• Title/Summary/Keyword: Thin film electrolyte

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Preparation of Electrolyte Film for Solid Oxide Fuel Cells by Electrophoretic Deposition (전착법에 의한 음극지지형 SOFC 전해질막 제조)

  • 김상우;이병호;손용배;송휴섭
    • Journal of the Microelectronics and Packaging Society
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    • v.6 no.1
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    • pp.23-29
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    • 1999
  • An yttria-stabilized zirconia(YSZ) thin film on a porous NiO-YSZ substrate for an anode support type solid oxide fuel cell(SOFC) was prepared by an electrophoretic deposition(EPD). Deposition condition and film properties in order to obtain the homogeneous YSZ thin film from the EPD solution with different polarity were studied. In different case of alcohol solution, hydrogen gas was produced in aqueous solution from the electrolyte reaction under constant current above 0.138 mA /$\textrm{cm}^2$.Its reaction generated the bubble-formed defect in the deposited film and decreased weight of the film. The homogeneous YSZ thin film was formed in alcohol solution at a constant current, 0.035 mA /$\textrm{cm}^2$ for 10 s.

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Fabrication of YSZ/GDC Bilayer Electrolyte Thin Film for Solid Oxide Fuel Cells

  • Yang, Seon-Ho;Choi, Hyung-Wook
    • Transactions on Electrical and Electronic Materials
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    • v.15 no.4
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    • pp.189-192
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    • 2014
  • Yttria-stablized zirconia (YSZ) is the most commonly used electrolyte material, but the reduction in working temperature leads to insufficient ionic conductivity. Ceria based electrolytes (GDC) are more attractive in terms of conductivity at low temperature, but these materials are well known to be reducible at very low oxygen partial pressure. The reduction of electrolyte resistivity is necessary to overcome cell performance losses. So, thin YSZ/GDC bilayer technology seems suitable for decreasing the electrolyte resistance at lower operating temperatures. Bilayer electrolytes composed of a galdolinium-doped $CeO_2$ ($Ce_{0.9}Gd_{0.1}O_{1.95}$, GDC) layer and yttria-stabilized $ZrO_2$ (YSZ) layer with various thicknesses were deposited by RF sputtering and E-beam evaporation. The bilayer electrolytes were deposited between porous Ni-GDC anode and LSM cathode for anode-supported single cells. Thin film structure and surface morphology were investigated by X-ray diffraction (XRD), using $CuK{\alpha}$-radiation in the range of 2ce morphol$^{\circ}C$. The XRD patterns exhibit a well-formed cubic fluorite structure, and sharp lines of XRD peaks can be observed, which indicate a single solid solution. The morphology and size of the prepared particles were investigated by field-emission scanning electron microscopy (FE-SEM). The performance of the cells was evaluated over $500{\sim}800^{\circ}C$, using humidified hydrogen as fuel, and air as oxidant.

Comparison of Yittria Stabilized Zirconia Electrolytes(YSZ) for Thin Film Solid Oxide Fuel Cell by Atomic Layer Deposition and Sputtering (원자층 증착법과 스퍼터링을 이용한 고체산화물 연료전지용 YSZ 전해질에 관한 연구)

  • Tanveer, Waqas Hassan;Ha, Seung Bum;Ji, Sanghoon;Cha, Suk Won
    • 한국신재생에너지학회:학술대회논문집
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    • 2011.11a
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    • pp.84.2-84.2
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    • 2011
  • In this research, two thin film deposition techniques, Atomic Layer Deposition and Sputtering are carried out for the fabrication of Yittria Stabilized Zirconia electrolyte for thin film Solid Oxide Fuel Cell. Zirconium to Yittrium ratio for both cases is about 1/8. Scanning Electron Microscope(SEM) image shows that the growth rate per hour for Atomic Layer Deposition is faster than for sputtering. X-ray Photo-electron Spectroscopy(XPS) shows that the peaks of both Zirconia and Yittria shift towards higher bending energy for the case of Atomic Layer deposition and thus are more strongly attached to the substrate. Later, Nyquist plot was used to compare the conductivity of Yittria Stabilized Electrolyte for both cases. The conductivity at $300^{\circ}C$ for Atomic Layer Deposited Yittria Stabilized Zirconia is found to be $5{\times}10^{-4}S/cm$ while that for sputtered Yittria Stabilized Zirconia is $2{\times}10^{-5}S/cm$ at the same temperature. The reason for better performance for Atomic Layered YSZ is believed to be the Nano-structured layer fabrication that aids in along the plane conduction as compared to the columnarly structured Sputtered YSZ.

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Improving the Reliability by Straight Channel of As2Se3-based Resistive Random Access Memory (As2Se3 기반 Resistive Random Access Memory의 채널 직선화를 통한 신뢰성 향상)

  • Nam, Ki-Hyun;Kim, Chung-Hyeok
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.29 no.6
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    • pp.327-331
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    • 2016
  • Resistive random access memory (ReRAM) of metallic conduction channel mechanism is based on the electrochemical control of metal in solid electrolyte thin film. Amorphous chalcogenide materials have the solid electrolyte characteristic and optical reactivity at the same time. The optical reactivity has been used to improve the memory switching characteristics of the amorphous $As_2Se_3$-based ReRAM. This study focuses on the formation of holographic lattices patterns in the amorphous $As_2Se_3$ thin film for straight conductive channel. The optical parameters of amorphous $As_2Se_3$ thin film which is a refractive index and extinction coefficient was taken by n&k thin film analyzer. He-Cd laser (wavelength: 325 nm) was selected based on these basic optical parameters. The straighten conduction channel was formed by holographic lithography method using He-Cd laser.$ Ag^+$ ions that photo-diffused periodically by holographic lithography method will be the role of straight channel patterns. The fabricated ReRAM operated more less voltage and indicated better reliability.

Fabrication and electrochemical characterization of amorphous vanadium oxide thin films for thin film micro-battery by reactive r.f. sputtering (반응성 r.f. 스퍼터링에 의한 마이크로 박막 전지용 산화바나듐 박막의 제작 및 전기화학적 특성 평가)

  • 전은정;신영화;남상철;윤영수;조원일
    • Journal of the Korean Vacuum Society
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    • v.9 no.1
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    • pp.42-47
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    • 2000
  • The amorphous vanadium oxide thin films for thin-film rechargeable lithium batteries were fabricated by r.f. reactive sputtering at room temperature. As the experimental parameter, oxygen partial pressure was varied during sputtering. At high oxygen partial pressures(>30%), the as-deposited films, constant current charge/discharge characteristics were carried out in 1M $LiPF_6$, EC:DMC+1:1 liquid electrolyte using lithium metal as anode. The specific capacity of amorphous $V_2O_5$ after 200cycles of operation at room temperature was higher compared to crystalline $V_2O_5$. The amorphous vanadium oxide thin film and crystalline film showed about 60$\mu$Ah/$\textrm{cm}^2\mu\textrm{m}$ and about 38$\mu$Ah/$\textrm{cm}^2\mu\textrm{m}$, respectively. These results suggest that the battery capacity of the thin film vanadium oxide cathode strongly depends on the crystallinity.

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Preparation of Thin Film Electrolyte for Solid Oxide Fuel Cell by Sol-Gel Method and Its Gas Permeability (졸-겔법을 이용한 고체산화물연료전지의 전해질 박막 제조 및 가스 투과도)

  • Son, Hui-Jeong;Lee, Hye-Jong;Lim, Tak-Hyoung;Song, Rak-Hyun;Peck, Dong-Hyun;Shin, Dong-Ryul;Hyun, Sang-Hoon;Kilner, John
    • Journal of the Korean Ceramic Society
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    • v.42 no.12 s.283
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    • pp.827-832
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    • 2005
  • In this study, thin electrolyte layer was prepared by 8YSZ ($8mol\%$ Yttria-Stabilized Zirconia) slurry dip and sol coating onto the porous anode support in order to reduce ohmic resistance. 8YSZ polymeric sol was prepared from inorganic salt of nitrate and XRF results of xerogel powder exhibited similar results $(99.2\pm1wt\%)$ compared with standard sample (TZ-8YS, Tosoh Co.). The dense and thin YSZ film with $1{\mu}m$ thickness was synthesized by coating of 0.7M YSZ sol followed by heat-treatment at $600^{\circ}C$ for 1 h. Thin film electrolyte sintered at $1400^{\circ}C$ showed no gas leakage at the differential pressure condition of 3 atm.

Preparation of Thin YSZ Film by Electrostatic Spray Deposition (정전분무법을 이용한 YSZ 박막 제조)

  • Kwon, Byeongwan;Kim, Jinsoo;Park, Jung Hoon
    • Applied Chemistry for Engineering
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    • v.19 no.1
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    • pp.117-121
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    • 2008
  • In this study, thin YSZ film was prepared by electrostatic spray deposition. The morphology of thin film was strongly influenced by precursor solution and substrate temperature. Especially, dense YSZ film was obtained at the substrate temperature of $400^{\circ}C$. The YSZ film growth rate was $12{\mu}m/h $ at the optimum conditions. Product film was characterized by XRD, FE-SEM and EDX.

Fabrication of Micro Solid Oxide Fuel Cell by Thin Film Processing Hybridization: I. Multilayer Structure of Sputtered YSZ Thin Film Electrolyte and Ni-Based Anodes deposited by Spray Pyrolysis (박막공정의 융합화를 통한 초소형 고체산화물 연료전지의 제작: I. Spray Pyrolysis법으로 증착된 Ni 기반 음극과 스퍼터링으로 증착된 YSZ 전해질의 다층구조)

  • Son, Ji-Won;Kim, Hyoung-Chul;Kim, Hae-Ryoung;Lee, Jong-Ho;Lee, Hae-Weon;Bieberle-Hutter, A.;Rupp, J.L.M.;Muecke, U.P.;Beckel, D.;Gauckler, L.J.
    • Journal of the Korean Ceramic Society
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    • v.44 no.10
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    • pp.589-595
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    • 2007
  • Physical properties of sputtered YSZ thin film electrolytes on anode thin film by spray pyrolisis has been investigated to realize the porous electrode and dense electrolyte multilayer structure for micro solid oxide fuel cells. It is shown that for better crystallinity and density, YSZ need to be deposited at an elevated temperature. However, if pure NiO anode was used for high temperature deposition, massive defects such as spalling and delamination were induced due to high thermal expansion mismatch. By changing anode to NiOCGO composite, defects were significantly reduced even at high deposition temperature. Further research on realization of full cells by processing hybridization and cell performance characterization will be performed in near future.

Preparation of Electrolyte Thin Film for Anode Support Type Solid Oxide Fuel Cells by Electrophoretic Deposition and Dip-Coating (전착법과 담금법에 의한 음극지지형 SOFC 지르코니아 전해질막 제조)

  • 김상우;이병호;손용배;송휴섭
    • Journal of the Korean Ceramic Society
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    • v.36 no.8
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    • pp.791-798
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    • 1999
  • The preparation method of yttria-stabilized zirconia(YSZ) thin film for an anode support type solid oxide fuel cell(SOFC) by electrophoretic deposition(EPD) and dip-coating was studied. And the difference in both preparation method was investigated through basic understanding of processing parameters which may significantly affect weight microstruxcture and defect of film. In dip-coating the thickness of film increased with time until 30 s and then the weight of film decreased with time due to particle falling off from the coagulated film. In EPD although the weight of film increased with time and applied constant-current sagging of the film was observed when the applied current was less that 0.035 mA/$cm^2$ and more than 120 s. Since YSZ thin film by EPD on porous substrate was dense smooth and homogeneous it was expected to be suitable for the electrolyte of an anode support type SOFC.

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