• 전자공학회논문지A
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• 제29A권1호
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• pp.33-40
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• 1992

4인치(100) 실리콘 기판상에 센서용 다이아프램을 제조할 때 생기는 식각 현상들을 관찰하고 분석하였다. 115$^{\circ}C$의 "F etch' 용액을 사용하여 300$\mu$ 이상의 깊은 식각을 행하였을 때 식각 표면에 발생하느 식각 결함은 hillock, 반응 생성물, 그리고 횐색 잔유물로 구분될 수 있었따. 특히 hillock의 경우 식각 표면에 부착된 반응 생성물의 밀도나 크기에 관계하여 |111|면들로 이루어질는 피라밋 구조나 사다리꼴 육면체등의 형태를 취함이 확인되었다. 또한 용해된 실리콘의 국부적인 과잉 포활 발생하는 흰색 잔유물의 IR 흡수 스펙트럼을 조사한 결과, Si-N-O 성분에 미량의 h와 C가 포함된 것임을 알 수 있었다. 아울러 식각면을 식각용액에 대해 아래쪽, 위쪽, 그리고 측면을 향하도록 놓았을때 식각 결함의 존재 확률과 분포 그리고 식각율의 분포를 비교한 결과 식각율의 균일성면에서는 하측방향의 자세가, 식각결함의 제거에 있어서는 측면방향의 자세가, 식각결함의 제거에 있어서는 측면방향의 자세가 유리하게 나타났으며 이를 반응조내의 흐름 패턴을 이용하여 해석하였다.

• 한국축산식품학회지
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• 제21권1호
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• pp.56-63
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• 2001

In this study, three domestic and one foreign formulas for the infants up to 5 month old were examined to detect chemical changes such as pH, reactive sulfhydryl groups(RSH) content, 5-hydroxymethylfurfral(HMF) content, available lysine content, electrophoresis, and surface color caused by heat treatment for long term storage. In the SDS-polyacrylamide gel electrophoresis, A and B products showed similar pattern, while C product had a clearly distinguishable $\beta$-lacto-globulin band, but in casein, only D product showed a few strong casein band. RSH content, which indicate the extent of whey protein denaturation, ranged from 4.40 to 5.93 mmole/g protein. HMF content. which indicate the extent of Maillard reaction, ranged from 192 to 432 $\mu$mole/100g in formulas. B product showed the highest RSH and HMF content. Available lysine content ranged from 31 to 46 mg/g protein. Among them D product contain the highest available lysine content and others showed no significant difference. In conclusion, the domestic infant formulas showed higher RSH and HMF content than the foreign product and the available lysine content of the domestic products were lower than of the foreign product.

• Membrane and Water Treatment
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• 제13권6호
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• pp.291-301
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• 2022

In this study, cement/PVDF hollow-fiber hybrid membranes were prepared via a mixed process of diffusion-induced phase separation and hydration. The presence of X-ray diffraction peaks of Ca(OH)₂, an AFt phase, an AFm phase, and C-S-H phase confirmed the hydration reaction. Good hydrophilicity was obtained. The cross-sectional and surface morphologies of the hybrid membranes showed that an asymmetric pore structure was formed. Hydration products comprising parallel plates of Ca(OH)₂, fibrous ettringite AFt, and granulated particles AFm were obtained gradually. For the hybrid membranes cured for different time, the pore-size distribution was similar but the porosity decreased because of blocking of the hydration products. In addition, the water flux decreased with hydration time, and carbon retention was 90% after 5 h of rejection treatment. Almost all the Zn²⁺ ions were adsorbed by the hybrid membrane. The above results proved that the obtained membrane could be alternative as basement membrane for separation application.

• 에너지공학
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• 제27권4호
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• pp.64-69
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• 2018

산업부산물인 화력발전소 석탄재와 제강슬래그의 활용방안을 확대하고, 폐광산의 지반침하를 방지하기 위해 저강도 고유동 채움재를 제조하였다. 중금속 용출 억제 등의 환경적 안정성을 확보하기 위해 화력발전소 바닥재(bottom ash)와 KR슬래그는 7:3으로 혼합하여 탄산화반응($CO_2$고정화)을 실시하였다. 효율적인 폐광산 충진을 위해 유동성에 따른 작업성 평가와 물성평가를 실시하였다. 유해성 분석결과 탄산화 반응을 실시할 경우 중금속 용출이 억제되는 것을 확인하였다. 비표면적 차이에 의해 각 배합별 물 비율을 확인하였다. flow 차이에 따른 작업 효율성을 평가한 결과 flow 300mm의 경우 flow 260mm 대비 효과적으로 충진이 가능한 것을 확인하였다. 압축강도 측정결과 flow 300mm 대비 flow 260mm의 경우 단위수량 감소로 인한 공극수가 적어 압축강도가 상대적으로 높은 것을 확인하였다.

• Journal of the Korean Wood Science and Technology
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• 제39권1호
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• pp.75-85
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• 2011

이 연구에서는 백합나무($Liriodendron$ $tulipifera$)를 옥살산으로 전처리한 시료로부터 에탄올 생산 가능성을 조사하고, response surface methodology (RSM)를 도입하여 전처리 조건을 분석하고자 한다. 산농도, 전처리 시간, 반응 온도를 조절하여 $2^3$ factorial central composite experimental design을 바탕으로 각기 다른 15가지의 전처리 조건에서 시험하였다(central point에서 2반복). 전처리 후 고체 시료는 발효 균주인 $Pichia$ $stipitis$를 사용하여 동시당화발효로 에탄올 생산에 이용되었으며, 각각의 시료에서의 72시간에서의 에탄올 생산량(y,g/${\ell}$)이 최대값으로, 종속변수로써 RSM에 적용되었다. $180^{\circ}C$에서 40분간 0.013 g/g의 옥살산으로 처리한 시료가 가장 많은 양의 에탄올(9.7 g/${\ell}$)을 생산하였으며, response surface methodology 분석에 따르면, 전처리 조건에서 온도 인자가 ethanol에 가장 큰 영향을 미치는 것으로 제시되었으며, 결과는 수식화되어 나타내었다.

• 한국안전학회지
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• 제23권1호
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• pp.66-71
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• 2008

$PcFe(4-VP)_2$[Pc: Phthalocyanine, 4-VP: 4-Vinylpyridine]와 $PcFe(VIM)_2$[VIM: 1-Vinylimidazole]의 제조를 재래식 방법인 유기용제 사용에 따른 폭발 및 유해증기 발생 위험성을 차단하기 위해 무용제 방식으로 ligand인 4-VP와 VIM을 반응매체로 하여 PcFe를 밀폐용기에서 용융시키는 새로운 방법을 도입, 제조하여 분말상 진청록색의 물질을 제조하였다. 이들 물질은 $CH_2Cl_2$에 가용성인 $PeFeL_2$형태의 물질이다. 제조된 물질을 ATR-FTIR, UV/Vis, DSC/TGA, Surface Resistivity Meter를 이용하여 분석한 결과 film 상태에서 UV/Vis 차단 특성이 뛰어남과 동시에 대전 방지특성을 나타내며 또한 내열성이 우수한 물질이 제조되어 사용 및 응용이 가능할 것으로 사료된다.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2008년도 추계학술대회 논문집
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• pp.67-70
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• 2008

Biological conversion of biomass into fuels and chemicals requires hydrolysis of the polysaccharide fraction into monomeric sugars. Hydrolysis can be performed enzymatically, and with dilute or concentrate mineral acids. In this study, dilute sulfuric acid used as a catalyst for the hydrolysis of rapeseed straw. The purpose of this study is to optimize the hydrolysis process in a 15ml bomb tube reactor and investigate the effects of the acid concentration, temperature and reaction time on the hemicellulose removal and consequently on the production of sugars (xylose, glucose and arabinose) as well as on the formation of by-products (furfural, 5-hydroxymethylfurfural and acetic acid). Statistical analysis was based on a model composition corresponding to a $3^3$ orthogonal factorial design and employed the response surface methodology (RSM) to optimize the hydrolysis conditions, aiming to attain maximum xylose extraction from hemicellulose of rapeseed straw. The obtained optimum conditions were: acid concentration of 0.77%, temperature of $164^{\circ}C$ with a reaction time of 18min. Under these conditions, 75.94% of the total xylose was removed and the hydrolysate contained 0.65g $L^{-1}$ Glucose, 0.36g $L^{-1}$ Arabinose, 3.59g $L^{-1}$ Xylose, 0.51g $L^{-1}$ Furfural, 1.36g $L^{-1}$ Acetic acid, and 0.08g $L^{-1}$ 5-hydroxymethylfurfural.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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• pp.190-194
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• 2002

In this study, the etching of Au thin films have been performed in an inductively coupled CF4/Cl2/Ar plasma. The etch properties were measured as the CF4 adds from 0 % to 30 % to the Cl2/(Cl2 + Ar) gas mixing ratio of 0.2. Other parameters were fixed at a rf power of 700 W, a dc bias voltage of 150 V, a chamber pressure of 15 mTorr, and a substrate temperature of $30^{\circ}C$. The highest etch rate of the Au thin film was 370 nm/min at a 10 % additive CF4 into Cl2/(Cl2 + Ar) gas mixing ratio of 0.2. The surface reaction of the etched Au thin films was investigated using x-ray photoelectron spectroscopy (XPS) analysis. From x-ray photoelectron spectroscopy (XPS) analysis, the intensities of Au peaks are changed. There is a chemical reaction between Cl and Au. Au-Cl is hard to remove on the surface because of its high melting point and the etching products can be sputtered by Ar ion bombardment. We obtained the cleaned and steep profile.

• 한국전기전자재료학회논문지
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• 제14권9호
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• pp.695-699
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• 2001

Cerium dioxide (CeO$_2$) was used as the intermediate layer between the ferroelectric thin film and Si substrate in a metal-ferroelectric-semiconductor field effect transistor (MFSFET), to improve the interface property by preventing the interdiffusion of the ferroelectric material and the Si substrate. In this study, CeO$_2$ thin films were etched with a CF$_4$/Ar gas combination in inductively coupled plasma (ICP). The maximum etch rate of CeO$_2$ thin films was 270$\AA$/min under CF$_4$/(CF$_4$+Ar) of 0.2, 600 W/-200V, 15 mTorr, and $25^{\circ}C$. The selectivities of CeO$_2$ to PR and SBT were 0.21, 0.25, respectively. The surface reaction in the etching of CeO$_2$ thin films was investigated with x-ray photoelectron spectroscopy (XPS). There is a chemical reaction between Ce and F. Compounds such as Ce-F$_{x}$ remains on the surface of CeO$_2$ thin films. Those products can be removed by Ar ion bombardment. The results of secondary ion mass spectrometry (SIMS) were consistent with those of XPS. Scanning electron microscopy (SEM) was used to examine etched profiles of CeO$_2$ thin films. The etch profile of over-etched CeO$_2$ films with the 0.5${\mu}{\textrm}{m}$ line was approximately 65$^{\circ}$.>.

• 동굴
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• 제82호
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• pp.1-4
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• 2007

In this paper, the etching of Au films using photoresist masks on Si substrates was investigated using a capacitively coupled plasma etch reactor. The advantages of plasma etch techniques over current methods for Au metalization include the ability to simplify the metalization process flow with respect to resist lift-off schemes, and the ability to cleanly remove etched material without sidewall redeposition, as is seen in ion milling. The etch properties were measured for different gas mixing ratios of CF4/Ar, and chamber pressures while the other conditions were fixed. According to statistical design of experiment (DOE), etching process of Au films was characterized and also 20 samples were fabricated followed by measuring etch rate, selectivity and etch profile. There is a chemical reaction between CF4 and Au. Au- F is hard to remove from the surface because of its high melting point. The etching products can be sputtered by Ar ion bombardment.