New Selective Tungsten Deposition Process by the alternating Cyclic Hydrogen Reduction of $WF_6$ using LPCVD
(LPCVD을 사용하여 $WF_6$ 의 교번적 수소환원 반응에 의한 새로운 선택적 텅스텐 박막 증착)
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- The Transactions of the Korean Institute of Electrical Engineers
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- v.39 no.7
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- pp.692-701
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- 1990