• 제목/요약/키워드: Surface patterning

검색결과 287건 처리시간 0.028초

X-선 노광용 마스크 제작공정에 관한 연구 (A Study on the Mask Fabrication Process for X-ray Lithography)

  • 박창모;우상균;이승윤;안진호
    • 마이크로전자및패키징학회지
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    • 제7권2호
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    • pp.1-6
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    • 2000
  • X-선 노광용 마스크의 재료로서 SiC와 Ta박막을 각각 ECR플라즈마 CVD, 스퍼터링 장비를 이용하여 증착한 뒤 잔류응력, 미세구조, 표면상태, 그리고 화학적 결합상태 등을 조사하였고, ECR etching system을 이용하여 Ta박막 미세 식각 특성을 연구하였다. SiC박막은 $N_2$분위기에서 RTA를 통하여 X-선 투과막 물질로서 필요한 적절한 인장응력을 변화 시킬 수 있었고, 공정 압력을 조절하여 증착한 Ta박막은 높은 밀도와 우수한 표면 평활도를 가지고 시간과 온도에 따른 응력의 안정성이 좋은 X-선 흡수체를 증착할 수 있었다. 또한 Cl 플라즈마는 흡수체 물질 Ta에 대해 좋은 식각특성을 보였고, two-step 식각을 통해 microloading effect를 억제함으로써 0.2 $\mu\textrm{m}$이하의 미세패턴을 식각해 낼 수 있었다.

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Gradual modification of Nanoimprint Patterns by Oxygen Plasma Treatment

  • Kim, Soohyun;Kim, Da Sol;Park, Dae Keun;Yun, Kum-Hee;Jeong, Mira;Lee, Jae Jong;Yun, Wan Soo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.233-233
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    • 2015
  • We report on a simple method for inducing physical and chemical property-gradient on nanoimprinted patterns by intensity-regulated plasma treatment under caved sample stage. As for the size gradient, a line pattern having a linewidth of 294.9 nm was etched to have gradually varying width from 277.4 nm to 147.9 nm. Modified pattern was proven to be adaptable to replica stamp for reversal patterning. To investigate the wettability gradient, imprinted nanopatterns were coated with fluoroalkylsilane to increase the hydrophobicity, and the surface was modified to have gradually varying wettability from hydrophobic to hydrophilic (contact angle was ${\sim}160^{\circ}$ to ${\sim}5^{\circ}$ on a single chip). This method is expected to be applicable to the selective adsorption of biological entities and hydrodynamic manipulation of liquid droplets for the pumpless microfluidics.

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Photoinitiator-free Photosensitive Polyimide Gate Insulator for Organic Thin Film Transistor

  • Pyo, Seung-Moon;Lee, Moo-Yeol;Jeon, Ji-Hyun;Son, Hyun-Sam;Yi, Mi-Hye
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.885-888
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    • 2004
  • We have prepared and investigated the properties of photoinitiator-free photosensitive polyimide gate insulatos for organic thin-film transistors (OTFTs). The precursor was prepared from a dianhydride, 3,3',4,4'-Benzophenone tetracarboxylic dianhydride (BTDA) and novel aromatic diamine, 7-(3,5-diaminobenzoyloxy) coumarine (DA-CM). Photo-patternability of the polyimide precursor film and surface morphology of the films before and after photo-patterning process were investigated and negative pattern with a resolution of 50 ${\mu}m$ was obtained nicely. In addition, we have fabricated OTFTs with pentacene and photosensitive polyimide as a semiconductor and a gate insulator; respectively. According to the device geometry, the ${\mu}$, current modulation ratio and subthreshold swing of the devices were around 0.2${\sim}$0.4 $cm^2$/Vs, more than $10^5$ and around 3${\sim}$5 V/dec, respectively.

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인쇄 롤의 간접식 레이저 가공을 위한 코팅과 에칭 기술 (Coating and Etching Technologies for Indirect Laser processing of Printing Roll)

  • 이승우;김정오;강희신
    • 한국레이저가공학회지
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    • 제16권4호
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    • pp.12-16
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    • 2013
  • For mass production of electronic devices, the processing of the printing roll is one of the most important key technologies for printed electronics technology. A roll of printing process, the gravure printing that is used to print the electronic device is most often used. The indirect laser processing has been used in order to produce printing roll for gravure printing. It consists of the following processing that is coating of photo polymer or black lacquer on the surface of printing roll, pattering using a laser beam and etching process. In this study, we have carried out study on the coating and etching for $25{\mu}m$ line width on the printing roll. To do this goals, a $4{\mu}m$ coating thickness and 20% average coating thickness of the coating homogeneity of variance is performed. The factors to determine the thickness and homogeneity are a viscosity of coating solution, the liquid injection, the number of injection, feed rate, rotational speed, and the like. After the laser patterning, a line width of $25{\mu}m$ or less was confirmed to be processed through etching and the chromium plating process.

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펨토초 레이저를 이용한 실리콘 웨이퍼 표면 미세가공 특성 (Micromachining of the Si Wafer Surface Using Femtoseocond Laser Pulses)

  • 김재구;장원석;조성학;황경현;나석주
    • 한국정밀공학회지
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    • 제22권12호
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    • pp.184-189
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    • 2005
  • An experimental study of the femtosecond laser machining of Si materials was carried out. Direct laser machining of the materials for the feature size of a few micron scale has the advantage of low cost and simple process comparing to the semiconductor process, E-beam lithography, ECM and other machining process. Further, the femtosecond laser is the better tool to machine the micro parts due to its characteristics of minimizing the heat affected zone(HAZ). As a result of line cutting of Si, the optimal condition had the region of the effective energy of 2mJ/mm-2.5mJ/mm with the power of 0.5mW-1.5mW. The polarization effects of the incident beam existed in the machining qualities, therefore the sample motion should be perpendicular to the projection of the electric vector. We also observed the periodic ripple patterns which come out in condition of the pulse overlap with the threshold energy. Finally, we could machined the groove with the linewidth of below $2{\mu}m$ for the application of MEMS device repairing, scribing and arbitrary patterning.

Local Back Contact Formed by Screen Printing and Atomic Layer Deposited Al2O3 for Silicon Solar Cell

  • 조영준;장효식
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.687-687
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    • 2013
  • In rearpoint contact solar cell and the PERC (passivated emitter rear contact) type cell, surfaces were passivated by SiO2 or Al2O3 to increase solar cell efficiency. Therefore, we have investigated the effect of surface passivation for crystalline silicon solarcell using mass-production atomic layer deposited (ALD) Al2O3. The patttern which consists of cylinders with 100um diameter and 5um height was formed by PR patterning on Si (100) substrate and then Al2O3 of about 10nm and 20nm thickness was deposited by ALD. The pattern in 10 nm Al2O3 film was removed by dipping in aceton solution for about 10 min but the pattern in 20 nm Al2O3 film was not. The influences of process temperature and heat treatment were investigated using microwave photoconductance decay (PCD) and Quasi-Steady-State photoconductance (QSSPC). The solar cell process used in this work combines the advantage of using the applicability of a selective deposition associated with a ALD passivation and the use of low-cost screen print for the contacts formation.

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줄기세포 연구의 현황과 의공학 기술과의 접목 (Current Status of Stem cell Research and its Connection with Biomedical Engineering Technologies)

  • 박용두
    • 대한의용생체공학회:의공학회지
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    • 제31권2호
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    • pp.87-93
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    • 2010
  • Researches for stem cells have been focused on scientists in biomedical sciences as well as clinical application for its great therapeutic potentials. Stem cells have two distinct characteristics: self-renewal and differentiation. In this short review, the links between stem cell research and biomedical engineering is discussed based on the basic characteristics of stem cells. This concept can be extended to the fundamental questions of biological sciences for cells such as proliferation, apoptosis, differentiation, and migration. For understanding proliferation and apoptosis of stem cells, techniques from biomedical engineering such as surface patterning, MEMS, nanotechnologies have been used. The advanced technologies such as microfluidic technologies, three dimensional scaffold fabrication, and mechanical/electrical stimulation have also been used in cell differentiation and migration. Basic and unsolved questions in the stem cell research field have limitations by studying conventional technologies. Therefore, the strategic fusion between stem cell biology and novel biomedical engineering field will break the barriers for understanding fundamental questions of stem cells, which can open the window for the clinical applications of stem cell based therapeutics as well as regeneration of damaged tissues.

원자힘 현미경의 습도 조절에 의한 그래핀 국소 산화 (Humidity dependent size control of local anodic oxidation on graphene using Atomic Force Microscope)

  • 고석남;이성준;손맹호;안도열;이승웅
    • 한국방송∙미디어공학회:학술대회논문집
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    • 한국방송공학회 2014년도 추계학술대회
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    • pp.226-227
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    • 2014
  • We demonstrate nanoscale local anodic oxidation (LAO) patterning on few layer graphene using atomic force microscope (AFM) at room temperature and normal atmosphere. We focus on the humidity dependency in nanoscale oxidation of graphene. The relationship between the oxidation size and the AFM setting values, such as set point, tip speed, and humidity are observed. By changing these values, proper parameters were found to produce features on demand size. This technique provides an easy way to form graphene oxide lithography without any chemical resists. We have obtained oxidation size down to 50-nm with 6-nm-height oxide barrier line with $0.1{\mu}m/s$ tip scanning speed and micrometer size symbols on a graphene flake. We attribute the bumps to local anodic oxidation on graphene surface and combination of oxygen ions into the graphene lattice.

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Oligothiophene-based Semi-Conducting Nanostructures: from Solution to Solid-State Aggregates

  • Leclere, Ph.;Surin, M.;Lazzaroni, R.;Feast, W.J.;Schenning, A.P.H.J.;Meijer, E.W.
    • 한국고분자학회:학술대회논문집
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    • 한국고분자학회 2006년도 IUPAC International Symposium on Advanced Polymers for Emerging Technologies
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    • pp.304-304
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    • 2006
  • The possibility to develop optoelectronic devices with improved properties by controlling the degree of organization at the molecular level of organic materials has been driving the design of new ${\pi}-conjugated$ systems. In particular, the organization by self-assembling processes (${\tilde{\Box}}{\d{\Box}}}$ interactions, hydrogen bonding) of well-defined oligomeric systems such as disubstituted oligothiophene derivatives has been demonstrated as a promising approach to conjugated materials with a high degree of structural order of the constituent building blocks. The self-organization of conjugated building blocks in solution or on surfaces, leading to the construction of nanoscopic and mesoscopic architectures, represents a starting point for the construction of molecular electronics or even circuits, through surface patterning with nanometer-sized objects.

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The Effect of Cr Dosage on FePt Nanoparticle Formation

  • Won, C.;Keavney, D.J.;Divan, R.;Bader, S.D.
    • Journal of Magnetics
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    • 제11권4호
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    • pp.182-188
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    • 2006
  • The search for high-density recording materials has been one of most active and vigorous field in the field of magnetism. $FePt-L1_{0}$ nanoparticle has emerged as a potential candidate because of its high anisotropy. In this paper, we provide an overview of recent work at Argonne National Laboratory that contributes to the ongoing dialogue concerning the relation between structure and properties of the FePt nanoparticle system. In particular we discuss the ability to control structure and properties via dosing with Cr. Cr-dosed FePt films were grown via molecular beam epitaxy and annealed at $550^{\circ}C$ in an ultrahigh vacuum chamber, and were studied with the surface magneto-optic Kerr effect (SMOKE), scanning electron microscopy (SEM) and x-ray magnetic circular dichroism (XMCD). We found that small dosage of Cr helps to generate $L1_{0}$ phase FePt magnetic nanoparticles with small size, defined shape and regular spatial distribution on MgO (001) substrate. The nanostructures are ferromagnetic with high magnetic coercivity (${\sim}0.9T$) and magnetic easy axis in the desired out-of-plane orientation. We also show that controlling the lateral region where nanostructures exist is possible via artificial patterning with Cr.