• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2002년도 하계종합학술대회 논문집(1)
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• pp.423-426
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• 2002

Undoped-GaN thin film is deposited on Sapphire substrate by MOCVD. SAW velocity is measured with tile center frequency by HP8753C. Center frequency is 266.52 MHz and SAW velocity is 5330㎧ when wavelength was 20 Um. insertion loss, Q factor and side love attenuation is 41.265 dB, 257.41 and over 23 dB. k'i is calculated from tile measured data. k2'is from 1 % to 4 %. TCF is -61.817pp/m/$^{\circ}C$.

• Journal of Magnetics
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• 제21권2호
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• pp.187-191
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• 2016

Retrieving the equivalent electromagnetic parameters (permittivity and permeability) plays an important role in the research and application of metamaterials. Frequency dispersion of magnetic permeability has been theoretically predicted in a metamaterial composed of cut wire pairs (CWP) separated by dielectric substrate on the basis of circuit theory. Magnetic resonance resulting from antiparallel currents between the CWP is observed at the frequency of minimum reflection loss (corresponding to absorption peak) and effective resonator size can be determined. Having calculated the circuit parameters (inductance L, capacitance C) and resonance frequency from CWP dimension, the frequency dispersion of permeability of Lorentz like magnetic response can be predicted. The simulated resonance frequency and permeability spectra can be explained well on the basis of the circuit theory of an RLC resonator.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 추계학술대회 논문집
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• pp.358-361
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• 1999

This paper describes on the fabrication and characteristics of hot-film type micro-flowsensors integrated with Pt-RTD\`s and micro-heater on the Si substrate, in which MgO thin-films were used as medium layer in order to improve adhesion of Pt thin-films to SiO$_2$ layer The MgO layer improved adhesion of Pt thin-films to SiO$_2$` layer without any chemical reactions to Pt thin-films under high as gas flow rate and its conductivity increased due to increase of heat-loss from sensor to external. Output voltage was 82 mV at N2 flow rate of 2000 sccm/min, heating power of 1.2W. The respons time was about 100 msec when input flow was step-input

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제53권2호
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• pp.73-78
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• 2004

AIN thin film has been deposited on the $AI_2$$O_3$substrate with reactive radio frequency( RF) magnetron sputtering method. In this work, elelctromechanical coupling coefficient of AIN thin film was increased with an increase of AIN thin film thickness, and the maximum value was 0.11%. Insertion loss of SAW device was decreased with an increase of AIN thin film thickness and the minimum value was 33［㏈］. SAW velocity of IDTs/AIN/$AI_2$$O_3$structure and IDTs/AIN/$AI_2$$O_3$/Si structure were about 5480［㎧］and 5040［㎧］respectively.

• 한국표면공학회지
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• 제23권4호
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• pp.218-224
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• 1990

Silicon nitride thin(SiNx) is deposited onto 3 inch silicon wafor using ECR plasma apparatus. For the two different plasma extraction windows size, the thin films which were deposited by changing the SiH4/N2 gas fole at at 1.5mTorr without substrate heating are analyzed through the XPS and wlliposometer measurements. The very uniform and good quality silicon nitride thin film were obtained with the analyzed results of the deposited films, and particularly, ion temperature perpendicular to the magnetic filed was nearly same as the neutral gas temperature. The large amount of plasma loss in the transport process following magnetic field lines could be seen from the plasma emission intensity measurements.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2006년도 제37회 하계학술대회 논문집 C
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• pp.1394-1395
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• 2006

$(Na_{0.5}LaK_{0.5})NbO_3$ (NKN) thin films were fabricated by the alkoxide-based MOD method. NKN stock solutions were made spin-coated onto the Pt/Ti/$SiO_2$/Si substrate. The structural properties of the NKN thin films examined by x-ray diffraction. The perovskite phase was obtained as a function of the annealing temperature from $550^{\circ}C$ to $700^{\circ}C$ for 1h. The crystallinity and grain size of the NKN thin films increased with increasing annealing temperature. The dielectric constants and loss of the NKN thin films annealed at $650^{\circ}C$ ($t_{eq}$=2.35 nm) showed 323 and 0.025.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2005년도 제36회 하계학술대회 논문집 C
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• pp.2386-2388
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• 2005

As anti-crash and pre-crash systems in vehicles become more extensively used, the need for high performance short-range radars is playing an increasing role. This paper presents the design of a micromachined, ultra-wideband beamformer centered at 24 GHz for automotive short-range radar systems. This beamformer is a Butler matrix designed using ultra-wideband transmission-line couplers, which consist of a multilayered structure that exhibits wider bandwidth compared to conventional microstrip branch-line couplers. The circuit has been designed on a quartz substrate, and to achieve the desired coupling, lines suspended on BCB layers located at specific parts of the circuit were used, achieving a three metal layered structure in form of wide microstrips, that give low loss and a wideband response. In this paper the design and fabrication procedure of the proposed beamformer are fully described.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2003년도 하계학술대회 논문집 C
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• pp.1586-1588
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• 2003

The Pb$(Zr{_{0.7}}Ti_{0.3})O_3$[PZT(70/30)] thin films were fabricated on Pt/$TiO_2/SiO_2$/Si substrate by RF sputtering method. The effects of Ar/$O_2$ ratio on the structural and dielectric properties of PZT thin fillms were investigated. In the case of the PZT thin films deposited with condition of 50/50$(Ar/O_2) $ ratio, the grain of the PZT thin films were fine and uniform. Increasing of $O_2$ ratio, the dielectric constant was increased. In this case the dielectirc constant and dielectric loss of PZT thin fims were about 627 and 0.010, respectively.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2003년도 하계학술대회 논문집 C
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• pp.1577-1579
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• 2003

AlN thin films are prepared on Si (111) substrate by RF magnetron sputtering. Two-step deposition method is proposed to obtain AlN thin films with high c-axis (002)-TC value and low surface roughnesses. For all the deposited AlN films, the c-axis (002)-orientation, surface mophology, and roughness are characterized in terms of deposition conditions FEAR devices with Al/AlN/Mo/Si(111) configuration are also fabricated. From the frequency response characteristics, the return loss and electromechanical coupling contant($k_t{^2}$) are estimated.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1994년도 춘계학술대회 논문집
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• pp.130-132
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• 1994

We fabricated Ag ion exchange glass waveguide. Generally, ion-exchange glass waveguide. are suitable for passive integrated optical components such as directional and star couplers. Its advantages include low loss, ease of fabrication, and low material cost. So, we faricated Ag ion-exchange glass waveguides in AgNO$_3$ melt solution from 2 mole %. And we used Sodalime glass as a substrate in the fabrication process. As the results, we observed multivalent ion-exchange in a typical sodalime glass. Diffusion coefficient and depth are predicted by actual experimental data of Stewart. The exchange rate in silver-ion-exchanged waveguides are compared to the exchange time of waveguide fabrication.