• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.416-416
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• 2016

Organic-inorganic metal halide perovskite solar cells have received attention because it has a number of advantages with excellent light harvesting, high carrier mobility, and facile solution processability and also recorded recently power conversion efficiency (PCEs) of over 20%. The major issue on perovskite solar cells have been reached the limit of small area laboratory scale devices produced using fabrication techniques such as spin coating and physical vapor deposition which are incompatible with low-cost and large area fabrication of perovskite solar cells using printing and coating techniques. To solution these problems, we have investigated the feasibility of achieving fully printable perovskite solar cells by the blade-coating technique. The blade-coating fabrication has been widely used to fabricate organic solar cells (OSCs) and is proven to be a simple, environment-friendly, and low-cost method for the solution-processed photovoltaic. Moreover, the film morphology control in the blade-coating method is much easier than the spray coating and roll-to-roll printing; high-quality photoactive layers with controllable thickness can be performed by using a precisely polished blade with low surface roughness and coating gap control between blade and coating substrate[1]. In order to fabricate perovskite devices with good efficiency, one of the main factors in printed electronic processing is the fabrication of thin films with controlled morphology, high surface coverage and minimum pinholes for high performance, printed thin film perovskite solar cells. Charge dissociation efficiency, charge transport and diffusion length of charge species are dependent on the crystallinity of the film [2]. We fabricated the printed perovskite solar cells with large area and flexible by the bar-coating. The morphology of printed film could be closely related with the condition of the bar-coating technique such as coating speed, concentration and amount of solution, drying condition, and suitable film thickness was also studied by using the optical analysis with SEM. Electrical performance of printed devices is gives hysteresis and efficiency distribution.

• 한국전기전자재료학회논문지
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• 제34권5호
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• pp.321-326
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• 2021

We fabricated BiAlO thin film by a solution process with a brush coating to be used as liquid crystal (LC) alignment layer. Solution-processed BiAlO was coated on the glass substrate by brush process. Prepared thin films were annealed at different temperatures of 80℃, 180℃, and 280℃. To verify whether the BiAlO film was formed properly, X-ray photoelectron spectroscopy analysis was performed on Bi and Al. Using a crystal rotation method by polarized optical microscopy, LC alignment state was evaluated. At the annealing temperature of 280℃, the uniform homogenous LC alignment was achieved. To reveal the mechanism of LC alignment by brush coating, field emission scanning electron microscope was used. Through this analysis, spin-coated and brush coated film surface were compared. It was revealed that physical anisotropy was induced by brush coating at a high annealing temperature. Particles were aligned in one direction along which brush coating was made, resulting in a physical anisotropy that affects a uniform LC alignment. Therefore, it was confirmed that brush coating combined with BiAlO thin film annealed at high temperature has a significant potential for LC alignment.

• Korean Chemical Engineering Research
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• 제56권3호
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• pp.327-334
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• 2018

출발물질로서 테트라에톡시실란(TEOS)과 메틸트리메톡시실란(MTMS)을 사용하여 졸-겔법에 의해 발수성 코팅용액을 제조하였다. 이 용액을 냉연강판 위에 스핀 코팅하고 열처리하여 비불소계 발수 코팅 도막을 제조 하였다. 이 과정 중 MTMS/TEOS의 몰 비, 물 농도 및 암모니아 농도가 코팅 도막의 발수성에 미치는 영향을 연구하였다. MTMS/TEOS의 몰 비를 1~20으로 변화시켜 제조 한 코팅 도막의 접촉각은 MTMS/TEOS 몰 비가 10 일 때 최대 수치인 $108^{\circ}$를 나타내었다. 반면에 물의 첨가량을 증가시킴에 따라 코팅 도막의 접촉각이 증가하여 발수성이 향상되었다. 또한 암모니아의 첨가량이 커질수록실리카입자의 크기가커져 실리카입자의표면 거칠기가증가하므로 발수성이 증가하였다.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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• pp.1538-1541
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• 2009

Amphiphobic thin films for touched panel application was prepared by $SiO_2$ nanoparticles self-assembled nanostructure. Silicon dioxide nano spheres were prepared by sol-gel method and well dispersed in a solution with surfacants of low surface energy. Nanostrcture thin films were obtained by spin coating technologies.

• Korean Chemical Engineering Research
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• 제53권6호
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• pp.762-769
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• 2015

직경 2~3 nm 크기를 갖는 이산화티탄 나노입자가 산성 용액에서 titanium tetraisopropoxide(TTIP)의 가수분해 반응을 조절함에 의해 합성되었다. 생성된 이산화티탄 나노입자를 졸-겔법에 의해 3-glycidoxypropyl trimethoxysilane(GPTMS)과 반응시킴에 의해 유-무기 혼성 코팅 용액이 제조되었다. 그 후 코팅 용액을 기재인 polycarbonate(PC) 시트 위에 스핀 코팅시키고, $120^{\circ}C$에서 열경화 시켜 고굴절률 하드코팅 도막이 제조되었다. 코팅 도막은 가시광선 영역에서 90%의 높은 광학적 투과율을 보였으며 2H의 연필경도를 나타내었다. 또한 코팅 용액 내의 이산화티탄 나노입자의 함량이 4%에서 25%로 증가됨에 따라 코팅 필름의 굴절률은 633 nm 파장에서 1.502로부터 1.584로 향상되었다.

• Journal of the Korean Physical Society
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• 제73권10호
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• pp.1473-1478
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• 2018

In this study, we have developed a simple and cost-effective method to prevent edge bead formation by covering the edge of a chip-level substrate with heat-resistant tape during patterning using SU-8. Edge beads are a fundamental problem in photoresists and are particularly notable in high-viscosity fluids and thick coatings. Edge beads can give rise to an air gap between the substrate and the patterning mask during UV exposure, which results in non-uniform patterns. Furthermore, the sample may break since the edge bead is in contact with the mask. In particular, the SU-8 coating thickness of the chip-level substrates used in MEMS or BioMEMS may not be properly controlled because of the presence of edge beads. The proposed method to solve the edge bead problem can be easily and economically utilized without the need for a special device or chemicals. This method is simple and prevents edge bead formation on the sample substrate. Despite the small loss in the taping area, the uniformity of the SU-8 coating is improved from 50.9% to 5.6%.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2009년도 춘계학술대회 논문집
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• pp.57-60
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• 2009

The conductive coating method was used for a various industrial fields. For example, Sputtering process is using to a coat of ITO layer in LCD or OLED panel manufacture process and fabricate a base layer of substrate of an electric printing device. However, conventional coating process (beam sputtering, spin coating etc.) has a problems in the industrial manufacturing process. These processes have a very high cost and critical manufacturing environment as a vacuum process. Recently, many researchers were proposed a various printing process instead of conventional coating process. In this paper, we propose an ESD printing process in ITO coating layer and apply to fabricate a conductive coating film. Ours transparent electrode had a surface resistance of about $66{\Omega}/{\square}$ and transparent of 74% in the wavelength of 500nm. This transparent electrode manufacturing process will be applied to Roll-to-Roll process. In addition, we developed roll printing process system for the next generation flexible solar cell.

• Korean Chemical Engineering Research
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• 제46권1호
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• pp.112-117
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• 2008

1:1로 몰 비가 조절된 glycidoxypropyl trimethoxysilane(GPTMS)과 methyl triethoxysilane(MTES)을 출발물질로 하여 sol-gel법에 의해 유-무기 혼성 용액을 제조하였다. 이 용액에 spiropyran계 광 변색 염료를 ethylacetate(EA)에 용해시킨 용액을 혼합하여 광 변색 코팅 용액을 제조하였다. 그 후 기재인 polycarbonate 시트에 스핀 코팅 시키고 $100^{\circ}C$에서 2 h 동안 열 경화 시켜 광 변색 코팅 막을 제조하였다. 코팅 막은 UV 광을 조사함에 의해 가역적인 색변화를 보여주었다. 이때 코팅 막의 소색속도는 코팅 용액 중의 EA의 첨가량이 증가됨에 따라 증가하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 하계학술대회 논문집
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• pp.377-380
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• 2001

The BST thin films to composite (Ba$\sub$x/Sr$\sub$l-x/)TiO$_3$ using sol-gel method were fabricated on Pt/Ti/SiO$_2$/Si substrate. The thin film capacitor to be ferroelectric materials was investigated by structural and electrical properties. BST solution was composited by moi ratio, and then spin-coated (from 3 times to 5 times coating on Pt/SiO$_2$/Si substrate. Thickness of BST ceramics thin films are about 2600∼2800[${\AA}$] in 3 times deposition. The property of leakage current was stable when the applied voltage was 3[V]. Leakage current of 3 times coated BST thin film was 10$\^$-9/∼10$\^$-11/[A] at 0∼3[V].

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제48권7호
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• pp.514-520
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• 1999

Ferroelectric PZT(30/70)/PZT(70/30) heterolayered thin films were fabricated by spin-coating method on the $Pt/Ti/SiO_2Si$ substrate alternately using(30/70) and PZT(70/30) alkoxide solutions prepared by sol-coating method. The coating and heating procedure was repeated six times to form PZT heterolayered films, and thickness of the film obtained by one-times drying/sintering process was about 40-50 nm. All PZT heterolayered films, showed dense and homogeneous structure without the presence of rosette sturctrue. The relative dielectric constant, remanent polarization and leakage current density of PZT heterolayered films were superior to those of single composition PZT(30/70) and PZT(70/30) films, and those values for the PZT-6 film were 975, $21 \muC/cm^2\; and\; 8\times10^{-9}\; A/cm^2$, respectively. And the PZT-6 heterolayered film showed fairly good fatigue characteristics of remanent polarization and coercive field after application of $10^8$ switching cycles.