• 제목/요약/키워드: TLM

검색결과 186건 처리시간 0.031초

Al 이온 주입된 p-type 4H-SiC에 형성된 Ni/Ti/Al Ohmic Contact의 전기적 특성 (Electrical Characteristics of Ni/Ti/Al Ohmic Contacts to Al-implanted p-type 4H-SiC)

  • 주성재;송재열;강인호;방욱;김상철;김남균
    • 한국전기전자재료학회논문지
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    • 제21권11호
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    • pp.968-972
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    • 2008
  • Ni/Ti/Al multilayer system ('/'denotes the deposition sequence) was tested for low-resistance ohmic contact formation to Al-implanted p-type 4H-SiC. Ni 30 nm / Ti 50 nm / Al 300 nm layers were sequentially deposited by e-beam evaporation on the 4H-SiC samples which were implanted with Al (norminal doping concentration = $4\times10^{19}cm^{-3}$) and then annealed at $1700^{\circ}C$ for dopant activation. Rapid thermal anneal (RTA) temperature for ohmic contact formation was varied in the range of $840\sim930^{\circ}C$. Specific contact resistances were extracted from the measured current vs. voltage (I-V) data of linear- and circular transfer length method (TLM) patterns. In constrast to Ni contact, Ni/Ti/Al contact shows perfectly linear I-V characteristics, and possesses much lower contact resistance of about $2\sim3\times10^{-4}\Omega{\cdot}cm^2$ even after low-temperature RTA at $840^{\circ}C$, which is about 2 orders of magnitude smaller than that of Ni contact. Therefore, it was shown that RTA temperature for ohmic contact formation can be lowered to at least $840^{\circ}C$ without significant compromise of contact resistance. X-ray diffraction (XRD) analysis indicated the existence of intermetallic compounds of Ni and Al as well as $NiSi_{1-x}$, but characteristic peaks of $Ti_{3}SiC_2$, a probable narrow-gap interfacial alloy responsible for low-resistance Ti/Al ohmic contact formation, were not detected. Therefore, Al in-diffusion into SiC surface region is considered to be the dominant mechanism of improvement in conduction behavior of Ni/Ti/Al contact.

Effects of Plasma Treatment on Contact Resistance and Sheet Resistance of Graphene FET

  • Ra, Chang-Ho;Choi, Min Sup;Lee, Daeyeong;Yoo, Won Jong
    • 한국표면공학회지
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    • 제49권2호
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    • pp.152-158
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    • 2016
  • We investigated the effect of capacitively coupled Ar plasma treatment on contact resistance ($R_c$) and channel sheet resistance ($R_{sh}$) of graphene field effect transistors (FETs), by varying their channel length in the wide range from 200 nm to $50{\mu}m$ which formed the transfer length method (TLM) patterns. When the Ar plasma treatment was performed on the long channel ($10{\sim}50{\mu}m$) graphene FETs for 20 s, $R_c$ decreased from 2.4 to $1.15k{\Omega}{\cdot}{\mu}m$. It is understood that this improvement in $R_c$ is attributed to the formation of $sp^3$ bonds and dangling bonds by the plasma. However, when the channel length of the FETs decreased down to 200 nm, the drain current ($I_d$) decreased upon the plasma treatment because of the significant increase of channel $R_{sh}$ which was attributed to the atomic structural disorder induced by the plasma across the transfer length at the edge of the channel region. This study suggests a practical guideline to reduce $R_c$ using various plasma treatments for the $R_c$ sensitive graphene and other 2D material devices, where $R_c$ is traded off with $R_{sh}$.

무전해 도금을 이용한 Si 태양전지 Ni-W-P/Cu 전극 형성 (Formation of Ni-W-P/Cu Electrodes for Silicon Solar Cells by Electroless Deposition)

  • 김은주;김광호;이덕행;정운석;임재홍
    • 한국표면공학회지
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    • 제49권1호
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    • pp.54-61
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    • 2016
  • Screen printing of commercially available Ag paste is the most widely used method for the front side metallization of Si solar cells. However, the metallization using Ag paste is expensive and needs high temperature annealing for reliable contact. Among many metallization schemes, Ni/Cu/Sn plating is one of the most promising methods due to low contact resistance and mass production, resulting in high efficiency and low production cost. Ni layer serves as a barrier which would prevent copper atoms from diffusion into the silicon substrate. However, Ni based schemes by electroless deposition usually have low thermal stability, and require high annealing process due to phosphorus content in the Ni based films. These problems can be resolved by adding W element in Ni-based film. In this study, Ni-W-P alloys were formed by electroless plating and properties of it such as sheet resistance, resistivity, specific contact resistivity, crystallinity, and morphology were investigated before and after annealing process by means of transmission line method (TLM), 4-point probe, X-ray diffraction (XRD), and Scanning Electron Microscopy (SEM).

스핀 코팅으로 제작된 유기 절연체와 P3HT 유기 박막 트랜지스터 특성 (Characteristics of Organic Thin-Film Transistors with Polymeric Insulator and P3HT by Using Spin-Coating)

  • 김중석;장종현;김병민;주병권;박정호
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2007년도 제38회 하계학술대회
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    • pp.1313-1314
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    • 2007
  • This paper presents organic thin-film transistors (OTFTs) with poly(3-hexylthiophene)(P3HT) semiconductor and several polymeric dielectric materials of poly(vinyl phenol)(PVP), poly(vinyl alcohol)(PVA), and polyimide(PI) by using soluble process. The fabricated OTFT's have inverted staggered structure using transmission line method(TLM) pattern. In order to evaluate the electrical characteristics of the OTFT, capacitance-voltage(C-V) and current-voltage(I-V) were measured. C-V graphs were measured at several frequencies of 100 Hz, 1 kHz, and 1 MHz and ID-VDS graphs according to $V_{GS}$. The current on/off ratio and threshold voltage with each of PVP, PVA, and PI based OTFTs were measured to $10^3$, and -0.36, -0.41, and -0.62 V. Also, the calculated mobility with each of PVP, PVA, and PI was 0.097, 0.095, and 0.028 $cm^{2}V^{-1}s^{-1}$, respectively. In the cases of PVP and PVA, the hole mobility of P3HT was in excellent agreement with the published value of 0.1 $cm^{2}V^{-1}s^{-1}$.

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PLD 방법에 의해서 증착된 ZnO 박막의 전기적 특성 및 접합 특성에 관한 연구 (Electrical Characterization and Metal Contacts of ZnO Thin Films Grown by the PLD Method)

  • 강수창;신무환
    • 한국전기전자재료학회논문지
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    • 제15권1호
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    • pp.15-23
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    • 2002
  • In this study, metal/ZnO contacts were thermally annealed at different temperatures (as-dep., 400$^{\circ}C$, 600$^{\circ}C$, 800$^{\circ}C$, 1000$^{\circ}C$) for the investigation of electrical properties, and surface and interface characteristics. The analysis of the element composition and the chemical bonding state of the surface was made by the XPS(X-ray photoelectron spectroscopy). An attempt was made to establish the electrical property-microstructure relationship for the (Ti, Au)/ZnO. The Ti/ZnO contact exhibits an ohmic characteristics with a relatively high contact resistance of 4.74${\times}$10$\^$-1/ $\Omega$$\textrm{cm}^2$ after an annealing at 400$^{\circ}C$. The contact showed a schottky characteristics when the samples were annealed at higher temperature than 400$^{\circ}C$. The transition from the ohmic to schottky characteristics was contributed from the formation of the oxide layers as was confirmed by the peaks for O-O and Ti-O bondings in XPS analysis. For the Au/ZnO contact the lowest contact resistance was obtained from the as-deposited sample. The resistance was slowly increased with annealing temperature up to 600$^{\circ}C$. The ohmic characteristics were maintained eden fort 600$^{\circ}C$ annealing. The XPS analysis showed that the Au-O intensity was dramatically decreased with temperature above 600$^{\circ}C$.

Study on Co- and Ni-base $Si_2$ for SiC ohmic contact

  • 김창교;양성준;노일호;장석원;조남인;정경화
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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    • pp.167-171
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    • 2003
  • We report the material and electrical properties of $CoSi_2$ and $NiSi_2$contacts to n-type 4H-SiC depending on the post-annealing and the metal covering conditions. The Ni and Co silicides are deposited by RF sputtering with Ni/Si/Ni and Co/Si/Co films separately deposited on 4H-SiC substrates. The deposited films are annealed at $800\;^{\circ}C$ in $Ar:H_2$ (9:1) gas ambient. Results of the specific surface resistivity measurements show that the resistivity of the Co-based metal contact was the one order lower than that of the Ni-based contact. The specific contact resistance was measured by a transmission line technique, and the specific contact resistivity of $1.5{\times}10^{-6}\;{\Omega}\;cm^2$ is obtained for Co/Si/Co metal structures after a two-step annealing; at $550\;^{\circ}C$ for 10 min and $800\;^{\circ}C$ for 3min. The physical properties of the contacts were examined by using XRD and AES, and the results indicate that the Co-based metal contacts have better structural stability of silicide phases formed after the high temperature annealing.

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ITO Nanoparticle Film을 이용한 센서의 전극 구조가 동작 성능에 미치는 영향에 대한 연구 (Study on the Effect of the Electrode Structure of an ITO Nanoparticle Film Sensor On Operating Performance)

  • 안상수;노재하;이창한;이상태;서동민;이문진;장지호
    • 센서학회지
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    • 제31권2호
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    • pp.90-95
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    • 2022
  • The effect of the structure of an ITO nanoparticle film sensor on its performance was studied. A printed ITO film (P-ITO film) was fabricated on a flexible polyethylene terephthalate (PET) substrate, and the contact resistance of the electrode and sensor response change were clarified according to the detection position. The contact resistance between Ag and P-ITO was observed to be -204.4 Ω using the transmission line method (TLM), confirming that a very good ohmic contact is possible. In addition, we confirmed that the contact position of the analyte had a significant influence on the response of the sensor. Based on these results, the performance of the four types of sensors was compared. Consequently, we observed that 1) optimizing the resistance of the printed film, 2) optimizing the electrode structure and analyte input position, and 3) optimizing the electrode area are very important for fabricating a metal oxide nanoparticle (MONP) sensor with optimal performance.

유체-구조물-지반 상호작용을 고려한 해상풍력발전기의 지진응답해석 (Earthquake Response Analysis of an Offshore Wind Turbine Considering Fluid-Structure-Soil Interaction)

  • 이진호;이상봉;김재관
    • 한국지진공학회논문집
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    • 제16권3호
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    • pp.1-12
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    • 2012
  • 이 논문에서는 유체-구조물-지반의 상호작용을 고려한 해상풍력발전기의 지진응답해석법을 제시하였다. 풍력발전기는 tower와 그 정점에 집중된 질량으로 모델링 되었다. 이 tower는 유연한 해저지반에 기초하고 있는 튜브형 cantilever로 이상화하였다. Tower와 해수 간의 동적 상호작용, 기초와 지반간의 동적 상호작용이 고려된 유체-구조물-지반 연성계의 지배방정식은 부분구조법과 Rayleigh-Ritz방법에 의해서 유도되었다. 해수는 압축성 비점성 이상 유체로 이상화하였다. 해수로 포화된 층상지반에 놓인 footing의 동적 강성은 Thin Layer법에 의해서 계산하여 상부구조물 모델과 결합시켰다. 이 해석법을 해상풍력발전기 모델의 지진응답해석에 적용하였다. 해석 결과를 준거해와 비교해서 제안한 해석법의 타당성을 검증하였다. Tower의 유연성, 지반의 강성이 해상풍력발전기 지진거동에 미치는 영향을 분석하였다. 유체-구조물 상호작용과 지반-구조물 상호작용의 지진응답에 대한 상대적인 중요도를 비교 평가하였다.

증착조건 및 열처리 온도에 따른 유기 TFT의 활성층용 펜타센 박막의 전기적 특성 연구 (The Electrical Characteristics of Pentacene Thin-Film for the active layer of Organic TFT deposited at the Various Evaporation conditions and the Annealing Temperatures)

  • 구본원;정민경;김도현;송정근
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2000년도 하계종합학술대회 논문집(2)
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    • pp.80-83
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    • 2000
  • 본 연구에서는 유기물 전자소자 개발을 위한 기초 연구로서 증착시 기판의 온도, 증칙비, 열처리 온도에 따른 펜타신 박막의 수평방향 전기전도도, 접촉저항, 면저항 둥 전기적 특성을 측정 하였다. 시료는 분말형 펜타신을 유기분자선 성막장치(OMBD)를 이용하여 성막 하였다. 전도도 계산을 위한 두께의 측정은 $\alpha$-step을 이용하였으며, TLM(transfer length method)으로 접촉저항, 면저항등 전기적 특성을 측정하였다. 전극은 Au를 사용하여 진공 증착법으로 제작하였다. 기판의 온도는 3$0^{\circ}C$, 4$0^{\circ}C$, 5$0^{\circ}C$, 6$0^{\circ}C$, 7$0^{\circ}C$, 8$0^{\circ}C$, 10$0^{\circ}C$ 일곱 종류로 하여 증착비를 달리 하였고, 열처리에 의한 효과는 10$0^{\circ}C$에서 증착한 시료를 10$0^{\circ}C$, 14$0^{\circ}C$에서 각각 10초간 열처리를 실시하였다. 기판 온도에 따른 막의 형상은 AFM을 이용하여 관찰하였다. 기판의 온도가 상승할수록 박막의 결정화가 활발히 진행되었으며 최대단일결정은 4$\mu\textrm{m}$였다. 전기전도도는 7.40$\times$$10^{-7}$ S/cm ~ 0.778$\times$$10^{-5}$ S/cm의 값을 나타내었으며, 접족저항은 10$0^{\circ}C$에서 증착하고 14$0^{\circ}C$에서 10초간 열처리 한 경우 2.5324㏁으로 가장 작았으며, 면저항은 약간의 차이는 있으나 전체적으로 ≒ $10^{9}$ Ω/ 의 값을 보였다

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작물생산과 농업공해 및 그 대책 (Agriculture Pollution and its Countermeasures with Special Consideration of Pesticides)

  • Li, Gwo-Chen
    • 한국작물학회지
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    • 제27권4호
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    • pp.340-360
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    • 1982
  • Because of the continuing rapid increase in pesticide usage in Taiwan, much attention has been focus on pesticide contamination of food and effect of pesticides on human and environmental health. The Plant Protection Center (PPC) conducts safety evaluation of pesticides usee! in Taiwan. The pesticides are classified into different groups based on their acute toxicities. Pesticides which are classified into extremely toxic group are not allow to used on short term crops or the continuously harvest crops. The acute toxicity of pesticides to the beneficial insects are also studied, special attention has been paid to the two predators of rice brown planthopper. 60% of cultivated land in Taiwan are paddy field; therefore, acute fish toxicity was taken into consideration when a pesticide was applied for registration to be used in the paddy. Fish toxicities were evaluated by the dangerous rating value which is the amount of pesticide residue in the field water over the TLM value. Mutagenicity of pesticides was continuously evaluated by using Arne's microbial testing method. Island wide survey of residual levels of pesticides of known pollutants such as chlorinated hydrocarbon . insecticides, mercurial compounds in soil, water and biological samples were carried out constantly. The potential of a new1y Imported esticides to pollute the environment were studied by using model ecosystem. Ecological magnification (EM) of a chemical was calculated from model ecosystem. A chemical was considered as a pollutant when its EM value over 5000. In order to ensure the levels of pesticides residue of the crop within the safety limit. The 'tolerance' of pesticides on different crop groupings were established base on 1) acceptable daily intake value of individual pesticides, 2) average daily consumption of each crop groupings by Chinese person, 3) Actual residues of pesticides. on different crops obtained from supervised trials. Total about 79 pesticides for which the tolerances have been established on different crop groupings. Because the intensive agricultural system was adopted in Taiwan. The phytotoxicity of pesticides to the non-target crops was therefore become one of the important factor in the safety evaluation of pesticide usage. These will include 1) direct injury, 2) injury caused by pesticide polluted irrigation water, 3) injury caused by the pesticide polluted soil, 4) reduction of growth caused by the effect of pesticide on the soil microorganisms. This paper will reviewed all the aspects mentioned in the previous .paragraphs. Most the works have done in Taiwan by the PPC.y the PPC.

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