• 제목/요약/키워드: Si(111)

검색결과 818건 처리시간 0.029초

RF 스퍼터링법에 의한 ($Sr_{1-x}Ca_x)TiO_3$ 세라믹 박막의 미세구조 및 유전특성 (Microstructure and Dielectric Properties of ($Sr_{1-x}Ca_x)TiO_3$ Ceramic Thin Film by RF Sputtering Method)

  • 김진사;오재한;이준웅
    • 한국전기전자재료학회논문지
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    • 제11권11호
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    • pp.984-989
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    • 1998
  • The ($Sr_{1-x}Ca_x)TiO_3$(SCT) thin films are deposited on Pt-coated electrode($Pt/TiN/SiO_2/Si$) using RF sputtering method with substitutional contents of Ca. The maximum grain of thin films is obtained by substitution of Ca at 15[mol%]. All SCT thin films had (111) preferred orientation. The dielectric constant was increased with increasing the substitutional contents of Ca, while it was decreased if the substitutional contents of Ca exceeded over 15[mol%]. The dielectric constant changes almost linearly in temperature ranges of -80~+90[$^{\circ}C$]. The temperature properties of the dielectric loss have a stable value within 0.02 independent of the substitutional contents of Ca. All SCT thin films used in this study show the phenomena of dielectric relaxation with the increase of frequency, and the relaxation frequency is observed above 200[kHz].

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$PbTiO_3$ 씨앗층을 이용한 $Pb(Mg_{1/3}Ta_{2/3})O_3$ 박막의 상안정화와 전기적 특성평가 (Stabilization of $Pb(Mg_{1/3}Ta_{2/3})O_3$ thin film by a thin $PbTiO_3$ seed layer and characterization of electric properties)

  • 김태언;유창준;문종하;김진혁
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 춘계학술발표강연 및 논문개요집
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    • pp.211-211
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    • 2003
  • PbTiO$_3$ 씨앗층을 이용하여 완화형 강유전체 Pb(Mg$_{1}$3/Ta$_{2}$3/)O$_3$ (PMT) 박막의 페로브스카이트 상안정화와 열처리 조건에 따른 미세구조변화, 이에 따른 전기적 특성 변화에 관하여 조사하였다. PbTiO$_3$ 박막을 스핀코팅법으로 3000 rpm에서 20초간(111) 방향으로 배향된 Pt / Ti / SiO$_2$/ Si 기판에 증착하여 안정화된 페로브스카이트 박막을 얻었다. 이렇게 제조된 PbTiO$_3$를 Buffer 층으로 사용하고 그 위에 Pb(Mg$_{1}$3/Ta$_{2}$3/)O$_3$를 박막을 Spin coating방법으로 증착한 후, 급속열처리 방법(RTA)으로 550- $650^{\circ}C$ 사이에서 열처리하였다. 제조된 박막의 열처리 온도에 따른 미세구조 변화와 결정성을 XRD, SEM, TEM으로 분석하였고 박막의 저온 강유전 특성을 RT66A를 이용하여 평가하였다. Pb(Mg$_{1}$3/Ta$_{2}$3/)O$_3$ 박막의 경우 씨앗층이 없는 경우에는 pyrochlore상이 주상이었지만 씨앗층을 사용한 경우 페로브스카이트 상이 주상임을 확인하였고 열처리 온도가 증가할수록 페로브스카이트상의 상대적 양이 증가함을 확인하였다. 미세구조와 상의 변화에 따른 전기적 특성 변화에 관하여 자세하게 논의할 것이다.

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Isoprenylated flavonoids from the root bark of Morus alba L. and their inhibition effect on NO production in LPS-induced RAW 264.7 cells

  • Jung, Jae-Woo;Ko, Jung-Hwan;Ko, Won-Min;Park, Ji-Hae;Baek, Yun-Su;Kim, Youn-Chul;Baek, Nam-In
    • Journal of Applied Biological Chemistry
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    • 제60권2호
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    • pp.109-111
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    • 2017
  • The root bark of Morus alba L. were extracted with 80% aqueous MeOH, and the concentrated extract was partitioned with EtOAc, n-BuOH, and $H_2O$ fractions. The repeated silica gel ($SiO_2$), octadecyl $SiO_2$ (ODS), and Sephadex LH-20 column chromatographies of the EtOAc fraction led to isolation of 12 phenolic compounds. The chemical structures of the compounds were determined as sanggenol Q (1), sanggenol A (2), sanggenol L (3), kuwanon T (4), cyclomorusin (5), sanggenon F (6), sanggenol O (7), sanggenon N (8), sanggenon G (9), mulberrofuran G (10), mulberrofuran C (11), and moracin E (12). All isolated compounds were evaluated for inhibit lipopolysaccharide-induced nitric oxide production in RAW 264.7 macrophages.

Ferroelectric and Structural Properties of Nd-substituted $Bi_4Ti_3O_{12}$ Thin Films Fabricated by MOCVD

  • Kang, Dong-Kyun;Park, Won-Tae;Kim, Byong-Ho
    • 한국반도체및디스플레이장비학회:학술대회논문집
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    • 한국반도체및디스플레이장비학회 2006년도 추계학술대회 발표 논문집
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    • pp.166-169
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    • 2006
  • A promising capacitor, which has conformable step coverage and good uniformity of thickness and composition, is needed to manufacture high-density non-volatile FeRAM capacitors with a stacked cell structure. In this study, ferroelectric $Bi_{3.61}Nd_{0.39}Ti_3O_{12}$ (BNT) thin films were prepared on $Pt(111)/Ti/SiO_2/Si$ substrates by the liquid delivery system MOCVD method. In these experiments, $Bi(ph)_3$, $Nd(TMHD)_3$ and $Ti(O^iPr)_2(TMHD)_2$ were used as the precursors and were dissolved in n-butyl acetate. The BNT thin films were deposited at a substrate temperature and reactor pressure of approximately $600^{\circ}C$ and 4.8 Torr, respectively. The microstructure of the layered perovskite phase was observed by XRD and SEM. The remanent polarization value (2Pr) of the BNT thin film was $31.67\;{\mu}C/cm^2$ at an applied voltage of 5 V.

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초음파 분무 증착법으로 제조한(Ba,Sr) $RuO_3$ 산화물 전극의 증착 특성 (Deposition characteristics of (Ba,Sr) $RuO_3$ thin films prepared by ultrasonic spraying deposition)

  • 홍석민;임성민;박흥진;김옥경
    • 한국결정성장학회지
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    • 제11권3호
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    • pp.111-114
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    • 2001
  • 초음파분무를 이용한 MOCVD법으로 전도성 산화물 (Ba,Sr)RuO$_3$ 박막을 Si(100) wafer위에 제조하였다. XRD 측정 결과 BSR박막은 (110) 배향성을 가지고 성장하였으며 500$^{\circ}C$ 이상의 증착온도에서 결정성장이 양호하였다. Ba과 Sr의 조성비의 차이에 따라 AFM 측정결과 Ba에 대한 Sr의 비가 증가함에 따라 grain크기가 증가하였다. 또한 비저항의 측정을 통해 Ba에 대해 Sr의 비의 증가에 따라 BSR 박막의 비저항이 415에서 261$\mu$$\Omega$${\cdot}$cm로 감소하였다.

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The Microstructure and Ferroelectric Properties of Ce-Doped Bi4Ti3O12 Thin Films Fabricated by Liquid Delivery MOCVD

  • Park, Won-Tae;Kang, Dong-Kyun;Kim, Byong-Ho
    • 한국세라믹학회지
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    • 제44권8호
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    • pp.403-406
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    • 2007
  • Ferroelectric Ce-doped $Bi_4Ti_3O_{12}$ (BCT) thin films were deposited by liquid delivery metal organic chemical vapor deposition (MOCVD) onto a $Pt(111)/Ti/SiO_2/Si(100)$ substrate. X-ray diffraction (XRD) and scanning electron microscopy (SEM) were used to identify the crystal structure, the surface, and the cross-section morphology of the deposited ferroelectric flims. After annealing above $640^{\circ}C$, the BCT films exhibited a polycrystalline structure with preferred (001) and (117) orientations. The BCT lam capacitor with a top Pt electrode showed a large remnant polarization ($2P_r$) of $44.56{\mu}C/cm^2$ at an applied voltage of 5 V and exhibited fatigue-free behavior up to $1.0{\times}10^{11}$ switching cycles at a frequency of 1 MHz. This study clearly reveals that BCT thin film has potential for application in non-volatile ferroelectric random access memories and dynamic random access memories.

$(Pb_{0.72}La_{0.28})Ti_{0.94}O_3$ buffer를 사용한 $Pb(Zr_{0.52}Ti_{0.48})O_3$ 박막의 수소 후열처리 효과 (Effect of the hydrogen annealing on the $Pb(Zr_{0.52}Ti_{0.48})O_3$ film using $(Pb_{0.72}La_{0.28})Ti_{0.94}O_3$ buffers)

  • 이은선;이동화;정현우;임성훈;이상렬
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.191-194
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    • 2004
  • Ferroelectric $Pb(Zr_{0.52}Ti_{0.48})O_3$ (PZT) 박막을 $Pt(111)/Ti/SiO_2/Si$ 기판위에 증착되었고, 수소 후열처리 후의 특성변화를 연구하였다. 동시에 10 nm의 $(Pb_{0.72}La_{0.28})Ti_{0.94}O_3$ (PLT) buffer를 사용한 PZT 박막의 수소 후열처리 효과를 관찰하였다. PZT 박막의 경우, 수소 후열처리 전과 후에 강유전 특성이 현저하게 감소한 반면, PLT buffer가 사용된 PZT 박막의 경우, 강유전 특성에 거의 변화가 없었다. 이는 PLT buffer를 사용함으로써 PZT 박막의 배향성이 향상되고, 이에 따라 forming gas에 의한 수소원자가 박막 내로의 침투가 어렵게 된다. 따라서 수소원자에 대한 PZT 박막의 열화되는 현상이 buffer를 사용하는 경우, 거의 나타나지 않게 된다.

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$Ar/O_2$ 비에 따른 PZT/BST 이종층 박막의 구조적 특성 (The Structural Properties of the PZT/BST Heterolayered Thin Films with $Ar/O_2$ Ratio)

  • 이의복;남성필;이상철;김지헌;이영희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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    • pp.607-610
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    • 2004
  • The Pb $(Zr_{0.52}Ti_{0.48})O_3/(Ba_{0.6}Sr_{0.4}TiO_3$ [PZT(52/48)/BST(60/40)] heterolayered thin films were fabricated on the Pt/Ti/$SiO_2$/Si by RF sputtering method. The structural properties of the PZT(52/48)/BST(60/40) heterolayered thin films were investigated with Ar/$O_2$ ratio condition. All the PZT(52/48)/BST(60/40) heterolayered thin films had shown the PZT(111), (200) and BST(200) Peaks of the tetragonal structure. Increasing the Ar/$O_2$ ratio, the average roughness was increased. The thickness ratio of the to the PZT and BST thin film was 1:2. In the case of the PZT(52/48)/BST(60/40) heterolayered thin films with Ar/$O_2$ ratio of 80/20, the average roughness was 3.4 [nm].

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Preparation and Characterization of $BaTiO_3-CuFe_2O_4$ Bi-Layer Thin Films Prepared By Pulsed Laser Deposition

  • ;;;이희영
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.209-209
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    • 2010
  • Multiferroic properties of $BaTiO_3-CuFe_2O_4$ thin films grown on highly-textured Pt(111)/$TiO_2/SiO_2$/Si(100) substrates were studied. $CuFe_2O_4$ ceramic target was synthesized by mixing oxide powders of CuO, $Fe_2O_03$, $BaTiO_3$ ceramic target was also prepared separately. The film structure was of bi-layer type, where $BaTiO_3$ layer lies underneath of $CuFe_2O_4$ layer, where both layers were grown by pulsed laser deposition technique. We will report the ferroelectric and magnetic properties of $BaTiO_3-CuFe_2O_4$ bi-layer films in some detail.

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RF 스퍼터링법에 의한 SCT 박막의 전압-전류 특성 (V-I Characteristics of SCT Thin Film by RF Sputtering Method)

  • 김진사;조춘남;신철기;최운식;김충혁;이준웅
    • 한국전기전자재료학회논문지
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    • 제13권9호
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    • pp.745-750
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    • 2000
  • The (S $r_{0.85}$C $a_{0.15}$) Ti $O_3$(SCT) thin films are deposited on Pt-coated electrode (Pt/TiN/ $SiO_2$/Si) using RF sputtering method at various deposition temperature. The crystallinity of SCT thin films were increased with increase of deposition temperature in the temperature range of 200~500[$^{\circ}C$]. Also, the composition of SCT thin films were closed to stoichiometry (1.080~1.111 in A/B ratio). V-I characteristics of SCT thin films show the increasing leakage current with the increases of deposition temperature. The conduction mechanism of the SCT thin films observed in the temperature range of 25~100[$^{\circ}C$] can be divided into four regions with different mechanism by the increasing current. The region I below 0.8[MV/cm]shows the ohmic conduction. The region II between 0.9~2[MV/cm] is in proportion to J∝ $E^{1.5}$ , the region III between 2~4[MV/cm] can be explained by the Child’s law, and the region IV above 4[MV/cm]is dominated by the tunneling effect.ect.

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