• Title/Summary/Keyword: Thickness Profile

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Elasto-plastic thermal stress analysis of functionally graded hyperbolic discs

  • Demir, Ersin;Callioglu, Hasan;Sayer, Metin
    • Structural Engineering and Mechanics
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    • v.62 no.5
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    • pp.587-593
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    • 2017
  • The objective of this analytical study is to calculate the elasto-plastic stresses of Functionally Graded (FG) hyperbolic disc subjected to uniform temperature. The material properties (elastic modulus, thermal expansion coefficient and yield strength) and the geometry (thickness) of the disc are assumed to vary radially with a power law function, but Poisson's ratio does not vary. FG disc material is assumed to be non-work hardening. Radial and tangential stresses are obtained for various thickness profile, temperature and material properties. The results indicate that thickness profile and volume fractions of constituent materials play very important role on the thermal stresses of the FG hyperbolic discs. It is seen that thermal stresses in a disc with variable thickness are lower than those with constant thickness at the same temperature. As a result of this, variations in the thickness profile increase the operation temperature. Moreover, thickness variation in the discs provides a significant weight reduction. A disc with lower rigidity at the inner surface according to the outer surface should be selected to obtain almost homogenous stress distribution and to increase resistance to temperature. So, discs, which have more rigid region at the outer surface, are more useful in terms of resistance to temperature.

A Study on Composite Tooth Profile Generation of Involute and Circular Are (인벌류우트 - 圓孤 合成齒形의 創成 에 대한 硏究)

  • 최상동;변준형;윤갑영
    • Transactions of the Korean Society of Mechanical Engineers
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    • v.9 no.5
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    • pp.572-578
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    • 1985
  • A composite gear with involute-circular are tooth profile and a tooth profile of the rack to cut this gear are theoretictically obtained. The composite gear has involute tooth profile in the vicinity of pitch point and has circular arc tooth profiles at addendum adn dedendum. The contact ratio(M$_{c}$), chordal tooth thickness (chordal tip tooth thickness S$_{t}$, chordal root tooth thickness S$_{t}$) of the composite gear are compared with those of involute gear. When module, number of teeth and pressure angle eqaul, S$_{t}$ of composite gear is much larger than that of involute gear. Under the same conditions, S/sib t/ and M$_{c}$ of composite gear become smaller than those of involute gear.lute gear.

LIP PROFILE CHANGES AFTER ORTHODONTIC TOOTH MOVEMENT IN FEMALE ADULT WITH BIMAXILLARY PROTRUSION (양악 전돌증 환자에서 소구치 발치를 통한 교정치료시 입술 주위 연조직변화에 관한 연구)

  • Kim, Tae-Kyung;Ryu, Young-Kyu
    • The korean journal of orthodontics
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    • v.24 no.1 s.44
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    • pp.135-147
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    • 1994
  • Facial esthetics is one of the most important goal of the orthodontic treatment and main concern of many patients. Facial esthetics should be considered in orthodontic diagnosis and treatment planning. Prediction of soft tissue profile changes after orthodontic tooth movement should be considered as well. The purpose of this study was to find out the effect of orthodontic treatment on lip profile in adult patient. The pre and post treatment cephalometric roentgenograms of 87 female adult with bimaxillary protrusion were used to analyze lip profile change. All subjects were treated with four bicuspids extraction. Obtained results were as follows . 1. Lip thickness changes after incisor retraction showed different patterns according to areas of the lip. The thickness of the red lip area showed 2.78 mm increase in average. In contrast the thickness of the cutaneous area showed 0.65 - 0.7 mm decrease according to the different cutaneous areas. 2. The length of the red lip area decreased(1.3mm) after incisor retraction. 3. The length of the cutaneous lip area increased(2.9mm) after incisor retraction.

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A ROENTGENOCEPHALOMETRIC STUDY OF PROFILE CHANCES IN ORTHODONTICALLY TREATED PATIENTS (교정치료환자의 측모변화에 관한 두부방사선 계측학적 연구)

  • Choi, Sun Woong
    • The korean journal of orthodontics
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    • v.4 no.1
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    • pp.21-29
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    • 1974
  • The purpose of the present study is to evaluate changes of the soft tissue relative to underlying skeletal elements during orthodontic treatment, and the influence of orthodontic treatment quantitatively on various regions of the facial profile. 59 Korean young women were selected, whose Hellman dental age was IV A, IV C and V A. Lateral cephalometric head films were taken before and after orthodontic treatment. From tracings, landmarks on skeletal and soft tissue profile were located, and then their linear and angular measurements were made directly. The results were obtained as follow: 1) Soft tissues of the facial profile were closely related and dependent on the underlying dentoskeletal frameworks. Orthodontic treament resulted in the reduction of dentofacial protrusion with both upper and lower lips becoming less procumbent during treament. 2) Thickness of the upper lip increased considerably during orthodontic treatment, and this change was related to maxillary incisor retraction. The ratio between the amount of maxillary incisor retraction and that of increment of upper lip thickness was approximately 5:3. 3) Soft tissue thickness overlying Downs' point A, point B and pogonion was not modified by orthodontic treatment. 4) Holdaway's H line, relating facial profile to the underlying dentoskeletal framework, seemed to be the most practical approach to soft tissue analysis.

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Property variation of transistor in Gate Etch Process versus topology of STI CMP (STI CMP후 Topology에 따른 Gate Etch, Transistor 특성 변화)

  • Kim, Sang-Yong;Chung, Hun-Sang;Park, Min-Woo;Kim, Chang-Il;Chang, Eui-Goo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.181-184
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    • 2001
  • Chemical Mechanical Polishing(CMP) of Shallow Trench Isolation(STD structure in 0.18 m semiconductor device fabrication is studied. CMP process is applied for the STI structure with and without reverse moat pattern and End Point Detection (EPD) method is tested. To optimize the transistor properties related metal 1 parameters. we studied the correlation between CMP thickness of STI using high selectivity slurry. DOE of gate etch recipe, and 1st metal DC values. Remaining thickness of STI CMP is proportional to the thickness of gate-etch process and this can affect to gate profile. As CMP thickness increased. the N-poly foot is deteriorated. and the P-Poly Noth is getting better. If CD (Critical Dimension) value is fixed at some point,, all IDSN/P values are in inverse proportional to CMP thickness by reason of so called Profile Effect. Weve found out this phenomenon in all around DOE conditions of Gate etch process and we also could understand that it would not have any correlation effects between VT and CMP thickness in the range of POE 120 sec conditions. As CMP thickness increased by $100\AA$. 3.2 $u\AA$ of IDSN is getting better in base 1 condition. In POE 50% condition. 1.7 $u\AA$ is improved. and 0.7 $u\AA$ is improved in step 2 condition. Wed like to set the control target of CD (critical dimension) in gate etch process which can affect Idsat, VT property versus STI topology decided by CMP thickness. We also would like to decide optimized thickness target of STI CMP throughout property comparison between conventional STI CMP with reverse moat process and newly introduced STI CMP using high selectivity slurry. And we studied the process conditions to reduce Gate Profile Skew of which source known as STI topology by evaluation of gate etch recipe versus STI CMP thickness.

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Property variation of transistor in Gate Etch Process versus topology of STI CMP (STI CMP후 Topology에 따른 Gate Etch, Transistor 특성 변화)

  • 김상용;정헌상;박민우;김창일;장의구
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11a
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    • pp.181-184
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    • 2001
  • Chemical Mechanical Polishing(CMP) of Shallow Trench Isolation(STI) structure in 0.18 m semiconductor device fabrication is studied. CMP process is applied for the STI structure with and without reverse moat pattern and End Point Detection (EPD) method is tested. To optimize the transistor properties related metal 1 parameters, we studied the correlation between CMP thickness of STI using high selectivity slurry, DOE of gate etch recipe, and 1st metal DC values. Remaining thickness of STI CMP is proportional to the thickness of gate-etch process and this can affect to gate profile. As CMP thickness increased, the N-poly foot is deteriorated, and the P-Poly Noth is getting better. If CD (Critical Dimension) value is fixed at some point, all IDSN/P values are in inverse proportional to CMP thickness by reason of so called Profile Effect. Weve found out this phenomenon in all around DOE conditions of Gate etch process and we also could understand that it would not have any correlation effects between VT and CMP thickness in the range of POE 120 sec conditions. As CMP thickness increased by 100 ${\AA}$, 3.2 u${\AA}$ of IDSN is getting better in base 1 condition. In POE 50% condition, 1.7 u${\AA}$ is improved, and 0.7 u${\AA}$ is improved in step 2 condition. Wed like to set the control target of CD (critical dimension) in gate etch process which can affect Idsat, VT property versus STI topology decided by CMP thickness. We also would like to decide optimized thickness target of STI CMP throughout property comparison between conventional STI CMP with reverse moat process and newly introduced STI CMP using high selectivity slurry. And we studied the process conditions to reduce Gate Profile Skew of which source known as STI topology by evaluation of gate etch recipe versus STI CMP thickness.

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Separation Algorithm for 2D Refractive Index Distribution and Thickness Measurement of Transparent Objects using Multi-wavelength Source (다파장 광원을 이용한 위상 물체의 2 차원 굴절률 분포와 두께 측정을 위한 분리 알고리즘)

  • Lee, Kwang-Chun;Ryu, Sung-Yoon;Lee, Yun-Woo;Kwak, Yoon-Keun;Kim, Soo-Hyun
    • Journal of the Korean Society for Precision Engineering
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    • v.26 no.5
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    • pp.72-78
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    • 2009
  • We propose the separation algorithm to simultaneously measure two-dimensional refractive index distribution and thickness profile of transparent samples using three wavelengths. The optical system was based on the Mach-zehnder interferometer with LD (Laser Diode)-based multi-wavelength sources. A LCR (Liquid Crystal Retarder) was used to obtain interference images at four phase states and then the optical phase of the object is calculated by four-bucket algorithm. Experimental results with a glass rod are provided at the different wavelengths of 635nm, 660nm and 675nm. The refractive indices of the sample are distributed with accuracy of less than 0.0005 and the thickness profile of sample was cylindrical type. This result demonstrates that it is possible to separate refractive index distribution and thickness profile of samples in two dimensions using the proposed algorithm.

Thickness Evaluation of Pipeline Using Density Profile on a Radiograph (방사선투과필름에서 Density Profile을 이용한 배관의 두께 평가)

  • Lee, Sung-Sik;Jang, Byoung-Gyu;Kim, Young-H.
    • Journal of the Korean Society for Nondestructive Testing
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    • v.22 no.5
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    • pp.483-489
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    • 2002
  • The computer simulation has been done for non-insulated and insulated pipes which are vacant or half filled with liquid. The simulation results showed that the density profile on the radiography is continuous and symmetrical around the center of pipe in the case of vacant pipe. On the other hand the density profiles are not symmetrical and depend on geometrical setting for radiography in the case of half filled pipes. Finally, experimental testing on a non-insulated carbon steel pipe with artificial notches of different depth is carried out using Ir-192 and industrial film. Comparing the measured density profile on the radiograph to the calculated one, it has been shown that it is possible to evaluate thickness variation by measuring density profile on a radiograph.

구름요소의 프로파일 설계에서의 EHL해석의 작용

  • 박태조;김경웅
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 1991.06a
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    • pp.50-54
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    • 1991
  • This paper shows the effect of axial profile on the elastohydrodnamic lubrication (EHL) behavior of axially profiled cylindrical roller. For two different type of profiles which have nearly similar elastostatic pressure distribution, the EHL results show large differences. Especially the difference in film shape is larger than that of pressure distribution. Therefore, the magnitude of the minimum film thickness should be a major criteria to design the axial profile of the roller and a new design procedure is presented which take into account the minimum film thickness as well as the pressure distribution.

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