• Title/Summary/Keyword: Si 나노구조

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게이트 유전체용 $HfO_2$ 박막의 증착 및 열처리 조건에 따른 Nano-Mechanical 특성 연구

  • Kim, Ju-Yeong;Kim, Su-In;Lee, Gyu-Yeong;Gwon, Gu-Eun;Kim, Min-Seok;Eom, Seung-Hyeon;Jeong, Hyeon-Jin;Jo, Yong-Seok;Park, Seung-Ho;Lee, Chang-U
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.291-292
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    • 2012
  • MOSFET 구조에서 metal oxide에 기반을 둔 게이트 유전체의 연구는 실리콘(Si)을 기반으로 한 반도체 발명이래로 가장 인상적인 발전을 이뤄 왔다. 이는 metal oxide의 높은 유전상수 특성이 $SiO_2$보다 우수하고, 유전체 박막의 두께 감소로 인한 전기적 특성 저하를 보완하기 때문이다. 특히 지난 10년 동안, Hafnium에 기반을 둔 $HfO_2$는 차세대 반도체용 유전 물질로 전기적 구조적 특성에 대한 연구가 활발히 진행되어왔다. 그러나 현재까지 $HfO_2$에 대한 nano-mechanical 특성 연구는 미미하여 이에 대한 연구가 필요하다. 이에 본 연구에서는 Hf 및 $HfO_2$ 박막의 증착 및 열처리 조건을 다르게 하여 실험을 진행하였다. 시료는 rf magnetron sputter를 이용하여 Si 기판위에 Hafnium target으로 산소유량(4, 6 sccm)을 달리하여 증착하였고, 이후 furnace에서 400에서 $800^{\circ}C$까지 질소분위기에서 20분간 열처리를 실시하였다. 실험결과 산소 유량을 6 sccm으로 증착한 시료의 current density 성능이 모든 열처리 과정에서 증가하였다. Nano-indenter로 측정하고 Weibull distribution으로 정량적 계산을 한 경도 (Hardness)는 as-deposited 시료를 기준으로 $400^{\circ}C$에서는 감소했으나 온도가 높아질수록 증가하였다. 특히, $400^{\circ}C$ 열처리한 시료에서 산소농도에(4 sccm : 5.35 GPa, 6 sccm : 6.15 GPa)따른 두 시료간의 변화가 가장 두드러졌다. 반면에, 탄성계수 (Elastic modulus)는 산소농도 6 sccm을 넣고 증착된 시료들이 4 sccm을 넣고 증착한 시료보다 모두 높은 값을 나타냈다. 또한, $800^{\circ}C$ 열처리한 시료에서 산소농도에(4 sccm : 128.88 GPa, 6 sccm : 149.39 GPa)따라 표면의 탄성에 큰 차이가 있음을 확인하였다. 이는 증착된 $HfO_2$ 시료들이 비정질 상태에서 $HfO_2$로 결정화되는 과정에서 산소가 증가할수록 박막의 defect이 감소되기 때문으로 사료된다.

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Characterization on the electrochemical and structural properties of polyanion cathode material Li2MnSiO4/C depending on the synthesis process (합성 방법에 따른 Li2MnSiO4/C 다중음이온 양극활물질의 구조 및 전기화학적 성질)

  • Lee, Young-Lim;Chung, Young-Min;Song, Min-Seob;Ju, Jeh-Beck;Cho, Won-Il
    • Journal of Energy Engineering
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    • v.20 no.2
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    • pp.103-108
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    • 2011
  • $Li_2MnSiO_4$/C was synthesized by solid state reaction and solution synthesis with sucrose for carbon source. The X-ray diffraction patterns of solid state reaction indicates small amount of impurities. By FE-SEM and HR-TEM, solution synthesis comprised several tens of nanometer comparing to 500~600 nm of $Li_2MnSiO_4$/C prepared by solid state reaction. The $Li_2MnSiO_4$/C prepared by solution synthesis show better electrochemical performance than solid state reaction. The first charge-discharge capacity are 236, 189 mAh/g respectively by solution synthesis. But its cycle performance was poor as yet and its capacity retention was 62% after 10 cycles.

Magnetic Property Evolution of Co-22%Cr Alloy Thin Films with Self-Organized Nano Structure Formation (Co-22%Cr 합금박막의 자가정렬형 나노구조에 의한 자기적 물성)

  • Song, O-Seong;Lee, Yeong-Min
    • Korean Journal of Materials Research
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    • v.11 no.12
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    • pp.1042-1046
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    • 2001
  • Co-22%Cr alloy films are promising for high-density perpendicular magnetic recording media with their perpendicular anisotropy and large coercivity of 3000 Oe. We observed that a self organized nano structure(SONS) of fine ferromagnetic Co-enriched phase and paramagnetic Cr-enriched phase appears inside the grain of Co-Cr magnetic alloy thin films at the elevated substrate temperature after do-sputtering. We prepared 1000 $\AA$-thick Co-22%Cr films on 2000 $\AA$- SiO$_2$/Si(100) substrates at the deposition rate of 100 $\AA$/min with substrate temperatures of 3$0^{\circ}C$, 10$0^{\circ}C$, 15$0^{\circ}C$, 20$0^{\circ}C$, 30$0^{\circ}C$, and 40$0^{\circ}C$, respectively. We employed a vibrating sample magnetometer(VSM) to measure the B-H loops showing the saturation magnetifation, coercivity, remanence in in- plane and out- of- plane modes. In- plane coercivity, perpendicular coercivity, and perpendicular remanence increased as substrate temperature increased, how-ever they decreased after 30$0^{\circ}C$ slowly. Transmission electron microscope (TEM) characterization revealed that the self organized nano structure (SONS) appears at the elevated substrate temperature, which forms fine Co-enriched phases inside a grain, then it eventually affect the perpendicular magnetic property. Our results imply that we may tune the perpendicular magnetic properties with SONS obtained at appropriate substrate temperature.

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Preparation of Polypropylene/Clay Nanocomposites Using Aminosilane Treated Clay (아미노실란 개질 클레이를 사용한 폴리프로필렌 클레이 나노복합재료)

  • Hong Chae-Hwan;Bae Jin-Woo;Lee Yong-Bum;Lee Choon-Soo;Jho Jae-Young;Nam Byeong-Uk
    • Polymer(Korea)
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    • v.30 no.4
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    • pp.318-325
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    • 2006
  • Polypropylene-clay nanocomposites were studied by the modification of clay with amino silanes to introduce covalent bonds in nanocomposites, and prepared by melt-compounding with polypropylene, clay modified with amino silanes and maleic anhydride grafted polypropylene. The . .structure and surface properties of modified clay were determined by x-ray diffraction, infrared spectrum, and solid-state $^{29}Si$ nuclear magnetic resonance spectrum. The modification of clay with aminosilanes led to the increase of the silicate interlayers to about $19.8{\AA}$, the weakening effects of hydroxy group at $3650cm^{-1}$ and the signal of amine groups at -69 ppm proved that the modification had taken place.

원자층 증착법을 이용한 고 단차 Co 박막 증착 및 실리사이드 공정 연구

  • Song, Jeong-Gyu;Park, Ju-Sang;Lee, Han-Bo-Ram;Yun, Jae-Hong;Kim, Hyeong-Jun
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2012.05a
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    • pp.83-83
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    • 2012
  • 금속 실리사이드는 낮은 비저항, 실리콘과의 좋은 호환성 등으로 배선 contact 물질로 널리 연구되고 있다. 특히 $CoSi_2$는 선폭의 축소와 관계없이 일정하고 낮은 비저항과 열적 안정성이 우수한 특성 등으로 배선 contact 물질로 활발히 연구되고 있다. 금속 실리사이드를 실리콘 평면기판에 형성시키는 방법으로는 열처리를 통한 금속박막과 실리콘 기판 사이에 확산작용을 이용한 SALICIDE (self-algined silicide) 기술이 대표적이며 CoSi2도 이와 같은 방법으로 형성할 수 있다. Co 박막을 증착하는 방법에는 물리적 기상증착법 (PVD)과 유기금속 화학 증착법 등이 보고되어있지만 최근 급격하게 진행 중인 소자구조의 나노화 및 고 단차화에 따라 기존의 증착 기술은 낮은 단차 피복성으로 인하여 한계에 부딪힐 것으로 예상되고 있다. ALD(atomic layer deposition)는 뛰어난 단차 피복성을 가지고 원자단위 두께조절이 용이하여 나노 영역에서의 증착 방법으로 지대한 관심을 받고 있다. 앞선 연구에서 본 연구진은 CoCp2 전구체과 $NH_3$ plasma를 사용하여 Plasma enhanced ALD (PE-ALD)를 이용한 고 순도 저 저항 Co 박막 증착 공정을 개발 하고 이를 SALICIDE 공정에 적용하여 $CoSi_2$ 형성 연구를 보고한 바 있다. 하지만 이 연구에서 PE-ALD Co 박막은 플라즈마 고유의 성질로 인하여 단차 피복성의 한계를 보였다. 이번 연구에서 본 연구진은 Co(AMD)2 전구체와 $NH_3$, $H_2$, $NH_3$ plasma를 반응 기체로 사용하여 Thermal ALD(Th-ALD) Co 및 PE-ALD Co 박막을 증착 하였다. 고 단차 Co 박막의 증착을 위하여 Th-ALD 공정에 초점을 맞추어 Co 박막의 특성을 분석하였으며, Th-ALD 및 PE-ALD 공정으로 증착된 Co 박막의 단차를 비교하였다. 연구 결과 Th-ALD Co 박막은 95% 이상의 높은 단차 피복성을 가져 PE-ALD Co 박막의 단차 피복성에 비해 크게 향상되었음을 확인하였다. 추가적으로, Th-ALD Co 박막에 고 단차 박막의 증착이 가능한 Th-ALD Ru을 capping layer로 이용하여 CoSi2 형성을 확인하였고, 기존의 PVD Ti capping layer와 비교하였다. 이번 연구에서 Co 박막 및 $CoSi_2$ 의 특성 분석을 위하여 X선 반사율 분석법 (XRR), X선 광전자 분광법 (XPS), X선 회절 분석법 (XRD), 주사 전자 현미경 (SEM), 주사 투과 전자 현미경 (STEM) 등을 사용하였다.

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Improvement in Light Extraction Efficiency of 380 nm UV-LED Using Nano-patterned n-type Gan Substrate (나노 구조의 패턴을 갖는 n-type GaN 기판을 이용한 380 nm UV-LED의 광 추출 효율 개선)

  • Baek, Kwang-Sun;Jo, Min-Sung;Lee, Young-Gon;Sadasivam, Karthikeyan Giri;Song, Young-Ho;Kim, Seung-Hwan;Kim, Jae-Kwan;Jeon, Seong-Ran;Lee, June-Key
    • Korean Journal of Materials Research
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    • v.21 no.5
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    • pp.273-276
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    • 2011
  • Ultraviolet (UV) light emitting diodes (LEDs) were grown on a patterned n-type GaN substrate (PNS) with 200 nm silicon-di-oxide (SiO2) nano pattern diameter to improve the light output efficiency of the diodes. Wet etched self assembled indium tin oxide (ITO) nano clusters serve as a dry etching mask for converting the SiO2 layer grown on the n-GaN template into SiO2 nano patterns by inductively coupled plasma etching. PNS is obtained by n-GaN regrowth on the SiO2 nano patterns and UV-LEDs were fabricated using PNS as a template. Two UV-LEDs, a reference LED without PNS and a 200 nm PNS UV-LEDs were fabricated. Scanning Electron microscopy (SEM), Transmission Electron Microscopy (TEM), X-Ray Diffraction (XRD), Photoluminescence (PL) and Light output intensity- Input current- Voltage (L-I-V) characteristics were used to evaluate the ITO-$SiO_2$ nanopattern surface morphology, threading dislocation propagation, PNS crystalline property, PNS optical property and UVLED device performance respectively. The light out put intensity was enhanced by 1.6times@100mA for the LED grown on PNS compared to the reference LED with out PNS.

Controlling Structural and Electrical Properties of Pt Nanopowder-Dispersed SiO2 Film (Pt 나노분말이 분산된 SiO2 박막의 구조 및 전기적 특성 제어)

  • Lee, Jae Ho;Shin, In Joo;Lee, Sung Woo;Kim, Hyeong Cheol;Choi, Byung Joon
    • Journal of Powder Materials
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    • v.21 no.5
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    • pp.355-359
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    • 2014
  • Pt nanopowder-dispersed $SiO_2$ (SOP) films were prepared by RF co-sputtering method using Pt and $SiO_2$ targets in Ar atmosphere. The growth rate and Pt content in the film were controlled by means of manipulating the RF power of Pt target while that of $SiO_2$ was fixed. The roughness of the film was increased with increasing the power of Pt target, which was mainly due to the increment of the size and planar density of Pt nanopowder. It was revealed that SOP film formed at 10, 15, 20 W of Pt power contained 2.3, 2.7, and 3.0 nm of spherical Pt nanopowder, respectively. Electrical conductivity of SOP films was exponentially increased with increasing Pt power as one can expect. Interestingly, conductivity of SOP films from Hall effect measurement was greater than that from DC I-V measurement, which was explained by the significant increase of electron density.

Structural and Electrical Properties of (La0.7Sr0.3)(Mn1-xFex)O3 Thin Films Prepared by Sol-Gel Method for Thermistor Devices (서미스터 소자로의 응용을 위한 솔-젤법으로 제작한 (La0.7Sr0.3)(Mn1-xFex)O3 박막의 구조적, 전기적 특성)

  • Ji-Su Yuk;Sam-Haeng Yi;Myung-Gyu Lee; Joo-Seok Park;Young-Gon Kim;Sung-Gap Lee
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.37 no.2
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    • pp.164-168
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    • 2024
  • (La0.7Sr0.3)(Mn1-xFex)O3 (LSMFO) (x = 0.03, 0.06, 0.09, 0.12) precursor solution are prepared by sol-gel method. LSMFO thin films are fabricated by the spin-coating method on Pt/Ti/SiO2/Si substrate, and the sintering temperature and time are 800℃ and 1 hr, respectively. The average thickness of the 6-times coated LSMFO films is about 181 to 190 nm and average grain size is about 18 to 20 nm. As the amount of Fe added in the LSMFO thin film increased, the resistivity decreased, and the TCR and B25/65-value increased. Electrical resistivity, TCR and B25/65-value of the (La0.7Sr0.3)(Mn0.88Fe0.12)O3 thin film are 0.0136 mΩ-cm, 0.358%/℃, and 328 K at room temperature, respectively. The resistivity properties of LSMFO thin films matched well with Mott's VRH model.

Millimeter-Scale Aligned Carbon Nanotubes Synthesized by Oxygen-Assisted Microwave Plasma CVD (MPCVD를 이용하여 밀리미터 길이로 수직 정렬된 탄소나노튜브의 합성)

  • Kim, Y.S.;Song, W.S.;Lee, S.Y.;Choi, W.C.;Park, C.Y.
    • Journal of the Korean Vacuum Society
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    • v.18 no.3
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    • pp.229-235
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    • 2009
  • Millimeter-scale aligned arrays of thin-multiwalled carbon nanotube (t-MWCNT) on layered Si substrates have been synthesized by oxygen-assisted microwave plasma chemical vapor deposition (MPCVD). We have succeeded in growth of vertically aligned MWCNTs up to 2.7 mm in height for 150 min. The effect of $O_2$ and water vapour on growth rate was systematically investigated. In the case of $O_2$ gas, the growth rate was ${\sim}22{\mu}m/min$, which is outstanding growth rate comparing with those of conventional thermal CVD (TCVD). Scanning electron microscope (SEM), energy-dispersive spectroscopy (EDS), and Raman spectroscopy were used to analyze the CNT morphology, composition and growth mechanism. The role of $O_2$ gas during the CNT growth was discussed on.

Guided-mode Resonances in Periodic Surface Structures Induced on Si Thin Film by a Laser (레이저에 의해 생성된 Si 박막의 주기적 표면 구조에서의 도파모드 공진 연구)

  • Ji Hyuk Lee;Yoon Joo Lee;Hyun Hong;Eun Sol Cho;Ji Young Park;Ju Hyeon Kim;Min Jin Kang;Eui Sun Hwang;Byoung-Ho Cheong
    • Korean Journal of Optics and Photonics
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    • v.34 no.6
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    • pp.241-247
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    • 2023
  • We examine the spectral characteristics of laser-induced periodic surface structures (LIPSSs) formed on an amorphous silicon film irradiated by a 355-nm nanosecond laser. A Gaussian beam with a diameter of 196 ㎛ is used to perform a two-dimensional raster scan. The laser's pulse number is varied from 190 to 280, and its intensity is adjusted within 100-130 mJ/cm2. LIPSSs with a periodicity of approximately 330 nm form on the surface of the Si film, aligned perpendicular to the laser's polarization. Transmission spectra of the samples show dips around 700 nm for transverse electric polarization and around 500 nm for transverse magnetic polarization. The features are investigated with a one-dimensional-grating model using a rigorous coupled-wave analysis. Simulations confirm that the observed dips are due to the resonant modes, depending on the polarization.