• 제목/요약/키워드: SiKyung

검색결과 2,128건 처리시간 0.033초

Influence of RTA treatments on optical properties of ZnO nanorods synthesized by wet chemical method

  • Shan, Qi;Ko, Y.H.;Lee, H.K.;Yu, J.S.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.190-190
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    • 2010
  • Zinc oxide is the most attractive material due to the large direct band gap (3.37 eV), excellent chemical and thermal stability, and large exciton binding energy (60 meV). Recently, ZnO nanorods were used as the high efficient antireflection coating layer of solar cells based on silicon (Si). In this reports, we studied the effects of rapid thermal annealing (RTA) treatment on optical properties of ZnO nanorods. For fabrication of ZnO nanorods, there are many methods such as hydrothermal method, sol-gel method, and metal organic chemical vapor deposition method. Among of them, we used the conventional wet chemical method which is simple and low temperature growth. In order to synthesize the ZnO nanorods, the ZnO films were deposited on Si substrate by RF magnetron sputtering at room temperature and the samples were dipped to aqua solution containing the zinc nitrate and hexamethylentetramines (HMT). The synthesis process was achieved in keeping with temperature of $90-95^{\circ}C$ and under constant stirring. The morphology of ZnO nanorods on glass and Si was characterized by scanning electron microscopy. For the analysis of antireflection performance, the reflectance and transmittance were measured by spectrophotometer. And for analyzing the effects of RTA treatment on ZnO nanorods, crystalline properties were investigated by X-ray diffraction measurements and optical properties was estimated by photoluminescence spectra.

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An Offset-Compensated LVDS Receiver with Low-Temperature Poly-Si Thin Film Transistor

  • Min, Kyung-Youl;Yoo, Chang-Sik
    • ETRI Journal
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    • 제29권1호
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    • pp.45-49
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    • 2007
  • The poly-Si thin film transistor (TFT) shows large variations in its characteristics due to the grain boundary of poly-crystalline silicon. This results in unacceptably large input offset of low-voltage differential signaling (LVDS) receivers. To cancel the large input offset of poly-Si TFT LVDS receivers, a full-digital offset compensation scheme has been developed and verified to be able to keep the input offset under 15 mV which is sufficiently small for LVDS signal receiving.

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반응소결 SiC 재료의 미세조직 및 강도 특성 (Microstructure and Strength Property of Reaction Sintered SiC Materials)

  • 이상필;신윤석;이진경
    • 한국해양공학회:학술대회논문집
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    • 한국해양공학회 2004년도 학술대회지
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    • pp.380-385
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    • 2004
  • The efficiency of complex slurry preparation route for developing the high performance SiC matrix of RS-SiCf/SiC composites has been investigated. The green bodies for RS-SiC materials prior to the infiltration of nw/ten silicon were prepared with various C/SiC complex matrix slurries, which associated with both different sizes of starting SiC particles and blending ratios of starting SiC and carbon particles. The characterization of RS-SiC materials was examined by means of SEM, TEM, EDS and three point bending test. Based on the mechanical property-microstructure correlation, process optimization methodology is also discussed. The flexural strength of RS-SiC materials greatly depended on the content of residual Si. The decrease of starting SiC particle size in the C/SiC complex slurry was effective for improving the flexural strength of RS-SiC materials.

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방사가열원이 Si의 흡수효과와 OSF 성장에 미치는 영향 (Influence of Radiation Heating Sources on the Absorption Effect and Growth of OSF in Si)

  • 홍순관;김철주;이철승;정관수
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1988년도 전기.전자공학 학술대회 논문집
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    • pp.332-334
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    • 1988
  • Influence of incoherent lamp heating sources on the absorption effect and variation of OSF' size were investigated. The absorption effect on I.R lamp caused by free carrier excitation is greater than that of Tungsten-Halogen lamp. The variation of DSF' size weakly affected by oxidation time.

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SHS화학로에 의한 SiC의 합성 (Synthesis of SiC by Self-Propagating High Temperature Synthesis Chemical Furnace)

  • 김도경;박성;조건;이형복
    • 한국세라믹학회지
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    • 제31권11호
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    • pp.1283-1292
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    • 1994
  • Ultra-fine $\beta$-SiC powders were fabricated by self-propagating high temperature synthesis process (SHS) using chemical furnace. The dependences of the C powders with different surface areas, the molar ratios of C/Si, the weight ratios of chemical fuel content, and pellet diameter-size on synthesis were investigated. Compositional and structural characterization of these powders was carried out by scanning electron micrograph and X-ray diffraction. The $\beta$-SiC powders which had C/Si mole ratio=1.05, 3 times chemical fuel contents, and pellet diameter=20 mm were optimum for synthesis efficiency. By optimizing process-variables, it is possible to fabricate $\beta$-SiC powders which have little secondary phases ($\alpha$-SiC).

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Electrical Analysis of Bottom Gate TFT with Novel Process Architecture

  • Pak, Sang-Hoon;Jeong, Tae-Hoon;Kim, Si-Joon;Kim, Kyung-Ho;Kim, Hyun-Jae
    • Journal of Information Display
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    • 제9권2호
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    • pp.5-8
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    • 2008
  • Bottom gate thin film transistors (TFTs) with microcrystalline and amorphous Si (a-Si) double active layers (DAL) were fabricated. Since the process of DAL TFTs can use that of conventional a-Si TFTs, these DAL TFT process has advantages, such as low cost, large substrate, and mass production capacity. In order to analyze the degradation characteristics in saturation region for driving TFTs of active matrix organic light emitting diode, three different dynamic stresses were applied to DAL TFTs and a-Si TFTs. The threshold voltage shift of DAL TFTs and a-Si TFTs during 10,000 second stress is 0.3V and 2V, respectively. DAL TFTs were more reliable than a-Si TFTs.

FBAR용 $ZnO/AZO/SiO_2/Si$ 박막의 결정학적 특성에 관한 연구 (Crystallography properties of $ZnO/AZO/SiO_2/Si$ thin film for FBAR)

  • 강태영;금민종;손인환;김경환
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.2
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    • pp.880-883
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    • 2003
  • ZnO thin films for Film Bulk Acoustic Resonator(FBAR) were prepared by FTS (Facing Target Sputtering) system. The FTS methode enable to generate high density plasma, and it has a high deposition rate at 1mTorr pressure. Therefore, the ZnO thin films were deposited on $AZO/SiO_2/Si$ substrates with oxygen gas flow rate, and the other sputtering conditions were fixed such as a sputtering current of 0.8A, a substrate temperature at room temperature. AZO bottom electrode were deposited on $SiO_2/Si$ substrate and by Zn:Al(Al:2wt%) metal target. ZnO thin film thickness and the c-axis preferred orientation of ZnO thin film were evaluated by ${\alpha}-step$ and XRD.

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반도체 metallization용 Al-Cu 합금의 미세구조 천이에 미치는 Si 첨가영향 (Effect of Si Addition on the Microstructure of AI-Cu-Si Alloy for Thin Film Metallization)

  • 박민우
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 영호남학술대회 논문집
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    • pp.237-241
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    • 2000
  • The effects of Si addition on the precipitation processes of in Al-Cu-Si alloy films were studied by the transmission electron microscopy. Deposition of an Al-1.5Cu-1.5Si (wt. %) film at $305^{\circ}C$ resulted in formation of fine, uniformly distributed spherical $\theta$-phase particles due to the precipitation of the $\theta$ and Si phase particles during deposition. For deposition at $435^{\circ}C$, fine $\theta$-phase particles precipitated during wafer cooldown, while coarse Si nodules formed at the sublayer interface during deposition. The film susceptibility to corrosion is discussed in relation to the film microstructure and deposition temperature.

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다결정 다이아몬드공구를 사용한 Al-Si합금의 선삭과정에서 절삭특성에 미치는 Si함량의 영향 (The Effects of Si Content on the Cutting Characteristics in the Turing Process of A1-Si Alloy, Using a Polycrystalline Diamond Tool)

  • 이경호;윤영식;이상조
    • 한국정밀공학회지
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    • 제12권6호
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    • pp.20-26
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    • 1995
  • With the recent development of light and high efficient automobiles and aircraft, demand of the A1-Si alloy is rapidly increasing. However, there is an inclination that as the content of silicon increases it becomes more difficult to machine. Accordingly, the present study intends to analyse and study the cutting resistance and surface roughness of A1-Si alloy with Si contents of 8%, 12%, 17%, and 20%. The A1-Si alloy specimens were turned by a poly- crystalline diamond tool under selected cutting conditions, and results are here described and discussed.

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