• 제목/요약/키워드: SiC film

검색결과 2,119건 처리시간 0.031초

저온화학기상증착에 의한 인듐산화막 구조에 관한 연구 (Structural study of indium oxide thin films by metal organic chemical vapor deposition)

  • 스리벤카트;성낙진;윤순길
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.47-47
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    • 2007
  • Indium oxide conducting films were dep9sited on Si(100) substrates at various temperatures by liquid delivery metal organic chemical vapor deposition using Indium (III) tris (2,2,6,6-tetramethyl-3.5-heptanedionato) $(dpm)_3$ precursors. The films deposited at $200{\sim}400^{\circ}C$ were grown with a (111) preferred orientation and exhibit an increase of grain size from 21 to 33nm with increasing deposition temperature. In the range of deposition temperature, there is no metallic indium phase in deposited films.

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고온 패드 컨디셔닝 후 열산화막 연마 메커니즘 연구 (Study on Polishing Mechanism of Thermal Oxide Film after High-Temperature Conditioning)

  • 최권우;김남훈;서용진;이우선
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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    • pp.193-194
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    • 2005
  • By the high-temperature pad conditioning process: The slurry residues in pores and grooves of the polishing pad were clearly removed. These clear pores and enlarged grooves made the slurry attack the oxide surface. The changed slurry properties by high-temperature pad conditioning process made the oxide surface hydro-carbonate to be removed easily.

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Calsium Test의 정밀도 향상을 위한 연구 (A Study on the Improvement of Calsium Test)

  • 한진우;황정연;서대식;김영훈;문대규;한정인
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 춘계학술대회 논문집 디스플레이 광소자 분야
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    • pp.169-172
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    • 2005
  • 공정시 플라스틱 기판의 변형을 방지하기 위해 PC(Polycarbonate) 기판을 약 12시간 동안 pre-annealing시킨 다음 SiN(silicon nitride)와 PI(Poly-imide)를 각각 Sputter와 Spin-Coater를 이용하여 Coating하였다. 완성된 PC 기판위에 Themal Evaporation으로 Calsium을 증착한 뒤 Al을 올렸다. Calsium 증착 된면에 삼성 코닝의 글래스를 UV resin으로 부착 시킨 다음 상온에서 투습률을 측정하였다. 측정 간격은 12시간으로 하였으며 Calsium Test 의 정확도 향상을 위해 CCD Camera로 측정하여 컴퓨터로 분석하였다. 그래픽 저장 파일은 저장시 이미지 손실을 방지하기 위해 Bitmap방식을 그대로 사용 하였으며 정확도 향상을 위한 분석 프로그램은 MicroSoft 사의 Visual C++로 작성하였다. 화상 처리 면적은 컴퓨터 시스템의 처리 속도를 감안하여 70*70 으로 하였다.

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산소 분위기에서 열처리시 ZnS 나노선의 발광 강도 변화 (Enhancement of Photoluminescence Intensity of ZnS Nanowires by Annealing in O2)

  • 권진업;이종우
    • 한국표면공학회지
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    • 제45권5호
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    • pp.193-197
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    • 2012
  • The influence of annealing process in an $O_2$ atmosphere on the photoluminescence (PL) spectra properties of ZnS nanowires has been investigated. ZnS nanowires with the diameters approximately 100 nm and the lengths a few tens micrometers were synthesized by evaporating ZnS powders on Si substrates while using an Au thin film as a catalyst. ZnS nanowires had an NBE emission band at 430 nm in the violet region. The emission intensity was improved drastically by a process in which ZnS nanowires were heat-treated at $500^{\circ}C$ in an $O_2$ atmosphere for 45 minutes.

Thermopile, 펠티어소자에 적용할 $Bi_2Te_3$, $Sb_2Te_3$의 annealing 온도변화에 따른 박막특성 분석 (Thermoelectric Properties of $Bi_2Te_3$, $Sb_2Te_3$ by varying annealing temperature)

  • 김현식;최연식;박효덕;서대식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.212-212
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    • 2009
  • Thermoelectric devices were used to wide range of application. At present, increasing the efficiency of these devices, in particular, through the preparation of materials showing a high thermoelectric figure of merit, Z, $Bi_2Te_3$ and $Sb_2Te_3$ thin films on Si substrates are deposited by flash evaporation method for thermopile sensor applications. In order to enhance the thermoelectric properties of the thin film, annealing in high vacuum is carried out in the temperature range from 200 to $350^{\circ}C$. The microstructure of the film is investigated by XRD and SEM. The resistivity and Seebeck coefficient of the films are measured by Van der Pauw method and hot probe method respectively. At elevating annealing temperature, the crystallinity and thermoelectrical properties of films are improved by increasing the size of grains. At excessive high annealing temperatures, it is shown that Seebeck coefficient of films is decreased because of Te evaporation. By optimizing the annealing conditions, it is possible to obtain a high performance thin film with a thermoelectric properties.

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Simple Route to High-performance and Solution-processed ZnO Thin Film Transistors Using Alkali Metal Doping

  • 김연상;박시윤;김경준;임건희
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.187-187
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    • 2012
  • Solution-processed metal-alloy oxides such as indium zinc oxide (IZO), indium gallium zinc oxide (IGZO) has been extensively researched due to their high electron mobility, environmental stability, optical transparency, and solution-processibility. In spite of their excellent material properties, however, there remains a challenging problem for utilizing IZO or IGZO in electronic devices: the supply shortage of indium (In). The cost of indium is high, what is more, indium is becoming more expensive and scarce and thus strategically important. Therefore, developing an alternative route to improve carrier mobility of solution-processable ZnO is critical and essential. Here, we introduce a simple route to achieve high-performance and low-temperature solution-processed ZnO thin film transistors (TFTs) by employing alkali-metal doping such as Li, Na, K or Rb. Li-doped ZnO TFTs exhibited excellent device performance with a field-effect mobility of $7.3cm^2{\cdot}V-1{\cdot}s-1$ and an on/off current ratio of more than 107. Also, in case of higher drain voltage operation (VD=60V), the field effect mobility increased up to $11.45cm^2{\cdot}V-1{\cdot}s-1$. These all alkali metal doped ZnO TFTs were fabricated at maximum process temperature as low as $300^{\circ}C$. Moreover, low-voltage operating ZnO TFTs was fabricated with the ion gel gate dielectrics. The ultra high capacitance of the ion gel gate dielectrics allowed high on-current operation at low voltage. These devices also showed excellent operational stability.

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후막 센서 어레이를 이용한 화학 작용제 분류 (Classification of Chemical Warfare Agents Using Thick Film Gas Sensor Array)

  • 곽준혁;최낙진;반태현;임연태;김재창;허증수;이덕동
    • 한국군사과학기술학회지
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    • 제7권2호
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    • pp.81-87
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    • 2004
  • Semiconductor thick film gas sensors based on tin oxide are fabricated and their gas response characteristics are examined for four simulant gases of chemical warfare agent (CWA)s. The sensing materials are prepared in three different sets. 1) The Pt or Pd $(1,\;2,\;3\;wt.\%)$ as catalyst is impregnated in the base material of $SnO_2$ by impregnation method.2) $Al_2O_3\;(0,\;4,\;12,\;20\;wt.\%),\;In_2O_3\;(1,\;2,\;3\;wt.\%),\;WO_3\;(1,\;2,\;3\;wt.\%),\;TiO_2\;(3,\;5,\;10\;wt.\%)$ or $SiO_2\;(3,\;5,\;10\;wt.\%)$ is added to $SnO_2$ by physical ball milling process. 3) ZnO $(1,\;2,\;3,\;4,\;5\;wt.\%)$ or $ZrO_2\;(1,\;3,\;5\;wt.\%)$ is added to $SnO_2$ by co-precipitation method. Surface morphology, particle size, and specific surface area of fabricated sensing films are performed by the SEM, XRD and BET respectively. Response characteristics are examined for simulant gases with temperature in the range 200 to $400^{\circ}C$, with different gas concentrations. These sensors have high sensitivities more than $50\%$ at 500ppb concentration for test gases and also have shown good repetition tests. Four sensing materials are selected with good sensitivity and stability and are fabricated as a sensor array A sensor array Identities among the four simulant gases through the principal component analysis (PCA). High sensitivity is acquired by using the semiconductor thick film gas sensors and four CWA gases are classified by using a sensor array through PCA.

YBCO 박막의 저항형 초전도 한류기에 대한 동작 특성 (Operating Properties for a Resistive SFCL of YBCO Thin Films)

  • 최효상;현옥배;김혜림;황시돌;김상준;문승현;한병성
    • 대한전기학회논문지:전기기기및에너지변환시스템부문B
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    • 제48권10호
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    • pp.537-543
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    • 1999
  • We fabricated a resistive superconducting fault current limiter (SFCL) of a meander type based on a YBCO film with the meander cross section of 5 $\times$ $10^{-6}$$cm^2$, and performed current limitation experiments. The film was coated quench current was 9.6 Apeak at 60 Hz, and the fast quench time was 0.63 msec. The resistance of the limiter continuously increased for three cycles dut to the temperature rise in the gold layer. The temperature of the current limiting element reached the room temperature in 11 msec, $150^{\circ}C$ in 54 msec after quench, and was saturated afterwards. For $45^{\circ}$and $90^{\circ}$faults the fast quench times were 0.56 msec and 0.26 msec, respectively. The quench time is believed to be reduced because the fault occurred when the current was either increasing or at the peak value. This limiter effectively limited the fault current to about 1/5 of the potential current with no SFCL right after the fault and to about 1/8.5 in three cycles. We confirmed that the gold layer effectively carried out the role of heat dissipation as the SFCL was quenched.

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AZO 박막의 증착 및 열처리 조건에 따른 전기·광학적 특성 (Electro-Optical Properties of AZO Thin Films with Deposition & Heat treatment Conditions)

  • 연응범;이택영;김선태;임상철
    • 한국재료학회지
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    • 제30권10호
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    • pp.558-565
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    • 2020
  • AZO thin films are grown on a p-Si(111) substrate by RF magnetron sputtering. The characteristics of various thicknesses and heat treatment conditions are investigated by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), Hall effect and room-temperature photoluminescence (PL) measurements. The substrate temperature and the RF power during growth are kept constant at 400 ℃ and 200 W, respectively. AZO films are grown with a preferred orientation along the c-axis. As the thickness and the heat treatment temperature increases, the length of the c-axis decreases as Al3+ ions of relatively small ion radius are substituted for Zn2+ ions. At room temperature, the PL spectrum is separated into an NBE emission peak around 3.2 eV and a violet regions peak around 2.95 eV with increasing thickness, and the PL emission peak of 300 nm is red-shifted with increasing annealing temperature. In the XPS measurement, the peak intensity of Al2p and Oll increases with increasing annealing temperature. The AZO thin film of 100 nm thickness shows values of 6.5 × 1019 cm-3 of carrier concentration, 8.4 cm-2/V·s of mobility and 1.2 × 10-2 Ω·cm electrical resistivity. As the thickness of the thin film increases, the carrier concentration and the mobility increase, resulting in the decrease of resistivity. With the carrier concentration, mobility decreases when the heat treatment temperature increases more than 500 ℃.

The Change of Magnetic Easy Axis in Ion Beam Mixed Co/Pt Multilayer

  • Kim, S.H.;Chang, G.S.;Son, J.H.;Kim, T.Y.;Chae, K.H.;Kang, S.J.;Lee, J.;Jeong, K.;Lee, Y.P.;Whang, C.N.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.162-162
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    • 2000
  • We have studied magnetic properties of Co/Pt multilayered films which have attracted great interest as high-density magneto-optical (MO) recording media due to their good MO properties. For this study, [Pt(45 )/Co(35 )]$\times$8 films were deposited with a Pt buffer layer of 60 on Si(100) substrate by alternating electron-beam evaporation in a high vacuum and were ion beam mixed by using 80keV Ar+ at 25$0^{\circ}C$. Especially, an external magnetic field was added to help changing magnetic property during ion beam mixing (IBM). The intermixing of Co and Pt layers after IBM was confirmed with Rutherford Backscattering Spectroscopy (RBS) and Transmission Electron Microscopy (TEM). The MO property of the film was measured with magneto-optical Kerr spectrometer and the change of magnetic easy axis in the film plane was observed from Ker loop data. This anomalous result might be correlated with the change of atomic structure due to the intermixing effect.

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