The Transactions of the Korean Institute of Electrical Engineers (대한전기학회논문지)

The Korean Institute of Electrical Engineers (대한전기학회)
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New Selective Tungsten Deposition Process by the alternating Cyclic Hydrogen Reduction of $WF_6$ using LPCVD

LPCVD을 사용하여 $WF_6$의 교번적 수소환원 반응에 의한 새로운 선택적 텅스텐 박막 증착

  • 신동렬 (한국동력자원연구소 에너지연구실) ;
  • ;
  • ;
  • 성영권 (고려대 공대 전기공학과)
  • Published : 1990.07.01
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Abstract

New selective tungsyen deposition deposition on silicon process is described which makes use of a previously unreported, alternating cyclic,

Keywords