Browse > Article
http://dx.doi.org/10.4191/KCERS.2007.44.8.403

The Microstructure and Ferroelectric Properties of Ce-Doped Bi4Ti3O12 Thin Films Fabricated by Liquid Delivery MOCVD  

Park, Won-Tae (Department of Materials Science and Engineering, Korea University)
Kang, Dong-Kyun (Department of Materials Science and Engineering, Korea University)
Kim, Byong-Ho (Department of Materials Science and Engineering, Korea University)
Publication Information
Abstract
Ferroelectric Ce-doped $Bi_4Ti_3O_{12}$ (BCT) thin films were deposited by liquid delivery metal organic chemical vapor deposition (MOCVD) onto a $Pt(111)/Ti/SiO_2/Si(100)$ substrate. X-ray diffraction (XRD) and scanning electron microscopy (SEM) were used to identify the crystal structure, the surface, and the cross-section morphology of the deposited ferroelectric flims. After annealing above $640^{\circ}C$, the BCT films exhibited a polycrystalline structure with preferred (001) and (117) orientations. The BCT lam capacitor with a top Pt electrode showed a large remnant polarization ($2P_r$) of $44.56{\mu}C/cm^2$ at an applied voltage of 5 V and exhibited fatigue-free behavior up to $1.0{\times}10^{11}$ switching cycles at a frequency of 1 MHz. This study clearly reveals that BCT thin film has potential for application in non-volatile ferroelectric random access memories and dynamic random access memories.
Keywords
Ce-doped $Bi_4Ti_3O_{12}$; Polycrystalline; Randomly oriented; Fatigue-free;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
Times Cited By SCOPUS : 0
연도 인용수 순위
1 J. F. Scott and C. A. Paz de Araujo, 'Ferroelectric Memories,' Science, 246 [4936] 1400-05 (1989)   DOI   ScienceOn
2 J. F. Scott, 'Device Physics of Ferroelectric Thin Film Memories,' Jpn. J. Appl. Phys., 38 [4B] 2272-74 (1999)   DOI
3 U. Chon, K. B. Kim, H. M. Jang, and G. C. Yi, 'Fatigue-Free Samarium-Modified Bismuth Titanate $(Bi_{4-x}Sm_xTi_3O_{12})$ Film Capacitors Having Large Spontaneous Polarizations,' Appl. Phys. Lett., 79 [19] 3137-39 (2001)   DOI   ScienceOn
4 U. Chon, H. M. Jang, M. G. Kim, and C. H. Chang, 'Layered Perovskites with Giant Spontaneous Polarizations for Non-volatile Memories,' Phys. Rev. Lett., 89 [8] 087601-4 (2002)   DOI   ScienceOn
5 H. Uchida, H. Yoshikawa, I. Okada, H. Matsuda, T. Iijima, T. Watanabe, T. Kojima, and H. Funakubo, 'Approach for Enhanced Polarization of Polycrystalline Bismuth Titanate Films by $Nd^{3+}/V^{5+}$ Co-Substitution,' Appl. Phys. Lett., 81 [12] 2229-31 (2002)   DOI   ScienceOn
6 Y. Shimakawa, Y. Kubo, Y. Tauchi, H. Asano, T. Kamiyama, F. Izumi, and Z. Hiroi, 'Structural Distortion and Ferroelectric Properties of $SrBi_2(Ta_{1-x}Nd_x)_2O_9$,' Appl. Phys. Lett., 77 [17] 2749-51 (2000)
7 Ch. H. Yang, Zh. Wang, J. F. Hu, Y. G. Yang, X. Zhang, F. Y. Jiang, and J. R. Han, 'Characteristics of metal-ferroelectric- insulator-semiconduvtor structure using a Nd-doped $Bi_4Ti_3O_{12}$ ferroelctroc layer,' J. Crystal Growth, 267 [3-4] 543-47 (2004)   DOI   ScienceOn
8 Y. Shimakawa, Y. Kubo, Y. Nakagawa, T. Kamiyama, H. Asano, and F. Izumi, 'Crystal Structure and Ferroelectric Propeties of $ABi_2Ta_2O_2 $(A= Ca,Sr, and Ba),' Phys. Rev. B, 61 [10] 6559-64 (2000)   DOI   ScienceOn
9 H. K. Kim, D. K. Kang, and B. H. Kim, 'Fabrication of Nd- Substituted $Bi_4Ti_3O_{12}$ Thin Films by Metal Organic Chemical Vapor Deposition and Their Ferroelectrical Characterization,' J. Kor. Ceram. Soc., 42 [4] 219-23 (2005)   과학기술학회마을   DOI   ScienceOn
10 T. J. Cho, D. K. Kang, and B. H. Kim, 'Electrical Properties of Sol-Gel Derived Ferroelectric $Bi_{3.35}Sm_{0.65}Ti_3O_{12}$ Thin Films by Rapid Thermal Annealing,' Trans. EEM., 6 [2] 51-6 (2005)   과학기술학회마을   DOI   ScienceOn
11 B. H. Park, B. S. Kang, S. D. Bu, T. W. Noh, J. Lee, and W. Jo, 'Lanthanide-Substituted Bismuth Titanate for Use in Non-Volatile Memories,' Nature, 401 [6754] 682-84 (1999)   DOI
12 H. Maiwa, N. Lizawa, D. Togawa, T. Hyashi, W. Sakamoto, M. Yamada, and S. Hirano, 'Electromechanical Properties of Nd-Doped $Bi_4Ti_3O_{12} $Films :A Candidate for Lead-Free Thin Film Piezoelectrics,' Appl. Phys. Lett., 82 [11] 1760-62 (2003)   DOI   ScienceOn
13 Y. Noguchi, I. Miwa, Y. Goshima, and M. Miyayam, 'Defect Control for Large Remanent Polarization in Bismuth Titanate Ferroelectric:Doping Effect of Higher Valent Cations,' Jpn. J.Appl. Phys., 39 [12B] L1259-62 (2000   DOI   ScienceOn
14 T. Kojima, T. Sakai, T. Watanabe, H. Funakubo, K. Saito, and M. Osada, 'Large Remnant Polarization of $(Bi,Nd)_4Ti_3O_{12}$ Epitaxial Thin Films Grown by Metalorganic Chemical Vapor Deposition,' Appl. Phys. Lett., 80 [15] 2746-8 (2002)   DOI   ScienceOn
15 T. Kojima, T. Sakai, T. Watanabe, H. Funakubo, K. Saito, and M. Osada, 'Large Remnant Polarization of $(Bi,Nd)_4Ti_3O_{12}$ Epitaxial Thin Films Grown by Metalorganic Chemical Vapor Deposition,' Appl. Phys. Lett., 80 [15] 2746-48 (2002)   DOI   ScienceOn
16 C. H. Yang, Zh. Wang, F. Y. Jiang, Y. L. Geng, B. Y. Zhu, X. J. Yi, G. P. Ma, and J. R. Han, 'Electrical Properties of Pr-Doped $Bi_4Ti_3O_{12}$ Thin Films on Si Substrate,' J. Crystal Growth, 271 [1-2] 171-75 (2004)   DOI   ScienceOn
17 W. J. Kim, S. S. Kim, K. Jang, J. C. Bae, T. K. Song, and Y. I. Lee, 'Ferroelectric $Bi_{3.4}Eu_{0.6}Ti_3O_{12}$Thin Films Deposited on Si(100) and Pt/Ti/$SiO_2$/Si(100) Substrates by a Sol-Gel Process,' J. Crystal Growth, 262 [1-4] 327-33 (2004)   DOI   ScienceOn