• Applied Microscopy
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• 제19권1호
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• pp.89-108
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• 1989

알루미늄-4%동 계에서의 ${\theta}$ 및 ${\theta}'$ 석출물과 석출물/기지 계면 전위를 투과전자현미경상으로 관찰하고 콘트라스트 실험 및 석출물 분석으로 석출물/기지 계면의 정합성과 여러 전위들의 Burgers 벡타를 규명하였다. 실험 결과, 변형장은 정벽면에 수직으로 되어 있고, 판상의 ${\theta}'$ 석출물은 {100}형 정벽면을 지니고 있었다. ${\theta}'$판 주위의 전위는 정벽면에 수직인 Burgers 벡타를 지닌 칼날전위였다. 그리고, 석출물과 기지 사이의 접합변형을 작게하기 위한 계면전위의 Burgers 벡타는 a<100>과 a/2<100>형이었다. 또한 Hornbogen의 예견과 일치하는 사실로, ${\theta}'$의 석출물의 끝부분에서 ${\theta}$상이 핵생성을 하는 사실을 발견하였다.

• Applied Microscopy
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• 제43권3호
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• pp.122-126
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• 2013

The heterogeneous nucleation of the ${\Theta}^{\prime}$ phase on nanoscale precipitates has been investigated using a combination of three-dimensional atom probe tomography and high-resolution transmission electron microscopy. Two types of ${\Theta}^{\prime}$ phases were observed, namely small (~2 nm thick) cylindrical precipitates and larger (~100 nm) globular precipitates and both appear to be heterogeneously nucleated on the nanoscale precipitates. The composition and crystal structure of precipitates were directly analyzed by combination of two advanced characterization techniques.

• Journal of the Optical Society of Korea
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• 제15권1호
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• pp.9-14
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• 2011

In this study, the internal structure of an optical waveguide embedded in a flexible optical circuit board is observed with a confocal microscope. In order to increase the light reflection from an internal material interface with a very small index difference, and thus enhance the signal contrast, a theta microscopy scheme has been integrated into a conventional confocal microscope, and a high NA oil-immersion lens has been used. The interface reflectivity is increased from roughly 0.0015% to 0.025% by the proposed method, and the internal structure can thus be successfully measured.

• 한국전자현미경학회:학술대회논문집
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• 한국현미경학회 2005년도 제36차 춘계학술대회 및 제3회 HVEM 이용자 워크샵
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• pp.145-146
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• 2005

• 마이크로전자및패키징학회지
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• 제7권2호
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• pp.37-42
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• 2000

저유전상수 폴리머와 $SiO_2$위에 형성된 Al/Ti박막의 우선방위에 대해 비교하였다. DC 마그네트론 스퍼터를 이용하여 50 nm 두께의 Ti과 500 nm의 Al-1%Si-0.5%Cu(wt%) 합금 박막을 저유전상수 폴리머와 $SiO_2$기판위에 증착하였다. Al의 우선방위는 XRD $\theta$-2$\theta$와 rocking curve로 측정하였고, Al/Ti박막의 미세조직은 투과전자현미경 (TEM)으로 관찰하였다. 저 유전상수 폴리머 위에 증착된 Al/Ti박막은 $SiO_2$위에 증착된 것보다 낮은 우선방위를 가졌다. 단면 TEM으로 Ti을 관찰한 결과, $SiO_2$위의 Ti의 결정립은 기판에 수직하게 성장하였으나 저유전상수 폴리머 위의 Ti 결정립은 등축정으로 성장하였으며, 저유전상수 폴리머위의 Al/Ti박막이 낮은 우선방위를 갖는 이유는 Ti 미세조직 때문이었다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 영호남학술대회 논문집
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• pp.237-241
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• 2000

The effects of Si addition on the precipitation processes of in Al-Cu-Si alloy films were studied by the transmission electron microscopy. Deposition of an Al-1.5Cu-1.5Si (wt. %) film at $305^{\circ}C$ resulted in formation of fine, uniformly distributed spherical $\theta$-phase particles due to the precipitation of the $\theta$ and Si phase particles during deposition. For deposition at $435^{\circ}C$, fine $\theta$-phase particles precipitated during wafer cooldown, while coarse Si nodules formed at the sublayer interface during deposition. The film susceptibility to corrosion is discussed in relation to the film microstructure and deposition temperature.

• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2000년도 Proceedings of 5th International Joint Symposium on Microeletronics and Packaging
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• pp.103-108
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• 2000

The texture of Al/Ti thin films deposited on low-dielectric polymer substrates has been investigated. Fifty-nm-thick Ti films and 500-nm-thick Al-1%Si-0.5%Cu (wt%) films were deposited sequentially onto low-k polymers and SiO$_2$ by using a DC magnetron sputtering system. The texture of Al thin film was determined using X-ray diffraction (XRD) theta-2theta ($\theta$-2$\theta$) and rocking curve and the microstructure of Al/Ti films on low-k polymer and SiO$_2$ substrates was characterized by Transmission electron microscopy (TEM). hall thin films deposited on SiO$_2$ had stronger texture than those deposited on low-k polymer. The texture of Al thin films strongly depended on that of Ti films. Cross-sectional TEM resealed that Brains of Ti films on SiO$_2$ substrates had grown perpendicular to the substrate, while the grains of Ti films on SiLK substrates were farmed randomly. The lower degree of 111 texture of Al thin films on low-k polymer was due to Ti underlayer.

• Journal of Microbiology and Biotechnology
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• 제19권4호
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• pp.403-408
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• 2009

A number of bifidobacterial species of human origin were screened for the presence of cryptic plasmids. One strain, Bifidobacterium longum FI10564, harbored plasmids of approximately 2.2 kb, 3.6 kb, and 4.9 kb in size. The smallest plasmid, pFI2576(2,197 bp), was studied in detail and its complete nucleotide sequence was determined. Computer-assisted analysis of this novel plasmid(G+C content 62%) identified 9 putative open reading frames(orfs), 3 of which were shown to be probable genes. These putative genes are arranged in an operon-like structure, in which the overlapping orfs 1 and 2 encode putative Rep proteins and are highly homologous to the rep genes of the B. longum plasmid pMBI(1,847 bp). The mechanism of replication of pFI2576 was investigated using Southern blot analysis of whole cell lysates, with and without S1 nuclease treatment, and atomic force microscopy(AFM). The results indicate that pFI2576 is likely to use the theta mode of replication.

• 한국진공학회:학술대회논문집
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• 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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• pp.170-170
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• 1999

We studied Nb growth mode on Cu(100) surface by scanning tunneling microscopy (STM) at room temperature. Nb/Cu is immiscible at room temperature and thus is an ideal system for studying surface alloy formation. Initially deposited Nb atoms are incorporated subsurface on Cu(100). After annealing, they are preferentially found at step edges and appear as bright dots surrounded by dark rings. Ordering emerges from step edges as annealed. Ordered ({{{{ SQRT { 5} }$\times${{{{ SQRT { 5} }}}})R 26.6$^{\circ}$phase Nb structure is formed at $\theta$<0.2ML after annealing to 50$0^{\circ}C$. At higher coverage, $\theta$>0.25, annealing leads to p(2$\times$2) phase. due to large mismatch in lattice parameters, the domain is limited to a few tens of nm2. Growth kinetics of the system will be discussed.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 하계학술대회 논문집
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• pp.536-539
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• 2000

The effects of annealing on the electrical and structural characteristics for the rf sputter deposited WO$_3$thin film. The sputtered thin films are annealed at 773K for 1 hour in air atmosphere. Oxygen flow rate were changed from 0 to 70% during sputtering. It is observed from the results of the AFM measurement that the average roughness for the rf sputter deposited WO$_3$thin film would be increased from 2.45 angstrom to 152 angstrom by annealing. The sheet resistance of the sputtered WO$_3$film is changed from insulting to MOhm after annealing. According to the results of the XRD, the as-deposited films revealed the amorphous state whereas the peaks of X-ray diffraction at 2 theta= 28 degrees and 2 theta = 25 degrees corresponding to the (111) and (200) plane of the WO$_3$film respectively are observed after annealing.