• Title/Summary/Keyword: Surface reaction products

Search Result 257, Processing Time 0.02 seconds

Ultrastructural Localization of Acid Phosphatase in Entamoeba histolytica and Entamoeba gingivalis (이질아메바 (Entamoeba histolytica)와 치은아메바 (Entamoeba gingivalis)의 Acid Phosphatase 활성에 관한 세포화학적 연구)

  • Cho, Kee-Mok;Cha, Hai-Young;Soh, Chin-Thack
    • Applied Microscopy
    • /
    • v.3 no.1
    • /
    • pp.1-16
    • /
    • 1973
  • A combined cytochemical and electron microscopic study was carried out for the demonstration of acid phosphatase activities in trophozoites of E. histolytica. and E. gingivalis. E. histolytica(YS-27) strain was isolated from liver abscess of 72-year-old man in September 1969, and E. gingivalis (YS-215) strain was collected from gingival crevice of 41-year-old man in January 1972. The amoeba strains were maintained by subculture on diphasic medium, and used throughout the study. The results are summarized as follows; 1. In E. histolytica, the reaction products were distributed evenly over the entire surface of plasma membrane, whereas E. gingivalis showed no activity of acid phosphatase on the plasma membrane, except in the portion of the uroid-like structure. 2. In the cytoplasm, various reaction precipitates were observed in vacuoles of both amoebae; vacuole limiting membrane, vacuole membrane and its contents and lysosome-like structure. Strong enzyme active contents but membrane reaction negative vacuoles were conspicuous in E. gingivalis. Endoplasmic reticulum showed a moderate activity. 3. Granule-like acid phosphatase reaction product was demonstrated in the nucleoplasm of E. gingivalis, but it was negative in E. histolytica.

  • PDF

Effects of EBCT and Water Temperature on HAA Removal using BAC Process (BAC 공정에서 EBCT와 수온에 따른 HAA 제거 특성)

  • Son, Hee-Jong;Yoo, Soo-Jeon;Yoo, Pyung-Jong;Jung, Chul-Woo
    • Journal of Korean Society of Environmental Engineers
    • /
    • v.30 no.12
    • /
    • pp.1255-1261
    • /
    • 2008
  • In this study, The effects of three different biological activated carbon (BAC) materials (each coal, coconut and wood based activated carbons), empty bed contact time (EBCT) and water temperature on the removal of haloacetic acid (HAA) 5 species in BAC filters were investigated. Experiments were conducted at three water temperatures (5, 10 and 20$^{\circ}C$) and four EBCTs (5, 10, 15 and 20 min). The results indicated that coal based BAC retained more attached bacterial biomass on the surface of the activated carbon than the other BAC, increasing EBCT or increasing water temperature increased the HAA 5 species removal in BAC columns. To achieve an HAA removal efficiency 50% or higher in a BAC filter, the authors suggest 10 min EBCT or longer for 5$^{\circ}C$ waters and 5 min EBCT for waters at 10$^{\circ}C$ or higher. The kinetic analysis suggested a first-order reaction model for HAA 5 species removal at various water temperatures (5, 10 and 20$^{\circ}C$). The pseudo-first-order reaction rate constants and half-lives were also calculated for HAA removal at 5, 10 and 20$^{\circ}C$. The pseudo-first-order reaction rate constants and half-lives were also calculated for HAA 5 species removal at 5$\sim$ 20$^{\circ}C$. The half-lives of HAA 5 species ranging from 0.75 to 18.58 min could be used to assist water utilities in designing and operating BAC filters for HAA removal.

Chemical Vapor Deposition of Ga2O3 Thin Films on Si Substrates

  • Kim, Doo-Hyun;Yoo, Seung-Ho;Chung, Taek-Mo;An, Ki-Seok;Yoo, Hee-Soo;Kim, Yun-Soo
    • Bulletin of the Korean Chemical Society
    • /
    • v.23 no.2
    • /
    • pp.225-228
    • /
    • 2002
  • Amorphous $Ga_2O_3$ films have been grown on Si(100) substrates by metal organic chemical vapor deposition (MOCVD) using gallium isopropoxide, $Ga(O^iPr)_3$, as single precursor. Deposition was carried out in the substrate temperature range 400-800 $^{\circ}C$. X-ray photoelectron spectroscopy (XPS) analysis revealed deposition of stoichiometric $Ga_2O_3$ thin films at 500-600 $^{\circ}C$. XPS depth profiling by $Ar^+$ ion sputtering indicated that carbon contamination exists mostly in the surface region with less than 3.5% content in the film. Microscopic images of the films by scanning electron microscopy (SEM) and atomic force microscopy (AFM) showed formation of grains of approximately 20-40 nm in size on the film surfaces. The root-mean-square surface roughness from an AFM image was ${\sim}10{\AA}$. The interfacial layer of the $Ga_2O_3$/Si was measured to be ${\sim}35{\AA}$ thick by cross-sectional transmission electron microscopy (TEM). From the analysis of gaseous products of the CVD reaction by gas chromatography-mass spectrometry (GC-MS), an effort was made to explain the CVD mechanism.

The Study of the Etch Characteristics of the HfAlO3 Thin Film in O2/BCl3/Ar Plasma (O2/BCl3/Ar 플라즈마를 이용한 HfAlO3 박막의 식각특성 연구)

  • Ha, Tae-Kyung;Woo, Jong-Chang;Kim, Chang-Il
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.23 no.12
    • /
    • pp.924-928
    • /
    • 2010
  • In this study, $HfAlO_3$ thin films using gate insulator of MOSFET were etched in inductively coupled plasma. The etch characteristics of the $HfAlO_3$ thin films has been investigated by varying $O_2/BCl_3$/Ar gas mixing ratio, a RF power, a DC bias voltage and a process pressure. As the $O_2$ concentration increases further, $HfAlO_3$ was redeposited. As increasing RF power and DC bias voltage, etch rates of the $HfAlO_3$ thin films increased. Whereas, as decreasing of the process pressure, etch rates of the $HfAlO_3$ thin films increased. The chemical reaction on the surface of the etched the $HfAlO_3$ thin films was investigated with X-ray photoelectron spectroscopy (XPS). These peaks moved a binding energy. This chemical shift indicates that there are chemical reactions between the $HfAlO_3$ thin films and radicals and the resulting etch by-products remain on the surface.

Study for Organic(Bio)-Inorganic Nano-Hybrid OMC

  • Lee, Jung-Eun;Ji, Hong-Geun;Park, Yoon-Chang;Lee, Kyoung-Chul;Yoo, Eun-Ah
    • Proceedings of the SCSK Conference
    • /
    • 2003.09a
    • /
    • pp.178-191
    • /
    • 2003
  • OMC is essentialiy necessary compound in sun goods as organic UV protecting products. But the skin-trouble problem is raising because of skin penetration of OMC. In this study, non-capsulated pure OMC was compared with Organic-Inorganic-Nano-hybrid OMC for skin penetration force and SPF degree. Organic- Inorganic Nano-Hybrid OMC is OMC trapped in the pore of the mesoporous silica synthesized by the sol-gel method after OMC is nanoemulsified in the system of the hydrogenated Lecithin/ Ethanol/caprylic/capric triglyceride/OMC/water. OMC- nano- emulsion was obtained by a microfluidizing process at 1000bar and then micelle size in the nanoemulsion solution is 100-200nm range. Mesoporous silica nano-hybrid OMC was prepared by the process; surfactant was added in dissolved OMC-Nanoemulsion, then the rod Micelle was formed. OMC-nanoemulsion was capsulated in this rod Micelle and then silica precursor was added in the OMC-nanoemulsion solution. Through the hydrolysis reaction of the silica precursor, mesoporous silica concluding OMC-Nanocapsulation was obtained. The nano-hybrid surface of this OMC-Nanoemulsion-Inorganic system was treated with polyalkyl-silane compound. OMC-Mesoporous silica Nano-hybrids coated with polyalkyl-silane compound show the higher sun protecting factor (SPF Analyzer: INDEX 10-15) than pure OMC and could reduce a skin penetration of OMC. The physico-chemical properties of these nano-hybrids measured on the SPF index, partical size, strcture, specific surface area, pore size, morphology, UV absorption, rate of the OMC dissolution using SPF Analyzer, Laser light scattering system, XRD, BET, SEM, chroma Meter, HPLC, Image analyzer, microfluidizer, UV/VIS. spectrometer.

  • PDF

Production of the ultra fine-composite powders of WC-Co and WC-Ni (초미립의 탄화 텅스텐-코발트와 탄화 텅스텐-니켈 복합분말의 제조)

  • 김병재;윤병하
    • Journal of the Korean institute of surface engineering
    • /
    • v.26 no.2
    • /
    • pp.87-107
    • /
    • 1993
  • The grain size of the final products of WC-Co and WC-Ni composite powders is dependent on the size of the starting material and the conditions employed for the reduction and carburization. APT-Co and -Ni com-plex salts were prepared by the substitution reaction between ammonium ions in APT and the metal ions in Co(NO3)2 and Ni(NO3)2 solutions of different concentrations(0.1 to 0.7M) at $50^{\circ}C$ and the grain sizes of the com-plex salts was $0.54~0.76\mu\textrm{m}$. The complex which calcined the complex salts at $700^{\circ}$~80$0^{\circ}C$ for 60min. were 0.2~0.5$\mu\textrm{m}$. W-Co($5.92^{\circ}C$) and -Ni(6.95%) powders which reduced the complex oxides with H2d atmo-sphere(flow rate;600cc/min.) at $700^{\circ}$~$800^{\circ}C$ for 60min. were $0.5~0.6\mu\textrm{m}$. The mean grain sizes of WC-Co and WC-Ni composite powders which carburized both complex metals of W-Co and W-Ni at $800^{\circ}C$ for 60min. were $0.5~0.6\mu\textrm{m}$, and take place the coarsening of the grain above $800^{\circ}C$ and the optmium ratio of C3H8 and H2 was 0.2 for the control of the free carbon. The effect of Co contents on the particle sizes decreased from 0.4 to $0.25\mu\textrm{m}$ with increasing the content from 2.0 to 7.6w%. The activation energies on the reductions of oxides and the formations of carbides were as follows ; W-Co : Q = 8.7 kcal/mole, W-Ni : Q = 8.1 kcal/mole, WC-Co pow-der : Q = 17.8 kcal/mole, WC-Ni powder : Q = 16.6 kcal/mole.

  • PDF

Optimization the Xylose Fractionation Conditions of Pepper Stem with Dilute Sulfuric Acid (농업부산물 고추대 (Pepper Stem)을 이용한 묽은 황산 자일로즈 분별공정의 최적화)

  • Won, Kyung-Yoen;Oh, Kyeong-Keun
    • KSBB Journal
    • /
    • v.24 no.4
    • /
    • pp.361-366
    • /
    • 2009
  • Response surface methodology (RSM) was used for optimization the fraction conditions of xylose from pepper stem with dilute sulfuric acid. The independent variables were acid concentration in the range of 1.134 to 2.866%, reaction temperatures in the range of 142.68 to $177.32^{\circ}C$, and hydrolysis time in the range of 6.34 to 23.66 min. were studied. The dependent variables were xylose yield from pepper stem, and the production of by-products, for example, furfural, acetic aicd, HMF etc. Experimental results had a good match with statistical result. The maximum xylose yield obtained in this experiment was 71% concentration.

The Effect of Electrochemical Treatment in Lowering Alkali Leaching from Cement Paste to an Aquatic Environment: Part 2- Microscopic Observation (전기화학적 기법을 통한 시멘트페이스트의 수중노출에 따른 알칼리이온 침출저감 효과: Part 2- 미세구조 분석)

  • Bum-Hee Youn;Ki-Yong Ann
    • Journal of the Korean Recycled Construction Resources Institute
    • /
    • v.11 no.2
    • /
    • pp.145-152
    • /
    • 2023
  • In this study, microscopic observation was made on the surface of cement paste immersed in an aquatic environment for 100 days at electrochemical treatment to mitigate the leaching of alkali ions. To quantitatively rank the hydration products, unhydrated grains and porosity in the interfacial region, the backscattered electron(BSE) images were obtained by scanninng electron microscopy. As a result, it was found that the porosity on the surface was significantly reduced by the electrochemical treatment, while unhydrated grains were more or less increased presumably limited hydration reaction under electric charge. At electrochemical treatment, Ca2+ ions present in C-S-H gel could be precipitated with OH- to form Ca(OH)2 then to lower C-S-H gel and simultaneously to enhance Ca(OH)2. Substantially, the risk of alkali leaching could be lowered by the limited ionized matrix under electrochemical treatment.

Preparation of Hypoallergenic Whey Protein Hydrolysate by a Mixture of Alcalase and Prozyme and Evaluation of Its Digestibility and Immunoregulatory Properties

  • Jiyeon Yang;Se Kyung Lee;Young Suk Kim;Hyung Joo Suh;Yejin Ahn
    • Food Science of Animal Resources
    • /
    • v.43 no.4
    • /
    • pp.594-611
    • /
    • 2023
  • Whey protein (WP) has nutritional value, but the presence of β-lactoglobulin (β-LG) and α-lactalbumin (α-LA) cause allergic reactions. In this study, hypoallergenic whey protein hydrolyate (HWPH) was prepared by decomposing β-LG and α-LA of WP using exo- and endo-type proteases. The enzyme mixing ratio and reaction conditions were optimized using response surface methodology (RSM). Degradation of α-LA and β-LG was confirmed through gel electrophoresis, and digestion, and absorption rate, and immunostimulatory response were measured using in vitro and in vivo systems. Through RSM analysis, the optimal hydrolysis conditions for degradation of α-LA and β-LG included a 1:1 mixture of Alcalase and Prozyme reacted for 10 h at a 1.0% enzyme concentration relative to substrate. The molecular weight of HWPH was <5 kDa, and leucine was the prominent free amino acid. Both in vitro and in vivo tests showed that digestibility and intestinal permeability were higher in HWPH than in WP. In BALB/c mice, as compared to WP, HWPH reduced allergic reactions by inducing elevated Type 1/Type 2 helper T cell ratio in the blood, splenocytes, and small intestine. Thus, HWPH may be utilized in a variety of low allergenicity products intended for infants, adults, and the elderly.

A Study on the etching mechanism of $CeO_2$ thin film by high density plasma (고밀도 플라즈마에 의한 $CeO_2$ 박막의 식각 메커니즘 연구)

  • Oh, Chang-Seok;Kim, Chang-Il
    • Journal of the Institute of Electronics Engineers of Korea SD
    • /
    • v.38 no.12
    • /
    • pp.8-13
    • /
    • 2001
  • Cerium oxide ($CeO_2$) thin film has been proposed as a buffer layer between the ferroelectric thin film and the Si substrate in Metal-Ferroelectric-Insulator-Silicon (MFIS) structures for ferroelectric random access memory (FRAM) applications. In this study, $CeO_2$ thin films were etched with $Cl_2$/Ar gas mixture in an inductively coupled plasma (ICP). Etch properties were measured for different gas mixing ratio of $Cl_2$($Cl_2$+Ar) while the other process conditions were fixed at RF power (600 W), dc bias voltage (-200 V), and chamber pressure (15 mTorr). The highest etch rate of $CeO_2$ thin film was 230 ${\AA}$/min and the selectivity of $CeO_2$ to $YMnO_3$ was 1.83 at $Cl_2$($Cl_2$+Ar gas mixing ratio of 0.2. The surface reaction of the etched $CeO_2$ thin films was investigated using x-ray photoelectron spectroscopy (XPS) analysis. There is a Ce-Cl bonding by chemical reaction between Ce and Cl. The results of secondary ion mass spectrometer (SIMS) analysis were compared with the results of XPS analysis and the Ce-Cl bonding was monitored at 176.15 (a.m.u). These results confirm that Ce atoms of $CeO_2$ thin films react with chlorine and a compound such as CeCl remains on the surface of etched $CeO_2$ thin films. These products can be removed by Ar ion bombardment.

  • PDF