• Title/Summary/Keyword: Stencil mask

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Development of Laser Process and System for Stencil Manufacturing

  • Lee, Jae-Hoon;Jeong Suh;Shin, Dong-Sig;Kim, Jeon-O;Lee, Young-Moon
    • International Journal of Precision Engineering and Manufacturing
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    • v.4 no.1
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    • pp.23-29
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    • 2003
  • Stencil is used normally as a mask for solder pasting on pad of a printed circuit board (PCB). The objective of this study is to develop a stencil cutting system and determine the optimal conditions to make good-quality stencil by using a Nd:YAG laser. The effects of process parameters such as laser power, type of mask, gas pressure, cutting speed and pulse duration on the cut edge quality were investigated. In order to analyze the cut surface characteristics (roughness, kerfwidth, dross) optical microscopy, SEM microscopy and roughness measurements were used. As a result, the optimal conditions of cutting process parameters were determined, and the practical feasibility of the proposed system was also examined by using a commercial Gerber file for PCB stencil manufacturing.

Development of Laser Process and System for Stencil Manufacturing (레이저 스텐실 가공 시스템 및 공정 기술 개발)

  • Lee, Jae-Hoon;Suh, Jeong;Kim, Jeng-O;Shin, Dong-Sig;Lee, Young-Moon
    • Journal of the Korean Society for Precision Engineering
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    • v.19 no.2
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    • pp.106-113
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    • 2002
  • Stencil is used normally as a mask for seeder pasting on pad of PCB. The objective of this study is to develop stencil cutting system and determine optimal conditions which make good-quality stencil by using a Nd:YAG laser. The effects of process parameters such as laser power, type of mask, gas pressure, cutting speed and pulse width old the cut edge quality were investigated. In order to analyse fille cut surface characteristics(roughness, kerf width, dross) optical microscopy, SEM photography and roughness test were used. As a result, the optimal conditions of process parameters were determined, and the practical feasibility of the proposed system is also examined by using a commercial Gerber file for PCB stencil manufacturing.

Development of laser process for stencil manufacturing (스텐실 제작용 레이저 공정기술 개발)

  • 신동식;이영문;이제훈
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 1997.10a
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    • pp.989-992
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    • 1997
  • The objective of this study is to develop stencil cutting process and determine optimal conditions which make good-quality stencil by using a Nd:YAG laser. The effects of process parameters such as laser power, type of mask, gas pressure, cutting speed and pulse width on the cut edge quality were investigated. In order to analyze the cut surface characteristics(roughness, kerf width, dross) optical microscopy, SEM photography and roughness test were used. A a results, the optimal conditions of process parameters were determined, and the practical feasibility of the proposed system is also examined by using a commercial gerber file for PCB stencil manufacturing.

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Stencil cutting process by Nd:YAG laser II -Influence of process parameters on cutting characteristics of stencil- (Nd:YAG레이저를 이용한 스텐실 절단공정II -레이저의 공정변수가 스텐실 절단특성에 미치는 영향-)

  • Lee, Je-Hoon;Seo, Jung;Kim, Jung-Oh;Shin, Dong-Sik;Lee, Young-Moon
    • Laser Solutions
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    • v.4 no.2
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    • pp.47-57
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    • 2001
  • This study deals with the laser cutting of stencil for the PCB. The most important aim of this study is to determine optimal conditions which make good-qualify stencil in Nd:YAG laser cutting. We made an experiment according to various variables (power. type of mask. gas pressure, cutting speed, and pulse width) and analyzed the cutting characteristics (surface roughness, kerf width. dross) . Each variable has optimal value for good-qualify cut edge under fixed condition. And neural network after learning experimental data with a million time iteration could predict surface roughness of cut edge under arbitrary condition approximately.

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Deformation Analysis of a Metal Mask for the Screen Printing of Micro Bumps (스크린 인쇄용 미세 범프 금속마스크의 변형특성 해석)

  • Lee, K.Y.;Lee, H.J.;Kim, J.B.;Park, K.
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.21 no.3
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    • pp.408-414
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    • 2012
  • Screen printing is a printing method that uses a woven mesh to support an ink-blocking stencil by transferring ink or other printable materials in order to form an image onto a substrate. Recently, the screen printing method has applied to micro-electronic packaging by using solder paste as a printable material. For the screen printing of solder paste, metal masks containing a number of micro-holes are used as a stencil material. The metal mask undergoes deformation when it is installed in the screen printing machine, which results in the deformation of micro-holes. In the present study, finite element (FE) analysis was performed to predict the amount of deformation of a metal mask. For an efficient calculation of the micro-holes of the metal mask, the sub-domain analysis method was applied to perform FE analyses connecting the global domain (the metal mask) and the local domain (micro-holes). The FE analyses were then performed to evaluate the effects of slot designs on the deformation characteristics, from which more uniform and adjustable deformation of the metal mask can be obtained.

A Study of Micro Stencil Printing based on Solution Atomization Process (용액 미립화공정 기반의 마이크로 스텐실 프린팅에 관한 연구)

  • Dang, Hyun Woo;Kim, Hyung Chan;Ko, Jeong Beom;Yang, Young Jin;Yang, Bong Su;Choi, Kyung Hyun;Doh, Yang Hoi
    • Journal of the Korean Society for Precision Engineering
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    • v.31 no.6
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    • pp.483-489
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    • 2014
  • In this study, experiments were conducted for micro pattern printing to combine solution atomization process and stencil printing based on electrospray deposition. The stencil mask fabricated by etching the photosensitive glass placed below 0.3 mm distance to substrate has 100 um line width. The process parameters of electrospray deposition system for the atomization of the solution are applied voltage and supply flow rate of the solution. Meniscus angle of cone-jet was optimized by varying the supply flow rate from 0.3 ml/hr to 0.7 ml/hr. Voltage condition was verified having symmetric cone-jet angle and no pulsation at 8.5 kV applied voltage. In addition, a number of micro patterns are printed using a single 1 step process by solution atomization process. Variable line width of approximate 100 um was confirmed by changing conditions of solution atomization regardless of the pattern size of stencil mask.