• Title/Summary/Keyword: Tunnel magnetoresistance

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Interface Engineering in Quasi-Magnetic Tunnel Junctions with an Organic Barrier

  • Choi, Deung-Jang;Lee, Nyun-Jong;Kim, Tae-Hee
    • Journal of Magnetics
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    • v.15 no.4
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    • pp.185-189
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    • 2010
  • Spin polarized tunneling through a hybrid tunnel barrier of a Spin filter (SF) based on a EuO ferro-magnetic semiconductor and an organic semiconductor (OSC) (rubrene in this case) was investigated. For quasi-magnetic tunnel junction (MTJ) structures, such as Co/rubrene/EuO/Al, we observed a strong spin filtering effect of the EuO layer exhibiting I-V curves with high spin polarization (P) of up to 99% measured at 4 K. However, a magnetoresistance (MR) value of 9% was obtained at 4.2 K. The low MR compared to the high P could be attributed to spin scattering caused by structural defects at the interface between the EuO and rubrene, due to nonstoichiometry in the EuO.

Magnetoresistance and Structural Properties of the Magnetic Tunnel Junction with Ternary Oxide Barrier (삼원계 산화 절연층을 가진 자기터널접합의 자기·구조적 특성에 관한 연구)

  • Park, Sung-Min;Lee, Seong-Rae
    • Journal of the Korean Magnetics Society
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    • v.15 no.4
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    • pp.231-235
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    • 2005
  • We studied the microstructural evolution of ZrTM-Al (TM=Nb and Ti) alloy films, MR and electrical properties of the MTJ with $ZrTM-AlO_x$ barrier as a function of Zr/TM ratio. We observed that the ternary-oxide barrier reduced the TMR ratio due mainly to the structural defects such as the surface roughness. The change in TMR ratio and $V_h$ with Zr/TM ratio exactly corresponds to the systematic changes in the microstructural variation. Although the MTJ with ternary oxide reduced the TMR and the electrical stabilities, the junction resistances decreased as the Ti and Nb concentration increased due to the band-gap reduction caused by the formation of extra bands

Ferromagnetic Resonance of Magnetic Tunnel Junctions with an Exchange Biased Synthetic Ferrimagnetic Reference Layer (교환 바이어스 인위적 준강자성 기준층을 포함한 자기 터널 접합의 강자성 공명)

  • Yoon, Jung-Bum;You, Chun-Yeol;Jung, Myung-Hwa
    • Journal of the Korean Magnetics Society
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    • v.21 no.4
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    • pp.121-126
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    • 2011
  • Spin dynamics of magnetic tunnel junctions with free and fixed reference layers is investigated by ferromagnetic resonance micromagnetic simulations. First, in magnetic tunnel junctions with an exchange biased synthetic ferrimagnetic reference layer, a magnetization direction of each layer and the tunneling magnetoresistance are calculated for a DC magnetic field. To investigate the spin exciting modes in magnetic tunnel junctions, we simulate the ferromagnetic resonance frequency spectra with small RF magnetic fields. Exciting modes of the tunneling magnetoresistance calculated by an included angle between free and reference layers is interpreted from those of each layer. Spin exciting modes are different according to a signs of the DC magnetic field. In a negative magnetic field, FMR frequency spectra of free and reference layers are well elucidated by the modified Kittel's equation. However, in a positive magnetic field, there is no simple analytic solution related to FMR frequency spectra due to the coupled modes. Since ferromagnetic layers in magnetic tunnel junctions are interactive each other, careful considerations of the reference and fixed layer as well as the free layer are required for understanding on the spin dynamics of magnetic tunnel junctions with an exchange biased synthetic ferrimagnetic reference layer.

Tunnel Magnetoresistance with Plasma Oxidation Time in Double Oxidized Barrier Process (2단계 AlOx 절연층 공정에서 하부절연층의 산화시간에 따른 터널자기저항 특성연구)

  • Lee, Young-Min;Song, Oh-Sung
    • Korean Journal of Materials Research
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    • v.12 no.3
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    • pp.200-204
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    • 2002
  • We fabricated TMR devices which have double oxidized tunnel barrier using plasma oxidation method to form homogeneously oxidized AlO tunnel barrier. We sputtered 10 $\AA$-bottom Al layer and oxidized it by varying oxidation time for 5, 10, 20 sec. Subsequent sputtering of 13 $\AA$ - Al was performed and the matallic layer was oxidized for 120 sec. The electrical resistance changed from 700$\Omega$ to 2700$\Omega$ with increase of oxidation time, while variation of MR ratio was little spreading 27~31% which is larger than that of TMR device of ordinary single tunnel barrier. We calculated effective barrier height and width by measuring I-V curves, from which we found the barrier height was 1.3~1.5 eV, sufficient for tunnel barrier, and the barrier width(<16.2 $\AA$) was smaller than that of directly measured value by the tunneling electron microscopy. Our results may be caused by insufficient oxidation of Al precursor into $Al_2O_3$. However, double oxidized tunnel barriers were superior to conventional single tunnel barrier in uniformity and density. We found that the external magnetic field to switch spin direction of ferromagnetic layer of pinned layer breaking ferro-antiferro exchange coupling was increased as bottom layer oxidation time increased. Our results imply that we were able to improve MR ratio and tune switching field by employing double oxidized tunnel barrier process.

Magnetoresistance Characteristics of Magnetic Tunnel Junctions Consisting of Amorphous CoNbZr Alloys for Under and Capping Layers

  • Chun, Byong Sun;Lee, Seong-Rae;Kim, Young Keun
    • Journal of Magnetics
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    • v.9 no.1
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    • pp.13-16
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    • 2004
  • Magnetic tunnel junctions (MTJs) comprising amorphous CoNbZr layers have been investigated. $Co_{85.5}Nb_8Zr_{6.5}$(in at. %) layers were employed to substitute the traditionally used Ta layers with an emphasis given on under-standing underlayer effect. The typical junction structure was $SiO_2/CoNbZr$ or Ta 2/CoFe 8/IrMn 7.5/CoFe 3/Al 1.6 + oxidation/CoFe 3/CoNbZr or Ta 2 (nm). For both as-deposited state and after annealing, the CoNbZr-underlayered structure showed superior surface smoothness up to the tunnel barrier than Ta-underlayerd one (rms roughness of 0.16 vs. 0.34 nm). CoNbZr-based MTJs was proven beneficial for increasing thermal stability and increasing $V_h$ (the bias voltage where MR ratio becomes half) characteristics than Ta-based MTJs. This is because the CoNbZr-based junctions offer smoother interface structure than the Ta-based one.

The Influence of Ferromagnetic $BaFe_{12}O_{19}$ Layer for Low-Field Tunnel-Type Magnetoresistance on $La_{2/3}Sr_{1/3}MnO_3/BaFe_{12}O_{19}/SiO_2/Si(001)$ Granular-Type Multilayer Thin Films ($La_{2/3}Sr_{1/3}MnO_3/BaFe_{12}O_{19}/SiO_2/Si(001)$ 입상형 다층박막 구조에서 강자성 $BaFe_{12}O_{19}$ 중간층이 저 자장 터널형 자기저항 특성에 미치는 영향)

  • 심인보;안성용;이희민;유홍주;김철성;최세영
    • Proceedings of the Korean Magnestics Society Conference
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    • 2001.10a
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    • pp.48-49
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    • 2001
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The effect of magnetostatic bonding between layers on Magnetoresistance in the $Cr/Co/Al-O_x/Ni-Fe$ for tunnel junction structure

  • 이종윤;전동민;박진우;윤성용;백형기;서수정
    • Proceedings of the Korean Magnestics Society Conference
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    • 2002.12a
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    • pp.70-71
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    • 2002
  • 터널 접합 소자은 절연층을 사이에 둔 두 강자성체로 이루어지는 데 두 강자성체의 서로 다른 보자력 차이로 인가해주는 자장의 방향에 기인한 spin들의 평행함과 반평행함에 의해 나타나는 자기 저항 현상을 이용한 것이다. 이 TMR 현상은 비휘발성, 고집적도, 적은 전력손실로 인해 차세대 RAM으로 사용될 것으로 보이는 MRAM 소자로써의 적용을 위해 연구 중에 있다. 그러나 TMR소자 공정중에서 비중이 큰 절연층 형성에서의 여러 요인의 개입으로 인해 고른 절연층 형성이 어려운 실정이다. (중략)

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