• Title/Summary/Keyword: Surface reaction controlled

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The Deposition of $SnO_2$ Films by Spray Pyrolysis (분무열분해법에 의한 $SnO_2$ 박막의 증착)

  • Kim, Tae-Heui
    • Solar Energy
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    • v.15 no.2
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    • pp.91-99
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    • 1995
  • The influence of deposition parameters on the deposition of $SnO_2$ thin films by spray pyrolysis has been studied. In the case of spray solution with tile concentration of 0.01M, at low deposition temperature the deposition was controlled by surface reaction and portion controlled by mass transfer is increased with increasing deposition temperature to $400^{\circ}C$. Above $400^{\circ}C$, the deposition is controlled by mass transfer at low spray pressure, and by surface reaction at high spray pressure. As the concentration of spray solution increased the deposition rate increased, and in this experiment the deposition depends on the Rideal-Eley mechanism. The deposition rate increased with increasing substrate temperature up to $400^{\circ}C$ and then decreased due to homogeneous nucleation. The thickness of the deposit increased with increasing spray duration, and the adhesion between substrate and deposit was formed physically.

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Characterization of the Purified Ca-type Bentonil-WRK Montmorillonite and Its Sorption Thermodynamics With Cs(I) and Sr(II)

  • Seonggyu Choi;Bong-Ju Kim;Surin Seo;Jae-Kwang Lee;Jang-Soon Kwon
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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    • v.21 no.4
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    • pp.427-438
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    • 2023
  • Thermodynamic sorption modeling can enhance confidence in assessing and demonstrating the radionuclide sorption phenomena onto various mineral adsorbents. In this work, Ca-montmorillonite was successfully purified from Bentonil-WRK bentonite by performing the sequential physical and chemical treatments, and its geochemical properties were characterized using X-ray diffraction, Brunauer-Emmett-Teller analysis, cesium-saturation method, and controlled continuous acid-base titration. Further, batch experiments were conducted to evaluate the adsorption properties of Cs(I) and Sr(II) onto the homoionic Ca-montmorillonite under ambient conditions, and the diffuse double layer model-based inverse analysis of sorption data was performed to establish the relevant surface reaction models and obtain corresponding thermodynamic constants. Two types of surface reactions were identified as responsible for the sorption of Cs(I) and Sr(II) onto Ca-montmorillonite: cation exchange at interlayer site and complexation with edge silanol functionality. The thermodynamic sorption modeling provides acceptable representations of the experimental data, and the species distributions calculated using the resulting reaction constants accounts for the predominance of cation exchange mechanism of Cs(I) and Sr(II) under the ambient aqueous conditions. The surface complexation of cationic fission products with silanol group slightly facilitates their sorption at pH > 8.

The Adsorption and Decomposition of NO on a Steped ppt(111) Surface

  • Lee, S.B.;Kang, C.Y.;Park, C.Y.;Kwak, H.T.
    • Proceedings of the Korean Vacuum Society Conference
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    • 1995.02a
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    • pp.113-113
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    • 1995
  • The adsorpption and decompposition of NO on a stepped ppt(111) surface have been studied using thermal desorpption sppectroscoppy and Auger electron sppectroscoppy. NO adsorbs molecularly in two different states of the terrace and the stepp, which are distinguishable in thermal desorpption sppectra. NO dissociates via a bent sppecies at the stepp sites on the basis of vibrational sppectrum data repported ppreviously. The dissociation of NO is activation pprocess : the activation energy is estimated to be about 2 kcal/mol. Increase in the NO dissociation with adsorpption tempperature is expplained by a pprocess controlled by different of the dissociated atomic nitrogen from the stepp to the terrace of the surface. In addition to No and N2, the desorpption ppeak of N2O is observed. We conclude that the formation of N2O is attributed to surface reaction of No and N adsorbed on the surface.

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Thr Adsorption and Decomposition of NO on a Stepped Pt(111) Surface

  • Lee, S. B.;Kang, D. H.;Park, C. Y.;Kwak, H. T.
    • Bulletin of the Korean Chemical Society
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    • v.16 no.2
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    • pp.157-163
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    • 1995
  • The adsorption and decomposition of NO on a stepped Pt(111) surface have been studied using thermal desorption spectroscopy and Auger electron spectroscopy. NO adsorbs molecularly in two different states of the terrace and the step, which are distinguishable in thermal desorption spectra. NO dissociates via a bent species at the step sites on the basis of vibrational spectrum data reported previously. The dissociation of NO is an activation process : the activation energy is estimated to be about 2 kcal/mol. Increase in the NO dissociation with adsorption temperature is explained by a process controlled by diffusion of the dissociated atomic nitrogen from the step to the terrace of the surface. In addition to NO and N2, the desorption peak of N2O is observed. We conclude that the formation of N2O is attributed to surface reaction of NO and N adsorbed on the surface.

A Study on the Electrochemical Hydrogenation Reaction Mechanism of the Laves Phase Hydrogen Storage Alloys (Laves phase계 수소저장합금의 전기화학적 수소화 반응 매카니즘에 관한 연구)

  • Lee, Ji-Youl;Kim, Chan-Jung;Kim, Dai-Ryong
    • Transactions of the Korean hydrogen and new energy society
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    • v.8 no.1
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    • pp.31-41
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    • 1997
  • In order to investigate the mechanism of electrochemical hydrogenation reaction on Zr-based Laves phase hydrogen storage alloy electrodes, electrochemical charge/discharge characteristics, potentiostatic/dynamic polarizations and electrocehmical impedance spectroscopy(EIS) of Zr-Ti-Mn-Ni and Zr-Ti-Mn-Ni-M(M=Fe, Co, Al) alloys were examined. Electrochemical discharge capacities of the alloys were quite different with gas charge capacities. Therefore, it was considered that discharge capacities of the alloys depend on electrochemical kinetic factors rather then thermodynamic ones. Discharge efficiencies were increased linearly with exchange current densities. The results of potentiostatic/dynamic polarization measurements showed that electrochemical charge and discharge reaction of Zr-based Laves phase hydrogen storage alloys is controlled by charge transfer process at the electrode surface. The EIS measurements also confirmed this result.

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The Fabrication of the $ZrO_2$ Thin Film by Chemical Vapor Deposition and the Effect of the Reaction Parameters on the Deposition Characteristics (화학증착법에 의한 $ZrO_2$ 박막의 제조 및 반응변수에 따른 증착특성)

  • 최준후;김호기
    • Journal of the Korean Ceramic Society
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    • v.28 no.1
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    • pp.1-10
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    • 1991
  • Zirconium dioxide(ZrO2) thin films have been deposited by chemical vapor deposition technique involving the application of gas mixture of ZrCl4, and H2O into silicon wafers. The relationships between the deposition rate and various reaction parameters such as the deposition time, the gas flow rate, the deposition temperature, and the composition of reactant gases were studied. The film was identified as nearly stoichiometric monoclinic ZrO2. The apparent activation energy is about 19Kcal/mole at surface chemical reaction controlled region. The deposition rate is mainly influenced by the H2O-forming reacting between CO2 and H2.

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Effect of Process Parameters of UV Enhanced Gas Phase Cleaning on the Removal of PMMA (Polymethylmethacrylate) from a Si Substrate

  • Kwon, Sung Ku;Kim, Do Hyun
    • Transactions on Electrical and Electronic Materials
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    • v.17 no.4
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    • pp.204-207
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    • 2016
  • Experimental study of UV-irradiated O2/H2 gas phase cleaning for PMMA (Polymethylmethacrylate) removal is carried out in a load-locked reactor equipped with a UV lamp and PBN heater. UV enhanced O2/H2 gas phase cleaning removes polymethylmethacrylate (PMMA) better at lower process pressure with higher content of H2. O2 gas compete for UV (184.9 nm) absorption with PMMA producing O3, O(1D) and lower dissociation of PMMA. In our experimental conditions, etching reaction of PMMA at the substrate temperature between 75℃ and 125℃ had activation energy of about 5.86 kcal/mol indicating etching was controlled by surface reaction. Above the 180℃, PMMA removal was governed by a supply of reaction gas rather than by substrate temperature.

A Study on the Reaction Force Characteristics of the Gas Spring for the Automotive (자동차용 가스 스프링의 반력 특성에 관한 연구)

  • Lee, Choon Tae
    • Journal of Drive and Control
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    • v.12 no.4
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    • pp.35-40
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    • 2015
  • A gas spring provides support force for lifting, positioning, lowering, and counterbalancing weights. It offers a wide range of reaction force with a flat force characteristic, simple mounting, compact size, speed controlled damping, and cushioned end motion. The most common usage is as a support on a horizontally hinged automotive tail gate. However, its versatility and ease of use has been applied in many other industrial applications ranging from office equipment to off-road vehicles. The cylinder of a gas spring is filled with compressed nitrogen gas, which is applied with equal pressure on both sides of the piston. The surface area of the rod side of the piston is smaller than the opposite side, producing a pushing force. The magnitude of the reaction force is determined by the cross-sectional area of the piston rod and the internal pressure inside the cylinder. The reaction force is influenced by many design parameters such as initial chamber volume, diameter ratio, etc. In this paper, we investigated the reaction force characteristics and carried out parameter sensitivity analysis for the design parameters of a gas spring.

Nanomachining on Single Crystal Silicon Wafer by Ultra Short Pulse Electrochemical Oxidation based on Non-contact Scanning Probe Lithography (비접촉 SPL기법을 이용한 단결정 실리콘 웨이퍼 표면의 극초단파 펄스 전기화학 초정밀 나노가공)

  • Lee, Jeong-Min;Kim, Sun-Ho;Kim, Tack-Hyun;Park, Jeong-Woo
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.20 no.4
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    • pp.395-400
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    • 2011
  • Scanning Probe Lithography is a method to localized oxidation on single crystal silicon wafer surface. This study demonstrates nanometer scale non contact lithography process on (100) silicon (p-type) wafer surface using AFM(Atomic force microscope) apparatuses and pulse controlling methods. AFM-based experimental apparatuses are connected the DC pulse generator that supplies ultra short pulses between conductive tip and single crystal silicon wafer surface maintaining constant humidity during processes. Then ultra short pulse durations are controlled according to various experimental conditions. Non contact lithography of using ultra short pulse induces electrochemical reaction between micro-scale tip and silicon wafer surface. Various growths of oxides can be created by ultra short pulse non contact lithography modification according to various pulse durations and applied constant humidity environment.

A Kinetic Study on the Electrodeposition of Ni-Zn-P Ternary Alloys onto a Steel (강상에 니켈-아연-인 삼원 합금도금에 관한 속도론적 연구)

  • 안종관;이응조
    • Journal of the Korean institute of surface engineering
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    • v.28 no.4
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    • pp.199-206
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    • 1995
  • A kinetic study on the electrodeposition of Ni-Zn-P ternary alloys onto a steel in chloride solutions was carried out using a rotating disc electrode. The coatings were characterized using SEM/EPMA and A. A. analysis. The results showed that the plating rates of three components were increased with applied potential, disc rotating speed and temperature. The activation energies of Ni, Zn and P of the coatings were 6.1, 5.1 and 8.0 kcal/mole respectively. Therefore, the deposition rates were controlled partly by surface electrochemical reaction and partly by mass transport. As the potential, temperature of bath and rotating speed of cathode disc were raised, the vol. % ratios of Ni and P of coating layer were increased but that of Zn decreased. The effect of coating parameters on the surface morphology was also examined.

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