• 제목/요약/키워드: Surface Area of Plasma

검색결과 258건 처리시간 0.028초

반도체 제조용 사일렌 플라즈마 반응기에서의 입자 성장 모델 (Model of Particle Growth in Silane Plasma Reactor for Semiconductor Fabrication)

  • 김동주;김교선
    • 한국진공학회지
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    • 제10권2호
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    • pp.275-281
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    • 2001
  • 플라즈마 반응기 내에서 입자 전하 분포가 Gaussian형태로 표현될 때 전하 분포를 가지는 입자들의 충돌에 의한 입자 성장을 discrete-sectional 모델을 사용하여 이론적으로 고찰하였다. 플라즈마 반응기 내에서 입자 성장을 분석하기 위해 monomer크기, monomer생성 속도 등의 공정 변수들을 변화시켰다. 입자 크기가 40 m이상인 큰 입자들은 플라즈마 반응기내에서 대부분이 음으로 존재하였으며 40 m이하인 작은 입자들은 음성, 중성 혹은 양으로 존재하였다 입자 충돌에 의해 입자 크기가 증가함에 따라 입자 표면적의 증가와 더불어 입자가 가지는 평균 음전하수도 증가하였다. 입자 충돌에 의해 큰 입자들이 생성됨에 따라 입자크기분포는 2개의 모드로 양분화 됐다. 본 연구의 이론 결과와 Shiratani 등 [3]의 실험결과가 비교적 잘 맞았으며 본 연구에서 사용한 모델식은 플라즈마 반응기 내에서 수 나노 크기의 입자 성장 연구에도 활용될 수 있을 것으로 기대된다.

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뷰테인 건식 개질 반응을 위한 Ni/γ-Al2O3 촉매를 이용한 촉매 공정과 촉매+플라즈마 공정 비교 (Comparison of Dry Reforming of Butane in Catalyst Process and Catalyst+Plasma Process over Ni/γ-Al2O3 Catalyst)

  • 조진오;좌은진;목영선
    • 한국가스학회지
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    • 제22권1호
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    • pp.26-36
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    • 2018
  • 기존 건식 개질 반응에 사용되는 니켈 기반 촉매 공정은 활성화 온도가 높고, 촉매 표면의 활성점에 탄소 침착 및 금속 소결 현상 등의 문제점이 있다. 이에 본 연구에서는 촉매공정에 DBD 플라즈마 공정이 결합된 촉매+플라즈마 공정을 이용하여 뷰테인 건식 개질 반응 특성을 조사하고 기존 촉매 공정과 비교 분석하였다. 촉매의 특성을 파악하기 위해 비표면적 분석기, XRD, SEM 및 TEM 등을 사용하여 물리 화학적 특성을 조사 하였다. $580^{\circ}C$에서 $10%Ni/{\gamma}-Al_2O_3$촉매를 사용한 경우 촉매+플라즈마 공정의 경우 촉매 단독 공정에 비해 이산화탄소와 뷰테인 전환율이 각각 27%, 39%향상되었다. 촉매+플라즈마 공정의 경우 플라즈마에 의해 생성된 다양한 활성종의 영향으로 이산화탄소와 뷰테인 전환율 및 생성되는 수소 농도가 증가하였으며, 뷰테인 건식 개질 반응 과정에서 플라즈마에 의해 니켈 촉매의 크기가 감소하고 분산도가 증가하여 반응 효율이 향상되는 것으로 판단되었다.

글로우방전을 이용한 폴리에스테르섬유의 발수가공 (Water Repellent Finishes of Polyester Fiber Using Glow Discharge)

  • Mo, Sang Young;Kim, Gi Lyong;Kim, Tae Nyun;Chun, Tae Il
    • 한국염색가공학회지
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    • 제5권4호
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    • pp.29-41
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    • 1993
  • In order to surface Hydrophobilization of Poly(ethylene terephthalate) (PET) fiber samples were treated in the atmosphere of CF$_{4}$ or $C_{2}$F$_{6}$glow discharge. The sample used in this study was PET film which is 75$\mu$m thick made by Teijin, O-Type(Japan). The cleaned samples were placed in plasma reactor made of pyrex glass cylinder, and plasma processing was carried out by glow discharge of CF$_{4}$ or $C_{2}$F$_{6}$ gas, being continuously fed by gas flow and continuously pumped out by a vacuum system. Electric power source for generate plasma state was sustained alternating current(60Hz) and voltage was sustained 600 volt. The duration of plasma treatment varied from 15 to 120 seconds except special case, the monomer gase pressure varied from 0.02 to 0.3 Torr and power range was 10 to 90 watts. The hydrophobic features of changed PET surface were evaluated by contact angle measurement and surface chemical characteristics were analyzed by ESCA. Results can be summerized as follows. 1. The most favorable setting position of substrate was the center area between the two electrodes. 2. $C_{2}$F$_{6}$ discharge current was lower than that of CF$_{4}$ when same voltage was sustained. Treated efficiency between CF$_{4}$ and $C_{2}$F$_{6}$ did not revealed significant differences under same electric power(wattage). 3. When monomer pressure is very low below 0.02 torr, as though substrate is exposed to CF$_{4}$ or $C_{2}$F$_{6}$ plasma, it tend to be hydrophilic through a little of fluorine bond and a great deal of oxidizing reaction. 4. There brought good hydrophobilization when monomer pressure was more 0.1 torr and duration of glow discharge treatment was over 45 seconds. When monomer pressure was too high, discharge current became low. Although prolong the duration, there was no more high hydrophobilization. 5. According to ESCA analysis, there were a little CF bond and a prevailing CF$_{2}$ bond in CF$_{4}$-treated substrate. There were CF$_{3}$, a little CF and a prevailing CF$_{2}$ bond in $C_{2}$F$_{6}$-treated substrate.d substrate.

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산화아연 피뢰기 소자와 전극사이에 발생하는 방전광 현상 (Discharge Luminous Phenomena Caused Between ZnO Surge Arrester Block and Electrodes)

  • 이복희;박건영;강성만
    • 조명전기설비학회논문지
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    • 제19권3호
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    • pp.44-50
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    • 2005
  • 본 논문에서는 산화아연(이하 ZnO) 피뢰기 열화진행의 한 요인으로 예측되는 전극과 ZnO소자 사이에서 발생하는 방전광 현상에 관한 연구를 수행하였다. 이를 위해 $8/20[{\mu}s]$, 최대 10[kA]의 뇌임펄스전류를 발생시키는 뇌임펄스전류 발생장치를 설계${\cdot} $제작하였다. 실험결과, 상${\cdot}$하부의 전극 부근에서 발생하는 방전광의 형상은 인가되는 뇌임펄스의 극성에 따라 다르게 나타났으며 상대적으로 (-)극의 전극부근에서 방전광이 더 강하고 활발하게 발생하는 것으로 관찰되었다. 또한 전극의 면적에 따른 방전광의 세기는 전극의 면적이 증가할수록 감소하는 것으로 관측되었다. 동시에 전극과 소자의 접촉상태도 방전광의 발생과 매우 밀접한 관계가 있는 것으로 확인되었다. 따라서 배전급 ZnO피뢰기의 기존 전극구조는 보완이 필요하며 ZnO피뢰기 제품의 성능향상 및 지속적인 성능유지를 위해서는 환형구조 대신 내부면적이 있는 원판구조로 교체하는 것이 바람직하다고 판단된다.

In Vivo 레벨에서 1-아닐리노-8-나프탈렌 설포네이트(ANS)의 간내 이행 및 담즙배설 과정의 속도론적 해석 (Kinetic Analysis of the Hepatic Uptake and Biliary Excretion of 1-Anilino-8-Naphthalene Sulfonate (ANS) in Vivo)

  • 배웅탁;정연복;한건
    • Journal of Pharmaceutical Investigation
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    • 제31권4호
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    • pp.209-216
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    • 2001
  • The purpose of the present study was to investigate the hepatic uptake and biliary excretion of l-anilino-8-naphthalene sulfonate (ANS) in vivo. The plasma concentration and liver concentration of ANS were determined after its i.v. bolus administration at a dose of $30\;{\mu}mol/kg$ in rats. The hepatic uptake clearance $(CL_{uptake})$ of ANS was 0.1 ml/min/g liver. On the basis of the unbound concentration of ANS, the permeability-surface area product $(PS_{influx})$ was calculated to be l0.4 ml/min/g liver, being comparable of in vitro data. On the other hand, we determined the plasma concentration, liver concentration and biliary excretion rate of ANS at steady-state after its i. v. infusion $(0.2-1.6\;{\mu}mol/min/kg)$ in rats. The excretion clearance $(CL_{excretion})$ of ANS showed Michaelis-Menten kinetics with increasing the infusion rate. The permeability-surface area product $(PS_{excretion})$ based on the unbound concentration in the liver was calculated to be 0.0165 ml/min/g liver, which is negligible compared with the intrinsic clearance $(CL_{int}=3.3\;ml/min/g\;liver)$ by rat liver microsomes. The sequestration process of ANS, therefore, was considered to be mainly due to the metabolic process in the liver $(PS_{seq}{\risingdotseq}CL_{int})$. Furthermore, $PS_{efflux}$ value calculated from $PS_{influx}$ and $PS_{seq}$ was 4.4 ml/min/g liver, which was comparable of in vitro data. In conclusion, in vivo parameters such as $PS_{influx}$, $PS_{efflux}$ and $PS_{seq}$ in the present study showed good in vivo-in vitro relationship. Thus, the kinetic analysis method proposed in the present study would be useful to analyze the hepatic transport of drugs in vivo.

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혈소판 농축혈장과 법랑기질 단백질이 임플란트 골 연상 골 재생에 미치는 영향에 관한 비교연구 (Comparative study on the Effects of Platelet-Rich Plasma and Enamel Matrix Protein on Supracrestal bone Regeneration of Dental Implant)

  • 은희종;임성빈;정진형;홍기석;이종헌
    • Journal of Periodontal and Implant Science
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    • 제35권1호
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    • pp.235-250
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    • 2005
  • The current interest in periodontal tissue regeneration has lead to research in bone graft, root surface treatments, guided-tissue regeneration, administration of growth factors, and the use of enamel matrix protein as possible means of regenerating lost periodontal tissue. Several studies have shown that a strong correlation between platelet-rich plasma and the stimulation of remodeling and remineralization of grafted bone exits, resulting in a possible increase of 15-30% in the density of bone trabeculae. The purpose of this study was to study the histopathological results and differences between the use of platelet-rich plasma and the use of enamel matrix $protein(Emdogain^?)$ about bone regeneration at the implant. Implant fixtures were inserted and graft materials placed into the left femur in the experimental group, while the only implant fixtures placed in the control group. In the first experimental group, platelet-rich plasma and xenograft were placed at the supracrestally placed implant site, and in the second experimental group, $Emdogain^{(R)}$ and xenograft placed at the supracrestally placed fixture site. The degree of bone regeneration adjacent to the implant fixture was observed and compared histopathologically at 2, 4, and 8 weeks after implant fixture insertion. The results of the experiment are as follows: 1. The rate of osseointegration to the fixture threads was found to be greater in the experimental group compared to in the control group. 2. The histopathological findings showed that the bone regeneration, the partial osseointegration existed at 4 weeks, and that osseointegration and bone density increaced in the experimental groups at 8 weeks. 3. The results showed that new bone formation and bone remodeling increased in the area near to the fixture in the first and second experimental groups at 8 weeks than at 4 weeks. The results showed that in the area distant from the fixture, new bone formation did not increase and bone remodeling decreased in the first experimental group at 4, 8 weeks, and that new bone formation increased in the second experimental group. 4. The histopathological findings showed that AZ deposition in the first experimental group was remarkable at 2, 8 weeks, and in the second experimental group at 2, 4, 8 weeks in the area distant from the fixture threads.

임프란트 표면처리 방법에 따른 골유착의 조직계측학적 분석 및 제거회전력 비교 연구 (HISTOMORPHOMETRIC AND REMOVAL TORQUE VALUES COMPARISION OF ROUGH SURFACE TITANIUM IMPLANTS)

  • 이상철;송우식
    • Maxillofacial Plastic and Reconstructive Surgery
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    • 제23권5호
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    • pp.396-405
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    • 2001
  • Osseointegrated implants are used for the fixation of dental prosthesis with good long-term clinical results. In an attempt to improve the quantity and quality of the bone-implant interface, numerous implant modification have been used. Implants surface modifications have been used such as titanium-plasma sprayed, hydroxyapatite-coating, sandblasted, sandblasted and acid-etched, acid-etched. Rough surface implants have greater implant surface area and enhance the bone-implant interface and improve stabilization. The purpose of present study was to evaluate light microscopic and scanning microscopic examinations and removal torque value of newly developed calcium phosphate blast and acid-etched implant in the femur of rabbits. Titanium plasma sprayed(TPS) implant served as controls. After 12 weeks of healing of the femurs of 12 rabitts, the implant-containing segments of femur were removed on bloc and bone block including sections. Histologic examination and histomorphometric and removal torque values comparision were made for two implants. Obtained results are follows: 1. Newly developed calcium phosphate blasted and acid-etched implants were in close contact with bone under light microscopic examinations. 2. New implants showed mean bone-to implant contact 59.8%, whereas TPS implants showed mean bone-to implant contact 54.5% (statistically no difference p<0.05). 3. New implants showed mean bone density 56.7%, whereas TPS implants showed mean bone density 49.2% (statistically difference p<0.05). 4. New implants demonstrated mean removal torque values 40.5Ncm, whereas the mean removal torque values of TPS implants ranged 39.3Ncm. No statistical differences(p<0.05) were observed between two groups of implants nor was there any difference between the two implants at the clinical level.

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Effect of Support of Two-Dimensional Pt Nanoparticles/Titania on Catalytic Activity of CO Oxidation

  • Qadir, Kamran;Kim, Sang-Hoon;Kim, S.M.;Reddy, A.S.;Jin, S.;Ha, H.;Park, Jeong-Y.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.246-246
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    • 2012
  • Smart catalyst design though novel catalyst preparation methods can improve catalytic activity of transition metals on reducible oxide supports such as titania by enhancement of metal oxide interface effects. In this work, we investigated Pt nanoparticles/titania catalysts under CO oxidation reaction by using novel preparation methods in order to enhance its catalytic activity by optimizing metal oxide interface. Arc plasma deposition (APD) and metal impregnation techniques are employed to achieve Pt metal deposition on titania supports which are prepared by multi-target sputtering and Sol-gel techniques. In order to tailor metal-support interface for catalytic CO oxidation reaction, Pt nanoparticles and thin films are deposited in varying surface coverages on sputtered titania films using APD. To assess the role of oxide support at the interface, APD-Pt is deposited on sputtered and Sol-gel prepared titania films. Lastly, characteristics of APD-Pt process are compared with Pt impregnation technique. Our results show that activity of Pt nanoparticles is improved when supported over Sol-Gel prepared titania than sputtered titania film. It is suggested that this enhanced activity can be partly ascribed to a very rough titania surface with the higher free metal surface area and higher number of sites at the interface between the metal and the support. Also, APD-Pt shows superior catalytic activity under CO oxidation as compared to Pt impregnation on sputtered titania support. XPS results show that bulk oxide is formed on Pt when deposited through impregnation and has higher proportion of oxidized Pt in the form of $Pt^{2+/4+}$ oxidation states than Pt metal. APD-Pt shows, however, mild oxidation with large proportion of active Pt metal. APD-Pt also shows trend of increasing CO oxidation activity with number of shots. The activity continues to increase with surface coverage beyond 100%, thus suggesting a very rough and porous Pt films with higher active surface metal sites due to an increased surface area available for the reactant CO and $O_2$ molecules. The results suggest a novel approach for systematic investigation into metal oxide interface by rational catalysts design which can be extended to other metal-support systems in the future.

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Spark Plasma Sintering and Ultra-Precision Machining Characteristics of SiC

  • Son, Hyeon-Taek;Kim, Dae-Guen;Park, Soon-Sub;Lee, Jong-Hyeon
    • 한국재료학회지
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    • 제20권11호
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    • pp.559-569
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    • 2010
  • The liquid-phase sintering method was used to prepare a glass lens forming core composed of SiC-$Al_2O_3-Y_2O_3$. Spark plasma sintering was used to obtain dense sintered bodies. The sintering characteristics of different SiC sources and compositions of additives were studied. Results revealed that, owing to its initial larger surface area, $\alpha$-SiC offers sinterability that is superior to that of $\beta$-SiC. A maximum density of $3.32\;g/cm^3$ (theoretical density [TD] of 99.7%) was obtained in $\alpha$-SiC-10 wt% ($6Al_2O_3-4Y_2O_3$) sintered at $1850^{\circ}C$ without high-energy ball milling. The maximum hardness and compression stress of the sintered body reached 2870 Hv and 1110 MPa, respectively. The optimum ultra-precision machining parameters were a grinding speed of 1243 m/min, work spindle rotation rate of 100 rpm, feed rate of 0.5 mm/min, and depth of cut of $0.2\;{\mu}m$. The surface roughnesses of the thus prepared final products were Ra = 4.3 nm and Rt = 55.3 nm for the aspheric lens forming core and Ra = 4.4 nm and Rt = 41.9 for the spherical lens forming core. These values were found to be sufficiently low, and the cores showed good compatibility between SiC and the diamond-like carbon (DLC) coating material. Thus, these glass lens forming cores have great potential for application in the lens industry.

펨토초레이저 충격파에 의한 형광 나노입자 제거 (Removal of Nano-scaled Fluorescence Particles on Wafer by the Femtosecond Laser Shockwave)

  • 박정규;조성학;김재구;장원석;황경현;유병헌;김광열
    • 한국정밀공학회지
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    • 제26권5호
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    • pp.150-156
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    • 2009
  • The removal of tiny particles adhered to surfaces is one of the crucial prerequisite for a further increase in IC fabrication, large area displays and for the process in nanotechnology. Various cleaning techniques (wet chemical cleaning, scrubbing, pressurized jets and ultrasonic processes) currently used to clean critical surfaces are limited to removal of micrometer-sized particles. Therefore the removal of sub-micron sized particles from silicon wafers is of great interest. For this purpose various cleaning methods are currently under investigation. In this paper, we report on experiments on the cleaning effect of 100nm sized fluorescence particles on silicon wafer using the plasma shockwave occurred by femtosecond laser. The plasma shockwave is main effect of femtosecond laser cleaning to remove particles. The removal efficiency was dependent on the gap distance between laser focus and surface but in some case surface was damaged by excessive laser intensity. These experiments demonstrate the feasibility of femtosecond laser cleaning using 100nm size fluorescence particles on wafer.