• Applied Chemistry for Engineering
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• v.22 no.6
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• pp.631-635
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• 2011

Spherical and non-spherical silica particles prepared by the direct oxidation were studied for the effect of the particle size and shape of these particles on oxide CMP removal rate. Spherical silica particles, which have 10~100 nm in size, were prepared by the direct oxidation process from silicon in the presence of alkali catalyst. The 10 nm silica particles were aggregated by addition of an acid, an alcohol, or a silane as an aggregation inducer between the particles. Two or more aggregated silica particles were used as a seed to grow non spherical silica particles in the direct oxidation process of silicon in the presence of alkali catalyst. The oxide removal rate of spherical silica particles increased with increasing an average particle size for spherical silica abrasives in the oxide CMP. It further increased non-spherical particles, compared with the spherical particles in the similar average particle size.

• Korean Chemical Engineering Research
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• v.50 no.6
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• pp.952-959
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• 2012

The photocatalytic reactor was designed to have improved efficiency by enhancing a light intensity of photocatalytic reactor using a reflector coated on the surface at the outer radius of annular shaped photocatalytic reactor. The improved photocatalytic reactor performed to treat waste air containing malodor and VOC with the enhanced light intensity, of which the effect on their removal efficiency was investigated. The intensities of illumination of the improved photocatalytic reactor filled with porous silica-based media and nonporous glass bead media carrying photocatalyst were observed to increase by 28.5% and 30.1%, respectively, compared to those of photocatalytic reactor without any reflector. Using the improved photocatalytic reactor filled with porous silica-based media and nonporous glass bead media carrying photocatalyst, the removal efficiencies were enhanced by 2~3% and insignificantly, respectively. The removal efficiencies of the optimized photocatalytic reactor with reflectors, filled with porous silica-based media carrying photocatalyst, were observed to increase by 26% and 60%, compared to those of photocatalytic reactor (i.e., 19% and 53%), without any reflector, filled with nonporous glass bead media carrying photocatalyst, for hydrogen sulfide and toluene, respectively. The roughness of used reflector surface was measured to be ca. four times as big as that of a commercial mirror. However, their removal efficiencies are expected to be enhanced by increasing an light intensity resulting from lowering the roughness of used reflector coated on the improved photocatalytic reactor in the future.

• Resources Recycling
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• v.30 no.2
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• pp.68-74
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• 2021

This study investigated formaldehyde (HCHO) removal by preparing porous supports using domestic low-grade silica coated with Co-ZSM5 and Cu-ZSM5 as the catalysts. First, the sample of the raw material for the support contained 90% silica with quartz crystal phase, which was confirmed as low-grade silica. According to Energy-dispersive X-ray spectroscopy (EDS) and Fourier-transform infrared spectroscopy (FT-IR) analyses, the catalysts, Co-ZSM5 and Cu-ZSM5, were successfully coated on the surface of the porous silica supports. During the removal test of HCHO using the prepared Co-ZSM5 and Cu-ZSM5 coated beads, depending on the reaction temperature, the Co-ZSM5 coated beads exhibited higher removal efficiencies (>97%) than the Cu-ZSM5 beads at 200 ℃. The higher efficiency of the Co-ZSM5 coating may be attributed to its superior surface activity properties (BET surface area and pore volume) that lead to the favorable HCHO decomposition. Therefore, Co-ZSM5 was determined to be the suitable catalyst for removing HCHO as a coating on a porous support fabricated using domestic low-grade silica.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.06a
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• pp.118-118
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• 2008

The oxide CMP has been applied to interlayer dielectric(ILD) and shallow trench isolation (STI) in chip fabrication. Recently the slurry used in oxide CMP being changed from silica slurry to ceria (cerium dioxide) slurry particularly in STI CMP, because the material selectivity of ceria slurry is better than material selectivity of silica slurry. Moreover, the ceria slurry has good a planarization efficiency, compared with silica slurry. However ceria abrasives make a material removal rate too high at the region of wafer center. Then we focuses on why profile of material removal rate is convex. The material removal rate sharply increased to 3216 $\AA$/min by $4^{th}$ run without conditioning. After $4^{th}$ run, material removal rate converged. Furthermore, profile became more convex during 12 run. And average material removal rate decreased when conditioning process is added to end of CMP process. This is due to polishing mechanism of ceria. Then the ceria abrasive remains at the pad, in particular remains more at wafer center contacted region of pad. The field emission scanning electron microscopy (FE-SEM) images showed that the pad sample in the wafer center region has a more ceria abrasive than in wafer outer region. The energy dispersive X-ray spectrometer (EDX) verified the result that ceria abrasive is deposited and more at the region of wafer center. Therefore, this result may be expected as ceria abrasives on pad surface causing the convex profile of material removal rate.

• Bulletin of the Korean Chemical Society
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• v.34 no.8
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• pp.2358-2366
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• 2013

Iron oxide (ferrihydrite, hematite, and magnetite) coated silica gels were prepared using a low-cost, easily-scalable and straightforward method as the adsorbent material for arsenic removal application. Adsorption of the anionic form of arsenic oxyacids, arsenite ($AsO^{2-}$) and arsenate ($AsO{_4}^{3-}$), onto hematite coated silica gel was fitted against non-linear 3-parameter-model Sips isotherm and 2-parameter-model Langmuir and Freundlich isotherm. Adsorption kinetics of arsenic could be well described by pseudo-second-order kinetic model and value of adsorption energy derived from non-linear Dubinin-Radushkevich isotherm suggests chemical adsorption. Although arsenic adsorption process was not affected by the presence of sulfate, chloride, and nitrate anions, as expected, bicarbonate and silicate gave moderate negative effects while the presence of phosphate anions significantly inhibited adsorption process of both arsenite and arsenate. When the actual efficiency to remove arsenic was tested against 1 L of artificial arsenic-contaminated groundwater (0.6 mg/L) in the presence competing anions, the reasonable amount (20 g) of hematite coated silica gel could reduce arsenic concentration to below the WHO permissible safety limit of drinking water of $10{\mu}g/L$ without adjusting pH and temperature, which would be highly advantageous for practical field application.

• Membrane Journal
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• v.27 no.1
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• pp.77-83
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• 2017

Transient behavior of fouling resistance was observed with a laboratory-scaled, submerged microfiltration membrane system treating high-turbidity source water consisting of inorganic silica particles and humic acid. Fouling mitigation efficiency with inorganic silica particles caused by aeration was reduced significantly as both humic acid and calcium ion existed together. Scanning electron microscopic observations showed that humic acid was adsorbed onto the surface of inorganic silica particles in the presence of calcium. Turbidity removal was achieved almost completely by submerged MF system regardless of feed compositions. However, the $UV_{254}$ removal of humic acid was improved in the presence of both calcium and inorganic silica particles. Additionally, increasing air-flow rate tended to increase $UV_{254}$ removal efficiency higher than 80%. This may be caused by back-transport of humic acid enhanced by inorganic silica particles providing surface for organic adsorption in the presence of calcium.

• Membrane Journal
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• v.7 no.4
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• pp.167-174
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• 1997

The concentration of silica is required to meet a certain level because silica affects fuel and materials integrity by forming a zeolite layer on fuel cladding surfaces. When the established Feed and Bleed method is employed, nuclear waste increase and the corresponding amount of boric acid is constantly consumed. This study concentrates on minimizing the amount of nuclear waste and consumption of boric acid. Using five different membranes, operating conditions such as temperatur, feed water flow rate, boric acid recovery and silica removal rate were examined. A silica-selective removal system was designed based on the above optimization procedures. Three-stage system was designed with two characteristically different membranes so that it could correspond with the different situation easily. Compared to the pevious results of the Feed and Bleed method, the current method showed that the amount of nuclear waste was reduced to 7%, and the consumption of boric acid to 15.7%.

• Journal of the Korean Geotechnical Society
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• v.38 no.6
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• pp.41-47
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• 2022

Permeable pavement technology allows the penetration of rainfall into the roadbed, thereby reducing surface runoff and enhancing water quality. The water quality can be improved by adding a filter layer to the permeable pavement. This study analyzes the permeability performance and particulate-matter removal efficiency of a bottom ash-silica sand filter. The performances of five filters with bottom ash and silica sand as the basic materials were evaluated on particulate matter sized 60 ㎛ or smaller. The pure silica sand sample and pure bottom ash sample delivered an average removal efficiency of around 70%. The removal efficiency of the mixed sample was approximately 90%, exceeding the recommended reduction rate (80%) at non-point pollution reduction facilities. In future work, the filter performance should be further verified on permeable pavement.

• Journal of the Korean Ceramic Society
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• v.36 no.12
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• pp.1374-1380
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• 1999

The cause of Scond Harmonic Generation (SHG) in thermally poled silica glass is suggested basedon the electrical and dielectric relaxation measurements. The absorption currents as functions of time were measured for various types of silica glasses and analyzed by the theory of Space Charge Polarization. Space charge polarization occurs when an ionic conducting material is subjected to dc electric field with blocking electrode. Thermal poling performed to induce SHG in silica glass is basically identical to the process generating space charge polarization. Hence it was found that gene-ration removal reproduction and temperature dependence of SHG in poled silica is directly related to those of space charge polarization. It turned out that the fundamental parameters governing the SHG in poled silica are charge carrier concentration and mobility. Based on the theory of space charge polarization and experimental results of electrical rela-xation the method to increase the intensity of SHG is proposed.

• Proceedings of the KIEE Conference
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• 2004.07c
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• pp.1600-1604
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• 2004

As the integrated circuit device shrinks to the smaller dimension, the chemical mechanical polishing (CMP) process was required for the global planarization of inter-metal dielectric(IMD) layer with free-defect. The effect of alternative commerical slurries pads, and post-CMP cleaning alternatives are discuess, with removal rate, scratch dentisty, surface roughness, dishing, erosion and particulate density used as performance metrics. we investigated the performance of $SnO_2$-CMP process using commonly used silica slurry, ceria slurry, tungsten slurry. This study shows removal rate and nonuniformity of $SnO_2$ thin film used to gas sensor by using Ceria, Silica, W-Slurry after CMP process. This study also shows the relation between partical size and CMP with partical size analysis of used slurry.