• Korean Chemical Engineering Research
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• v.45 no.6
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• pp.611-618
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• 2007

We demonstrate the sol-gel coating technique of colloidal clusters for producing hollow micro-particles with complex morphologies. Cross-linked amidine polystyrene (PS) microspheres were synthesized by emulsifier-free emulsion copolymerization of styrene and divinylbenzene. The amidine PS particles were self-organized inside toluene-in-water emulsion droplets to produce large quantities of colloidally stable clusters. These clusters were coated with thin silica shell by sol-gel reaction of tetraethylorthosilicate (TEOS) and ammonia, and the organic polystyrene cores were removed by calcination at high temperature to generate nonspherical hollow micro-particles with complex morphologies. This process can be used to prepare hollow particles with shapes such as doublets, tetrahedra, icosahedra, and others.

• Korean Journal of Optics and Photonics
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• v.6 no.3
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• pp.233-238
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• 1995

'#65279;We made $P_2O_5-SiO_2$ films on silicon for integrated optics application by low pressure chemical vapor deposition using TEOS(tetraethylorthosilicate), TMPite(trimethylphosphite) and phosphine($PH_3$). And We studied and compared between TMPite and PH, as a dopant of P in PSG films in the aspect of the de,position characteristics. Deposition rate of TMPate-PSG films was $55 \AA/min$ which was smaller than 90 A/min , that of $PH_3-PSG$ films. Thickness deviation of TMPate-PSG films was 2% and that of PH3-PSG was 4.5%. So TMPate-PSG films had a good quality in thickness uniformity. The range of refractive index was controlled from 1.445 to 1.468 at 633 nm in TMPate-PSG films and it was controlled from 1.456 to 1.476 in $PH_3-PSG$ films.

• Journal of the Korean Vacuum Society
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• v.6 no.2
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• pp.103-108
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• 1997

Silicon field emitter arrays (FEAs) have been fabricated by a novel method employing a two-step tip etch and a spin-on-glass (SOG) etch-back process using double layered thermal/tetraethylortho-silicate (TEOS) oxides as a gate dielectric. A partial etching was performed by coating a low viscous photo resist and $O_2$ plasma ashing on order to form the double layered gate dielectric. A small gate aperture with low gate leakage current was obtained by the novel process. The hight and the end radius of the fabricated emitter was about 1.1 $\mu\textrm{m}$ and less than 100$\AA$, respectively. The anode emission current from a 256 tips array was turned-on at a gate voltage of 40 V. Also, the gate current was less than 0.1% of the anode current.

• Membrane Journal
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• v.25 no.2
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• pp.115-122
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• 2015

$SiO_2{\cdot}B_2O_3$ was prepared by trimethylborate (TMB)/tetraethylorthosilicate (TEOS) mole ratio 0.01 at $800^{\circ}C$. PDMS[poly(dimethysiloxane)]-$SiO_2{\cdot}B_2O_3$ composite membranes were prepared by adding porous $SiO_2{\cdot}B_2O_3$ to PDMS. To investigate the characteristics of PDMS-$SiO_2{\cdot}B_2O_3$ composite membrane, we observed PDMS-$SiO_2{\cdot}B_2O_3$ composite membrane using TG-DTA, FT-IR, BET, X-ray, and SEM. PDMS-$SiO_2{\cdot}B_2O_3$ composite membrane was studied on the permeabilities of $H_2$ and $N_2$ and the selectivity ($H_2/N_2$). Following the results of TG-DTA, BET, X-ray, FT-IR, $SiO_2{\cdot}B_2O_3$ was the amorphous porous $SiO_2{\cdot}B_2O_3$ with $247.6868m^2/g$ surface area and $37.7821{\AA}$ the mean of pore diameter. According to the TGA measurements, the thermal stability of PDMS-$SiO_2{\cdot}B_2O_3$ composite membrane was enhanced by inserting $SiO_2{\cdot}B_2O_3$. SEM observation showed that the size of dispersed $SiO_2{\cdot}B_2O_3$ in the PDMS-$SiO_2{\cdot}B_2O_3$ composite membrane was about $1{\mu}m$. The increasing of $SiO_2{\cdot}B_2O_3$ content in PDMS leaded the following results in the gas permeation experiment: the permeability of both $H_2$ and $N_2$ was increased, and the permeability of $H_2$ was higher than $N_2$, but the selectivity($H_2/N_2$) was decreased.

• Applied Chemistry for Engineering
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• v.10 no.8
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• pp.1180-1185
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• 1999

Modispersed silica fine particles were produced from the hydrolysis of $Si(OC_2H_5)_4$ by using batch-semibatch mixed systems. Four types of mixed process, i.e., batch-batch, batch-semibatch, semibatch-batch, semibatch-semibatch, were used in order to measure mean particle size, particle size distribution, yield, and packing density. As a result of the test, silica particles prepared by semibatch-semibatch process were larger than those prodeced from any other systems in particle size and yield. On the other hand, silica particles prepared by batch-semibatch process were better than those produced from any other systems in particle size distribution and packing density. Especially, it was found that particle size of $SiO_2$ prepared by semibatch-batch process decreased with increasing the reaction time. Therefore, batch-semibatch process was a successful method for controlling the size, i.e., a narrow distribution of a particle size which ranges to several microns.

• Advances in nano research
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• v.1 no.3
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• pp.159-169
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• 2013

A preparation method for gadolinium compound (GdC) nanoparticles coated with silica ($GdC/SiO_2$) is proposed. GdC nanoparticles were prepared with a homogeneous precipitation method at $80^{\circ}C$ using $1.0{\times}10^{-3}$ M $Gd(NO_3)_3$, 0.5 M urea and $0-3.0{\times}10^{-4}$ M ethylenediarinnetetraacetic acid disodium salt dihydrate (ETDA) in water. As a result of preparation at various EDTA concentrations, GdC nanoparticles with a size as small as $40.5{\pm}6.2$ nm, which were colloidally stable, were prepared at an EDTA concentration of $2.0{\times}10^{-4}$ M. Silica-coating of the GdC nanoparticles was performed by a St$\ddot{o}$ber method at $35^{\circ}C$ using $1.0-10.0{\times}10^{-3}$ M tetraethylorthosilicate (TEOS), 11 M $H_2O$ and $1.5{\times}10^{-3}$ M NaOH in ethanol in the presence of $1.0{\times}10^{-3}$ M GdC nanoparticles. Performance of preparation at various TEOS concentrations resulted in production of $GdC/SiO_2$ particles with an average size of $106.1{\pm}11.2$ nm at a TEOS concentration of $5.0{\times}10^{-3}$ M. The gadolinium (Gd) concentration of $1.0{\times}10^{-3}$ M in the as-prepared $GdC/SiO_2$ particle colloid solution was increased up to a Gd concentration of 0.2 M by concentrating with centrifugation. The core-shell structure of $GdC/SiO_2$ particles was undamaged, and the colloid solution was still colloidally stable, even after the concentrating process. The concentrated $GdC/SiO_2$ colloid solution showed images of X-ray and magnetic resonance with contrast as high as commercial Gd complex contrast agents.