조건을 도출했다. 또한, 조건에 따른 Slurry의 정확한 분석을 위해 Zeta Potential Analyzer를 이용하여 연마입자의 크기 및 Zeta Potential에 대한 평가를 실시한 후 연마제와 석영기판의 Interaction force를 측정하였다. 상기 실험에 의해 얻어진 최적화된 연마 공정 조건하에서 Ceria slurry를 사용하여 연마평가를 실시함으로써 Removal Rate/Roughness 등의 결과를 관찰하였다. 본 연구를 통해 반도체 photo mask 제작을 위한 Ceria slurry의 주요특성을 파악하고 석영기판의 Polishing에 효율적인 조건을 도출함으로써 Lithography 마스크를 효율적으로 제작할 수 있을 것으로 예상된다.

• Analytical Science and Technology
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• v.9 no.4
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• pp.355-363
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• 1996

The two metabolites, Aaptamine(1) and Demethyl(oxy)aaptamine(2) were isolated from marine Sponge Luffariella sp., collected in October 1992, Manado Bay, Sulawesi in Indonesia showed in vitro activity against KB cancer cell line. Their structures were elucidated by $^1H-$, $^{13}C-NMR$, $^1H-^{13}C$(1 bond) heteronuclear multiple quantum coherence spectroscopy(HMQC), electron ionization mass spectroscopy(EIMS), ultra-violet spectroscopy(UV) and infrared spectroscopy(IR).

• Transactions of the Korean Society of Automotive Engineers
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• v.8 no.5
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• pp.47-53
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• 2000

To overcome the shortage of conventional TWC that is activated at high temperature, higher than 25$0^{\circ}C$, photocatalyst is considered as an new technology. Because the photocatalytic reaction of photocatalyst is not a thermo mechanical reaction, it is necessary to heat the system to start the reaction. It can be activated just by ultra violet light that includes wavelengths shorter than 400 nanometers even at ambient temperature. In this study photocatalytic reduction of hydrocarbon was investigated with a model gas test. To understand the effects of co-existence gases on the hydrocarbon reduction by photoreaction, CO and NO, $O_2, H_2O$ gases those are components of exhaust gases of gasoline engine are supplied with C3H8/N2 to a photoreactor. The photoreactor contains $TiO_2$ photocatalyst powders and a UV bulb. The results show that oxygen is the most important factor to reduce HC emission with photocatalyst. Photocatalyst seems to have a good probability for automotive application to reduce cold start HC emissions.

• Journal of Microbiology and Biotechnology
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• v.29 no.1
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• pp.105-113
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• 2019

Although siderophore compounds are mainly biosynthesized as a response to iron deficiency in the environment, they also bind with other metals. A few studies have been conducted on the impact of heavy metals on the siderophore-mediated iron uptake by microbiome. Here, we investigated siderophore production by a variety of rhizosphere fungi under different concentrations of $Zn^{2+}$ ion. These strains were specifically isolated from the rhizosphere of Panax ginseng (Korean ginseng). The siderophore production of isolated fungi was investigated with chrome azurol S (CAS) assay liquid media amended with different concentrations of $Zn^{2+}$ (50 to $250{\mu}g/ml$). The percentage of siderophore units was quantified using the ultra-violet (UV) irradiation method. The results indicated that high concentrations of $Zn^{2+}$ ion increase the production of siderophore in iron-limited cultures. Maximum siderophore production by the fungal strains was detected at $Zn^{2+}$ ion concentration of $150{\mu}g/ml$ except for Mortierella sp., which had the highest siderophore production at $200{\mu}g/ml$. One potent siderophore-producing strain (Penicillium sp. JJHO) was strongly influenced by the presence of $Zn^{2+}$ ions and showed high identity to P. commune (100% using 18S-rRNA sequencing). The purified siderophores of the Penicillium sp. JJHO strain were chemically identified using UV, Fourier-transform infrared spectroscopy (FTIR), and matrix-assisted laser desorption/ionization time-of-flight mass spectrometer (MALDI-TOF-MS) spectra.

• Journal of the Korea Safety Management & Science
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• v.25 no.3
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• pp.31-36
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• 2023

The use of hanging scaffolding for exterior wall painting and cleaning in building construction and maintenance carries the inherent risk of fall accidents. While periodic rope replacement is crucial for preventing accidents resulting from rope breakage, current regulations lack specificity in determining appropriate disposal period for fiber ropes. This study analyzed the tensile strength of the most commonly used PP fiber ropes with different diameters (16 mm, 20 mm) in the domestic construction industry. Additionally, the effect of outdoor exposure was examined by measuring the tensile strength of new ropes and ropes exposing to outdoor conditions for 30 days and 90 days. The results showed that the new ropes and those exposed to outdoor for 30 days met the KS (Korean Standards) criteria for tensile strength. However, a significant decrease in tensile strength was observed in ropes exposed to outdoor for 90 days compared to both the new ropes and those exposed for 30 days. Furthermore, the ropes exposed for 90 days did not meet the KS criteria. These findings indicate the degradation of PP fiber ropes due to UV (Ultra Violet) radiation, highlighting the importance of considering this factor when determining the replacement period for fiber ropes used in scaffolding work.