• 전기의세계
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• v.26 no.4
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• pp.68-72
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• 1977

The main purpose of this paper is to study on the nature of the traps in polymer. The polyethlene is typical of polymer material as to be selected for a sample. The current I$_{th}$ are obtained with an small external bias voltage from high density polyethylene which have been treated by the high-field application. Two peaks, P$_{1}$ and P$_{2}$ with maxima near 85.deg. C, respectively, appeared on the current I$_{th}$ spectrum. From the results of experiment, It is clear that The current I$_{th}$ arises from the drift, under the external field, of carriers released from the trap sites by the heating and the trap is surrounded by a potential barrier and trapping proceeds during the high-field treatment. The obtained results can suggest that polyethylene contains trap sites which have an important role in the electrical conduction and breakdown of polymeric materials.rials.

• Journal of the Korean Ceramic Society
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• v.29 no.2
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• pp.161-165
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• 1992

Nonlinear exponents and electron trap density variations were observered in ZnO-Bi2O3-MnO2 ternary ZnO varistors as a function of heat treatment temperature. Three kinds of ZnO varistor compositions were selected; i.e. 99.0 ZnO-0.5 Bi2O3-0.5 MnO2, 98.5 ZnO-1.0 Bi2O3-0.5 MnO2, and 98.0 ZnO-1.5 Bi2O3-0.5 MnO2 in mol%. Sintering was done at 1150$^{\circ}C$ for three hours, and heat treatments were done at 500$^{\circ}C$, 700$^{\circ}C$, and 900$^{\circ}C$. When heat treated at 500$^{\circ}C$, nonlinear exponents were increased regardless of the Bi2O3 amount. Increasing heat treatment temperature above 500$^{\circ}C$ resulted in lowering nonlinear exponents. Nonlinear exponents seem to be related to the 0.17 and 0.33 eV electron traps which are possibly of intrinsic origin.

• The Transactions of the Korean Institute of Electrical Engineers
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• v.45 no.4
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• pp.574-581
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• 1996

The neural network approach has been shown to be a general scheme for nonlinear dynamical system identification. Unfortunately the error surface of a Multilayer Neural Networks(MNN) that widely used is often highly complex. This is a disadvantage and potential traps may exist in the identification procedure. The objective of this paper is to identify a nonlinear dynamical systems based on Self-Organized Distributed Networks (SODN). The learning with the SODN is fast and precise. Such properties are caused from the local learning mechanism. Each local network learns only data in a subregion. This paper also discusses neural network as identifier of nonlinear dynamical systems. The structure of nonlinear system identification employs series-parallel model. The identification procedure is based on a discrete-time formulation. Through extensive simulation, SODN is shown to be effective for identification of nonlinear dynamical systems. (author). 13 refs., 7 figs., 2 tabs.

• Electrical & Electronic Materials
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• v.7 no.3
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• pp.213-219
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• 1994

Cu compensated Si doped GaAs (GaAs :Si:Cu has been chosen as the switch material. The GaAs material has been characterized by DLTS(Deep Level Transient Spectroscopy) technique and the obtained data were used in the computer simulation. Simulation studies are performed on several GaAs switch systems, composed of different densities of Cu, to investigate the influence of deep traps in the switch systems. The computed results demonstrates important aspect of the switch, the existence of two stable states and fast optical quenching. An important parameter optimum Cu density for the switch are also determined.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.6
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• pp.668-672
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• 2004

Upon Debye's dielectric relaxation theory, we tried simple determination method of trap level in organic EL materials. From dielectric measurements in the 20 Hz - 1 MHz frequency range and in the 150 K - 320K temperature range, the depth of traps in Alq$_3$ filled with remaining electrons was determinated. Comparing to other determination techniques like TSL, or TL, the apparatus all we need is just simple LCR meter, thermometer and cooling method(liquid nitrogen). The mean activation energy is about 0.20 eV. It is in good agreement with previous determinations by other techniques like TSL. This results consolidate the validity of Burrow's transport mechanism model. Further intensified experiment with UV light on the dielectric absorption(Photodipolair effect) was nevertheless disturbed by the photoconductivity component.

• Transactions on Electrical and Electronic Materials
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• v.15 no.1
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• pp.16-19
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• 2014

Charge trapping nonvolatile memory capacitors with $ZrO_2$ as charge trapping layer were fabricated, and the effects of post annealing atmosphere ($NH_3$ and $N_2$) on their memory storage characteristics were investigated. It was found that the memory windows were improved, after annealing treatment. The memory capacitor after $NH_3$ annealing treatment exhibited the best electrical characteristics, with a 6.8 V memory window, a lower charge loss ~22.3% up to ten years, even at $150^{\circ}C$, and excellent endurance (1.5% memory window degradation). The results are attributed to deep level bulk charge traps, induced by using $NH_3$ annealing.

• Journal of Sensor Science and Technology
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• v.17 no.5
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• pp.346-349
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• 2008

A metal-semiconductor-metal (MSM) ultraviolet (UV) photodetector (PD) is proposed as an effective UV sensing device for integration with a GaN n-channel MISFET on auto-doped p-type GaN grown on a silicon substrate. Due to the high hole barrier of the metal-p-GaN contact, the dark current density of the fabricated MSM PD was less than $3\;nA/cm^2$ at a bias of up to 5 V. Meanwhile, the UV/visible rejection ratio was 400 and the cutoff wavelength of the spectral responsivity was 365 nm. However, the UV/visible ratio was limited by the sub-bandgap response, which was attributed to defectrelated deep traps in the p-GaN layer of the MSM PD. In conclusion, an MSM PD has a high process compatibility with the n-channel GaN Schottky barrier MISFET fabrication process and epitaxy on a silicon substrate.

• Journal of Electrical Engineering and Technology
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• v.9 no.2
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• pp.609-614
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• 2014

We fabricated amorphous zinc tin oxide (ZTO) transparent thin-film transistors (TTFTs). The effects of Al electrode on the mobility and threshold voltage of the ZTO TTFTs were investigated. It was found that the aluminum (Al)-ZTO contact decreased the mobility and increased the threshold voltage. Traps, originating from $AlO_x$, were assumed to be the cause of degradation. An indium tin oxide film was inserted between Al and ZTO as a buffer layer, forming an ohmic contact, which was revealed to improve the performance of ZTO TTFTs.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.11a
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• pp.360-363
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• 2003

In this paper, we investigated SiNx film as a buffer layer of TFT-FRAM. Buffer layers were prepared by two step process of a $N_2$ plasma treatment and subsequent $SiN_x$ deposition. By employing $N_2$ plasma treatment, interface traps such as mobile charges and injected charges were removed, hysteresis of current-voltage curve disappeared. After $N_2$ plasma treatment, a leakage current was decreased about 2 orders. From these results, it is possible to perform the plasma treating process to make a good quality buffer layer of MFIS-FET or capacitor as an application of non-volatile memory.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2005.07a
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• pp.29-30
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• 2005

Experimental results are presented for the degradation of 3 nm-thick gate oxide ($SiO_2$) under both Negative-bias Temperature Instability(NBTI) and Hot-carrier-induced(HCI) stresses using P and NMOSFETs that are annealed with hydrogen or deuterium gas at high-pressure (1~5 atm.). Statistical parameter variations depend on the stress conditions. We suggest that deuterium bonds in $SiO_2$ film is effective in suppressing the generation of traps related to the energetic hot electrons.