• Title/Summary/Keyword: Surface technology

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Formability of Locally Surface-Modified Aluminum Alloy Sheets (국부 표면개질된 알루미늄 합금 판재의 성형성)

  • Lee C. G.;Kim S. J.;Lee T. H.;Park S. S.;Ham H. N.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 2005.10a
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    • pp.299-300
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    • 2005
  • Surface friction welding (SFW) is a newly developed technology fur joining thin metal sheets, which utilizes friction between tool and weldment. In the present study, the 5052 and 1050 Al sheets were locally surface-modified using SFW technology. Formability of the locally surface-modified sheets was superior to that of the parent material. Yield or tensile strengths of the locally surface-modified specimens were lower then those of the parent material, but elongations of the locally surface-modified specimens were higher then that of the parent material.

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Corrosion Protection of Plasma-Polymerized Cyclohexane Films Deposited on Copper

  • Park, Z.T.;Lee, J.H.;Choi, Y.S.;Ahn, S.H.;Kim, J.G.;Cho, S.H.;Boo, J.H.
    • Journal of the Korean institute of surface engineering
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    • v.36 no.1
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    • pp.74-78
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    • 2003
  • The corrosion failure of electronic devices has been a major reliability concern lately. This failure is an ongoing concern because of miniaturization of integrated circuits (IC) and the increased use of polymers in electronic packaging. Recently, plasma-polymerized cyclohexane films were considered as a possible candidate for a interlayer dielectric for multilever metallization of ultra large scale integrated (ULSI) semiconductor devices. In this paper the protective ability of above films as a function of deposition temperature and RF power in an 3.5 wt.% NaCl solution were examined by polarization measurement. The film was characterized by FTIR spectroscopy and contact angle measurement. The protective efficiency of the film increased with increasing deposition temperature and RF power, which induced the higher degree of cross-linking and hydrophobicity of the films.

Growth and characterization of BON thin films prepared by low frequency RF plasma enhanced MOCVD method

  • Chen, G.C.;Lim, D.-C.;Lee, S.-B.;Hong, B.Y.;Kim, Y.J.;Boo, J.-H.
    • Journal of the Korean institute of surface engineering
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    • v.34 no.5
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    • pp.510-515
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    • 2001
  • It was first time that low frequency R.F. derived plasma enhanced MOCVD with frimethylborate precursor was used to fabricate a new ternary compound $BO_{x}$ $N_{y}$ . The formation of BON molecule was resulted from nitrogen nitrifying B-O, and forming the angular molecule structure proved by XPS and FT-IR results. The relationship between hardness and film thickness was studied. An thickness-independent hardness was fond about 10 GPa. The empirical calculation of band-gap and UV test result showed that our deposited $BO_{x}$ $N_{y}$ thin film was semiconductor material with 3.4eV of wide band gap. The electrical conductivity, $4.8$\times$10^{-2}$ /($\Omega$.cm)$^{-1}$ also confirmed that $BO_{x}$ $N_{y}$ has a semiconductor property. The roughness detected from the as-grown films showed that there was no serious bombarding effect due to anion in the plasma occurring in the RF frequency derived plasma.

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A Study on the Effect of Pre-treatment on the Formation of Nitriding Layer by Post Plasma (포스트 플라즈마를 이용한 질화의 질화층 형성에 미치는 전처리의 영향에 대한 연구)

  • Moon, Kyoung Il;Byun, Sang Mo;Cho, Yong Ki;Kim, Sang Gweon;Kim, Sung Wan
    • Journal of the Korean Society for Heat Treatment
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    • v.18 no.1
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    • pp.24-28
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    • 2005
  • New post plasma nitriding can achieve a high uniformity that have been difficult in DC nitriding and have a high productivity comparable to gas nitriding. However, it has not a enough high nitriding potential for a rapid nitriding, because surface activation or ion etching in the general plasma nitriding cannot be expected. Thus, in this study, the effects of pre-treatments with oxidation and reduction gas have been investigated to improve the nitriding kinetics of post plasma nitriding. An effective pre-treatment consisting of oxidation and reduction resulted in the increase of surface energy of STD 11. This induced the surface hardness and the effective nitriding depth of STD 11. It is thought that the increase of the surface energy and the surface area with pre-treatment promote the nucleation of nitriding layer.

Nanosecond Laser Cleaning of Aluminum Alloy Oxide Film

  • Hang Dong;Yahui Li;Shanman Lu;Wei Zhang;Guangyong Jin
    • Current Optics and Photonics
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    • v.7 no.6
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    • pp.714-720
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    • 2023
  • Laser cleaning has the advantages of environmental protection, precision, and high efficiency, and has good prospects for application in removing oxide films on the surface of aluminum alloy. This paper discusses the cleaning threshold and cleaning mechanism of aluminum alloy surface oxide film. A nanosecond pulsed laser was used to remove a 5-㎛-thick oxide film from the surface of 7A04 aluminum alloy, and the target surface temperature and cleaning depth were simulated. The effects of different laser energy densities on the surface morphology of the aluminum alloy were analyzed, and the plasma motion process was recorded using a high-speed camera. The temperature measurement results of the experiment are close to the simulation results. The results show that the laser cleaning of aluminum alloy oxide film is mainly based on the vaporization mechanism and the shock wave generated by the explosion.

Soft Mold Imprinting Fabrication of Anti-reflection Film using Self-Organized Nanostructure Polymer Surfaces Irradiated by Ion Beams (이온빔 처리된 폴리머 표면의 자가나노구조화를 이용한 반사방지 필름 제조용 소프트 몰드 임프린팅 연구)

  • Lee, Seunghun;Byeon, Eun-Yeon;Choi, Juyeon;Jung, Sunghoon;Yu, Byeong-Gil;Kim, Do-Geun
    • Journal of the Korean institute of surface engineering
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    • v.50 no.6
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    • pp.480-485
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    • 2017
  • Soft mold imprinting method that uses nanostructured polymer mold was investigated for anti-reflection film fabrication. The nanostructured soft mold was polyethylene terephthalate(PET) irradiated by oxygen ion beams. The collisional energy transfer between oxygen ion and the polymer surface induced cross-linking and scission reactions, resulting in self-organized nanostructures with regular patterns of the wavenumber of $5{\mu}m^{-1}$. Post processes including ultra-violet curable resin coating and delamination fabricated anti-reflection films. The imprinted resin surface also showed the consistent wavenumber, $5{\mu}m^{-1}$. Pristine PET, oxygen ion beam treated PET, and imprinted replica sample showed total transmittance of 91.04, 93.25, and 93.57-93.88%, respectively.

Hydrophobic Characteristics of a Silicone Resin Surface Produced by Replicating an Electric Discharge Machined Surface (방전가공면을 복제한 실리콘수지 표면의 발수특성연구)

  • Kim, Y.H.;Hong, S.K.;Lee, S.Y.;Lee, S.H.;Kim, K.H.;Kang, J.J.
    • Transactions of Materials Processing
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    • v.22 no.1
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    • pp.23-29
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    • 2013
  • In this study, a micro/nano-random-pattern-structure surface was machined by electric discharge machining (EDM) followed by replicating the EDM surface with a silicone elastomer having low energy and greater hydrophobicity. The variation of hydrophobicity was of prime interest and was examined as a function of the surface roughness of the replicated silicone elastomer. The hydrophobicity was evaluated by the water contact angle (WCA) measured on the relevant surface. For the experiments, the original surfaces were machined by die sinking electric discharge machining (DS-EDM) and wire cutting electric discharge machining (WC-EDM). The ranges of surface roughness were Ra $0.8{\sim}19{\mu}m$ for the DS-EDM and Ra $0.5{\sim}4.7{\mu}m$ for the WC-EDM. In order to fabricate a hydrophobic surface, the EDM surfaces were directly replicated using a liquid-state silicone elastomer, which was thermally cured. The measured WCA on the replicated surfaces for DS-EDM was in the range of $115{\sim}130^{\circ}$ and for WC-EDM the WCA was in the range of $123{\sim}150^{\circ}$. Additionally, the dynamic hydrophobicity was evaluated by measuring an advancing and a receding WCA on the replicated silicone elastomer surfaces.

Effect of Argon Ion Beam Incident Angle on Self-Organized Nanostructure on the Surface of Polyethylene Naphthalate Film (알곤 이온빔 입사각에 따른 Polyethylene Naphthalate 필름 표면의 자가나노구조화 분석)

  • Joe, Gyeonghwan;Yang, Junyeong;Byeon, Eun-Yeon;Park, Young-Bae;Jung, Sunghoon;Kim, Do-Geun;Lee, Seunghun
    • Journal of the Korean institute of surface engineering
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    • v.53 no.3
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    • pp.116-123
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    • 2020
  • Ion beam irradiation induces self-organization of nanostructure on the surface of polymer film. We show that the incident angle of Ar ions on polyethylene naphthalate(PEN) film changes self-organized nanostructure. PEN film was irradiated by argon ion beams with the ion incident angle of 0°, 30°, 45°, 60°, and 80°. Nanostructure was altered from dimple to ripple structure as the angle increases. The ripple structure changed to pillar structure after 60°due to that the shallow incident angle increased the ion energy transfer per depth up to 50 eV/Å, which value could induce excessive surface heating and oligomer formation reacting as a physical mask for anisotropic etching. And quantitative analysis of the nanostructures was adapted by using ABC model and fractal dimension theory.