The Effect of Slurry with Pattern Density, Size & Stepheight on Chemical Mechanical Polishing for sub $0.18{\mu}m$ DRAM
(화학기계연마에 있어 패턴 밀도, 크기 및 단차에 따른 슬러리 효과)
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- Proceedings of the Materials Research Society of Korea Conference
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- 1999.05a
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- pp.29-29
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- 1999