• 대한화학회지
• /
• 제50권3호
• /
• pp.243-246
• /
• 2006

박막은 Pt/Ti/SiO2/Si 기판 위에 구연산 졸을 이용하여 spin coating에 의해 제작하였다. 기판위에 코팅된 구연산 졸을 380oC에서 15분간 건조시킨 후 750oC에서 10분간 열처리하여 박막을 얻었다. 얻어진 박막은 X-선 회절분석 결과 R3m의 결정구조를 가짐을 알수 있었고, 전기화학적 특성의 측정결과 1차 방전용량은 0.35Ah/cm2-m로 측정되었다.

• 한국전기전자재료학회논문지
• /
• 제34권5호
• /
• pp.321-326
• /
• 2021

We fabricated BiAlO thin film by a solution process with a brush coating to be used as liquid crystal (LC) alignment layer. Solution-processed BiAlO was coated on the glass substrate by brush process. Prepared thin films were annealed at different temperatures of 80℃, 180℃, and 280℃. To verify whether the BiAlO film was formed properly, X-ray photoelectron spectroscopy analysis was performed on Bi and Al. Using a crystal rotation method by polarized optical microscopy, LC alignment state was evaluated. At the annealing temperature of 280℃, the uniform homogenous LC alignment was achieved. To reveal the mechanism of LC alignment by brush coating, field emission scanning electron microscope was used. Through this analysis, spin-coated and brush coated film surface were compared. It was revealed that physical anisotropy was induced by brush coating at a high annealing temperature. Particles were aligned in one direction along which brush coating was made, resulting in a physical anisotropy that affects a uniform LC alignment. Therefore, it was confirmed that brush coating combined with BiAlO thin film annealed at high temperature has a significant potential for LC alignment.

• 한국재료학회지
• /
• 제17권1호
• /
• pp.1-5
• /
• 2007

GaN thin fan were grown by spin coated colloidal GaOOH precursor. Polycrystalline GaNs with crystalline size of $10{\sim}100nm$ were grown on $SiO_2$ substrate. The shape of crystallite above $900^{\circ}C$ had the hexagonal plate and column type. X-ray diffraction patterns for them correspond to those of the hexagonal wurtzite GaN. With increasing droplets. i.e, thickness of deposited layers, XRD intensity increased. PL (photoluminescence) spectrum consisted with an weak near band-edge emission at 3.45 eV and a broad donor-acceptor emission band at 3.32 eV. From the low temperature PL measurement on GaN grown at $800^{\circ}C$ that the shallow donor-acceptor recombination induced emission was more intense than the near band-edge excitonic emission.

• 한국대기환경학회지
• /
• 제16권4호
• /
• pp.389-398
• /
• 2000

Photocatalytic removal of benzene from air was examined using titanium dioxide photocatalyst films prepared on soda lime glass(50$\times$50$\times$2 mm) by spin coating and chemical vapor deposition. For the measurement of photocatalytic reactivity titanium dioxide coated glass was placed into a batch reactor and concentration of benzene in the reactor was set to abuot 100 ppm, and then illuminated with UV. It was found that catalytic reactivity of titanium dioxide films increased with the increase of titanium dioxide film thickness and then level off beyond a certain film thickness. UV absorption by the films showed the similar trend. The formation of stoichiometric amount of carbon dioxide was confirmed by measurement of carbon dioxide concentration in the reactor. In general spin coated films revealed better photocatalytic reactivity than chemically deposited one within the experimental ranges covered in this study. Morphology and crystal structure of prepared films were investigated by XRD and SEM and they showed significant difference between spin coated films and CVD films. Highest quantum efficiency of prepared titanium dioxide photocatalyst was close to 50%.

• 한국표면공학회지
• /
• 제34권3호
• /
• pp.258-263
• /
• 2001

Siloxane thin films were fabricated on a silicon wafer by spin-coating using a siloxane solution made by the sol-gel process. Fluorine was doped using$ CF_4$ plasma treatment. The film was then annealed in-situ state in the nitrogen atmosphere. In order to examine the influence of annealing and fluorine doping on the siloxane thin film, thermogravimetric-differential thermal analysis (TG-DTA), Fourier transform-infrared spectroscopy (FT-IR) and X-ray photoelectron spectroscopy (XPS) were used and the dielectric constant was determined by the high-frequency capacitance-voltage method. Stable siloxane films could be obtained by in-situ annealing in a nitrogen atmosphere after $CF_4$ plasma treatment, and the dielectric value of the film was $\varepsilon$ 2.5.

• 반도체디스플레이기술학회지
• /
• 제19권1호
• /
• pp.17-22
• /
• 2020

Recently, the decrease in thin film thickness has been actively studied by changing several physical elements such as the increase in revolution velocity of lower substrate equipped with AC or DC motor. In this paper, we propose a novel spin coater control system that changes AC or DC motor and common use software with limitation of velocity and position control into step motor and LABVIEW software based on GUI to control revolution velocity and position more precisely. By determining six input values of rotation velocity 1, 5, 10, 25, 50, 100 PPS, we fabricated six samples using coating target, TA(tantalum) on silicon substrate and measured their thin film thickness by SEM. Hence, this research can be applied to inferring thin film thickness of tantalum regarding any value of revolution velocity without additional experiments and for linear reference model via property analysis of thin film thickness using other thin-film materials.

• 한국신재생에너지학회:학술대회논문집
• /
• 한국신재생에너지학회 2009년도 춘계학술대회 논문집
• /
• pp.57-60
• /
• 2009

The conductive coating method was used for a various industrial fields. For example, Sputtering process is using to a coat of ITO layer in LCD or OLED panel manufacture process and fabricate a base layer of substrate of an electric printing device. However, conventional coating process (beam sputtering, spin coating etc.) has a problems in the industrial manufacturing process. These processes have a very high cost and critical manufacturing environment as a vacuum process. Recently, many researchers were proposed a various printing process instead of conventional coating process. In this paper, we propose an ESD printing process in ITO coating layer and apply to fabricate a conductive coating film. Ours transparent electrode had a surface resistance of about $66{\Omega}/{\square}$ and transparent of 74% in the wavelength of 500nm. This transparent electrode manufacturing process will be applied to Roll-to-Roll process. In addition, we developed roll printing process system for the next generation flexible solar cell.

• 소성∙가공
• /
• 제13권8호
• /
• pp.716-722
• /
• 2004

Effects of sliding speed, applied load, and thickness of PMMA (Poly Methyl Methacrylate) coating layers on their dry sliding frictional and wear behavior were investigated. Sliding wear tests were carried out using a pin-on-disk wear tester. The PMMA layer was coated on Si wafer by a spin coating process with two different thicknesses, $1.5\mu\textrm{m}$ and $0.8\mu\textrm{m}$. AISI 52100 bearing steel balls were used as a counterpart of the PMMA coating during the wear. Normal applied load and sliding speed were varied. Wear mechanisms of the coatings were investigated by examining worn surfaces using an SEM. Friction coefficient of the coatings decreased with the increase of the applied load. Both adhesion and deformation of the coating determined the coefficient. The thicker PMMA layer with the thickness of $1.5mutextrm{m}$ showed lower friction coefficient than the thinner layer under most test conditions. Effects of sliding speed and applied load on the frictional behavior were varied depending on the thickness of the coating layer.

• 한국진공학회지
• /
• 제18권4호
• /
• pp.254-258
• /
• 2009

순방향 전압에서 안정적인 전류 흐름을 가지고 낮은 turn-on 전압으로 구동하는 이리듐 합성물 기반의 인광 고분자 발광 다이오드를 제작하였다. Poly(N-vinylcabazole)와 tris(2-phenylpyridine)iridium 재료를 포함하는 유기 발광층은 $10{\mu}m$/s 와 $20{\mu}m$m/s의 저속도 dip-coating으로 만들었다. 제안한 방법으로 형성된 유기 발광 다이오드는 100 cd/$m^2$의 기준 휘도에서 각각 5.8 V와 6.7 V로 구동이 되었지만, 발광층을 스핀코팅으로 제작된 소자는 다소 높은 전압인 9.1 V를 기록하였다. 본 연구는 대면적, 용액 공정 기반의 고효율 특성을 요구하는 유기 발광 소자에서 발광층의 새로운 박막 형성기술로 이용될 수 있다.

• 한국표면공학회지
• /
• 제52권1호
• /
• pp.6-15
• /
• 2019

Metal-halide perovskite (MHP) solar cell is a promising candidate for next-generation flexible devices and the BIPV (Building-integrated photovoltaics) because it can exhibit high power conversion efficiencies over 23%, good bendability and low processing cost. However, MHP solar cells are commonly fabricated by the spin coating that is not a reliable method to produce large-scale commercial solar cells. A shear coating can be one of the potential candidates for the large-scale deposition method of MHP films. In this work, the influences of the process parameters such as solvents of precursor solution, substrate temperature, concentrations of precursor solution, and annealing time on the thin film growth of MHP were investigated for the shear coating process. This study presents the possibility of the shear coating process for large-scaled perovskite film fabrication and reveals the role of process condition in the thin film growth of perovskites.