• 제목/요약/키워드: Thin layer

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순차 증착에 의한 BSCCO 박막의 에피택셜 성장 (Epitaxial Growth of BSCCO Films by Leyer-by-Layer Deposition)

  • 안준호;박용필;김정호
    • 한국전기전자재료학회논문지
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    • 제14권10호
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    • pp.855-860
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    • 2001
  • Bi$_2$Sr$_2$CuO$_{x}$(Bi-2201) thin film were fabricated by atomic layer-by -layer deposition using an ion beam sputtering method. 10 wt% and 90 wt% ozone mixed oxygen were used with ultraviolet light irradiation to assist oxidation. XRD and RHEED investigations revealed that a buffer layer is formed at the early stage of deposition (less than 10 unit cell), and then c-axis oriented Bi-2201 grows on top of it.t.

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Two Step방식과 아몰퍼스 Si 하지층 도입에 따른 수직자기기록 매체용 CoCrTa 박막의 특성 평가 (Properties of CoCrTa Thin Film Introduce Two Step methode and Amorphous Si Under Layer for Perpendicular Magnetic Recording Media)

  • 박원효;김경환
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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    • pp.550-552
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    • 2003
  • We prepared $Co_{77}Cr_{20}Ta_3$ Magnetic layer for perpendicular magnetic recording media with introduce Two-step methode and Amorphous Si Underlayer on slide glass substrate. The thickness of magnetic layer were 100nm, and Underlayer were varied from 5 to 100 nm. The multi layer Properties of crystal structure were examined with XRD. Prepared thin films showed improvement of dispersion angle of c-axis orientation ${\Delta}{\theta}_{50}$ caused by inserting Buffer-layer and amorphous Si underlayer.

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초전도 박막의 에피택셜 성장에 관한 연구 (A Study on the Epitaxial Growth of Superconducting Thin Film)

  • 이희갑;박용필;김귀열
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 춘계학술대회 논문집 유기절연재료 전자세라믹 방전플라즈마 일렉트렛트 및 응용기술
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    • pp.208-211
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    • 2002
  • $Bi_2Sr_2CuO_x$(Bi-2201) thin films were fabricated by atomic layer-by-layer deposition using an ion beam sputtering method. 10 wt% and 90 wt% ozone mixed with oxygen were used with ultraviolet light irradiation to assist oxidation. At early stages of the atomic layer by layer deposition, two dimensional epitaxial growth which covers the substrate surface would be suppressed by the stress and strain caused by the lattice misfit, then three dimensional growth takes place. Since Cu element is the most difficult to oxidize, only Sr and Bi react with each other predominantly, and forms a buffer layer on the substrate in an amorphous-like structure, which is changed to $SrBi_2O_4$ by in-situ anneal.

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CoCrTa/Ti 이층막의 하지층기판온도의존성 및 특성개선 (Improvement of characteristics and dependence on underlayer substrate temperature of CoCrTa/Ti double layer)

  • 김용진;성하윤;금민종;손인환;김경환
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 추계학술대회 논문집
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    • pp.492-495
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    • 2000
  • In order to develop an ultra-thin CoCr perpendicular magnetic recording layer, we prepared CoCrTa/Ti double layer for perpendicular magnetic recording media by new facing targets sputtering system, Crystallgraphics and magnetic characteristics of CoCrTa on underlayer substrate temperature have been investigated. Crystallgraphic and magnetic characteristic of thin films were evaluated by X-ray diffractometry(XRD), vibrating sample magnetometer(VSM) and atomic force microscopy(AFM). The coercivity and anisotropy field was increased by increasing under layer substrate temperature, c-axis orientation of CoCrTa magnetic recording layer was improved 8$^{\circ}$ to 5.6$^{\circ}$when under layer substrate temperature was 250[$^{\circ}C$]. Also, through annealing effect for CoCrTa/Ti double layer, it was certain that crystallgraphics and magnetic characteristics was improved.

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초저속 순차증착으로 제작한 Bi2212 박막의 특성 (Characteristics of Bi2212 Thin Film Fabricated by Layer-by-Layer Deposition at an Ultra Low Growth rate)

  • 이희갑;박용필;천민우
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2002년도 추계학술대회 논문집 전기물성,응용부문
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    • pp.119-121
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    • 2002
  • $Bi_2Sr_2CuO_x$ thin films were fabricated by atomic layer-by-layer deposition using an ion beam sputtering method, 10 wt% and 90 wt% ozone mixed with oxygen were used with ultraviolet light irradiation to assist oxidation. At early stages of the atomic layer by layer deposition, two dimensional epitaxial growth which covers the substrate surface would be suppressed by the stress and strain caused by the lattice misfit, then three dimensional growth takes place. Since Cu element is the most difficult to oxidize, only Sr and Bi react with each other predominantly, and forms a buffer layer on the substrate in an amorphous-like structure, which is changed to $SrBi_2O_4$ by in-situ anneal.

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간흡충에 대한 항체검출을 위한 Thin Layer Immounoassay (TIA) (Thin Layer Immnunoassay (TIA) for circulating antibody detection in clonorchiasis)

  • 임경일
    • Parasites, Hosts and Diseases
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    • 제21권1호
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    • pp.1-5
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    • 1983
  • 간츱충증 환자로부터 혈액을 채취하여 그 혈청에서 간흡충에 대한 항체를 Thin Layer Immunoassay(TIA)에 의하여 검출하였다. TIA는 Elwing et al.(1976)이 기술한 방법에 의하여 시행하였고, 항원은 이등(1981)의 방법으로 제조된 간흡충 성충 생리식염수 추출물을 사용하였으며 그 단백질 함량은 2.87mg/ml이었다. 간흡충중 환자 60명의 혈청에서의 항체가는 건강대조군 및 이질아메바 감염자에서의 항체가와 비교할 때 그 차이가 유의하였으나, 폐흡충증 환자와의 차이는 유의하지 않았다. 간흡충중 환자의 성별이나 연령과 TIA에 의한 항체가 사이에 상관 관계가 없었다. 환자의 분변내 EPG, 말초혈액내 호산구의 수와도 상관이 없었다. TIA에 의한 항체가와 간기능 검사 결과와의 관계를 보면 alkaline phosphatase, SGOT 및 SGPT 측정치와 모두 상관이 없음을 알 수 있었다.

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Effect of Film Thickness on Structural, Electrical, and Optical Properties of Sol-Gel Deposited Layer-by-layer ZnO Nanoparticles

  • Shariffudin, S.S.;Salina, M.;Herman, S.H.;Rusop, M.
    • Transactions on Electrical and Electronic Materials
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    • 제13권2호
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    • pp.102-105
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    • 2012
  • The structural, electrical, and optical properties of layer-by-layer ZnO nanoparticles deposited using sol-gel spin coating technique were studied and now presented. Thicknesses of the thin films were varied by increasing the number of deposited layers. As part of our characterization process, XRD and FE-SEM were used to characterize the structural properties, current-voltage measurements for the electrical properties, and UV-Vis spectra and photoluminescence spectra for the optical properties of the ZnO thin films. ZnO thin films with thicknesses ranging from 14.2 nm to 62.7 nm were used in this work. Film with thickness of 42.7 nm gave the lowest resistivity among all, $1.39{\times}10^{-2}{\Omega}{\cdot}cm$. Photoluminescence spectra showed two peaks which were in the UV emission centered at 380 nm, and visible emission centered at 590 nm. Optical transmittance spectra of the samples indicated that all films were transparent (>88%) in the visible-NIR range. The optical band gap energy was estimated to be 3.21~3.26 eV, with band gap increased with the thin film thickness.

임피던스 측정법을 이용한 엑시머 레이져 열처리 Poly-Si의 특성 분석 (APPLICATION OF IMPEDANCE SPECTROSCOPY TO POLYCRYSTALLINE SI PREPARED BY EXCIMER LASER ANNEALING)

  • 황진하;김성문;김은석;류승욱
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 추계학술발표강연 및 논문개요집
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    • pp.200-200
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    • 2003
  • Polycrystalline Si(polysilicon) TFTs have opened a way for the next generation of display devices, due to their higher mobility of charge carriers relative to a-Si TFTs. The polysilicon W applications extend from the current Liquid Crystal Displays to the next generation Organic Light Emitting Diodes (OLED) displays. In particular, the OLED devices require a stricter control of properties of gate oxide layer, polysilicon layer, and their interface. The polysilicon layer is generally obtained by annealing thin film a-Si layer using techniques such as solid phase crystallization and excimer laser annealing. Typically laser-crystallized Si films have grain sizes of less than 1 micron, and their electrical/dielectric properties are strongly affected by the presence of grain boundaries. Impedance spectroscopy allows the frequency-dependent measurement of impedance and can be applied to inteface-controlled materials, resolving the respective contributions of grain boundaries, interfaces, and/or surface. Impedance spectroscopy was applied to laser-annealed Si thin films, using the electrodes which are designed specially for thin films. In order to understand the effect of grain size on physical properties, the amorphous Si was exposed to different laser energy densities, thereby varying the grain size of the resulting films. The microstructural characterization was carried out to accompany the electrical/dielectric properties obtained using the impedance spectroscopy, The correlation will be made between Si grain size and the corresponding electrical/dielectric properties. The ramifications will be discussed in conjunction with active-matrix thin film transistors for Active Matrix OLED.

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흰쥐에서 NG-Monomethyl-L-arginine으로부터 methylamine의 생성 (Formation of methylamine from NG-Monomethyl-L-arginine in Rat)

  • 조영봉;안영곤;최홍순;김춘성
    • 한국산업보건학회지
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    • 제6권1호
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    • pp.138-143
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    • 1996
  • After oral administration of 14C-labelled $N^G$-mono[methyl-14C]-L-arginine into rats, 38.2 % and 14.7 % of the administered radioactivity bad been recovered in the urine and stool during 10 days. In the urine, 59.4 % of the radioactivity was recovered in the first 24-hours and used for the indentification of the formation of methylamine. The strong cation-exchange resin column chromatography showed 6.3 %, 7.4 %, 4.9 %, and 81.5 % of the distributions of radioactivity of the neutral, monomethylamine, basic, and uneluted portions, respectively. The radioactivity of monomethylamine portion reeluted into the column chromatography was 39.5 %. The radioactivities corresponding monomethylamine in the column chromatography, thin-layer chromatography, and thin-layer electrophoresis were 39.5 %, 37.3 %, and 28.8 % of the recovered radioactivity, respectively.

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Bi 박막의 성막 특성에 관한 연구 (Study on the deposition Characteristics of Bi Thin Film)

  • 이희갑;박용필;이준웅
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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    • pp.1071-1074
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    • 2002
  • This paper presents Bi thin films have been fabricated by atomic layer-by-layer deposition and co-deposition at an IBS method. The growth rates of the films was set in the region from 0.17 to 0.27 nm/min. MgO(100) was used as a substrate. In order to appreciate stable existing region of Bi 2212 phase with temperature and ozone pressure, the substrate temperature was varied between 655 and $820^{\circ}C$ and the highly condensed ozone gas pressure$(PO_3)$ in vacuum chamber was varied between $2.0{\times}10^{-6}$ and $2.3{\times}10^{-5}Torr$. Bi 2212 phase appeared in the temperature range of 750 and $795^{\circ}C$: and single phase of Bi 2201 existed in the lower region than $785^{\circ}C$. Whereas, $PO_3$ dependance on structural formation was scarcely observed regardless of the pressure variation. And high quality of c-axis oriented Bi 2212 thin film with $T_c$(onset) of about 90 K and $T_c$(zero) of about 45 K is obtained. Only a small amount of CuO in some films was observed as impurity, and no impurity phase such as $CaCuO_2$ was observed in all of the obtained films.

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