• Title/Summary/Keyword: Surface patterning

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Deposition of Poly(3-hexylthiophene)(P3HT) by Vapor Deposition and Patterning Using Self-Assembled Monolayers (Oxide 표면에 Self-Assembly Monolayers를 이용한 전도성 고분자 Poly(3-hexylthiophene)(P3HT) 증착 및 Patterning 연구)

  • Pang, Il-Sun;Kim, Hyun-Ho;Kim, Sung-Soo;Lee, Jae-Gab
    • Korean Journal of Materials Research
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    • v.18 no.12
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    • pp.664-668
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    • 2008
  • Vapor phase polymerization of a conductive polymer on a $SiO_2$ surface can offer an easy and convenient means to depositing pure and conductive polymer thin films. However, the vapor phase deposition is generally associated with very poor adhesion as well as difficulty when patterning the polymer thin film onto an oxide dielectric substrate. For a significant improvement of the patternability and adhesion of Poly(3-hexylthiophene) (P3HT) thin film to a $SiO_2$ surface, the substrate was pre-patterned with n-octadecyltrichlorosilane (OTS) molecules using a ${\mu}$-contact printing method. The negative patterns were then backfilled with each of three amino-functionalized silane self-assembled monolayers (SAMs) of (3-aminopropyl) trimethoxysilane (APS), N-(2-aminoethyl)-aminopropyltrimethoxysilane (EDA), and (3- trimethoxysilylpropyl)diethylenetriamine (DET). The quality and electrical properties of the patterned P3HT thin films were investigated with optical and atomic force microscopy and a four-point probe. The results exhibited excellent selective deposition and significantly improved adhesion of P3HT films to a $SiO_2$ surface. In addition, the conductivity of polymeric thin films was relatively high (${\sim}13.51\;S/cm$).

Laser patterning process for a-Si:H single junction module fabrication (레이저 가공에 의한 비정질 실리콘 박막 태양전지 모듈 제조)

  • Lee, Hae-Seok;Eo, Young-Joo;Lee, Heon-Min;Lee, Don-Hee
    • 한국신재생에너지학회:학술대회논문집
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    • 2007.11a
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    • pp.281-284
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    • 2007
  • Recently, we have developed p-i-n a-Si:H single junction thin film solar cells with RF (13.56MHz) plasma enhanced chemical vapor deposition (PECVD) system, and also successfully fabricated the mini modules ($>300cm^2$), using the laser patterning technique to form an integrated series connection. The efficiency of a mini module was 7.4% ($Area=305cm^2$, Isc=0.25A, Voc=14.74V, FF=62%). To fabricate large area modules, it is important to optimise the integrated series connection, without damaging the cell. We have newly installed the laser patterning equipment that consists of two different lasers, $SHG-YVO_4$ (${\lambda}=0.532{\mu}m$) and YAG (${\lambda}=1.064{\mu}m$). The mini-modules are formed through several scribed lines such as pattern-l (front TCO), pattern-2 (PV layers) and pattern-3 (BR/back contact). However, in the case of pattern-3, a high-energy part of laser shot damaged the textured surface of the front TCO, so that the resistance between the each cells decreases due to an incomplete isolation. In this study, the re-deposition of SnOx from the front TCO, Zn (BR layer) and Al (back contact) on the sidewalls of pattern-3 scribed lines was observed. Moreover, re-crystallization of a-Si:H layers due to thermal damage by laser patterning was evaluated. These cause an increase of a leakage current, result in a low efficiency of module. To optimize a-Si:H single junction thin film modules, a laser beam profile was changed, and its effect on isolation of scribed lines is discussed in this paper.

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Patterning of conducting polymer at micron- scale using a selective surface treatment

  • Lee, Kwang-Ho;Kim, Sang-Mook;Kim, Ki-Seok;Song, Sun-Sik;Kim, Eun-Uk;Jung, Hee-Soo;Kim, Jin-Ju;Jung, Gun-Young
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.834-836
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    • 2008
  • We demonstrated micro-scale conducting polymer patterning based on a selective surface treatment. A substrate with a patterned photoresist was immersed into OTS (Octadecyltrichlosilnae) solution. The protected substrate areas were hydrophilic after removing the PR resist, where a conducting polymer solution was coated selectively by spin-coating method.

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Polyimide Surface Modifying using Near-Atmospheric Pressure Plasma for Inkjet Printing (준 대기압 플라즈마를 이용한 잉크젯 프린팅용 폴리이미드 표면 개질)

  • Mun, Mu-Gyeom;Yeom, Geun-Yeong
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2014.11a
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    • pp.16-16
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    • 2014
  • 본 논문에서는 polymer 기판 위에 direct inkjet patterning을 효율적으로 수행하기 위하여 기판 표면의 chemical bonding과 morphology를 in-line system 적용이 가능한 near atmospheric pressure plasma (N-APP)를 이용 하여 기판을 modifying 시켰다. modified substrate 위에 inkjet printing을 이용하여 metal interconnection을 하였다. 그 결과 기존 기판에서의 line width 보다 얇은 선폭을 획득 하였고 adhesion이 향상 되었다.

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Surface modification of Poly-(dimethylsiioxane) using polyelectrolYte multilayers and its characterization (다층의 고분자 전해질을 이용한 Poly-(dimetnylsiloxane)의 표면 개질 및 특성)

  • Shim, Hyun-Woo;Lee, Chang-Hee;Lee, Ji-Hye;Hwang, Taek-Sung;Lee, Chang-Soo
    • KSBB Journal
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    • v.23 no.3
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    • pp.263-270
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    • 2008
  • A poly-(dimethylsiloxane) (PDMS) surface modified by the successive deposition of the polyelectrolytes, poly-(allylamine hydrochloride) (PAH), poly-(diallyldimethylammoniumchloride) (PDAC), poly-(4-ammonium styrenesulfonic acid) (PSS), and poly-(acrylic acid) (PAA), was presented for the application of selective cell immobilization. It is formed via electrostatic attraction between adjacent layers of opposite charge. The modified PDMS surface was examined using static contact angle measurements and fourier transform infrared (FT-IR) spectrophotometer. The wettability of the PDMS surface could be easily controlled and functionalized to be biocompatible through regulation of layer numbers. The modified PDMS surface provides appropriate environment for adhesion to cells, which is essential technology for cell patterning with high yield and viability in the patterning process. This method is reproducible, convenient, and rapid. It could be applied to the fabrication of biological sensing, patterning, microelectronics devices, screening system, and study of cell-surface interaction.

Cell Patterning on Various Substrates Using Polyelectrolyte Multilayer and Microstructure of Poly(Ethylene Glycol) (다양한 기판 위에서 고분자 전해질 다층 막과 폴리에틸렌글리콜 미세 구조물을 이용한 세포 패터닝 방법)

  • Shim, Hyun-Woo;Lee, Ji-Hye;Choi, Ho-Suk;Lee, Chang-Soo
    • Korean Chemical Engineering Research
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    • v.46 no.6
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    • pp.1100-1106
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    • 2008
  • In this study, we presented rapid and simple fabrication method of functionalized surface on various substrates as a universal platform for the selective immobilization of cells. The functionalized surface was achieved by using deposition of polyelectrolyte such as poly(allyamine hydrochloride) (PAH), poly(diallyldimethyl ammonium chloride) (PDAC), poly(4-ammonium styrene sulfonic acid) (PSS), poly(acrylic acid) (PAA) and fabrication of poly(ethylene glycol) (PEG) microstructure through micro-molding in capillaries (MIMIC) technique on each glass, poly(methyl methacrylate) (PMMA), polystyrene (PS) and poly(dimethyl siloxane) (PDMS) substrate. The polyelectrolyte multilayer provides adhesion force via strong electrostatic attraction between cell and surface. On the other hand, PEG microstructures also lead to prevent non-specific binding of cells because of physical and biological barrier. The characteristic of each modified surface was examined by using static contact angle measurement. The modified surface onto several substrates provides appropriate environment for cellular adhesion, which is essential technology for cell patterning with high yield and viability in the micropatterning technology. The proposed method is reproducible, convenient and rapid. In addition, the fabrication process is environmentally friendly process due to the no use of harsh solvent. It can be applied to the fabrication of biological sensor, biomolecules patterning, microelectronics devices, screening system, and study of cell-surface interaction.

A Study on the Characteristics of the Functional Groups of the Alkanethiol Molecules in UV Laser Photochemical Patterning and Wet Etching Process (UV Laser를 이용한 광화학적 패터닝과 습식에칭에 따른 알칸티올 분자 작용기의 특성 연구)

  • Huh, Kab-Soo;Chang, Won-Seok
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.5
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    • pp.104-109
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    • 2007
  • Photochemical patterning of self-assembled mono layers (SAMs) has been performed by diode pumped solid state (DPSS) 3rd harmonic Nd:$YVO_4$ laser with wavelength of 355 nm. SAMs patternings of parallel lines have subsequently been used either to generate compositional chemical patterns or fabricate microstructures by a wet etching. This paper describes a selective etching process with patterned SAMs of alkanetiolate molecules on the surface of gold. SAMs formed by the adsorption of alkanethiols onto gold substrate employs as very thin photoresists. In this paper, the influence of the interaction between the functional group of SAMs and the etching solution is studied with optimal laser irradiation conditions. The results show that hydrophobic functional groups of SAMs are more effective for selective chemical etching than the hydrophilic ones.

Nanopatterning of Self-assembled Transition Metal Nanostructures on Oxide Support for Nanocatalysts

  • Van, Trong Nghia;Park, Jeong-Young
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.211-211
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    • 2011
  • Nanostructures, with a diversity of shapes, built on substrates have been developed within many research areas. Lithography is one powerful, but complex, technique to make structures at the nanometer scale, such as platinum nanowires for studying CO catalytic reactions [1], or aluminum nanodisks for studying the plasmon effect [2]. In this work, we approach a facile method to construct nanostructures using noble metals on a titania thin film by using self-assembled structures as a pattern. Here, a large-scale silica monolayer is transferred to the titania thin film substrates using a Langmuir-Blodgett trough, followed by the deposition of a thin transition metal layer. Owing to the hexagonal close-packed structure of the silica monolayer, we would obtain a metal nanostructure that includes separated metallic triangles (islands) after removing the patterning silica beads. This nanostructure can be employed to investigate the role of metal-oxide interfaces in CO catalytic reactions by changing the patterning silica particles with different sizes or by replacing the oxide support. The morphology and chemical composition of the structure can be characterized by scanning electron microscopy, atomic force microscopy and X-ray photoelectron spectroscopy. In addition, we modify these islands to a connected island structure by reducing the silica size of the patterning monolayer, which is utilized to generating hot electron flow based on the localized surface plasmon resonance effect of the metal nanostructures.

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Fabrication of a Hybrid Superhydrophobic/superhydrophilic Surface for Water Collection: Gravure Offset Printing & Colloidal Lithography (수분수집을 위한 초발수/초친수 복합 표면 제작: 그라비아 옵셋 프린팅과 콜로이달 리소그래피 공정)

  • Ji, Seung-Muk;Kim, In-Young;Kim, Eun-Hee;Jung, Jie-Un;Kim, Wan-Doo;Lim, Hyun-Eui
    • Journal of the Korean Society for Precision Engineering
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    • v.29 no.1
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    • pp.19-24
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    • 2012
  • We demonstrate the desert beetle back mimicking hybrid superhydrophilic/superhydrophobic patterned surface by using the combination method of colloidal lithography and gravure offset printing for nano and micro patterning, respectively. The two methods are cost-effective and industrially available techniques compared to the other nano/micro patterning methods. To verify the water collecting function of the hybrid surface, the water condensation behavior is investigated on the chilled surface in ambient temperature and high humidity. Due to the synergetic effect of drop and film wise condensation, the hybrid superhydrophobic/superhydrophilic surface shows the higher efficiency than one of single wettability surfaces. The work is underway to get the good patterns of hybrid surfaces for water collecting from the dew or fog.