• 제목/요약/키워드: Surface reaction-layer

검색결과 572건 처리시간 0.029초

순수 티타늄 주조체의 주형온도에 따른 용탕반응성 및 표면거칠기 (Metal-Mold Reaction and Surface Roughness Measurement of Pure Titanium Casting Specimens with Mold Temperatures)

  • 차성수;송영주;박수철
    • 대한치과기공학회지
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    • 제32권4호
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    • pp.297-305
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    • 2010
  • Purpose: The purpose of this study was to observe the change of metal-mold reaction and surface roughness in titanium casting specimens for phosphate-silica alumina bonded investment with mold temperatures. Methods: The metal-phosphate silica alumina bonded mold interface reaction and surface roughness of titanium casting specimens according to mold temperatures were investigated. The Specimens were analysed by scanning electron microscopy and surface roughness tester. Results: The oxidation behavior indicated by the growth of oxide thickness. The titanium-oxide layer were consisted two layer of a porous external and a dense internal one. The reaction layer and surface roughness increased with increasing investment material temperature. Conclusion: In this work, The most suitable mold temperature in casting of pure titanium was $200^{\circ}C$.

원주형으로 성형된 하동고령토의 수산화나트륨 수용액 처리에 의한 결정의 변화 (On Crystallization of Hadong Kaolin Granulated Cylindrically Treated with Aqueous Sodium Hydroxide Solution)

  • 김면섭
    • 한국세라믹학회지
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    • 제15권1호
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    • pp.21-27
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    • 1978
  • Hadong Kaolin (Halloysite) was granulated cylindrically and treated with 1N aqueous sodium hydroxide solution for 6-48 hrs at 60-10$0^{\circ}C$. The crystalling structure of surface of the products was studied by X-ray powder diffraction method. The reaction rate of halloysite to sodium A zeolite showed a gradual decrease from surface to inner layer. At the surface layer, the reaction mechanism was observed as first order consecutive reaction as follows: halloysitelongrightarrowamorphous aluminosilicatelongrightarrowsodium A zeolitelongrightarrowhydroxysodalite By applying the above reaction mechanism, the rate constants and activation energies was measured.

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Epitaxial Growth of Polyurea Film by Molecular Layer Deposition

  • 최성은;강은지;이진석
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.264.2-264.2
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    • 2013
  • Molecular layer deposition (MLD) is sequential, self-limiting surface reaction to form conformal and ultrathin polymer film. This technique generally uses bifunctional precursors for stepwise sequential surface reaction and entirely organic polymer films. Also, in comparison with solution-based technique, because MLD is vapor-phase deposition based on ALD, it allows epitaxial growth of molecular layer on substrate and is especially good for surface reaction or coating of nanostructure such as nanopore, nanochannel, nanwire array and so on. In this study, polyurea film that consisted of phenylenediisocyanate and phenylenediamine was formed by MLD technique. In situ Fourier Transform Infrared (FTIR) measurement on high surface area SiO2 substrate was used to monitor the growth of polyurethane and polyurea film. Also, to investigate orientation of chemical bonding formed polymer film, plan-polarized grazing angle FTIR spectroscopy was used and it showed epitaxial growth and uniform orientation of chemical bones of polyurea films.

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Initial Reaction of Hexachlorodisilane on Amorphous Silica Surface for Atomic Layer Deposition Using Density Functional Theory

  • Kim, Ki-Young;Yang, Jin-Hoon;Shin, Dong-Gung;Kim, Yeong-Cheol
    • 한국세라믹학회지
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    • 제54권5호
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    • pp.443-447
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    • 2017
  • The initial reaction of hexachlorodisilane ($Si_2Cl_6$, HCDS) on amorphous silica ($SiO_2$) surface for atomic layer deposition was investigated using density functional theory. Two representative reaction sites on the amorphous $SiO_2$ surface for HCDS reaction, a surface hydroxyl and a two-membered ring, were considered. The reaction energy barrier for HCDS on both sites was higher than its adsorption energy, indicating that it would desorb from the surface rather than react with the surface. At high temperature range, some HCDSs can have kinetic energy high enough to overcome the reaction energy barrier. The HCDS reaction on top of the reacted HCDS was investigated to confirm its self-limiting characteristics.

Low Temperature Encapsulation-Layer Fabrication of Organic-Inorganic Hybrid Thin Film by Atomic Layer Deposition-Molecular Layer Deposition

  • 김세준;김홍범;성명모
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.274-274
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    • 2013
  • We fabricate encapsulation-layer of OLED panel from organic-inorganic hybrid thin film by atomic layer deposition (ALD) molecular layer deposition (MLD) using Al2O3 as ALD process and Adipoyl Chloride (AC) and 1,4-Butanediamine as MLD process. Ellipsometry was employed to verify self-limiting reaction of MLD. Linear relationship between number of cycle and thickness was obtained. By such investigation, we found that desirable organic thin film fabrication is possible by MLD surface reaction in monolayer scale. Purging was carried out after dosing of each precursor to eliminate physically adsorbed precursor with surface. We also confirmed roughness of the organic thin film by atomic force microscopy (AFM). We deposit AC and 1,4-Butanediamine at $70^{\circ}C$ and investigated surface roughness as a function of increasing thickness of organic thin film. We confirmed precursor's functional group by IR spectrum. We calculated WVTR of organic-inorganic hybrid super-lattice epitaxial layer using Ca test. WVTR indicates super-lattice film can be possibly use as encapsulation in flexible devices.

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Comparison of Adsorption Properties of Adsorbates on Pt(111) and Pt(111)/$\gamma-Al_2O_3$ Surface in the Ethylene Hydrogenation Reaction : MO-Theory

  • 조상준;박상문;박동호;허도성
    • Bulletin of the Korean Chemical Society
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    • 제19권7호
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    • pp.733-737
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    • 1998
  • Using an atom superposition and electron delocalization molecular orbital (ASED-MO) method, we have compared adsorption properties of adsorbates on the Pt(Ill) surface with the Pt(lll)/γ-Al203 surface in the ethylene hydrogenation reaction. In two-layer thick model systems, the calculated activation energy of the hydrogenation by the surface platinum hydride is equal to the energy by the hydride over supported platinum/γ-alumina. The transition structure on platinum is very close to the structure on the supported platinum/γ-alumina surface. Hydrogenation by the surface hydride on platinum can take place easily because the activation energy is about 0.5 eV less than hydrogenation by ethylidene. On supported platinum/,y-alumina the activation energy of the hydride mechanism is about 0.61 eV less than that of ethylidene mechanism. In one-layer thick model systems, the activation energy of hydrogenation by ethylidene is about 0.13 eV less than the activation energy of hydride reaction. The calculated activation energy by the hydride over the supported platinum y-alumina is 0. 24 eV higher than the platinum surface. We have found from this result that the catalytic properties of one-layer thick model systems have been influenced by the support but the two-layer thick model systems have not been influenced by the support.

Chemical Reaction between Aluminium and graphite Crucible During the Fabrication of Spherical Monosized Al particles

  • Kwon, Hansang
    • 한국분말재료학회지
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    • 제25권2호
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    • pp.99-103
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    • 2018
  • Spherical monosized pure aluminum (Al) particles are successfully fabricated by the pulsated orifice ejection method (POEM). The surface reaction between Al and the graphite crucible is investigated by analysing the microstructure and chemical composition of the materials. No significant chemical reaction occurs between Al and the graphite owing to the crystalline Al oxide (${\gamma}-Al_2O_3$) layer generated in the initial state. The ${\gamma}-Al_2O_3$ layer is clearly observed in all regions between the Al particles and graphite via transmission electron microscopy and confirmed by the selected area diffraction pattern. The morphology of the ${\gamma}-Al_2O_3$ layer perfectly follows the surface morphology of the graphite crucible, which showed nanoscale roughness. This implies that molten Al could not directly contact graphite even though the surface of the crucible became rough to some extent. However, this passivation phenomenon allowed the successful fabrication of monosized pure Al particles. Therefore, POEM is a useful process at least to manufacture monosized pure Al particles.

다양한 온도에서 염소가스 반응에 의해 표면 개질된 SiC의 트라이볼로지 특성평가 (Estimation of Tribological Properties on Surface Modified SiC by Chlorine Gas Reaction at Various Temperatures)

  • 배흥택;정지훈;최현주;임대순
    • 한국세라믹학회지
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    • 제46권5호
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    • pp.515-519
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    • 2009
  • Carbon layers were fabricated on silicon carbide by chlorination reaction at temperatures between $1000^{\circ}C$ and $1500^{\circ}C$ with $Cl_2/H_2$ gas mixtures. The effect of reaction temperature on the micro-structures and tribological behavior of SiC derived carbon layer was investigated. Tribological tests were carried out ball-on-disk type wear tester. Carbon layers were characterized by X-ray diffractometer, Raman spectroscopy and surface profilometer. Both friction coefficients and wear rates were maintained low values at reaction temperature up to $1300^{\circ}C$ but increased suddenly above this temperature. Variation of surface roughness as a function of reaction temperature was dominant factor affecting tribological transition behavior of carbon layer derived from silicon carbide at high temperature.

열 원자층 식각법을 이용한 박막 재료 식각 연구 (Thermal Atomic Layer Etching of the Thin Films: A Review )

  • 조현희;이서현;윤은서;서지은;이진우;한동훈;남서아;한정환
    • 한국분말재료학회지
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    • 제30권1호
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    • pp.53-64
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    • 2023
  • Atomic layer etching (ALE) is a promising technique with atomic-level thickness controllability and high selectivity based on self-limiting surface reactions. ALE is performed by sequential exposure of the film surface to reactants, which results in surface modification and release of volatile species. Among the various ALE methods, thermal ALE involves a thermally activated reaction by employing gas species to release the modified surface without using energetic species, such as accelerated ions and neutral beams. In this study, the basic principle and surface reaction mechanisms of thermal ALE?processes, including "fluorination-ligand exchange reaction", "conversion-etch reaction", "conversion-fluorination reaction", "oxidation-fluorination reaction", "oxidation-ligand exchange reaction", and "oxidation-conversion-fluorination reaction" are described. In addition, the reported thermal ALE processes for the removal of various oxides, metals, and nitrides are presented.

용융아연 도금층의 응고에 미치는 콜로이달 실리카의 영향 (Effect of Colloidal Silica on the Solidification of Galvanized Coatings)

  • 김상헌;정원섭;김형인
    • 한국표면공학회지
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    • 제33권5호
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    • pp.381-386
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    • 2000
  • It was found that colloidal silica sprayed to the galvanized steel sheet apparently made the molten zinc layer solidified to be the randomly oriented fine grains. Its spraying effect was also little affected by steel temperature that had been considered as one of the major operating factors in this process. From the results of surface analysis, it is considered that aluminum dissolved in coating layer reduces silica to silicon by the oxidation-reduction reaction, and that the reduced silicon acts as a more effective nucleus in solidification reaction than phosphate salt, siica and alumina.

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