• 제목/요약/키워드: Thin film patterning

검색결과 170건 처리시간 0.021초

Soft-Lithographic Fabrication of Ni Nanodots Using Self-Assembled Surface Micelles

  • Seo, Young-Soo;Lee, Jung-Soo;Lee, Kyung-Il;Kim, Tae-Wan
    • Journal of Magnetics
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    • 제13권2호
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    • pp.53-56
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    • 2008
  • This study proposes a simple nano-patterning process for the fabrication of magnetic nanodot arrays on a large area substrate. Ni nanodots were fabricated on a large area (4 inches in diameter) Si substrate using the soft lithographic technique using self-assembled surface micelles of Polystyrene-block-Poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer formed at the air/water interface as a mask. The hexagonal array of micelles was successfully transferred to a Ni thin film on a Si substrate using the Langmuir-Blodgett technique. After ion-mill dry etching, a magnetic Ni nanodot array with a regular hexagon array structure was obtained. The Ni nanodot array showed in-plane easy axis magnetization and typical soft magnetic properties.

레이저를 이용한 차세대 평판 디스플레이 공정 (Laser Microfabrications for Next-Generation Flat Panel Display)

  • 김광열
    • 한국재료학회지
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    • 제17권7호
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    • pp.352-357
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    • 2007
  • Since a pattern defects "repair" system using a diode pumped solid state laser for Flat Panel Display (FPD) was suggested, a lot of laser systems have been explored and developed for mass-production microfabrication process. A maskless lithography system using 405 nm violet laser and Digital Micromirror Device (DMD) has been developed for PDP and Liquid Crystal Display (LCD) Thin Film Transistor (TFT) photolithography process. In addition, a "Laser Direct Patterning" system for Indium Tin Oxide (ITO) for Plasma Display Panel(PDP) has been evaluated one of the best successful examples for laser application system which is applied for mass-production lines. The "heat" and "solvent" free laser microfabrications process will be widely used because the next-generation flat panel displays, Flexible Display and Organic Light Emitting Diode (OLED) should use plastic substrates and organic materials which are very difficult to process using traditional fabrication methods.

나노미터 규격의 친수성 박막 패터닝을 이용한 선택적 폴리스티렌 입자 배열 (Selective Array of Polystyrene Beads by Using Nanometer-Scaled Hydrophilic Thin Film Patterning)

  • 강정화;김경섭;김남훈;노용한
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.103-104
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    • 2007
  • Nanometer-scaled polymer beads, such as polystyrene beads, were used as nanometer fabrication materials due to their some advantages such as self-assembled monolayer, nanometer scaled size and excellent compatibility with silicon based devices. Thus, the investigation on these properties of polymer beads was required. It is difficult to control the array of polystyrene beads on silicon substrate. In this study, we investigated the condition of selective array of polystyrene beads on nanometer-scaled hydrophilic surface which was obtained by APS coating. A tilting method was used to array the polystyrene beads selectively on the substrate. The polystyrene beads could be arrayed selectively by this method. From these results, we verified that there are possibilities to fabricate unique tools for the nanometer-scaled electrical devices.

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반도체 제조에 있어서의 품질공학 : 패터닝 공정과 박막형성 공정을 중심으로 (Quality Engineering in Semiconductor Manufacturing with Emphasis on Patterning and Thin Film Forming Processes)

  • 염봉진;김길수;이팔훈;박양길;김성준
    • 산업공학
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    • 제10권1호
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    • pp.67-77
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    • 1997
  • 반도체 제조공정에서 패터닝 공정과 박막형성 공정은 매우 중요한 위치를 차지하고 있다. 본 논문의 목적은 위 두가지의 공정을 최적화하기 위한 품질공학적 접근방법을 소개하는데 있다. 특히, 패터닝 공정의 전사성과 박막현상 공정의 두께의 균일성에 관한 문제를 동특성의 문제로 정형화하고 신호인자를 어떻게 설정할 것인가에 관해 논의하였다.

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Multiform Oxide Optical Materials via the Versatile Pechini-type Sol-Gel Process

  • Lin, J.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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    • pp.1247-1250
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    • 2008
  • This presentation highlights work from the authors' laboratories on the various kinds of oxide optical materials, mainly luminescence and pigment materials with different forms (powder, core-shell structures, thin film and patterning) prepared by the Pechini-type sol-gel (PSG) process. The PSG process which uses the common metal salts (nitrates, acetates, chlorides etc) as precursors and citric acid (CA) as chelating ligands of metal ions and polyhydroxy alcohol (such as ethylene glycol or poly ethylene glycol) as cross-linking agent to form a polymeric resin on molecular level, allowing the preparation of many forms of luminescent materials.

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Gate dielectric based on organic-inorganic hybrid polymer in organic thin-film transistors

  • Lee, Seong-Hui;Jeong, Sun-Ho;Moon, Joo-Ho
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.727-729
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    • 2007
  • Inorganic-organic hybrid polymer provides various advantages including low-temperature process, high dielectric constant and direct photo-patterning. The hybrid dielectric was synthesized by the sol-gel process in which an acid-catalyzed solution of Si alkoxide and Zr alkoxide was used as a precursor. The electrical performance of transistors with hybrid dielectric was investigated.

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고집적 MCM을 이용한 ATM교환기의 Switching Module 구현 (The realization of the switching module for ATM system with high integrated MCM.)

  • 김승곤
    • 마이크로전자및패키징학회지
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    • 제4권1호
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    • pp.31-38
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    • 1997
  • 대용량, 고속정보처리가 요구되는 B-ISDN용 스위칭 모듈은 90년초부터 MCM으로 제작후 사용되어 왔다. 특히 MCM은 Data 처리의 고속성 및 회로의 고집적이 요구되는 ATM, GPS 및 개인휴대 통신 분야에 광범위하게 개발 및 응용되고 있다. 따라서 본논문에 서는 고속, 고집적 ATM 교환기의 Switching Module을 제품의 Low Cost와 다충회로를 간 단하게 구현할수 있는"Diffusion patterning"(이하 DP)공정과 기보유중인 Thin Film 공정으 로 MCM을 구현하였다.CM을 구현하였다.

이층 박막 구조에서 ITO 전극의 레이저 직접 패터닝 시레이저 식각 패턴 중첩 비율의 변화 (Overlapping Rates of Laser Spots on the Laser Direct Patterning of ITO Electrode in the Double-layer Structure of Thin Film)

  • 왕건훈;박정철;권상직;조의식
    • 한국전기전자재료학회논문지
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    • 제25권5호
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    • pp.377-380
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    • 2012
  • Laser direct patterning of indium tin oxide(ITO) is one of new methods of direct etching process to replace the conventional photolithography. A diode pumped Q-switched Nd:$YVO_4$ (${\lambda}$= 1,064 nm) laser was used to produce ITO electrode on various transparent oxide semiconductor films such as zinc oxide(ZnO). The laser direct etched ITO patterns on ZnO were compared with those on glass substrate and were considered in terms of the overlapping rate of laser beam. In case of the laser etching on double-layer, it was possible to obtain the higher overlapping rate of laser beam.