• Journal of Information Display
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• v.1 no.1
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• pp.3-8
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• 2000

We have developed a high performance vertical alignment TFT-LCD (Thin Film Transistor Liquid Crystal Display), that shows a high light transmittance, and wide viewing angle characteristics with an unusually high contrast ratio. In order to optimize the electro-optical properties we have studied the effect of cell parameters, multi-domain structure and retardation film compensation. With the optimized cell parameters and process conditions, we have achieved a 24" wide UXGA TFTLCD monitor (16:10 aspect ratio 1920X1200) showing a contrast ratio of over 500:1, panel transmittance near 4.5%, response time near 25 ms, and viewing angle higher than 80 degree in all directions.

• 한국정보디스플레이학회:학술대회논문집
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• 2000.01a
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• pp.11-12
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• 2000

An 18.1" Thin Film Transistor Liquid Crystal Display (TFT LCD) monitor adopting high brightness In Plane Switching (IPS) technology was realized. While conventional IPS structure used a Chromium (Cr) and Molybdenum (Mo) for a drain electrode, Indium Tin Oxide (ITO) was proposed and verified in this paper. Black sticky micropeal spacers were introduced for the reduction of light scattering phenomena, which was observed at dark room with the conventional micropeal spacers. With the proposed method, more than 10 % aperture ratio was increased and the excellent image quality was obtained.

• Applied Microscopy
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• v.39 no.4
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• pp.349-354
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• 2009

In this paper we have constructed three dimensional images and examined structural failure on thin film transistor (TFT) liquid crystal display (LCD) by using dual-beam focused ion beam (FIB) and IMOD software. Specimen was sectioned with dual-beam focused ion beam. Series of two dimensional images were obtained by scanning electron microscopy. Three dimensional reconstruction was constructed from them by using IMOD software. The short defect between Gate layer and Data layer was found from the result of three dimensional reconstruction. That phenomena made the function of the gate lost and data signal supplied to the electrode though the Drain continuously. That signal made continuous line defect. The result of the three dimensional reconstruction, serial section, SEM imaging by using the FIB will be the foundation of the next advanced study.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2008.10a
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• pp.592-595
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• 2008

This paper presents development of automatic image quality register optimization system using mobile TFT-LCD (Thin Film Transistor-Liquid Crystal Display) driver IC and embedded software. It optimizes automatically gamma adjustment and voltage setting registers in mobile TFT-LCD driver IC to improve gamma correction error, adjusting time, flicker noise and contrast ratio. Developed algorithms and embedded software are generally applicable for most of the TFT-LCD modules. The proposed optimization system contains module-under-test (MUT, TFT-LCD module), control program, multimedia display tester for measuring luminance, flicker noise and contrast ratio, and control board for interface between PC and TFT-LCD module. The control board is designed with DSP and FPGA, and it supports various interfaces such as RGB and CPU.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1993.05a
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• pp.96-99
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• 1993

Electrical properties of the Thin Film Transistor(TFT) electrode metal films were investigated through the Test Elements Group(TEG) experiment. The main purpose of this investigation was to characterize the electrical resistance properties of patterned metal films with respect to the variations of film thickness and TEG metal line width. Aluminum(Al), Tantalum(Ta) and Chromium(Cr) that are currently used as TFT electrode films were selected as the probed metal films. To date, no work in the electrical characterizations of patterned electrodes of a-Si TFT was accomplished. Bulk resistance$(R_b)$, sheet resistance$(R_s)$, and resistivities($\rho$) of TEG patterned metal lines were obtained. Electrical continuity test of metal film lines was also performed in order to investigate the stability of metallization process. Almost uniform-linear variations of the electrical properties with respect to the metal line displacements was also observed.

• Proceedings of the KIEE Conference
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• 2006.07d
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• pp.2061-2062
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• 2006

a-Si(amorphous silicon) TFT(thin film transistor)는 TFT-LCD(liquid crystal display)의 화소 스위칭(switching) 소자로 폭넓게 이용되고 있다. 현재는 a-Si을 이용하여 gate drive IC를 기판에 집적하는 ASG(amorphous silicon gate) 기술이 연구, 적용되고 있는데 이때 가장 큰 제약은 문턱 전압(Vth)의 이동이다. 특히 고온에서는 문턱 전압의(Vth) 이동이 가속화 되고, Ioff current가 증가 하게 되고, 저온($0^{\circ}C$)에서는 전류 구동능력이 상온($25^{\circ}C$) 상태에서 같은 게이트 전압(Vg)에 대해서 50% 수준으로 감소하게 된다. 특히 ASG 회로는 여러 개의 TFT로 구성되는데, 각각의 TFT가 고온에서 Vth shift 값이 다르게 되어 설계시 예상하지 못 한 고온에서의 화면 무너짐 현상 즉 고온 노이즈 불량이 발생 할 수 있다. 고온 노이즈 불량은 고온에서의 각 TFT의 문턱전압 및 $I_D-V_G$ 특성을 측정한 결과 고온 노이즈 불량에 영향을 주는 인자가 TFT의 width와 기생 capacitor비 hold TFT width가 영향을 주는 것으로 실험 및 시뮬레이션 결과 확인이 되었다. 발생 mechanism은 ASG 회로는 AC 구동을 하기 때문에 Voff 전위에 ripple이 발생 되는데 특히 고온에서 ripple이 크게 증가 하여 출력 signal에 영향을 주어 불량이 발생하는 것을 규명하였다.

• Journal of Korea Multimedia Society
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• v.13 no.8
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• pp.1115-1127
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• 2010

In order to increase the productivity in manufacturing TFT-LCD(thin film transistor-liquid crystal display), it is essential to classify defects that occur during the production and make an appropriate decision on whether the product with defects is scrapped or not. The decision mainly depends on classifying the defects accurately. In this paper, we present an effective classification method for film defects acquired in the panel production line by analyzing the intensity distribution and shape feature of the defects. We first generate a binary image for each defect by separating defect regions from background (non-defect) regions. Then, we extract various features from the defect regions such as the linearity of the defect, the intensity distribution, and the shape characteristics considering intensity, and construct a referential image database that stores those feature values. Finally, we determine the type of a defect by matching a defect image with a referential image in the database through the matching cost function between the two images. To verify the effectiveness of our method, we conducted a classification experiment using defect images acquired from real TFT-LCD production lines. Experimental results show that our method has achieved highly effective classification enough to be used in the production line.

• Korea-Australia Rheology Journal
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• v.19 no.3
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• pp.165-169
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• 2007

The light guide plate (LGP) of LCD-BLU (Liquid Crystal Display-Back Light Unit) is usually manufactured by forming numerous dots by etching process. However, the surface of those etched dots of LGP is very rough due to the characteristics of etching process, so that its light loss is relatively high due to the dispersion of light. Accordingly, there is a limit in raising the luminance of LCD-BLU. In order to overcome the limit of current etched-dot patterned LGP, micro-lens pattern was tested to investigate the possibility of replacing etched pattern in the present study. The micro-lens pattern fabricated by the modified LiGA with thermal reflow process was applied to the optical design of LGP. The attention was paid to the effects of different optical pattern type (i.e. etched dot, micro-lens). Finally, the micro-lens patterned LGP showed better optical qualities than the one made by the etched-dot patterned LGP in luminance.

• Proceedings of the KIEE Conference
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• 2006.07c
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• pp.1665-1666
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• 2006

TFT-LCD(Thin Film Transistor Liquid Crystal Display)는 표시장치로서 실용화된 후 많은 상품에 적용중이다. 그러나, LCD는 자체 발광능력이 없으므로 그후면에서 LCD 화면을 밝혀주는 BLU(Backlight Unit)를 필요로 한다. BLU는 내부 광원으로 밝기가 균일한 평면광을 만들어 LCD 화면을 균일하게 면조사하는 역할을 한다. LCD가 적용되는 분야중 Note PC에는 광원으로 CCFL(Cold Cathode Fluorescent Lamp)가 적용되어 왔지만, 최근 고휘도, 박형화, 저소비 전력을 달성하기 위해 CCFL로는 한계가 있어 LED(Light Emitting Diode)를 적용한 BLU를 제작하기 위한 연구가 진행되고 있다. 본 연구에서는 점광원인 LED 적용한 LED에 있어서 요구되는 휘도 균일성을 향상시키기 위해서는 LED광원이 적용된 BLU의 외관 품질 향상을 위한 도광판 입광부 구조 최적화를 광추적 Simulation을 통해 예측하고 향상시킬 수 있는 구조를 제안한다. Simulation결과, 외관품질 개선을 위해 도광판 입광면에 130도의 Serration과 휘도를 향상하기 위해 도광판 밑면에 렌즈 형상의 바 구조를 도출해 적용한 결과 외관품질향상과 휘도향상을 얻었다.

• Journal of the Microelectronics and Packaging Society
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• v.21 no.2
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• pp.85-89
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• 2014

We propose the new fabrication method of a 70 nm half-pitch wire grid polarizer with high performance using magnetic soft mold. The device is a form of aluminium gratings on a PET(Polyethylene phthalate) substrate whose size of $3cm{\times}3cm$ is compatible with a TFT_LCD(Tin Flat Transistor Liquid Crystal Display) panel. A magnetic soft mold with a pitch of 70 nm is fabricated using two-step replication method. As a result, we get a NWGP pattern which has 70.39 nm line width, 64.76 nm depth, 140.78 nm pitch, on substrate. The maximum and minimum transmittances of the NWGP at 800 nm are 75% and 10%, respectively. This work demonstrates a unique cost-effective solution for nanopatterning requirements in consumer electronics components.