• Title/Summary/Keyword: Surface electronic structure

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Relationship Between the Structure and the Superconductivity in LaFeAsO

  • Jung, Dongwoon;Cho, Sungwoo;Lee, In-Ja
    • Bulletin of the Korean Chemical Society
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    • v.34 no.3
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    • pp.912-916
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    • 2013
  • The electronic structure of LaFeAsO was analyzed by tight-binding band calculation based upon the normal and shrunk lattices. A strong Fermi surface nesting was found in the normal LaFeAsO, while most of the nesting area was disappeared in the shrunk LaFeAsO. It was found, therefore, high pressure atmosphere is required to become a superconductor for LaFeAsO by suppressing the SDW (spin density wave) state through the disappearance of the Fermi surface nesting.

The electronic structure of the ion-beam-mixed Pt-Cu alloys by XPS and XANES

  • Lim, K.Y.;Lee, Y.S.;Chung, Y.D.;Lee, K.M.;Jeon, Y.;Whang, C.N.
    • Proceedings of the Korean Vacuum Society Conference
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    • 1998.02a
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    • pp.133-133
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    • 1998
  • In the thin film alloy formation of the transition metals ion-beam-mixing technique forms a metastable structure which cannot be found in the arc-melted metal alloys. Sppecifically it is well known that the studies about the electronic structure of ion-beam-mixed alloys pprovide the useful information in understanding the metastable structures in the metal alloy. We studied the electronic change in the ion-beam-mixed ppt-Ct alloys by XppS and XANES. These analysis tools pprovide us information about the charge transfer in the valence band of intermetallic bonding. The multi-layered films were depposited on the SiO2 substrate by the sequential electron beam evapporation at a ppressure of less than 5$\times$10-7 Torr. These compprise of 4 ppairs of ppt and Cu layers where thicknesses of each layer were varied in order to change the alloy compposition. Ion-beam-mixing pprocess was carried out with 80 keV Ae+ ions with a dose of $1.5\times$ 1016 Ar+/cm2 at room tempperature. The core and valence level energy shift in these system were investigated by x-ray pphotoelectron sppectroscoppy(XppS) pphotoelectrons were excited by monochromatized Al K a(1486.6 eV) The ppass energy of the hemisppherical analyzer was 23.5 eV. Core-level binding energies were calibrated with the Fermi level edge. ppt L3-edge and Cu K-edge XANES sppectra were measured with the flourescence mode detector at the 3C1 beam line of the ppLS (ppohang light source). By using the change of White line(WL) area of the each metal sites and the core level shift we can obtain the information about the electrons pparticippating in the intermetallic bonding of the ion-beam-mixed alloys.

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Photocharge Voltage Measurement on the $LiNbO_3$ Wafers by Using the Laser Beam (레이저빔을 이용한 $LiNbO_3$ 웨이퍼의 광-전하 전압 측정)

  • Park Jong-Duck;Joo Chang-Bok;Park Nam-Chun
    • Proceedings of the Acoustical Society of Korea Conference
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    • spring
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    • pp.385-388
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    • 2000
  • Electromagnet ic wave falling on solid surface acts on the medium with a force. This force brings about a redistribution of surface charges and the surface potential is varied. By measuring this potential variations, the surface electrical properties on conductors, semicionductors and dielectrics can be tested. In this paper, two dimensional photocharge voltage on the $LiNbO_3$ wafer induced by He-Ne laser beam, the temperature characteristics and the capacitive coupling test structure for the photocharge voltage measurement for the dielectrical materials are shown.

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Analysis of Chemical and Morphological Changes of Phenol Formaldehyde-based Photoresist Surface caused by O2 Plasma

  • Shutov, D.A.;Kang, Seung-Youl;Baek, Kyu-Ha;Suh, Kyung-Soo;Min, Nam-Ki;Kwon, Kwang-Ho
    • Transactions on Electrical and Electronic Materials
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    • v.8 no.5
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    • pp.211-214
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    • 2007
  • Chemical and morphological changes of phenol formaldehyde-based photoresist after $O_2$ radiofrequency(RF) plasma treatment depending on exposure time and source power were investigated. It was found that etch rate of photoresist sharply increased after discharge turn on and reached a limit with increase in plasma exposure time. Contact angle measurements and X-ray photoelectron spectroscopy(XPS) analysis showed that the surface chemical structure become nearly constant after 15 sec of the treatment. Atomic force microprobe(AFM) measurements were shown that surface roughness was increased with plasma exposure time.

Surface Morphological Evolution of (0001) α-Al2O3 Substrate During Low Temperature Annealing (저온 열처리 과정에서 일어나는 (0001) α-Al2O3 기판 표면의 형상 변화)

  • Lee, Geun-Hyoung
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.11
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    • pp.859-863
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    • 2010
  • Evolution of surface morphology of ${\alpha}-Al_2O_3$ substrate was investigated as a function of annealing temperature and time. Commercial (0001) ${\alpha}-Al_2O_3$ single crystal substrates were annealed in the range of $600-1000^{\circ}C$ in air. At $600^{\circ}C$, step-terrace structure started to be formed on the substrate. However, the surface roughness on the terrace was still considerable and a number of islands were observed on the step edges as well as the terraces. As the annealing temperature increased, the islands were absorbed into the step edges. Thus the terraces were smoother and the step edges were more straightened. Well-defined surface with a step height of 0.2 nm was formed above $900^{\circ}C$. On the other hand, when the substrate was annealed at a fixed temperature of $1000^{\circ}C$, the change of surface morphology was observed for the substrate annealed for 10 min. After the annealing for 30 min, the surface on which any islands could not survive was observed.

Microsturctures of copper thin films sputtered onto polyimide (폴리이미드 위에 스퍼터 증착된 구리 박막의 미세구조)

  • Chung, Tae-Gyeong;Kim, Young-Ho;Yu, Jin
    • Journal of the Korean institute of surface engineering
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    • v.25 no.2
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    • pp.90-96
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    • 1992
  • Thed effects of sputter gas pressure and substrate surface micro-roughness on the microstructure and surface topography have been investigated in the Cu thin films sputter deposited onto polyimide substrates. The surface roughness of polyimide was controlled by oxygen rf plasma treatment. In the Cu film deposited at the pressure of 5 mtorr, the surface is smooth and the columnar structure is not visible regardless of polyimide surface more open boundaries. The polyimide surface roughness enhances these effects, These phenomena can be explained in therm of atomic shadowing effect.

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The property of surface morphology of AZO films deposited at low temperature with post-annealing (저온증착 AZO 박막의 분위기 후열처리에 따른 표면 형상 특성)

  • Jeong, Yun-Hwan;Chen, Ho;Song, Min-Jong;Park, Choon-Bae
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.417-418
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    • 2008
  • Transparent conductive oxide (TCO) are necessary as front electrode or anti-reflecting coating for increasing efficiency of LED and Photodiode. In this paper, aluminum-doped Zinc oxide films(AZO) were prepared by DC magnetron sputtering on glass(corning 1737) and Si substrate at temperature of $100^{\circ}C$ and then annealed at temperature of $400^{\circ}C$ for 1hr in Ar and vaccum. The AZO films were etched in diluted HCL (0.5 %) to examine the surface morphology properties. After annealing, Structural and electrical property were investigated. The c-axis orientation along (002) plane was enhanced and the electrical resistivity of the AZO film decreased from $1.1\times10^{-1}$ to $1.6\times10^{-2}{\Omega}cm$. We observed textured structure of AZO thin film etched for 2s.

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Silver Nanowire-based Stretchable and Transparent Electrodes (Silver Nanowire 기반 Stretchable 투명 전극)

  • Lee, Jin-Young;Kim, Su-Yeon;Jeong, Da-Hye;Shin, Dong-Kyun;Yoo, Su-Ho;Seo, Hwa-Il;Park, Jong-Woon
    • Journal of the Semiconductor & Display Technology
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    • v.14 no.3
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    • pp.51-55
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    • 2015
  • We have fabricated silver nanowire (AgNW) films as a stretchable and transparent electrode on polydimethylsiloxane (PDMS) substrates using a spray coater. Inherently, they show poor surface roughness and stretchability. To tackle it, we have employed a conductive polymer, poly (3,4-ethylenedioxythiophene) : Poly(styrene sulfonate) (PEDOT : PSS). PEDTO : PSS solution is mixed with AgNWs or spin-coated on the AgNW film. Compared with AgNW film only, PEDOT : PSS film only, and polymer-mixed AgNW films, the AgNW/polymer bilayer films exhibit much better surface roughness and stretchability. It is found that spray-coating of AgNWs on uncured PDMS and spin-coating of PEDOT : PSS solution on the AgNW films enhance the surface roughness of electrodes. Such a bilayer structure also provides a stable resistance under tensile strain due to the fact that each layer acts as a detour route for carriers. With this structure, we have obtained the peak-to-peak roughness ($R_{pv}$) as low as 76.8nm and a moderate increase of sheet resistance (from $10{\Omega}/{\Box}$ under 0% strain to $30{\Omega}/{\Box}$ under 40% strain).