• 한국의류학회지
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• 제36권2호
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• pp.127-137
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• 2012

This study focuses on the optimal washing conditions for dry cleaning recommended fabrics to minimize dimensional changes using wet cleaning. We suggest water-based alternatives to a perchloroethylene based cleaning process. Wool and rayon fabrics were laundered under various washing conditions and then air-dried for 24hrs. All specimens were extended after spinning and shrunk after drying. This is probably because the fibers were swollen and extended by wetting. The wool fabrics were shown to be acutely influenced by washing temperature and mechanical force. The optimal washing conditions for wool fabric to minimize the dimensional change implied a normal washing temperature and minimized mechanical force. For rayon specimens, dimensional change by a hand wash showed a remarkable decrease compared with a machine wash. Rayon fabric seemed to be influenced by the quantity of water contained in the fabric after spinning and washing time. Therefore, the desirable washing conditions for rayon fabric are to reduce the time required for washing and to increase the spin speed.

• 한국염색가공학회지
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• 제22권4호
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• pp.373-379
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• 2010

The laboratory inspection and analysis of several types of ropes such as edge tensile test, D/d tensile test and abrasion test were carried out in order to investigate the abrasion degradation by external damage and to obtain the fundamental data for measurement against the abrasion. PET ropes were socketed and evaluated under tensile testing. A yarn-on-yarn abrasion test machine has been developed to study the damage and failure associated with rubbing between fiber surfaces. The abrasion test method consists of sliding a length of interwrapped yarn against itself in a reciprocating fashion, either dry or immersed in liquid. It has also been adapted to measure yarn-on-yarn friction. The influence of spin finish on yarn friction and abrasion was investigated extensively. This study indicates that finish has a major effect not only on yarn performance but also on rope performance under the marine environment.

• 소성∙가공
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• 제13권8호
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• pp.716-722
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• 2004

Effects of sliding speed, applied load, and thickness of PMMA (Poly Methyl Methacrylate) coating layers on their dry sliding frictional and wear behavior were investigated. Sliding wear tests were carried out using a pin-on-disk wear tester. The PMMA layer was coated on Si wafer by a spin coating process with two different thicknesses, $1.5\mu\textrm{m}$ and $0.8\mu\textrm{m}$. AISI 52100 bearing steel balls were used as a counterpart of the PMMA coating during the wear. Normal applied load and sliding speed were varied. Wear mechanisms of the coatings were investigated by examining worn surfaces using an SEM. Friction coefficient of the coatings decreased with the increase of the applied load. Both adhesion and deformation of the coating determined the coefficient. The thicker PMMA layer with the thickness of $1.5mutextrm{m}$ showed lower friction coefficient than the thinner layer under most test conditions. Effects of sliding speed and applied load on the frictional behavior were varied depending on the thickness of the coating layer.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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• pp.665-668
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• 1999

Thin films of Pb(Zr,Ti)O$_3$ were fabricated by means of the sol-gel spin-coating method and the multi-coating of eight coating numbers. The thin films were dried on the temperature range of 250 ~ 400($^{\circ}C$), whenever the specimens were dried after each coating Processing. The fabricated ferroelectric thin films of lead zirconate titanate(PZT) were treated with the rapid thermal annealing(RTA) at 650($^{\circ}C$),or 3(min), and direct insertion thermal annealing(DITA) at 650($^{\circ}C$), for 30(min). The measured properties of dielectric thin films were following: The good results of dielectric properties were shown by the RTA specimen. The saturation polarization(Ps), remanent polarization(Pr), coercive field (Ec), dielectric constant and dielectric loss factor of the RTA specimen were estimated to be about 27.1[ $\mu$ C/$\textrm{cm}^2$], 13.7[ $\mu$ C/$\textrm{cm}^2$], 55.6(kV/cm), 786 and 6.4(%) respectively.

• 한국재료학회지
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• 제18권2호
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• pp.98-102
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• 2008

The ferroelectric properties of UV irradiated and non-irradiated PZT films prepared via photochemical metal-organic deposition using photosensitive precursors were characterized. Fourier transform infrared spectroscopy showed that complete removal of organic groups was possible through UV exposure of the spin-coated PZT precursor films at room temperature. The measured remnant polarization values of UV-irradiated and non-irradiated PZT films after annealing at $650^{\circ}C$ were 29 and $23\;{\mu}C/cm^2$, respectively. The UV irradiation was found to be effective for the enhancement of the <111> growth orientation and ferroelectric property of PZT film and in the direct patterning in the fabrication of micro-patterned systems without dry etching.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.393-393
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• 2012

Optically active nanostructures such as subwavelength moth-eye antireflective structures or surface enhanced Raman spectroscopy (SERS) active structures have been demonstrated to provide the effective suppression of unwanted reflections as in subwavelength structure (SWS) or effective enhancement of selective signals as in SERS. While various nanopatterning techniques such as photolithography, electron-beam lithography, wafer level nanoimprinting lithography, and interference lithography can be employed to fabricate these nanostructures, roll-to-roll (R2R) nanoimprinting is gaining interests due to its low cost, continuous, and scalable process. R2R nanoimprinting requires a master to produce a stamp that can be wrapped around a quartz roller for repeated nanoimprinting process. Among many possibilities, two different types of mask can be employed to fabricate optically active nanostructures. One is self-assembled Au nanoparticles on Si substrate by depositing Au film with sputtering followed by annealing process. The other is monolayer silica particles dissolved in ethanol spread on the wafer by spin-coating method. The process is optimized by considering the density of Au and silica nano particles, depth and shape of the patterns. The depth of the pattern can be controlled with dry etch process using reactive ion etching (RIE) with the mixture of SF6 and CHF3. The resultant nanostructures are characterized for their reflectance using UV-Vis-NIR spectrophotometer (Agilent technology, Cary 5000) and for surface morphology using scanning electron microscope (SEM, JEOL JSM-7100F). Once optimized, these optically active nanostructures can be used to replicate with roll-to-roll process or soft lithography for various applications including displays, solar cells, and biosensors.

• 대한화학회지
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• 제16권1호
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• pp.40-45
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• 1972

An electron spin resonance study has been made on lysozyme in. frozen aqueous solutions irradiated with $_{60}Co$ r-rays in air at $77^{circ}K.$ Water resonances are dominant when the concentration and the temperature are both below 20% and $130^{circ}K$ respectively. More solute radicals are produced in the solution of higher concentration. Majority of the solute radicals results from direct hit of the radiation. The same types of radicals are induced at $77^{circ}K$ whether the substances are irradiated in the dry state or in frozen aqueous solution. Based on these results, it is assumed that the number of ESR centers produced by the secondary intermolecular radical reacions and stabilized in aqueous solutions may depend on the concentration of the solution, and the presence of water may facilitate the secondary radical reactions occuring in the solute molecules after heat treatment. Majority of the solute radicals above around $193^{circ}K$ are believed to react with oxygen to form peroxytype radicals. However, when the solution is subiected to heat-treatment at $265^{circ}K$ after irradiation at $195^{circ}K$ the peroxy-type resonance was not observed, suggestin that an appreciable amount of oxygen is condensed into the ice, at $77^{circ}K.$ in addition to the oxygen that has already been dissolved in solution and react with solute free radicals during the process of heat-treatment. When the solution contains $H_2O_2$, no water resonance but $HO_2$, type resonance was observed probably indicating that the radiation-induced OH radicals are trapped in $H_2O_2$ aggregates and react readily with $H_2O_2$ molecules to poroduce $HO_2$ type radicals even at $77^{circ}K.$.

• 한국산업보건학회지
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• 제15권3호
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• pp.166-175
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• 2005

Health effects associated with metal working fluid (MWF) exposures include dermatitis, respiratory disease, hypersensitive pneumonitis, and asthma. Frequently, occupational exposures to MWFs are controlled by ventilating an enclosure with an air cleaning unit that includes a fan preceded by various kinds of filtration. There are several kinds of air cleaning units used in machining centers. But the associated troubles have hindered from efficiently using these devices. The main problem is the relatively short period of filter replacement. The reason is that the air cleaning units usually do not have the de-oiling systems, thus leading the earlier clogging of filters and reducing the flow rate of hood. Thus, the first stage of study was conducted to overcome this problem by developing the new oil mist collector equipped with the easy de-oiling system. The principle of de-oiling is that the centrifugal force generated by spinning the drum covered by filter fabric separates oils from the filter fabric. It would be very similar to the spin-dry laundry. By adopting this de-oiling technique, the problems associated with the conventional oil mist collectors could be solved. Several tests/analyses were performed to make the lab-scale oil mist collector. The collection efficiencies and the de-oiling efficiencies of commercially available filter fabrics were tested. Subsequently, the endurance test were conducted by observing SEM photos of filter fabrics and measuring tensile strength/expansion coefficient after spinning the filter drum for 20 minutes at the different rotation speeds. By doing these experiments, the most appropriate filter fabric and rotation speed/duration were selected. Finally, the new oil mist collector was designed. In the near future, this device must be tested in the real machining center.

• 한국세라믹학회지
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• 제41권1호
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• pp.13-18
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• 2004

$La_{0.5}Sr_{0.5}CoO_3$ (LSCO) electrodes were prepared on ferroelectric $Sr_{0.9}Bi_{2.1}Ta_2O_9$(SBT) thin films by spin coating method using photosensitive sol-gel solution. Self-patterning technique of photosensitive sol-gel solution has advantages such as simple manufacturing process compared to photoresist/dry etching process. Lanthanum(III) 2-methoxyethoxide, Stronitium diethoxide. Cobalu(II)2-methoxyethoxide were used as starting materials for LSCO electrode. UV irradiation on LSCO thin films lead to decrease solubility by M-O-M bond formation and the solubility difference allows us to obtain self-patternine. There was little composition change of the LSCO thin films between before leaching and after leaching in 2-methoxyethanol. The lowest resistivity of LSCO thin films deposited on $SiO_2$/Si substrate was $1.1{\times}10^{-2}{\Omega}cm$ when the thin film was ennealed at $740^{\circ}C$. The values of Pr/Ps and 2Pr of LSCO/SBT/Pt capacitor on the applied voltage of 5V were 0.51, 8.89 ${\mu}C/cm^2$, respectively.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 춘계학술대회 논문집 센서 박막재료 반도체 세라믹
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• pp.116-119
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• 2003

Self-patterning of thin films using photosensitive sol solution has advantages such as simple manufacturing process compared to photoresist/dry etching process. In this study, ferroelectric $Sr_{0.9}Bi_{2.1}Ta_2O_9$(SBT) and $La_{0.5}Sr_{0.5}CoO_3$(LSCO)thin films have been prepared by spin coating method using photosensitive sol solution. $Sr(OC_2H5)_2$, $Bi(TMHD)_3$ and $Ta(OC_2H)_5)_5$ were used as starting materials for SBT solution and $La(OCH_2CH_2OCH_3)_3$, $Sr(OC_2H_5)_2$, $CO(OCH_2CH_2OCH_3)_2$ were used for LSCO solution. Solubility difference by UV irradiation on LSCO thin film allows to obtain a fine patterning due to M-O-M bond formation. The lowest resistivity($4{\times}10^{-3}{\Omega}cm$) of LSCO thin films was obtained by annealing at $740^{\circ}C$.