• Title/Summary/Keyword: Ti 전극

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A study on the fabrication process development of FeTi type alloy for Ni/MH battery (니켈-수소 2차전지용 철-티타늄계 전극용 합금제조 공정에 관한 연구)

  • Lee, Moon-Goo;Kim, Eul-Su;Jeong, Sun-Dol;Kim, Ki-Won;Ahn, Hyo-Jun
    • Transactions of the Korean hydrogen and new energy society
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    • v.10 no.1
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    • pp.1-7
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    • 1999
  • In order to study on the effect of fabrication methods on the changes of hydrogenation properties of FeTi alloy, FeTi samples were prepared using three different methods, i.e., arc melting, mechanical alloying and combination of the two methods. The FeTi prepared by mechanical alloying represented amorphous structure. The hydrogen storage capacity of arc melted FeTi alloy is larger than any other samples. However, FeTi electrode fabricated by mechanical alloying after arc melting showed largest discharge capacity among them.

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Micro Electrochemical Machining Characteristics and Shape Memory Effect in Ni-Ti SMA (Ni-Ti SMA의 미세 전해가공특성과 형상기억효과)

  • 김동환;박규열
    • Journal of the Korean Society for Precision Engineering
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    • v.20 no.1
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    • pp.43-49
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    • 2003
  • In this study, micro electrochemical machining method was introduced for accomplishment the fabrication technology of functional parts and smart structures using the Ni-Ti shape memory alloy. From the experimental result, the micro part which has very fine surface could be achieved by use of micro electrochemical process with point electrode method. Concretely, the optimal performance of micro electrochemical process in Ni-Ti SMA was obtained at the condition of approximately 100% of current efficiency and high frequency pulse current. That is, much finer surface integrity and shape memory effect can be obtained at the same condition mentioned above.

The Study on Thermal Stability of Ti-Capped Ni Monosilicide (Ti-capped Ni monosilicide의 열적 안정성에 관한 연구)

  • 이근우;유정주;배규식
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.03a
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    • pp.106-106
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    • 2003
  • 반도체 소자의 고집적화에 따라 채널길이와 배선선 폭은 점차 줄어들고, 이에 따라 단채널효과, 소스/드레인에서의 기생저항 증가 및 게이트에서의 RC 시간지연 증가 등의 문제가 야기되었다. 이를 해결하기 위하여 자기정렬 실리사이드화(SADS) 공정을 통해 TiSi2, CoSi2 같은 금속 실리사이드를 접촉 및 게이트 전극으로 사용하려는 노력이 진행되고 있다. 그런데 TiSi2는 면저항의 선폭의존성 때문에, 그리고 CoSi2는 실리사이드 형성시 과도한 Si소모로 인해 차세대 MOSFET소자에 적용하기에는 한계가 있다. 반면, NiSi는 이러한 문제점을 나타내지 않고 저온 공정이 가능한 재료이다. 그러나, NiSi는 실리사이드 형성시 NiSi/Si 계면의 산화와 거침성(roughness) 때문에 높은 누설 전류와 면저항값, 그리고 열적 불안정성을 나타낸다. 한편, 초고집적 소자의 배선재료로는 비저항이 낮고 electro- 및 stress-migration에 대한 저항성이 높은 Cu가 사용될 전망이다. 그러나, Cu는 Si, SiO2, 실리사이드로 확산·반응하여 소자의 열적, 전기적, 기계적 특성을 저하시킨다. 따라서 Cu를 배선재료로 사용하기 위해서는 확산방지막이 필요하며, 확산방지재료로는 Ti, TiN, Ta, TaN 등이 많이 연구되고 있다.

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Photoactivity of n-type $TiO_2$ Ceramic Electrodes (n-형 $TiO_2$ 세라믹 전극의 광 활동도)

  • 윤기현;김종선
    • Journal of the Korean Ceramic Society
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    • v.22 no.4
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    • pp.9-14
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    • 1985
  • The quantum efficiency vs. wavelength curves with different reducing treatments for the 99.99% and 98.5% $TiO_2$ ceramic electrodes have been analyzed according to the Schottky barrier model of the semiconductor-elect-rolyte interface, The model allows the main physical parameters governing the photoelectrochemical properties of the semicon-ductor to be determined. According to these data the impurity ions as three valence state ($Fe^{3+})$ in the $TiO_2$ raw materials have great influence on the photoresponse and the $TiO_2$ ceramic electrodes show much lower quantum efficiency than the $TiO_2$ single crystal due to existence of the recombination centers.

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RF Glow Discharge and TiN Thin Film Characteristics in a Plane Electrode System (평판형 전극계의 RF 글로우 방전특성 및 TiN 박막특성)

  • Kwak, D.J.;Kim, D.H.;Kim, H.J.;Park, C.H.
    • Proceedings of the KIEE Conference
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    • 1996.07c
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    • pp.1838-1840
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    • 1996
  • In order to study the relationship between the physical properties of glow discharge plasma and the physical behavior of TiN thin film, electrical characteristics of RF discharge plasma driven at 13.56MHz in a parallel-plate electrode system were measured. Plasma parameters, such as electron density and temperature, are also studied since they may be considered as one of the very important factors deciding the physical properties of TiN thin film under given conditions of applied biasd voltage and pressure. The TiN thin film were fabricated over a wide range of discharge conditions, and some of the general relationships between the measured plasma parameters and the properties of TiN thin film were discussed.

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Relationship between Machining Characteristics & Current Efficiency in Electro Chemical Machining of Ni-Ti Shape Memory Alloy (Ni-Ti 형상기억합금의 전해가공에서 전류효율과 가공특성의 관계)

  • 김동환;강지훈;박규열
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 2000.10a
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    • pp.320-325
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    • 2000
  • This study was performed to investigate the electro-chemical-machining (ECM) characteristic of Ni-Ti Shape Memory Alloy (SMA). From the experimental results, we could gain optimal electro-chemical conditions to bound with lesser machining effect and better surface roughness than any other machining methods to workpiece at the same time. At these conditions, current efficiency was, for especially ECM working of Ni-Ti SMA, approximately 100% and high frequency pulse current was detected.

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Influence of Grain Size and Dopant ZnO on the Photoelectrochemical Conversion in TiO2 Ceramic Electrods (TiO2 세라믹 전극의 광전기 화학 변환에 미치는 결정립 크기와 첨가제 ZnO의 영향)

  • 윤기현;장병규;김태희
    • Journal of the Korean Ceramic Society
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    • v.26 no.2
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    • pp.258-266
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    • 1989
  • The effects of grain size and dopant ZnO on the photoelectrochemical conversion in TiO2 ceramic electrodes have been investigated. The photocurrent increases with increasing grain size in the undoped TiO2 ceramic electrode. In ZnO-doped TiO2 electrodes, the photocurrent decreases with increasing ZnO up to 0.4 wt% due to decrease of donor concentration, and then with further addition of ZnO, photocurrent increases according to the formation of second phase. However, the photoresponse appears at wavelength of 420nm, which is very close to the energy band gap of TiO2, regardless of grain size and amount of ZnO.

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Dry Etch Characteristics of TiN Thin Film for Metal Gate Electrode (Metal 게이트 전극을 위한 TiN 박막의 건식 식각 특성)

  • Um, Doo-Seung;Woo, Jong-Chang;Park, Jung-Soo;Kim, Chang-Il
    • Journal of the Korean institute of surface engineering
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    • v.42 no.4
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    • pp.169-172
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    • 2009
  • We investigated the dry-etching mechanism of the TiN thin film using a $Cl_2$/Ar inductively coupled plasma system. To understand the effect of the $Cl_2$/Ar gas mixing ratio, we etched the TiN thin film by varying $Cl_2$/Ar gas mixing ratio. When the gas mixing ratio was 100% $Cl_2$, the highest etch rate was obtained. The chemical reaction on the surface was investigated with X-ray photoelectron spectroscopy (XPS). Scanning electron microscopy (SEM) was used to examine etched profiles of the TiN thin film.

Preparation and characterization of $TiO_2$ Thin Film By Various temperature ($TIO_2$ 전극의 소결온도에 따른 DSSCS 제조 및 성격)

  • Kim, Sung Jin;Pak, Hunkyun
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.06a
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    • pp.95.2-95.2
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    • 2010
  • 염료감응형 태양전지의 효율을 향상을 시키기 위하여, 이산화티타니아박막을 doctor-blade 방법으로 FTO 기판위에 15-16um 코팅을 한뒤, 다른 온도의 $400^{\circ}C-600^{\circ}C$ 범위에서, 소결을 하였다. 상대전극은 FTO 기판위에 5Ml의 Pt용액을 가지고, $450^{\circ}C$온도에서 제작을 하였다. 실험의 결과 이산화티타니아의 표면거칠기 및 입자사이즈의 소결의 형상에 따라 DSSC의 효율의 상관관계가 영향을 받았다. 표면의 형상은 AFM으로 측정을 하였으며, 표면의 단차가 RMS의 값이 7nm이하 일 때, 효율의 향상을 이루었다. 실험결과 $500^{\circ}C$ 이하일 때, 상대적으로 낮은 open circuit voltage를 이루었으며, 낮은 Fill-factor를 이루었다. $500^{\circ}C$이상의 온도에서는 상대적으로 높은 high circuit voltage와 높은 fill factor를 나타내었다. 실험결과 $500^{\circ}C$에서 소결된 전극을 가진 DSSC가 단락의 전압과 개방전류가 상호보완된 적정값을 가져 가장 개선된 FF와 Eff를 나타내었다. 이와 같은 특성은 이산화티타니아의 준위 모식도에서 설명이 될수 있고, 이산화티타니아의 최적의 necking 및 pore, 입자크기등이 제어될수 있음을 의미한다.

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Electrochemical Decolorization of a Rhodamine B using Dimensionally Stable Anode (불용성 전극을 이용한 Rhodamine B의 전기화학적 탈색)

  • Kim, Dong Seog;Park, Young Seek
    • Journal of Korean Society on Water Environment
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    • v.23 no.3
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    • pp.377-384
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    • 2007
  • This study has carried out a performance of dimensionally stable anode for the purpose of decolorization of Rhodamine B (RhB) in water. Seven kinds of 1, 2 and 3 component electrodes were prepared by plating and thermal deposition, which were coated by the oxides of Pt, Ru, Ir, Sn-Sb, Ir-Sn-Sb, Ru-Sn-Sb and Ru-Sn-Ti on Ti metal surface, respectively. Performance for RhB decolorization of the seven electrodes lay in: Ru-Sn-Ti/Ti ${\fallingdotseq}$ Ru-Sn-Sb/Ti > Ir-Sn-Sb/Ti > Sn-Sb/Ti > Ru/Ti > Ir/Ti > Pt/Ti. The effects of electrode area and distance, electrolyte type and concentration, current density and pH were investigated on the decolorization of RhB using Ru-Sn-Ti/Ti electrode. Decolorization of RhB was not influenced by electrode area and distance largely, however wattage was influenced by them. NaCl was superior to the decolorization of RhB than $Na_2SO_4$. Optimum NaCl dosage and current density were 0.5 g/L and $0.183A/cm^2$, respectively. The pH effect of decolorization of RhB was not significant within the range of 3-7.