• Title/Summary/Keyword: Shadow length

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Control of a Novel PV Tracking System Considering the Shadow Influence

  • Ko, Jae-Sub;Chung, Dong-Hwa
    • Journal of Electrical Engineering and Technology
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    • v.7 no.4
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    • pp.524-529
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    • 2012
  • This paper proposes a novel control strategy of a PV tracking system considering the shadow influence. If distance of between PV arrays is not enough, shadow can be occurred to PV module. In PV system, if shadow is occurred to PV modules then PV modules operates reverses bias, and will eventually cause hot-spot and loss. To reduce loss by shadow influence, this paper proposes shadow compensation algorithm using distance between arrays and shadow length of array. The distance between arrays is calculated by using azimuth of solar, and length of array shadow is calculated using by altitude of solar. The shadow compensation algorithm proposed in this paper compares distance between arrays and length of array shadow. When the shadow length is longer than the distance between arrays, the algorithm adjusts altitude of array to avoid the shadow effects. The control algorithm proposed in this paper proves validity through compared with conventional algorithm and proposes experiment result.

Control of a Novel PV Tracking System Considering the Shadow Influence (그림자 영향을 고려한 새로운 태양광 추적시스템 제어)

  • Park, Ki-Tae;Choi, Jung-Sik;Chung, Dong-Hwa
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.57 no.6
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    • pp.994-1002
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    • 2008
  • In this paper a novel tracking system is described, regarding the influence of shadow between array, aimed at improving the efficiency of PV tracking system. Comparing with a building site versus capacity power, domestic solar powers have a limited siting. Therefore, each array interferes with the shadow of other arrays. The loss by influence of those shadow can be compensated for by means of control algorithm of the tracking device. The paper suggests a method controlling an altitude for length which is received the shadow influence of PV array. By using an azimuth of current solar position and the length between arrays, the controller of tracking device is able to calculate the length between actual arrays and make a comparison of the shadow length at a specific time with the length between arrays. When the shadow length is longer than the length between arrays, the controller of tracking device can adjust a position by compensating error altitude of the length between arrays at an altitude of current solar position. In the paper, we develop the control algorithm able to minimize the loss caused by the influence of shadow on the PV tracking system, and compared this with conventional output system. The controller has been tested in the laboratory with proposed algorithm and shows excellent performance.

Photovoltaic tracking system considered loss by shadow (음영에 의한 손실을 고려한 태양광 발전 추적 시스템)

  • Choi, Jung-Sik;Ko, Jae-Sub;Jung, Chul-Ho;Kim, Do-Yon;Jung, Byung-Jin;Chung, Dong-Hwa
    • 한국태양에너지학회:학술대회논문집
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    • 2008.04a
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    • pp.135-141
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    • 2008
  • In this paper a novel tracking system is described, regarding the influence of shadow between array, aimed at improving the efficiency of PV tracking system. Comparing with a building site versus capacity power, domestic solar powers have a limited siting. Therefore, each array interferes with the shadow of other arrays. The loss by influence of those shadow can be compensated for by means of control algorithm of the tracking device. The paper suggests a method controlling an altitude for length which is received the shadow influence of PV array. By using an azimuth of current solar position and the length between arrays, the controller of tracking device is able to calculate the length between actual arrays and make a comparison of the shadow length at a specific time with the length between arrays. When the shadow length is longer than the length between arrays, the controller of tracking device can adjust a position by compensating error altitude of the length between arrays at an altitude of current solar position. In the paper, we develop the control algorithm able to minimize the loss caused by the influence of shadow on the PV tracking system, and compared this with conventional output system. The controller has been tested in the laboratory with proposed algorithm and shows excellent performance

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Development of shadow compensation algorithm for efficiency improvement of photovoltaic tracking system (태양광 발전 추적 시스템의 효율 향상을 위한 그림자 보상알고리즘 개발)

  • Ko, Jae-Sub;Choi, Jung-Sik;Jung, Chul-Ho;Kim, Do-Yeon;Jung, Byung-Jin;Jun, Young-Sun;Chung, Dong-Hwa
    • Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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    • 2008.05a
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    • pp.411-414
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    • 2008
  • In this paper a novel tracking system is described, regarding the influence of shadow between array, aimed at improving the efficiency of PV tracking system. The loss by influence of those shadow can be compensated for by means of control algorithm of the tracking device. The paper suggests a method controlling an altitude for length which is received the shadow influence of PV array. By using an azimuth of current solar position and the length between arrays, the controller of tracking device is able to calculate the length between actual arrays and make a comparison of the shadow length at a specific time with the length between arrays. In the paper, we develop the control algorithm able to minimize the loss caused by the influence of shadow on the PV tracking system, and compared this with conventional output system. The controller has been tested in the laboratory with proposed algorithm and shows excellent performance

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ON THE EXTREMAL TYPE I BINARY SELF-DUAL CODES WITH NEAR-MINIMAL SHADOW

  • HAN, SUNGHYU
    • Journal of applied mathematics & informatics
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    • v.37 no.1_2
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    • pp.85-95
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    • 2019
  • In this paper, we define near-minimal shadow and study the existence problem of extremal Type I binary self-dual codes with near-minimal shadow. We prove that there is no such codes of length n = 24m + 2($m{\geq}0$), n = 24m + 4($m{\geq}9$), n = 24m + 6($m{\geq}21$), and n = 24m + 10($m{\geq}87$).

Fabrication of Miniaturized Shadow-mask for Local Deposition (국부증착용 마이크로 샤도우 마스크 제작)

  • 김규만;유르겐부르거
    • Journal of the Korean Society for Precision Engineering
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    • v.21 no.8
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    • pp.152-156
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    • 2004
  • A new tool of surface patterning technique for general purpose lithography was developed based on shadow mask method. This paper describes the fabrication of a new type of miniaturized shadow mask. The shadow mask is fabricated by photolithography and etching of 100-mm full wafer. The fabricated shadow mask has over 388 membranes with apertures of micrometer length scale ranging from 1${\mu}{\textrm}{m}$ to 100s ${\mu}{\textrm}{m}$ made on each 2mm${\times}$2mm large low stress silicon nitride membrane. It allows micro scale patterns to be directly deposited on substrate surface through apertures of the membrane. This shadow mask method has much wider choice of deposit materials, and can be applied to wider class of surfaces including chemical functional layer, MEMS/NEMS surfaces, and biosensors.

A Hybrid Shadow Testing Scheme During Ray Tracing (광선추적 수행중 혼합 음영검사에 관한 연구)

  • Eo, Kil-Su;Kyung, Chong-Min
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.26 no.3
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    • pp.95-104
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    • 1989
  • This paper presents a new shadow testing acceleration scheme for ray tracing called Hybrid Shadow Testing (HST) based on a conditional switching between the conventinal shadow testing method and Crow's shadow volume method, where the shadow polygons as well as the object polygons are registered onto the corresponding cells under the 3-D space subdivision environment. Despite the preprocessing time for the generation and registration of the shadow polygons, the total shadow testing time of the proposed algorithm, HST was approximately 50% of that of the conventional shadow testing method for several examples while the total ray tracing time was typically reduced by 30% from the conventional approach. This due to the selective use of the shadow volume method with a compromise between the maximal utilisation of shadow's spatial coherency and minimising the computational overhead for checking ray intersections with the shadow polygons. A parameter, $N_{th}$ denoting the critical number of shadow polygons between successive reflection points was used as a guideline for switching the shadow testing scheme between the conventional method and shadow volume method. A method for calculating $N_{th}$ from such statistical data as the number of object polygons, average polygon size average peripheral length of the polygons was proposed, resulting in good agreement with the experimental results.

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A Study on the Improvement of Accuracy of Shape Measurement in the Shadow Moire Method (그림자식 모아레를 이용한 형상측정법의 정확도 개선에 관한 연구)

  • 박경근;박윤창;정경민
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 1999.05a
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    • pp.175-180
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    • 1999
  • Generally, When we measure of object 3D surfaces with phase shifting shadow moire method, it is use of optical system consist of light source, grating, and ccd camera. At this time, it is important parameter that vertical distance of grating and camera, grating and light source, and horizontal distance of camera and light source. When use camera consist of complex lens vertical distance of grating and camera is unknown parameter. From this cause equivalent wave length of moire fringe is uncertain. In this study, We exactly obtain a vertical distance of grating and camera so improve on measurement accuracy.

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Pentacene Thin Film Transistors Fabricated by High-aspect Ratio Metal Shadow Mask

  • Jin, Sung-Hun;Jung, Keum-Dong;Shin, Hyung-Chul;Park, Byung-Gook;Lee, Jong-Duk;Yi, Sang-Min;Chu, Chong-Nam
    • 한국정보디스플레이학회:학술대회논문집
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    • 2004.08a
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    • pp.881-884
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    • 2004
  • The robust and large-area applicable metal shadow masks with a high aspect ratio more than 20 are fabricated by a combination of micro-electro-discharge machining (${\mu}$-EDM) and electro chemical etching (ECE). After defining S/D contacts using a 100 ${\mu}m$ thick stainless steel shadow mask, the top-contact pentacene TFTs with channel length of 5 ${\mu}m$ showed routinely the results of mobility of 0.498 ${\pm}$ 0.05 $cm^2$/Vsec, current on/off ratio of 1.6 ${times}$ $10^5$, and threshold voltage of 0 V. The straightly defined atomic force microscopy (AFM) images of channel area demonstrated that shadow effects caused by the S/D electrode deposition were negligible. The fabricated pentacene TFTs have an average channel length of 5 ${\pm}$ 0.25 ${\mu}m$.

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