• 제목/요약/키워드: Silicon Piezoresistive Accelerometer

검색결과 14건 처리시간 0.02초

Silicon-no-insulatir 구조를 갖는 실리콘 압저항 가속도계 (A Silicon Piezoresistive Accelerometer with Silicon-on-insulator Structure)

  • 양의혁;양상식
    • 대한전기학회논문지
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    • 제43권6호
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    • pp.1036-1038
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    • 1994
  • In this paper, a silicon piezoresistive accelerometer is designed and fabricated using a silicon direct bonded wafer. The accelerometer consists of a seismic mass and four cantilevers, and is fabricated mainly by the anisotropic etching method using EPW as an etchant. The measured sensitivity and the resonant frequency are 0.02 mV/V.g and 3.4 kHz, respectively. The nonlinearity is less than $\pm$0.3% of the full scale of the output.

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SOI 구조를 이용한 실리콘 압저항 가속도계의 설계 및 제작 (Design and Fabrication of a Silicon Piezoresistive Accelerometer using SOI Structure)

  • 양희혁;양상식;한상우
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1993년도 정기총회 및 추계학술대회 논문집 학회본부
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    • pp.192-194
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    • 1993
  • In this paper, a silicon piezoresistive accelerometer of which the cantilevers have uniform thickness is designed and fabricated with SOI wafer. The accelerometer consists of a seismic mass and four cantilevers, and is fabricated mainly by the anisotropic etching method using EPW etchant. The fabrication processes are that of the frontside processes including the etching of the cantilevers and the doubleside alignment holes, the diffusion of the piezoresisters and patterning of the contact windows, and the metal connection process, and that of the backside processes including the etching of the shallow cavity and the seismic mass. Because of the uniformity of thickness, the performance of the accelerometer fabricated with SOI wafer is expected to be better than that of accelerometer fabricated by the time-controlled etching method.

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p+ 실리콘 박막을 이용한 폴리실리콘 압저항 가속도계의 제작 및 측정 (Fabrication and Testing of a Polysilicon Piezoresistive Accelerometer using p+ Silicon Diaphragm)

  • 양의혁;정옥찬;양상식
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1996년도 하계학술대회 논문집 C
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    • pp.1994-1996
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    • 1996
  • This paper presents the fabrication and testing of a polysilicon piezoresistive accelerometer with p+ silicon diaphragm by simple process such as two step photolithography for the RIE process to form the cantilevers and a deep anisotropic etch process for the complete fabrication of the accelerometer. The fabricated accelerometer consists of a seismic mass and four cantilevers on which polysilicon piezoresistors are formed. The measurement of the output signal from the bridge circuit of the fabricated accelerometer is carried out with the HP 3582A spectrum analyzer. The analysis of the experimental result is showed in terms of the sensitivity and the resonant frequency. At atmospheric condition, the measurement values of the sensitivity and the resonant frequency are $11\;{\mu}V/Vg$ and 475 Hz, respectively.

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고온용 3차원 실리콘 가속도센서 (Three Dimensional Silicon Accelerometer for High Temperature Range)

  • 손미정;서희돈
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1998년도 하계학술대회 논문집 G
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    • pp.2504-2508
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    • 1998
  • In this paper, we propose the new detecting method for three dimensional piezoresistive silicon accelerometer. Furthermore the accelerometer is formed to have endurance for high temperature by perfect isolation of the piezoresistors using Silicon On Insulator(SOI) wafer. Sensor size are optimized with analytical formulae and extended with FEM simulation for the more detailed results. The accelerometer was fabricated by bulk micromachining techonology. We measured the temperature characteristics and the output characteristics, and the both characteristics were compared with the simulated results

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고충격 미소가속도계의 압저항-구조 연성해석 및 최적설계 (Piezoresistive-Structural Coupled-Field Analysis and Optimal Design for a High Impact Microaccelerometer)

  • 한정삼;권순재;고종수;한기호;박효환;이장우
    • 한국군사과학기술학회지
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    • 제14권1호
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    • pp.132-138
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    • 2011
  • A micromachined silicon accelerometer capable of surviving and detecting very high accelerations(up to 200,000 times the gravitational acceleration) is necessary for a high impact accelerometer for earth-penetration weapons applications. We adopted as a reference model a piezoresistive type silicon micromachined high-shock accelerometer with a bonded hinge structure and performed structural analyses such as stress, modal, and transient dynamic responses and sensor sensitivity simulation for the selected device using piezoresistive-structural coupled-field analysis. In addition, structural optimization was introduced to improve the performances of the accelerometer against the initial design of the reference model. The design objective here was to maximize the sensor sensitivity subject to a set of design constraints on the impact endurance of the structure, dynamic characteristics, the fundamental frequency and the transverse sensitivities by changing the dimensions of the width, sensing beams, and hinges which have significant effects on the performances. Through the optimization, we could increase the sensor sensitivity by more than 70% from the initial value of $0.267{\mu}V/G$ satisfying all the imposed design constraints. The suggested simulation and optimization have been proved very successful to design high impact microaccelerometers and therefore can be easily applied to develop and improve other piezoresistive type sensors and actuators.

압전저항 가속도계를 위한 실리콘 공진자에 관한 연구 (A Study on a Silicon Resonator for Piezoresistive Accelerometer)

  • 양의혁;양상식
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1991년도 추계학술대회 논문집 학회본부
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    • pp.274-277
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    • 1991
  • A piezoresistive silicon resonator which can be used as an accelerometer is designed and fabricated using silicon micromachining techniques. The device consists of a seismic mass and four deflection beams in which eight piezoresistors are diffused. The structure is fabricated by EPW etching process. The piezoresistors are properly arranged and connected to make a bridge circuit, with which acceleration in only one direction can be measured. According to the experimental results, the first resonant frequency of this resonator is above 15 kHz, and this transducer has a sensitivity of 5.56 ${\mu}V/Vg$.

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범프 본딩된 압저항 실리콘 가속도센서의 제조 (Fabriaction of bump bounded piezoresistive silicon accelerometer)

  • 심준환;이상호;이종현
    • 전자공학회논문지D
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    • 제34D권7호
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    • pp.30-36
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    • 1997
  • Bump bonded piezoesistive silicon accelerometer was fabricated by the porous silicon micromachining and th eprocess technique of integrated circuit. The output voltage of the accelerometer fabricated on (111)-oreiented Si substrates with n/n$^{+}$n triple layers showed good linear characteristic of less than 1%. The measured sensitivity and the resonant frequency was about 743 .mu.V/g and 2.04 kHz, respectively. And the transverse sensitivity of 5.2% was measured from the accelerometer. Also, to investigate an influence on the output characteristics of the sensor due to bump bonding, the values of the piezoresistors were measured through thermal-cycling test in the temperature variation form -50 to 120.deg. C. Then, there was 0.014% resistance changes about 3.61 k.ohm., so sthe output charcteristics of the sensor was less affected by bump bonding.g.

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$p^+$ 컨틸레버 빔을 이용한 다결정 실리론 압저항 가속도계의 제작 (Fabrication of a Polysilicon Piezoresistive Accelerometer Using $p^+$ Cantilever Beams)

  • 지영훈;양의혁;양상식
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1994년도 추계학술대회 논문집 학회본부
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    • pp.416-418
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    • 1994
  • In this study, a silicon piezoresistive accelerometer is designed and fabricated using $p^+$ etch stop layer. The accelerometer consists of a seismic mass and tour cantilevers, and is fabricated mainly by the anisotropic etching method using EPW as an etchant. Eight piezoresistors are properly arranged and connected to make a bridge circuit so that acceleration in only one direction may be measured. The etch stop method is adequate to the mass-production and the precise thickness control of the diaphragms as well, whet compared with the electrochemecal etch stop method.

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실리콘 에피층을 이용한 자동차 에어백용 가속도계 (Airbag Accelerometers Using Silicon Epitaxial Layers)

  • 고종수;김규현;이창렬;조영호;이귀로;곽병만
    • 한국자동차공학회논문집
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    • 제4권5호
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    • pp.9-15
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    • 1996
  • A silicon microaccelerometer is designed and fabricated using silicon epitaxial layers for automotive electronic airbag applications. A cantilever structure is chosen for high sensitivity and piezoresistive detection method is adopted for circuit simplicity and low cost. An optimum design is used to find optimum microstructure sizes for maximum sensitivity subject to performance requirements and design constraints on natural frequency, damping ratio, maximum allowable stress and microfabrication limitations. The microaccelerometer is fabricated by micromachining processing steps, composed of material-selective and orientation-dependent chemical etching techniques. Fabricated prototype shows a sensitivity of 88.6$\mu\textrm{V}$/g within a resonant frequency of 1.75KHz. Estimated performance of the microaccelerometer is compared with measured one. Discrepancy between the theoretical values and the experimental values is discussed together with possible sources of the errors.

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TPMS용 4빔 실리콘 미세 압저항형 가속도센서의 설계 및 제작 (Design and Fabrication of 4-beam Silicon-Micro Piezoresistive Accelerometer for TPMS Application)

  • 박기웅;김현철
    • 대한전자공학회논문지SD
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    • 제49권2호
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    • pp.1-8
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    • 2012
  • 본 논문은 자동차용 타이어 공기압 모니터링 시스템(TPMS)의 핵심 부품인 가속도센서에 관한 연구이다. 일반적으로 압저항형 가속도센서는 정전용량형 가속도센서에 비하여 제조 비용이 적고 출력 특성이 선형적이며 주변 잡음에 면역성이 강한 장점을 갖는다. 그래서 TPMS용으로 압저항형을 선택하였고, ANSYS 프로그램을 이용하여 3가지 타입의 구조를 설계하여 공진주파수 특성을 비교하여 가장 안정적인 구조인 질량체 가장자리의 가운데에 있는 4개의 빔에 의하여 지지되는 브릿지 타입의 실리콘압저항형 가속도센서를 선택하였다. 그리고 센서 크기를 고려하여 빔의 길이는 $200{\mu}m$로 정하였으며, 빔 길이에 따른 최대응력과 최대변위를 시뮬레이션하여 센서를 설계하였다. TPMS용 4 빔 실리콘 미세 압저항형 가속도센서의 크기는 $3.0mm{\times}3.0mm{\times}0.4mm$의 크기로 제작 되었다. 휠 각도에 따른 출력 특성과 온도 특성을 측정하여 센서의 특성을 분석 하였다. 그 결과 가속도센서의 옵셋 전압은 43.2 mV 이고 감도는 $42.5{\mu}V/V/g$ 이다. 센서의 특징으로 내충격성은 1500 g 이고, 측정 범위는 0 ~ 60 g, 사용온도는 $-40^{\circ}C{\sim}125^{\circ}C$ 를 갖는다.