ELUTION OF RESIDUAL MONOMER ACCORDING TO VARIOUS LIGHT SOURCES AND CURING TIME ON THE POLYMERIZATION OF PHOTOACTIVATED PIT AND FISSURE SEALANTS (광중합 광원의 종류와 조사시간에 따른 치면열구전색제의 미반응 모노머 용출)
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- Journal of the korean academy of Pediatric Dentistry
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- v.31 no.3
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- pp.421-430
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- 2004