• Title/Summary/Keyword: Sn-3.0Ag

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A Study on Wetting, Interfacial Reaction and Mechanical Properties between Sn-Bi-Ag System Solders and Cu Substrate (Sn-Bi-Ag계 땜납과 Cu기판과의 젖음성, 계면 반응 및 기계적 성질에 관한 연구)

  • Seo, Youn-Jong;Lee, Kyung-Ku;Lee, Doh-Jae
    • Journal of Korea Foundry Society
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    • v.17 no.3
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    • pp.245-251
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    • 1997
  • Solderability, interfacial reaction and mechanical properties of joint between Sn-Bi-Ag base solder and Cu-substrate were studied. Solders were subjected to aging treatments to see the change of mechanical properties for up to 30 days at $100^{\circ}C$, and then also examined the changes of microstructure and morphology of interfacial compound. Sn-Bi-Ag base solder showed about double tensile strength comparing to Pb-Sn eutectic solder. Addition of 0.7wt%Al in the Sn-Bi-Ag alloy increase spread area on Cu substrate under R-flux and helps to reduce the growth of intermetallic compound during heat-treatment. According to the aging experiments of Cu/solder joint, interfacial intermetallic compound layer was exhibited a parabolic growth to aging time. The result of EDS, it is supposed that the soldered interfacial zone was composed of $Cu_6Sn_5$.

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Development of Copper Cored Solder Ball(CCSB) by Sn-Ag-Cu Alloy Plating Process

  • Lee, Deok-Haeng;Jeong, Un-Seok;Kim, Jong-Uk;Kim, Pan-Su
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2015.11a
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    • pp.284-284
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    • 2015
  • 반도체 Ball Grid Array(BGA)에 사용되던 종래의 Solder Ball은 Sn96.3 Ag3.0 Cu0.7의 용융솔더를 이용하여 제작하고 있다. 이는 SMT Reflow공정에서 BGA Ball의 퍼짐현상으로 인해 원래의 Ball Height에 영향을 미쳐 접합불량의 원인이 되고 있다. 이러한 문제를 해결하기 위해 Copper Core Ball위에 SnAgCu 삼원합금도금공정을 이용해 문제점을 해결하고자 했으며, 본 실험을 통해 구현한 CCSB를 이용해 SMT Reflow를 진행한 결과 종래의 BGA Ball보다 우수한 효과를 확인할 수 있었다.

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Bonding Strength of Cu/SnAgCu Joint Measured with Thermal Degradation of OSP Surface Finish (OSP 표면처리의 열적 열화에 따른 Cu/SnAgCu 접합부의 접합강도)

  • Hong, Won-Sik;Jung, Jae-Seong;Oh, Chul-Min
    • Journal of the Microelectronics and Packaging Society
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    • v.19 no.1
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    • pp.47-53
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    • 2012
  • Bonding strength of Sn-3.0Ag-0.5Cu solder joint due to degradation characteristic of OSP surface finish was investigated, compared with SnPb finish. The thickness variation and degradation mechanism of organic solderability preservative(OSP) coating were also analyzed with the number of reflow process. To analyze the degradation degree of solder joint strength, FR-4 PCB coated with OSP and SnPb were experienced preheat treatment as a function of reflow number from 1st to 6th pass, respectively. After 2012 chip resistors were soldered with Sn-3.0Ag-0.5Cu on the pre-heated PCB, the shear strength of solder joints was measured. The thickness of OSP increased with increase of the number of reflow pass by thermal degradation during the reflow process. It was also observed that the preservation effect of OSP decreased due to OSP degradation which led Cu pad oxidation. The mean shear strength of solder joints formed on the Cu pads finished with OSP and SnPb were 58.1 N and 62.2 N, respectively, through the pre-heating of 6 times. Although OSP was degraded with reflow process, the feasibility of its application was proven.

Influence of P and Mg Additions on the Mechanical Properties and Electrical Conductivity of Cu-Sn Based Alloys (Cu-Sn계 합금의 기계적 성질과 전기전도도에 미치는 P 및 Mg 첨가의 영향)

  • Kim, Jeong-Min;Park, Joon-Sik;Kim, Ki-Tae
    • Journal of the Korean Society for Heat Treatment
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    • v.20 no.6
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    • pp.318-322
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    • 2007
  • The high electrical conductivity Cu-0.15% Sn alloys containing various P contents, and the high conductivity and high strength Cu-0.1% Sn-0.1%Ag alloys with various Mg/P additions were fabricated and their mechanical properties and electrical conductivity were investigated. The electrical conductivity was generally decreased as the P content was increased where as the hardness and strength was shown to increase. When Mg was added to P-containing Cu alloys, the detrimental effect of P on the conductivity was significantly reduced, and TEM observations indicated that the formation of $Mg_3P_2$ phase is responsible for this result.

Non-conductive Film Effect on Ni-Sn Intermetallic Compounds Growth Kinetics of Cu/Ni/Sn-2.5Ag Microbump during Annealing and Current Stressing (열처리 및 전류인가 조건에서 Cu/Ni/Sn-2.5Ag 미세범프의 Ni-Sn 금속간화합물 성장 거동에 미치는 비전도성 필름의 영향 분석)

  • Kim, Gahui;Ryu, Hyodong;Kwon, Woobin;Son, Kirak;Park, Young-Bae
    • Journal of the Microelectronics and Packaging Society
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    • v.29 no.2
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    • pp.81-89
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    • 2022
  • The in-situ electromigration(EM) and annealing test were performed at 110, 130, and 150℃ with a current density of 1.3×105 A/cm2 conditions to investigate the effect of non-conductive film (NCF) on growth kinetics of intermetallic compound (IMC) in Cu/Ni/Sn-2.5Ag microbump. As a result, the activation energy of the Ni3Sn4 IMC growth in the annealing and EM conditions according to the NCF application was about 0.52 eV, and there was no significant difference. This is because the growth rate of Ni-Sn IMC is much slower than that of Cu-Sn IMC, and the growth behavior of Ni-Sn IMC increases linearly with the square root of time, so it has the same reaction mechanism dominated by diffusion. In addition, there is no difference in the activation energy of the Ni3Sn4 IMC growth because the EM resistance effect of the back stress according to the NCF application is not large.

Effect of surface treatment on thermo-compression bonding properties of electrodes between printed circuit boards (표면처리에 따른 인쇄회로기판의 열압착 접합 특성 평가)

  • Lee, Jong-Gun;Lee, Jong-Bum;Choi, Jung-Hyun;Jung, Seong-Boo
    • Proceedings of the KWS Conference
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    • 2010.05a
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    • pp.81-81
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    • 2010
  • 전자 패키징은 미세화, 경량화, 저가화를 지향하고 신뢰성의 향상을 위해 발전해 왔다. 이러한 경향은 전자부품 자체의 성능 향상 뿐 아니라 전자부품을 장착, 고정할 수 있게 하는 인쇄회로 기판(PCB : Printed Circuit Board)의 성능에 많은 관심을 가지게 되었다. 전기적 신호의 손실을 줄이기 위해 전기, 전자 산업체에서는 가볍고 굴곡성이 우수한 연성인쇄회로기판(FPCB : Flexible PCB)과 가격이 싸고 신뢰성이 입증된 경성인쇄회로기판(RPCB : Rigid PCB)이 그 대상이다. 본 논문에서는 이 PCB중에서도 RPCB와 FPCB간의 열압착 방식으로 접합 시 전극간의 접합 양상을 보았다. 이 열압착 방식은 기존에 PCB를 접합하는데 사용하고 있는 connector를 이용한 체결법을 대체하는 기술로써 솔더를 중간층(interlayer)로 이용하여 열과 압력으로 접합하는 방식이다. 이 방식을 connector를 사용하는 방식에 비해 그 부피가 작고 I/O개수에 크게 영향 받지 않으며 자동화 공정이 쉬운 장점을 가지고 있다. 접합의 대상 중 RPCB의 경우는 무전해 니켈 금도금(ENIG : Electroless Nickle Immersion Gold)로 제작하였으며 FPCB의 경우는 ENIG와 유기보호피막(OSP : Organic solderability preservation) 처리하였다. 실험에 사용한 PCB는 $300\;{\mu}m$ pitch의 미세피치이며 솔더의 조성은 Sn-3.0Ag-0.5Cu (in wt%)과 Sn-3.0Ag (in wt%)를 사용하였다. 접합 온도와 접합 시간 그리고 접합 압력에 따라 최적의 접합 조건을 도출하였다. 접합 강도는 $90^{\circ}$ Peel Test를 통해서 측정하였으며 접합면 및 파괴면은 SEM과 EDS를 통하여 분석하였다.

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Electrical and Optical Properties of F-Doped SnO2 Thin Film/Ag Nanowire Double Layers (F-Doped SnO2 Thin Film/Ag Nanowire 이중층의 전기적 및 광학적 특성)

  • Kim, Jong-Min;Koo, Bon-Ryul;Ahn, Hyo-Jin;Lee, Tae-Kun
    • Korean Journal of Materials Research
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    • v.25 no.3
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    • pp.125-131
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    • 2015
  • Fluorine-doped $SnO_2$ (FTO) thin film/Ag nanowire (NW) double layers were fabricated by means of spin coating and ultrasonic spray pyrolysis. To investigate the optimum thickness of the FTO thin films when used as protection layer for Ag NWs, the deposition time of the ultrasonic spray pyrolysis process was varied at 0, 1, 3, 5, or 10 min. The structural, chemical, morphological, electrical, and optical properties of the double layers were examined using X-ray diffraction, X-ray photoelectron spectroscopy, field-emission scanning electron microscopy, transmission electron microscopy, the Hall effect measurement system, and UV-Vis spectrophotometry. Although pure Ag NWs formed isolated droplet-shaped Ag particles at an annealing temperature of $300^{\circ}C$, Ag NWs covered by FTO thin films maintained their high-aspect-ratio morphology. As the deposition time of the FTO thin films increased, the electrical and optical properties of the double layers degraded gradually. Therefore, the double layer fabricated with FTO thin films deposited for 1 min exhibited superb sheet resistance (${\sim}14.9{\Omega}/{\Box}$), high optical transmittance (~88.6 %), the best FOM (${\sim}19.9{\times}10^{-3}{\Omega}^{-1}$), and excellent thermal stability at an annealing temperature of $300^{\circ}C$ owing to the good morphology maintenance of the Ag NWs covered by FTO thin films.

Shearing Characteristics of Sn3.0AgO.5Cu Solder Ball for Standardization of High Speed Shear Test (고속전단시험의 표준화를 위한 Sn3.0Ag0.5Cu 솔더볼의 전단특성)

  • Jung, Do-Hyun;Lee, Young-Gon;Jung, Jae-Pil
    • Journal of the Microelectronics and Packaging Society
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    • v.18 no.1
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    • pp.35-39
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    • 2011
  • Shearing characteristics of Sn-3.0wt%Ag-0.5wt%Cu ball for standardization of high speed shear test were investigated. The solder ball of 450 ${\mu}m$ in diameter was reflowed at $245^{\circ}C$ on FR4 PCB (Printed Circuit Board) to prepare a sample for the high-speed shear test. The metal pads on the PCB were OSP (Organic Solderability Preservative, Cu pad) and ENIG (Electroless Nickel/Immersion Gold, i.e CulNi/Au). Shearing speed was varied from 0.5 to 3.0 m/s, and tip height from 10 to 135 ${\mu}m$. As experimental results, for the OSP pad, a ductile fracture increased with tip height, and it decreased with shearing speed. In the case of ENIG pad, the ductile fracture increased with the tip height. The tip height of 10 ${\mu}m$ (2% of solder ball diameter) was unsuitable since the fracture mode was mostly pad lift. Shear energy increased with increasing shearing tip height from 10 to 135 ${\mu}m$ for both of OSP and ENIG pads.

Flux residue effect on the electrochemical migration of Sn-3.0Ag-0.5Cu (Sn-3.0Ag-0.5Cu 솔더링에서 플럭스 잔사가 전기화학적 마이그레이션에 미치는 영향)

  • Bang, Jung-Hwan;Lee, Chang-Woo
    • Journal of Welding and Joining
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    • v.29 no.5
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    • pp.95-98
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    • 2011
  • Recently, there is a growing tendency that fine-pitch electronic devices are increased due to higher density and very large scale integration. Finer pitch printed circuit board(PCB) is to be decrease insulation resistance between circuit patterns and electrical components, which will induce to electrical short in electronic circuit by electrochemical migration when it exposes to long term in high temperature and high humidity. In this research, the effect of soldering flux acting as an electrical carrier between conductors on electrochemical migration was investigated. The PCB pad was coated with OSP finish. Sn3.0Ag0.5Cu solder paste was printed on the PCB circuit and then the coupon was treated by reflow process. Thereby, specimen for ion migration test was fabricated. Electrochemical migration test was conducted under the condition of DC 48 V, $85^{\circ}C$, and 85 % relative humidity. Their life time could be increased about 22% by means of removal of flux. The fundamentals and mechanism of electrochemical migration was discussed depending on the existence of flux residues after reflow process.