• Journal of the Korean Magnetics Society
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• v.3 no.3
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• pp.196-200
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• 1993

$(Sm_{0.5}RE_{0.5})Fe_{11}Ti$ compounds have tetragonal $ThMn_{12}$-type structure and show the uniaxial magnetocrystalline anisotropy with the easy magnetization c-axis. Among the $(Sm_{0.5}RE_{0.5})Fe_{11}Ti$ series, RE=Sm shows the highest anisotropy field of 11200 kA/m(140 kOe). On the other hand, RE=Nd has the highest saturation magnetization of $122.3\;Am^{2}/kg$(122.3 emu/g) and RE=Gd the highest Curie temperature of $326^{\circ}C$.

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 2005.11a
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• pp.36-36
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• 2005

• Journal of the Korean Ceramic Society
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• v.36 no.2
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• pp.136-144
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• 1999

Crystal structures of tungsten-bronze type microwave dielectric ceramics, $BaOLa_2O_34TiO_2$ (BLT) and $BaO(Nd_{0.77}Y_{0.23})_4TiO_2$ (B(NY)T), were analysed using the Rietveld method. The most relibale refinement was obtained by refining the cation and anion positions from the x-ray and neutron diffraction data, respectively. The ambiguites inherent in the refined crystal structure by Mateeva et al. were resolved. The $BaORe_2O_34TiO_2$ structure consiste of $3\times2$ perovskite blocks and 4 pentagon-channels. The Ti-O6 octahedrons are distroted and tilted, which, consequently, induces the displacements of Ba and Re ions producing the superlattics (c$\approx$ 7.6 $\AA$). The B(NY)T showed more severely tilted Ti-O6 octahedrons. The relative dielectric constant $\varepsilon_{\gamma}$ and temperature coefficient $\tau_\varepsilon$ are 109.5 and-$180 ppm/^{\circ}C$ in BLT, 76 and $+40 ppm/^{\circ}C$ in B(NY)T, respectively. The small Re ions produced a positive $\tau_\varepsilon$. The relation between $\tau_\varepsilon$ and the octahedron tilting in complex perovskite is discussed for the tungsten bronze type structure.

• Journal of the Korean Ceramic Society
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• v.46 no.3
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• pp.330-335
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• 2009

We investigated the effects of the re-oxidation temperature and time on the positive temperature coefficient (PTC) of resistivity characteristics of Sm-doped $BaTiO_3$ sintered at $1200{\sim}1260^{\circ}C$ for 2 h in a reducing atmosphere (3% $H_2/N_2$), followed by re-oxidization processes in air, in which re-oxidization temperature and time were $600{\sim}1000^{\circ}C$ and $1{\sim}10$h, respectively. The result reveals that Smdoped (Ba,Ca)$TiO_3$ ceramics fired in a reducing atmosphere exhibit low PTC characteristics, whereas the sample re-oxidized at $800^{\circ}C$ for 1 h in air exhibit pronounced PTC characteristics. The room-temperature resistivity and jumping characteristics of resistivity (${\rho}_{max}/{\rho}25^{\circ}C$) decrease with Sm contents. The PTC characteristics with reoxidization time at $800^{\circ}C$ have improved about $2{\sim}3$ orders of magnitude whereas differed according to the sintering temperature. The 0.7 at% Sm-doped (Ba,Ca)$TiO_3$ samples reveal the best PTC characteristics in the present range of formula and processes.

• Proceedings of the Materials Research Society of Korea Conference
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• 2005.05a
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• pp.190-190
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• 2005

• Proceedings of the Korean Powder Metallurgy Institute Conference
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• 1999.04a
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• pp.34-34
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• 1999

• Proceedings of the Korean Magnestics Society Conference
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• 1995.05a
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• pp.54-55
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• 1995

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.306.1-306.1
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• 2014

정보화 시대의 발전에 따라 점점 더 많은 정보를 더욱 빠르게 처리할 수 있는 기기들이 요구되고 있다. 메모리는 그 중에서 핵심적인 부품으로써 소자의 고집적화와 고속화가 계속 진행되면서 기존의 메모리 소자들은 집적화에서 그 한계에 도달하고 있다. 기존 소자들의 집적화의 한계를 극복하기 위하여 새로운 비휘발성 메모리 소자들이 제안되었다. 그 중 resistive switching random access memory(ReRAM)은 저항의 변화특성을 사용하는 메모리로 간단한 구조를 가지고 있기 때문에 집적화에 유리하다는 장점을 가지고 있다. 그 외에도 빠른 동작 속도와 낮은 전압에서의 동작이 가능하여 차세대 메모리로써 각광받고 있는 추세이다. 본 연구실에서는 이미 nitride 물질을 기반으로 한 여러 ReRAM 소자들을 제안해 왔다. 그 중 AlN-based ReRAM 소자는 빠른 동작 속도와 좋은 내구성을 보인 바 있다. 하지만 상업화를 위해서 해결해야 할 문제점들이 아직 존재하고 있다. 대표적으로 소자의 배열에서 각 소자의 균일한 동작이 보증되어야 하기 때문에 소자의 셋/리셋 전압의 산포를 줄이고 동작 전류 레벨을 낮추어야 할 필요성이 존재한다. 이러한 ReRAM의 이슈를 해결하기 위해, 본 실험에서는 기존의 AlN-based ReRAM 소자에 Ti를 도핑 방법을 이용하여 소자의 동작 전압 및 전류의 산포를 줄이기 위한 연구를 진행 하였다. 본 실험은 co-sputtering 방법을 이용하여 Ti가 도핑된 AlN을 저항변화 물질로 사용하여 그 특성을 살펴보았다. Ti의 도핑 효과로 소자의 신뢰성 향상 및 동작 전압의 감소 등의 효과를 얻을 수 있었다. 이는 nitride 기반 물질에서 Ti dopant에 의해 형성된 TiN의 효과로 설명된다. TiN는 metallic한 특성을 지니고 있기에 저항변화물질 내에서 일종의 metallic particle의 역할을 수행할 수 있다. 따라서 conducting path의 형성과정에서 이러한 particle 들이 전계를 유도하여 좀 더 균일한 set/reset 특성을 나타내게 된다.

• Journal of the Korea Convergence Society
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• v.11 no.10
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• pp.1-7
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• 2020

The manufacturing process of the resistive variable memory device, which is the based of neuromorphic device, maintained the continuity of vacuum process and applied plasma module suitable for the production of the ReRAM(resistive random access memory) and process technology for the neuromorphic computing, which ensures high integrated and high reliability. The ReRAM device of the oxide thin-film applied to the plasma module was fabricated, and research to improve the properties of the device was conducted through various experiments through changes in materials and process methods. ReRAM device based on TiO₂/TiOx of oxide thin-film using plasma module was completed. Crystallinity measured by XRD rutile, HRS:LRS current value is 2.99 × 10³ ratio or higher, driving voltage was measured using a semiconductor parameter, and it was confirmed that it can be driven at low voltage of 0.3 V or less. It was possible to fabricate a neuromorphic ReRAM device using oxygen gas in a previously developed plasma module, and TiOx thin-films were deposited to confirm performance.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.33 no.6
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• pp.454-459
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• 2020

In this study, a TiO₂/TiO_2-x-based resistance variable memory was fabricated using a DC/RF magnetron sputtering system and ALD. In order to analyze the effect of oxygen plasma treatment on the performance of resistance random access memory (ReRAM), the TiO₂/TiO_2-x-based ReRAM was evaluated by applying RF power to the TiO_2-x oxygen-holding layer at 30, 60, 90, 120, and 150 W, respectively. The ReRAM was fabricated, and the electrical and surface area performances were compared and analyzed. In the case of ReRAM without oxygen plasma treatment, the I-V curve had a hysteresis curve shape, but the width was very small, with a relatively high surface roughness of the oxygen-retaining layer. However, in the case of oxygen plasma treatment, the HRS/LRS ratio for the I-V curve improved as the applied RF power increased; stable improvement was also noted in the surface roughness of the oxygen-retaining layer. It was confirmed that the low voltage drive was not smooth due to charge trapping in the oxygen diffusion barrier layer owing to the high intensity ReRAM applied with an RF power of approximately 150 W.