• 한국결정성장학회지
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• 제29권6호
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• pp.294-297
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• 2019

New insights about macro-step formation has been investigated. The phenomena of surface instability caused by the interaction between step flow and fluid flow was describe in mechanical way. The rotation of the seed crystal in a clockwise direction was applied with a speed varied from 30 to 200 rpm during the TSSG process on the Si- and C-faces 4H-SiC. The macro-steps were formed along the two specific directions at different locations on the crystal for each, i.e., [10-10] or [01-10] directions or both. From the results, it is suggested that the macro-steps were generated from the micro-steps by interaction between step flow and fluid flow during the rotation of seed crystal. Furthermore, The fluid flow could be effective to control the micro- and/or macro-step behavior during solution growth.

• 한국결정성장학회지
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• 제2권2호
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• pp.77-82
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• 1992

FZ법에 의한 결정성장에 있어서 용융대는 고액 계면의 장력에 의해 유지되고 상.하부의 고체봉 사이에 위치하고 있다. 따라서, 용융대의 표면에서는 온도와 농도 차이에 의해 표면장력의 구배가 발생하고 있는 marangoni 대류의 구동력으로 작용한다. 본 연구에서 정상상태의 결정성장시는 결정의 가장자리 영역에서의 Solute 농도는 결정내부 보다도 높아지게 되고 전위의 분포도 불규칙하여 지며, void나 기포 침투, Secondary phase의 생성 및 미소균열등의 결함 발생 확률이 계면부근에서 높아지는 결과를 알 수 있었다. 이는 고액성장 계면이 marangoni 대류에 의하여 이 영역에서 온도의 국부적인 변동에 의해 불규칙하여 지게 되기 때문이라 사료된다.

• 한국세라믹학회지
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• 제37권6호
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• pp.604-611
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• 2000

Glass-ceramics containing a cordierite (2MgO-2Al2O3-5SiO2) as a main crystal phase was prepared from MgO-Al2O3-SiO2 system glass through a controlled 2-step heat treatment for the application to magnetic memory disk substrate for higher storage capacity. Parent glasses prepared with addition of CeO2 as a fulx and TiO2 as a nucleating agent were crystallized by a 2-step heat treatment i.e. nucleation and crystal grwoth. Then the maximum nucleation and crystal growth rates were investigated and several properties such as bending strength, surface hardness and surface roughness were also studied for heat treated glass. As a result, only a $\alpha$-cordierite was precipitated as a main crystal phase for all heat treatment conditions and the maximum nucleation and crystal growth rates were 2.4$\times$109/㎣.hr at 80$0^{\circ}C$ and 0.3${\mu}{\textrm}{m}$/hr at 915$^{\circ}C$ respectively. After being nucleated at 80$0^{\circ}C$ for 5 hours and then crystallized at 915$^{\circ}C$ for 1 hour, the heat treated glass had a crystal volume fraction of 17.6% and crystal size fo 0.3${\mu}{\textrm}{m}$, and showed the optimum properties for the application to magnetic memory disk substrates as follows. ; Bending strength of 192 MPa, Vidkers hardness of 642.1kgf/$\textrm{mm}^2$, and surface roughness of 27$\AA$.

• 한국결정성장학회지
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• 제9권4호
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• pp.441-445
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• 1999

Thick diamond film having $~700\mu\textrm{m}$ thickness was deposited on polycrystalline molybdenum(Mo) substrate using high power (4 kW) microwave plasma-enhanced chemical vapor depostion (MPECVD) system. We could achieve free-standing diamond film via detaching as-deposited diamond film from the substrate by rapid cooling them under vacuum. We investigated the variation of photoconductivity after exposing the film surface to either oxygen or hydrogen plasma. At as-grown state, the growth side (the as-grown surface of the film) showed noticeable photoconcuctivity. The oxygen plasma treatment of this side led to the insulator. After exposing the film surface to hydrogen plasma, on the other hand, we could observe the reappearing of photoconductivity at the growth side. Based on these results, we suggest that the hydrogen plasma treatment may enhance the photoconductivity of free-standing diamond film.

• 연구논문집
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• 통권23호
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• pp.15-27
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• 1993

The single crystal specimens were solidified by modified Bridgeman method. The surface recrystallized single crystal specimens were prepared by shot peening followed by heat treatment. The surface recrystallization begins at the dendrite cores on the surface. The recrystallized grains grew into the inner side of the specimen. The growth of recrystallized grains was inhibited by the pores and eutectic phases. The primary $\gamma'$ phases were dissolved at the recrystallized grain boundaries during the grain growth. The grain growth of recrystallized grains was similar to the cellular type transformation. No orientation relationships were found bewteen the recrystallized grains and the parent phase.

• 한국결정성장학회지
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• 제13권1호
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• pp.5-14
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• 2003

Principles of a novel pulse growing method are described. The method realized in the crystal growing on a seed from melts under raw melt feeding provided a more reliable control of the crystallization process when producing large alkali halide crystals. The slow natural convection of the melt in the crucible at a constant melt level is intensified by rotating the crucible, while the crystal rotation favors a more symmetrical distribution of thermal stresses over the crystal cross-section. Optimum rotation parameters for the crucible and crystal have been determined. The spatial position oi the solid/liquid phase interface relatively to the melt surface, heaters and the crucible elements are considered. Basing on that consideration, a novel criterion is stated, that is, the immersion extent of the crystallization front (CF) convex toward the melt. When the crystal grows at a <> CF immersion, the raised CF may tear off from the melt partially or completely due to its weight. This results in avoid formation in the crystal. Experimental data on the radial crystal growth speed are discussed. This speed defines the formation of a gas phase layer at the crystal surface. The layer thickness il a function of time a temperature at specific values of pressure in the furnace and the free melt surface dimensions in the gap between the crystal and crucible wall. Analytical expressions have been derived for the impurity component mass transfer at the steady-state growth stage describing two independent processes, the impurity mass transfer along the <> path and its transit along the <> one. The heater (and thus the melt) temperature variation is inherent in any control system. It has been shown that when random temperature changes occur causing its lowering at a rate exceeding $0.5^{\circ}C/min$, a kind of the CF decoration by foreign impurities or by gas bubbles takes place. Short-term temperature changes at one heater or both result in local (i.e., at the front) redistribution of the preset axial growth speed.

• 공업화학
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• 제7권2호
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• pp.308-314
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• 1996

경막형 결정화기에서 벤젠-시클로헥산 혼합물로부터 벤젠의 결정성장속도가 조사되었다. 결정성장속도는 경막결정화기의 냉각벽에 부착되는 결정의 양으로부터 얻어진 결정두께와 시간에 대한 상관관계식으로부터 결정되었다. 결정성장속도와 결정의 표면온도와, 용융액의 온도의 차로 정의되는 과냉각정도와의 상관관계가 얻어졌다. 이 이성분 공융계에 대한 결정성장속도는 과냉각정도의 2승에 비례하였다. 경막결정화기의 열전달 및 물질전달 속도에 근거하여 결정의 표면온도 및 결정두께를 예측할 수 있는 모델식이 제시되었다. 5wt% 및 10wt%의 시클로헥산을 포함한 벤젠-시클로헥산 혼합물에 대하여 여러 다른 냉각온도에서 실험적으로 얻어진 결정두께의 자료와 모델식으로 계산된 결과가 비교되었다.

• 한국결정성장학회:학술대회논문집
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• 한국결정성장학회 1996년도 The 9th KACG Technical Annual Meeting and the 3rd Korea-Japan EMGS (Electronic Materials Growth Symposium)
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• pp.528-528
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• 1996

• 한국결정성장학회지
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• 제9권5호
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• pp.504-509
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• 1999

In-situ cleaning and subsequent silicon epitaxial film growth were performed in a load-locked reactor equipped with Hg-grid UV lamp and PBN heater to obtain the smooth and contaminant-free underlying surface and develop low-temperature epitaxial film growth process. The removals of organic and native oxide were investigated using UV-excited $O_2$ and $NF_{3}/H_{2}$, and the effect of the surface condition was examined on the quality of silicon epitaxial film grown at temperature as low as $750^{\circ}C$. UV-excited gas phase cleaning was found to be effective in removing the organic and native oxide successfully providing a smooth surface with RMS roughness of 0.5$\AA$ at optimal condition. Crystalline quality of epitaxial film was determined by smoothness of cleaned surface and the presence of native oxide and impurity. Crystalline defects such as dislocation loops or voids due to the surface roughness were observed by XTEM.

• 열처리공학회지
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• 제33권3호
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• pp.124-128
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• 2020

Recently, many studies on growth of single crystal diamond using MPECVD have been conducted. The heteroepitaxial method is one of the methods for growing diamonds on a large-area substrate, and research on synthesis of single crystal diamonds using SrTiO₃, MgO, and sapphire substrates has been attempted. In addition, research is being conducted to reduce the internal stress generated during diamond growth and to improve the crystallinity of the diamond. The compressive stress generated therein causes peeling and bowing from the substrate. This study aimed to synthesize heteroepitaxial single crystal diamonds with high crystallinity by surface modification. A diamond thin film was first grown on a sapphire/Ir substrate by MPECVD, and then etched with H₂ gas to modified the morphology and roughness of the surface. A secondary diamond layer was grown on the surface, and the internal stress, crystallinity of the diamond were investigated. As a result, the fabrication of single crystal diamonds with improved crystallinity was confirmed.