Photoinitiator-free Photosensitive Polyimide Gate Insulator for Organic Thin Film Transistor

  • Pyo, Seung-Moon (Polymeric nanomaterials lab., Korea research institute of chemical technology) ;
  • Lee, Moo-Yeol (Polymeric nanomaterials lab., Korea research institute of chemical technology) ;
  • Jeon, Ji-Hyun (Polymeric nanomaterials lab., Korea research institute of chemical technology) ;
  • Son, Hyun-Sam (Polymeric nanomaterials lab., Korea research institute of chemical technology) ;
  • Yi, Mi-Hye (Polymeric nanomaterials lab., Korea research institute of chemical technology)
  • Published : 2004.08.23

Abstract

We have prepared and investigated the properties of photoinitiator-free photosensitive polyimide gate insulatos for organic thin-film transistors (OTFTs). The precursor was prepared from a dianhydride, 3,3',4,4'-Benzophenone tetracarboxylic dianhydride (BTDA) and novel aromatic diamine, 7-(3,5-diaminobenzoyloxy) coumarine (DA-CM). Photo-patternability of the polyimide precursor film and surface morphology of the films before and after photo-patterning process were investigated and negative pattern with a resolution of 50 ${\mu}m$ was obtained nicely. In addition, we have fabricated OTFTs with pentacene and photosensitive polyimide as a semiconductor and a gate insulator; respectively. According to the device geometry, the ${\mu}$, current modulation ratio and subthreshold swing of the devices were around 0.2${\sim}$0.4 $cm^2$/Vs, more than $10^5$ and around 3${\sim}$5 V/dec, respectively.

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