• 한국분말재료학회지
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• 제24권6호
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• pp.464-471
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• 2017

A metal mesh TCE film is fabricated using a series of processes such as UV imprinting of a transparent trench pattern (with a width of $2-5{\mu}m$) onto a PET film, filling it with silver paste, wiping of the surface, and heat-curing the silver paste. In this work nanosized (40-50 nm) silver particles are synthesized and mixed with submicron (250-300 nm)-sized silver particles to prepare silver paste for the fabrication of metal mesh-type TCE films. The filling of these silver pastes into the patterned trench layer is examined using a specially designed filling machine and the rheological testing of the silver pastes. The wiping of the trench layer surface to remove any residual silver paste or particles is tested with various mixture solvents, and ethyl cellosolve acetate (ECA):DI water = 90:10 wt% is found to give the best result. The silver paste with 40-50 nm Ag:250-300 nm Ag in a 10:90 wt% mixture gives the highest electrical conductance. The metal mesh TCE film obtained with this silver paste in an optimized process exhibits a light transmittance of 90.4% and haze at 1.2%, which is suitable for TSP application.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.334-334
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• 2012

Transparent oxide semiconductors have recently attracted much attention as channel layer materials due to advantageous electrical and optical characteristics such as high mobility, high stability, and good transparency. In addition, transparent oxide semiconductor can be fabricated at low temperature with a low production cost and it permits highly uniform devices such as large area displays. A variety of thin film transistors (TFTs) have been studied including ZnO, InZnO, and InGaZnO as the channel layer. Recently, there are many studies for substitution of Ga in InGaZnO TFTs due to their problem, such as stability of devices. In this work, new quaternary compound materials, tantalum-indium-tin oxide (TaInSnO) thin films were fabricated by using co-sputtering and used for the active channel layer in thin film transistors (TFTs). We deposited TaInSnO films in a mixed gas (O2+Ar) atmosphere by co-sputtering from Ta and ITO targets, respectively. The electric characteristics of TaInSnO TFTs and thin films were investigated according to the RF power applied to the $Ta_2O_5$ target. The addition of Ta elements could suppress the formation of oxygen vacancies because of the stronger oxidation tendency of Ta relative to that of In or Sn. Therefore the free carrier density decreased with increasing RF power of $Ta_2O_5$ in TaInSnO thin film. The optimized characteristics of TaInSnO TFT showed an on/off current ratio of $1.4{\times}108$, a threshold voltage of 2.91 V, a field-effect mobility of 2.37 cm2/Vs, and a subthreshold swing of 0.48 V/dec.

• Journal of information and communication convergence engineering
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• 제3권4호
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• pp.179-183
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• 2005

A photodiode capable of obtaining a sufficient photo/ dark current ratio at both forward bias state and reverse bias state is proposed. The photodiode includes a glass substrate, an aluminum film formed as a lower electrode over the glass substrate, an alumina film formed as an insulator barrier over the aluminum film, a hydrogenated amorphous silicon film formed as a photo conduction layer over a portion of the alumina film, and a transparent conduction film formed as an upper electrode over the hydro-generated amorphous silicon film. A good quality alumina $(Al_2O_3)$ film is formed by oxidation of aluminum film using electrolyte solution of succinic acid. Alumina is used as a potential barrier between amorphous silicon and aluminum. It controls dark-current restriction. In case of photodiodes made by changing the formation condition of alumina, we can obtain a stable dark current $(\~10^{-12}A)$ in alumina thickness below $1000{\AA}$. At the reverse bias state of the negative voltage in ITO (Indium Tin Oxide), the photo current has substantially constant value of $5{\times}10^{-9}$ A at light scan of 100 1x. On the other hand, the photo/dark current ratios become higher at smaller thicknesses of the alumina film. Therefore, the alumina film is used as a thin insulator barrier, which is distinct from the conventional concept of forming the insulator barrier layer near the transparent conduction film. Also, the structure with the insulator thin barrier layer formed near the lower electrode, opposed to the ITO film, solves the interface problem of the ITO film because it provides an improved photo current/dark current ratio.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.299-299
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• 2013

Indium Tin Oxide (ITO) has widely been used as a transparent conductive oxide (TCE) for photovoltaic devices. Lately, flexibility of ITO becomes an issue as demand of flexible device increases. Several scientists have tried to substitute ITO to different materials such as conductive polymer, graphene, CNT, and metal nanowire because of ITO brittleness. Among the substitute materials, PEDOT:PSS has mostly paid attention because PEDOT:PSS has excellent flexibility and good conductivity. The conductivity of PEDOT:PSS increases up to 1000 S/cm with additives such as DMSO, EG, sorbitol, and so on. In our research group, we introduce a conductive polymer PEDOT:PSS as a buffer layer to improve not only flexibility but also conductivity. As PEDOT:PSS layer forms beneath ITO thin film (20 nm), sheet resistance decreases from $230{\Omega}$/${\Box}$ to $85{\Omega}$/${\Box}$ and crack initiation decreases from 4.5 mm to 3.5 mm as well. We have fabricated organic photovoltaic device and power conversion efficiencies using conventional ITO electrode and ITO/PEDOT:PSS hybrid electrode. The photovoltaic property such as power conversion efficiency for ITO/PEDOT:PSS hybrid electrode is comparable to the value obtained using conventional ITO electrode on glass substrate.

• 한국전기전자재료학회논문지
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• 제26권12호
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• pp.867-871
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• 2013

The Ti adhesion layers were deposited onto the glass substrate for transparent capacitors using $Bi_2Mg_{2/3}Nb_{4/3}O_7$ (BMNO) dielectric thin films. Graphene was transferred onto the Ti/glass substrate after growing onto the Ni/$SiO_2$/Si using rapid-thermal pulse CVD (RTPCVD). The BMNO dielectric thin films were investigated for the microstructure, dielectric and leakage properties in the case of capacitors with and without Ti adhesion layers. Leakage current and dielectric properties were strongly dependent on the Ti adhesion layers grown for graphene bottom electrode.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.436-437
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• 2012

염료감응형 태양전지의 성능을 향상시키기 위해서는 염료에서 여기된 전자가 TiO2 계면을 따라 TCO (Transparent Conductive Oxide)로 이동하지 않고 산화된 염료나 전해질과 재결합하는 것을 차단하는 것, 그리고 염료에 TCO의 전기적 접촉을 차단하는 것 등이 필요하다. 이를 위해 본 연구에서는 TiO2 박막층 위에 차단층 TiO2를 $450^{\circ}C$, $600^{\circ}C$, $700^{\circ}C$에서 각각 소결한 뒤Blocking layer로서의 온도에 따른 상(phase) 변화를 통해 염료감응형 태양전지의 효율 향상에 대해 실험하였다. 기존 염료 감응형 태양전지에 대한 보고에 의하면 $600^{\circ}C$ 이상에서의 상은rutile 상임을 확인할 수 있다. 실험결과 Blocking layer로서의 TiO2를 $750^{\circ}C$에서 $750^{\circ}C$에서 sintering 했을 때, 가장 좋은 전기적 특성을 나타내었다.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2003년도 추계학술발표강연 및 논문개요집
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• pp.121-121
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• 2003

NiO thin films are very attractive for use as an antiferromagnetic layer, p-type transparent conducting films, in electrochromic devices and functional sensor layer for chemical sensors, due to their excellent chemical stability, as well as optical, electrical and magnetic properties. In addition, (100)- and (111)-oriented NiO films can be used as buffer layers on which to deposit other oriented oxide films, such as c-axis-oriented perovskite-type ferromagnetic films and superconducting films, because of the similarity in symmetry of oxygen ion lattice and lattice constants between the NiO films and the oriented oxide films. Thus, controlling the crystallographic orientation and surface roughness of the NiO films for a buffer layer are very important.

• 한국분말재료학회지
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• 제14권1호
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• pp.44-49
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• 2007

In the fabrication of dye-sensitized solar cells (DSSCs), carbon counter electrode has been tested for replacing the platinum counter electrode which has two drawbacks: limited surface area and high material cost. Poor mechanical stability of carbon layer due to weak bonding strength to electrically conductive TCO (transparent conducting oxide) glass substrate is a crucial barrier for practical application of carbon counter electrode. In the present study a carbon counter electrode with high conversion efficiency, comparable to Pt counter electrode, could be fabricated by adaption of a bonding layer between particulate carbon material and TCO substrate.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.108-108
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• 2012

High-performance GaN-based light emitting diodes (LEDs) with high efficiency and excellent reliability have been of technological importance forapplications in full color display, automotive lighting, and solid state lighting. To realize high-performance and excellent-reliability LEDs, various technologies such as surface texturing, transparent conducting oxide, surface Plasmon, highly p-conduction layer, current blocking layer, photon-enhanced layer, and nanostructures have been extensively investigated. Among them, advanced core technologies based on how to suppress surface leakage and current crowding, how to enhance current injection efficiency and output power, and how to resist electrostatic damage will be displayed and discussed using our reported and preliminary results. New approaches like integrated LEDs will be also introduced and discussed.

• 반도체디스플레이기술학회지
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• 제13권2호
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• pp.1-5
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• 2014

Transparent and conducting aluminum-doped ZnO electrodes were fabricated by atomic layer deposition methods. The electrode showed the lowest resistivity of $5.73{\times}10^{-4}{\Omega}cm$ at a 2.5% cyclic layer deposition ratio of Trimethyl-aluminum and Diethyl-zinc chemicals. The electrodes showed minimum resistivity when deposited at a temperature of $225^{\circ}C$. The electrode also showed optical transmittance of about 92% at 300 nm. An organic solar cell made with a 300-nm-thick aluminum-doped ZnO electrode exhibited 2.0% power conversion efficiency.